CN109650745A - A kind of Low emissivity hollow glass with ultraviolet isolating effect - Google Patents
A kind of Low emissivity hollow glass with ultraviolet isolating effect Download PDFInfo
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- CN109650745A CN109650745A CN201910106417.9A CN201910106417A CN109650745A CN 109650745 A CN109650745 A CN 109650745A CN 201910106417 A CN201910106417 A CN 201910106417A CN 109650745 A CN109650745 A CN 109650745A
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- 239000011521 glass Substances 0.000 title claims abstract description 160
- 230000000694 effects Effects 0.000 title claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 238000004134 energy conservation Methods 0.000 claims abstract description 18
- 238000009413 insulation Methods 0.000 claims abstract description 14
- 229910004205 SiNX Inorganic materials 0.000 claims description 44
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 43
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 43
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 31
- 229910001120 nichrome Inorganic materials 0.000 claims description 31
- 229910003087 TiOx Inorganic materials 0.000 claims description 23
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 23
- 238000002310 reflectometry Methods 0.000 claims description 14
- 239000010410 layer Substances 0.000 claims 86
- 239000002344 surface layer Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 11
- 238000010521 absorption reaction Methods 0.000 abstract description 8
- 230000004224 protection Effects 0.000 abstract description 8
- 230000006750 UV protection Effects 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract 1
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 14
- 238000006124 Pilkington process Methods 0.000 description 11
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- 230000004888 barrier function Effects 0.000 description 7
- 239000002131 composite material Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 230000006378 damage Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 4
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- 238000010586 diagram Methods 0.000 description 4
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- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 239000005340 laminated glass Substances 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 238000011056 performance test Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
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- 238000012545 processing Methods 0.000 description 2
- CBECDWUDYQOTSW-UHFFFAOYSA-N 2-ethylbut-3-enal Chemical group CCC(C=C)C=O CBECDWUDYQOTSW-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- 208000012641 Pigmentation disease Diseases 0.000 description 1
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- JTHNLKXLWOXOQK-UHFFFAOYSA-N n-propyl vinyl ketone Natural products CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/74—UV-absorbing coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A30/00—Adapting or protecting infrastructure or their operation
- Y02A30/24—Structural elements or technologies for improving thermal insulation
- Y02A30/249—Glazing, e.g. vacuum glazing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B80/00—Architectural or constructional elements improving the thermal performance of buildings
- Y02B80/22—Glazing, e.g. vaccum glazing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a kind of Low emissivity energy conservation hollow glass with ultraviolet isolating effect, including two panels glass substrate, and the two panels glass substrate complements one another to form hollow structure, wherein, there is the Low emissivity complex function film layer of ultraviolet isolating effect at least a piece of glass substrate surface setting.Mainly pass through absorption compared to existing ultraviolet isolating product and obstruct ultraviolet line method, hollow glass of the present invention is, it can be achieved that ultraviolet light reflection mode reaches ultraviolet isolating effect, greatly enhancing ultraviolet reflection intensity.And; the hollow glass is more easily implemented extensive deposition; while realizing ultraviolet isolating; with good function of heat insulation; its product cost is low compared with PVB scheme low with double film products simultaneously; the place of the ultraviolet protection protection and some airports and a large amount of reflection ultraviolet lights of needs that act on suitable for the art work, photography uses.
Description
Technical field
The present invention relates to optical coating glass production manufacturing technology fields, and in particular to one kind has ultraviolet isolating effect
Low emissivity hollow glass.
Background technique
Solar spectrum is a kind of continuous spectrum being made of different wave length light wave, can be divided into visible light and black light two
Part.Wherein, it is seen that light refers to the visible light wave of human eye of the wave-length coverage between 400~760nm, it is seen that light passes through three
It is divided into seven kinds of colors such as red, orange, yellow, green, blue, blue, purple after prism scattering, all visible lights put together, show white
Light.Black light can also be divided into two kinds: the exterior domain positioned at feux rouges is known as infrared ray, typically refers to wavelength greater than 760nm's
Light wave；And ultraviolet light, 290~400nm of wavelength are positioned at the exterior domain of purple light.The ultraviolet range of stricti jurise is covered
100-400nm can specifically divide three wave bands, i.e. short wave ultraviolet (UVC) 100-290nm, ultraviolet B radiation (UVB)
290-320nm, long wave ultraviolet (UVA) 320-400nm.Since short wave ultraviolet is very easy to be absorbed by atmosphere, institute's ether
The ultraviolet light that earth surface is irradiated in solar spectrum is concentrated mainly on 290nm-400nm.
Usual simple glass can stop UVB completely, but UVA can then penetrate glass, and in UVA SPECTRAL REGION,
The reflectivity of simple glass is only 5%, as shown in Figure 5.It is well known that be exposed under the conditions of strong sunlight irradiation for a long time,
Human eye can be caused to damage.And after human eye is irradiated by ultraviolet light for a long time, caused damage is even more to be difficult to restore.
The art work, antique and photography class works, for a long time receive sunlight irradiation in addition fluorescence, ultraviolet light irradiation
Under effect, it may occur that discoloration, aging.Currently, still not establishing corresponding level of protection to irradiation time and degree of injury.Cause
For containing solvent and binder difference in the different arts work, the dyestuff and pigment contained is also not quite similar, in identical light
Under irradiation condition, their ageing time and degree of aging is all different.
For various damages caused by better protectiving ultraviolet, many methods and measure are invented ultraviolet for stopping
Line, to reduce the injury from ultraviolet light.
Currently, the prior art mainly utilizes material self structure characteristic and material characteristic, ultraviolet spectra is absorbed
Formula barrier, absorbs ultraviolet light by macromolecule resin material.
For example, the resin of preparation sunglasses eyeglass has ultraviolet radiation absorption effect, under strong illumination occasion, sunglasses energy
Enough play the role of good antiultraviolet.But sunglasses not only stops ultraviolet light, also reduces the light transmission of some visible light, while too
Positive mirror size is usually smaller, and it is bad to be allowed to applicability in some cases.
For another example, ultraviolet ray intercepting glass product, the ultraviolet light formed by pressing from both sides one layer of PVB film between two panels glass substrate
Protect laminated glass.Wherein, the main component of PVB film is vinyl butyral.But since PVB film is expensive, and
Finished product is at least two sheet glass, so ultraviolet ray intercepting glass higher cost.
In addition, the UV, visible light transmission curves of certain domestic PVB ultraviolet ray intercepting glass as shown in Figure 6, sample structure 6/
1.52/6, visible light transmittance is less than 90%, it is seen that light is reflected 8% or so.If necessary to increase visible light transmittance, drop
Its low reflectivity, it is also necessary to carry out plated film or coating treatment on its surface.
It in the prior art there are also a kind of method of glass antiultraviolet, is changed by the way that cerium oxide is added in glass ingredient
Become glass for the transmission characteristic of ultraviolet light, obtains the glass with barrier ultraviolet light.By controlling cerium-oxide contents, Ke Yishi
Now to the regulation of absorption of UV size, to obtain the glass product of different ultraviolet ray transmissivities.
But the glass of cerium oxide is added, there are certain pigmentations, and not only appearance has an impact, simultaneously for glass base
The transmitance of piece and being affected for appearance color.This glass is mainly used for space station and military aspect, such as solar battery
The protection of component.It does not have large-scale application in the protection of sunglasses, the art work and photographic work.
Summary of the invention
It is an object of the invention to overcome existing for existing ultraviolet isolating glass product, molding difficulty is big, forming shape has
Limit, the cost of raw material are high and/or light transmittance is low, have the defects that appearance chromatic difference influence etc., provide one kind and have non-absorbing formula purple
The Mobyneb hollow glass of outside line barrier action and Low emissivity energy-conserving action.
To achieve the goals above, the technical solution adopted by the present invention are as follows:
A kind of Low emissivity energy conservation hollow glass with ultraviolet isolating effect, including two panels glass substrate, and described two
Sheet glass substrate complements one another to form hollow structure, wherein
There is the Low emissivity complex function film layer of ultraviolet isolating effect at least a piece of glass substrate surface setting.
According to above-mentioned technical proposal, the present invention has the Low emissivity energy conservation hollow glass of ultraviolet isolating effect, by
One layer of the sandwiched Low emissivity complex function with ultraviolet isolating effect in the closed hollow structure that two panels glass substrate is formed
Type film layer.
It wherein, is preferably vacuum inside the hollow structure.
Preferably, the Low emissivity complex function film layer with ultraviolet isolating effect is arranged in glass substrate outer surface
On, the outer surface refers to the outer surface far from hollow structure.It is highly preferred that the complex function film layer is arranged in hollow glass
Towards on the glass surface of wall face side.
Preferably, the complex function film layer is located at any glass in the two panels glass substrate surface in above-mentioned hollow structure
Glass substrate surface is substrate, and is arranged on above-mentioned substrate surface.
In conjunction with above structure, the complex function type film layer is arranged inside the hollow structure, it not only can be to described
Complex function type film layer plays the role of being effectively protected, and extends the normal service life of film layer, and effectively deduction and exemption are in functional form film layer
Influence of the protectiveness film layer to film layer optical function is arranged in surface；Also, experimental researches prove that by ultraviolet isolating Low emissivity
The hollow glass product formed in glass substrate hollow structure is arranged in, it can be achieved that ultraviolet reflectivity reaches in complex function type film layer
45% or more, ultraviolet ray transmissivity is 20% hereinafter, optimally, ultraviolet ray transmissivity can reach 10% hereinafter, and its radiation
Rate is lower than 0.1, can preferably be lower than 0.05, have good function of heat insulation.
It is highly preferred that the ultraviolet isolating Low emissivity complex function film layer, is arranged in the hollow structure to be located at and build
It builds on the glass substrate surface inside object.
According to above-mentioned preferred embodiment, the ultraviolet isolating Low emissivity complex function film layer is preferably provided at and is located at building
On glass substrate surface inside object, by taking hollow glass structure shown in FIG. 1 as an example, hollow knot will be located in two panels glass substrate
Glass substrate surface in structure is inner surface, and using remaining two surfaces as outer surface, then outer surface is towards interior of building
Glass substrate is " positioned at the glass substrate of interior of building " as of the present invention, corresponding, the ultraviolet isolating Low emissivity
Complex function film layer is arranged on the outer surface of the glass substrate.The Low emissivity complex function film layer of ultraviolet isolating effect is set
It sets in building interior side, plays good ultraviolet light insulating effect.It is preferred that above-mentioned complex function type film layer is in hollow structure
Setting position, can further extend reflection route of the light in hollow structure, improve its reflectivity to ultraviolet light.
Further, preferably following three kinds preferred sides arranged side by side of the specific film layer structure of the Low emissivity complex function film layer
Case.
Scheme one, the Low emissivity complex function film layer successively include bottom since glass substrate surface from inside to outside
SiNx layer, second layer ZnO layer, third layer NiCr alloy-layer, the 4th layer Ag layers, NiCr layers of layer 5, layer 6 SiNx layer, the 7th
SiOx layers, the 8th layer TiOx layers, the 9th layer SiOx layers of layer.
Scheme two, the Low emissivity complex function film layer successively include bottom since glass substrate surface from inside to outside
SiNx layer, second layer ZnO layer, Ag layers of third layer, the 4th layer Cu layers, layer 5 NiCr alloy-layer, ZnSnOx layers of layer 6, the 7th
Layer ZnO layer, the 8th layer Ag layers, the 9th layer AZO layers, the tenth layer of SiNx layer, SiOx layers of eleventh floor, TiOx layers of Floor 12 and the
13 layers SiOx layers.
Scheme three, the Low emissivity complex function film layer successively include bottom since glass substrate surface from inside to outside
SiNx layer, second layer ZnO layer, Ag layers of third layer, the 4th layer AZO layers, ZnSnOx layers of layer 5, layer 6 ZnO layer, layer 7 Ag
Layer, the 8th layer of NiCr alloy-layer, the 9th layer ZnSnOx layers, the tenth layer of ZnO layer, Ag layers of eleventh floor, AZO layers of Floor 12,
13 layers of SiNx layer, the 14th layer SiOx layers, the 15th layer TiOx layers, the 16th layer SiOx layers.
Further, in the preferred embodiment arranged side by side of the above-mentioned 3 kinds ultraviolet isolating Low emissivity complex function film layer structures,
The thickness of each film layer are as follows: positioned at bottom SiNx with a thickness of 5-25nm, positioned at middle layer SiNx with a thickness of 30-70nm,
ZnO layer with a thickness of 5-20nm, the thick bottom of NiCr alloy-layer is 0.1-5nm.ZnSnOx layers of thickness range is 30-75nm.If
The thickness range for setting the SiOx layer on SiNx layer surface is 25-60nm, and the thickness of the SiOx layer in TiOx layer surface is arranged in
Range is 40-110nm, and Cu layers of thickness range is 0~15nm, and TiOx layers of thickness range is 20~60nm, Ag layers of thickness
Range is 5~20nm, and AZO layers of thickness range is 5-15nm.
Be preferably located at the SiNx of middle layer with a thickness of 30-70nm, such as layer 6 SiNx layer, scheme two in scheme one
In the tenth layer of SiNx layer, the 13rd layer of SiNx layer in scheme three, thickness is preferably 30-70nm.
Preferably, ZnO layer with a thickness of 5-20nm, second layer ZnO layer in scheme 1, layer 7 ZnO in scheme two
Layer, layer 6 ZnO layer in scheme three, the thickness of the tenth layer of ZnO layer can choose 5-20nm in scheme three.
Preferably, the thick bottom of NiCr alloy-layer is 0.1-5nm.For example, third layer NiCr alloy-layer, layer 5 in scheme one
NiCr layers, layer 5 NiCr alloy-layer in scheme two, the 8th layer of NiCr alloy-layer in scheme three.
Preferably, ZnSnOx layers of thickness range is 30-75nm.For example, layer 6 ZnSnOx layers in scheme two, scheme three
Middle layer 5 ZnSnOx layers, the 9th layer ZnSnOx layers with a thickness of 30-75nm.
Preferably, the thickness range that the SiOx layer on SiNx layer surface is arranged in is 25-60nm.Such as the 7th in scheme one
SiOx layers of layer, SiOx layers of eleventh floor in scheme two, the 14th layer of SiOx thickness degree can choose 25-60nm in scheme three.
Preferably, the thickness range that the SiOx layer in TiOx layer surface is arranged in is 40-110nm.Such as in scheme one
Nine layers SiOx layers, the 13rd layer SiOx layers in scheme two, the 16th layer SiOx layers of thickness is preferably 40-110nm in scheme three.
Preferably, Cu layers of thickness range is that the 4th layer of Cu thickness degree can choose 0- in 0~15nm, such as scheme two
15nm。
Preferably, TiOx layers of thickness range is 20~60nm.Such as the 8th layer TiOx layers in scheme one, in scheme two
The 15th layer TiOx layers in TiOx layers of Floor 12, scheme three, thickness can be set to 20-60nm.
Preferably, Ag layers of thickness range is 5~20nm.Such as the 4th layer Ag layers in scheme one, third layer in scheme two
Ag layers, the 8th layer Ag layers, Ag layers of third layer, Ag layers, Ag layers of eleventh floor of layer 7 in scheme three.
Preferably, AZO layers of thickness range is 5-15nm.Such as the 9th layer AZO layers in scheme two, the 4th layer in scheme three
AZO layers, AZO layers of Floor 12, thickness can choose 5-15nm.
Further, the ultraviolet reflectivity 30~85% of the hollow glass product of scheme one, ultraviolet ray transmissivity 10~50%,
Radiance is 0.05~0.12, has good function of heat insulation.
Further, the ultraviolet reflectivity 45~85% of the hollow glass product of scheme two, ultraviolet ray transmissivity 5~20%,
Radiance is 0.08~0.02, has good function of heat insulation.
Further, the ultraviolet reflectivity 40~85% of the hollow glass product of scheme three, ultraviolet ray transmissivity 5~25%,
Radiance is 0.05~0.02, has good function of heat insulation.
Foundation above-mentioned technical proposal, the beneficial effects of the present invention are:
1, for existing absorption ultraviolet-resistant glass product, the present invention has the low spoke of ultraviolet radiation absorption effect
Energy saving hollow glass is penetrated, it is multiple by the way that one layer of ultraviolet isolating Low emissivity is arranged inside the hollow structure that two panels glass substrate is formed
Functional form film layer is closed, composite film is isolated with external environment by hollow structure inside, to play the role of effective protection, has
Effect deduction and exemption cause the defects of film layer transmissivity is low, there are appearance chromatic differences in functional form film surface setting protectiveness film layer, more suitable
For the protection of human eye and the protection application of the art work.
2, the composite construction of hollow film of the present invention can be realized through light reflection mode, realize that ultraviolet reflection barrier is made
With reaching 45% or more to its reflectivity of ultraviolet light, ultraviolet ray transmissivity relative to existing absorption ultraviolet isolating mode
20% hereinafter, effectively obstructing ultraviolet light.Hollow glass product reflection ultraviolet light ratio is greatly enhanced simultaneously, so that birds pair
It is improved in the visibility of glass, reduces birds collision.
3, it is purple to effectively prevent existing absorption ultraviolet isolating glass product Long-term absorption for hollow film-plated glass of the present invention
After outside line, it is easy the defect of aging, extends product service life.
4, hollow glass product of the present invention passes through test verification, not only has excellent ultraviolet isolating effect, also has
Radiance is lower than 0.1 fine quality, has good function of heat insulation, can be suitable for broader applications requirement.
5, hollow glass product composite film structure of the present invention, processing and film plating difficulty is lower, is easily worked molding, reduce at
This, can preferably expand the application range of hollow glass product.
Detailed description of the invention
Fig. 1 is the structural schematic diagram for the Low emissivity energy conservation hollow glass that the present invention has the effect of ultraviolet light Low emissivity.
Fig. 2 is the structural schematic diagram of ultraviolet isolating Low emissivity complex function film layer described in embodiment 1.
Fig. 3 is the structural schematic diagram of ultraviolet isolating Low emissivity complex function film layer described in embodiment 2.
Fig. 4 is the structural schematic diagram of ultraviolet isolating Low emissivity complex function film layer described in embodiment 3.
Fig. 5 is common 6mm float glass near ultraviolet visible light transmission curve.
Fig. 6 is that the ultraviolet light that one layer of PVB film is formed that presss from both sides between two sheet glass of certain existing domestic PVB producer production is prevented
Protect the UV, visible light transmission curves of laminated glass.
Fig. 7 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 1.
Fig. 8 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 2.
Fig. 9 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 3.
Marked in the figure: A- outdoor face, B- chamber internal surface, the first glass substrate of 1-, the second glass substrate of 2-, 3- ultraviolet light
Obstruct Low emissivity complex function type film layer, 4- hollow structure frame.
In 1 complex function film layer structure of embodiment illustrated in fig. 2: 311- bottom SiNx layer, 312- second layer ZnO layer, 313-
Third layer NiCr alloy-layer, the 4th layer Ag layers of 314-, NiCr layers of 315- layer 5,316- layer 6 SiNx layer, 317- layer 7
SiOx layers, the 8th layer TiOx layers of 318-, the 9th layer SiOx layers of 319-.
In 2 complex function film layer structure of embodiment illustrated in fig. 3: 321- bottom SiNx layer, 322- second layer ZnO layer, 323-
Ag layers of third layer, the 4th layer Cu layers of 324-, 325- layer 5 NiCr alloy-layer, ZnSnOx layers of 326- layer 6,327- layer 7
ZnO layer, the 8th layer Ag layers of 328-, the 9th layer AZO layers of 329-, the tenth layer of SiNx layer of 3210-, SiOx layers of 3211- eleventh floor,
TiOx layers of 3212- Floor 12, the 13rd layer SiOx layers of 3213-.
In 3 complex function film layer structure of embodiment illustrated in fig. 4: 331- bottom SiNx layer, 332- second layer ZnO layer, 333-
Ag layers of third layer, the 4th layer AZO layers of 334-, ZnSnOx layers of 335- layer 5,336- layer 6 ZnO layer, Ag layers of 337- layer 7,
The 8th layer of NiCr alloy-layer of 338-, the 9th layer ZnSnOx layers of 339-, the tenth layer of ZnO layer of 3310-, Ag layers of 3311- eleventh floor,
AZO layers of 3312- Floor 12, the 13rd layer of SiNx layer of 3313-, the 14th layer SiOx layers of 3314-, the 15th layer of TiOx of 3315-,
The 16th layer of SiOx of 3316-.
Specific embodiment
With reference to the accompanying drawing, the present invention is described in detail.
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments, right
The present invention is further elaborated.It should be appreciated that described herein, specific examples are only used to explain the present invention, not
For limiting the present invention.
There is the structure of the Low emissivity energy conservation hollow glass product of ultraviolet light Low emissivity effect as shown in Figure 1: including first
2 two panels glass substrate of glass substrate 1 and the second glass substrate, and the first glass substrate 1 and the second glass substrate 2 complement one another,
It combines to form hollow structure in the two sides of hollow structure frame 4, be set on the surface of the first glass substrate 1 or the second glass substrate 2
Set the Low emissivity complex function film layer 3 with ultraviolet isolating effect.
Preferably, ultraviolet isolating Low emissivity complex function film layer 3 is arranged on 1 outer surface of the first glass substrate, i.e., and the
One glass is far from the surface of hollow structure.
Using the surface positioned at hollow structural glass substrate hollow structure side as inner surface, other two surface is appearance
Face；It is indoor surface B positioned at the outer surface of interior of building, the outer surface being located outside is outdoor face A.Correspondingly, ultraviolet light hinders
It is arranged on B surface every Low emissivity complex function film layer 3.
Furthermore it is also possible to be arranged ultraviolet isolating every Low emissivity complex function film layer 3 in two inner surface (the first glass
The surface of substrate and the second glass substrate close to hollow structure side) in any one on.
In a specific embodiment of the invention, the ultraviolet isolating Low emissivity complex function film layer 3 is plated on
In the hollow structure on 1 surface of the first glass substrate of interior of building.It can be the close room of the first glass substrate
The surface of interior side is also possible to the first glass substrate close to the surface of the side of hollow structure.
With hollow glass structure described in Fig. 1 for a kind of Low emissivity section with ultraviolet light Low emissivity effect of the present invention
The foundation structure of energy hollow glass product, then specifically with the film layer structure of the ultraviolet isolating Low emissivity complex function film layer 3
Subject to, following 3 kinds of specific product embodiments are provided:
Embodiment 1
The present embodiment provides a kind of Low emissivity energy conservation hollow glass product with ultraviolet light Low emissivity effect, specifically to scheme
1 hollow structure.Use the white glass of our company's 6mm float glass process as glass substrate, wherein the white glass basis piece surface vacuum of a piece of float glass process
Sputtering obtains the ultraviolet isolating Low emissivity complex function film layer 3, and film layer structure is as shown in Figure 2.
Wherein, the structure of exterior wall surface plating complex function film layer is using the first glass substrate 1 as substrate, from substrate table
Face starts successively to process to obtain from inside to outside: bottom SiNx layer 311, second layer ZnO layer 312, third layer NiCr alloy-layer 313,
317, the 8th layers of 4th layer of Ag layer 314, layer 5 NiCr layer 315, layer 6 SiNx layer 316, layer 7 SiOx layer TiOx layer 318
With the 9th layer of SiOx layer 319.
It processes to obtain above-mentioned composite film structure in the white glass substrate surface of 6mm float glass process using vacuum magnetic-control sputtering technique,
In, bottom SiNx layer 311 with a thickness of 15nm, second layer ZnO layer 312 with a thickness of 18nm, third layer NiCr alloy-layer 313
With a thickness of 5nm, the 4th layer of Ag layer 314 with a thickness of 5-20nm, layer 5 NiCr layer 315 with a thickness of 10nm, layer 6 SiNx layer
316 with a thickness of 30-70nm, layer 7 SiOx layer 317 with a thickness of 25-60nm, the thickness 20- of the 8th layer of TiOx layer 318
60nm and the 9th layer of SiOx layer 319 with a thickness of 40-110nm.
Through detecting, the ultraviolet reflectivity 30~85% of above-mentioned hollow glass product, ultraviolet ray transmissivity 10~50%, radiation
Rate is 0.05~0.12, has good function of heat insulation.
Comparative example 1
The comparative example is prepared referring to embodiment 1, the difference from embodiment 1 is that: by ultraviolet isolating Low emissivity
The thickness adjustment of each film layer in the film layer structure of complex function film layer 3 are as follows: 311 thickness 30nm of bottom SiNx layer, second layer ZnO layer
312 thickness 30nm, 313 thickness 7nm of third layer NiCr alloy-layer, the 4th layer of 314 thickness 5-20nm of Ag layer, layer 5 SiNx layer
317 thickness 80nm and the 8th layers of 315 thickness 80nm, 316 thickness 80nm of layer 6 SiOx layer, layer 7 TiOx layer SiOx layer 318
Thickness 20nm.The preparation selection of remaining hollow glass and technological parameter are consistent, and obtain hollow film-plated glass product.
Comparative example 2
The comparative example is prepared referring to embodiment 1, the difference from embodiment 1 is that: omit the low spoke of ultraviolet isolating
The third layer NiCr alloy-layer 313 in complex function film layer 3 is penetrated, remaining film layer material and thickness remain unchanged, and obtain hollow plating
Film glass product.
Embodiment 2
The present embodiment provides another the Low emissivity energy conservation hollow glass product with ultraviolet light Low emissivity effect, knot
Structure is oppositely arranged in conjunction with hollow glass frame, building obtains hollow as shown in Figure 1, using the white glass of two panels 6mm float glass process as substrate
The product of structure.Wherein, have ultraviolet isolating Low emissivity shown in Fig. 3 compound in the glass substrate surface processing of exterior wall surface
The film layer structure of functional film layer 3.
The structure for the complex function film layer 3 processed in the glass substrate of exterior wall surface is with the interior table of the first glass substrate 1
Face is substrate, since substrate from inside to outside successively are as follows: bottom SiNx layer 321, second layer ZnO layer 322, third layer Ag layer 323,
4th layer of Cu layer 324, layer 5 NiCr alloy-layer 325, layer 6 ZnSnOx layer 326, layer 7 ZnO layer 327, the 8th layer Ag layers
328,329, the tenth layers of SiNx layer 3210 of the 9th layer of AZO layer, eleventh floor SiOx layer 3211, Floor 12 TiOx layer 3212 and
13 layers of SiOx layer 3213.
It processes to obtain above-mentioned composite film structure in the white glass substrate surface of 6mm float glass process using vacuum magnetic-control sputtering technique,
In, the bottom SiNx layer 321 with a thickness of 20nm, second layer ZnO layer 322 with a thickness of 15nm, the thickness of third layer Ag layer 323
Degree is 9nm, the 4th layer of Cu layer 324 with a thickness of 6nm, layer 5 NiCr alloy-layer 325 with a thickness of 2nm, layer 6 ZnSnOx
Layer 326 with a thickness of 35nm, layer 7 ZnO layer 327 with a thickness of 15nm, the 8th layer of Ag layer 328 with a thickness of 12nm, the 9th layer
AZO layer 329 with a thickness of 10nm, the tenth layer of SiNx layer 3210 with a thickness of 45nm, eleventh floor SiOx layer 3211 with a thickness of
35nm, Floor 12 TiOx layer 3212 with a thickness of 40nm, the 13rd layer of SiOx layer 3213 with a thickness of 60nm.
Through detecting, the ultraviolet reflectivity 45~85% of above-mentioned hollow glass product, ultraviolet ray transmissivity 5~20%, radiation
Rate is 0.08~0.02, has good function of heat insulation.
Comparative example 3
The comparative example is arranged referring to embodiment 2, the difference from example 2 is that: ultraviolet isolating Low emissivity is compound
In the film layer structure of functional film layer 3: the thickness of layer 5 NiCr alloy-layer 325 is adjusted to 6nm, layer 6 ZnSnOx layer 326
Thickness is adjusted to 90nm；The thickness of 9th layer of AZO layer 329 is adjusted to 30nm；The material and thickness of remaining film layer structure are constant, obtain
To hollow film-plated glass product.
Embodiment 3
The present embodiment provides a kind of Low emissivity energy conservation hollow glass product with ultraviolet light Low emissivity effect, hollow glass
Structure is as shown in Figure 1.The white glass of float glass process being oppositely arranged by two panels is processed in the white glass basis piece of two panels float glass process by frame 4 as substrate
Form hollow structure.The white glass substrate surface of one piece of float glass process is machined with ultraviolet isolating Low emissivity complex function film layer 3, institute wherein
It is as shown in Figure 4 to state complex function film layer structure.
Complex function film layer structure is using the inner surface of the first glass substrate 1 as substrate, from introversive since substrate surface
What outer successively vacuum sputtering obtained: bottom SiNx layer 331, second layer ZnO layer 332,333, the 4th layers AZO layers of third layer Ag layer
334, layer 5 ZnSnOx layer 335, layer 6 ZnO layer 336,337, the 8th layers of NiCr alloy-layer 338 of layer 7 Ag layer, the 9th layer
ZnSnOx layer 339, the tenth layers of 3312, the 13rd layers of ZnO layer 3310, eleventh floor Ag layer 3311, Floor 12 AZO layer SiNx layer
3313,3314, the 15th layers of TiOx3315, the 16th layer of SiOx3316 of the 14th layer of SiOx layer.
It processes to obtain above-mentioned composite film structure in the white glass substrate surface of 6mm float glass process using vacuum magnetic-control sputtering technique,
In, the bottom SiNx layer 331 with a thickness of 10nm, second layer ZnO layer 332 with a thickness of 12nm, the thickness of third layer Ag layer 333
Degree is 6nm, the 4th layer of AZO layer 334 with a thickness of 14nm, layer 5 ZnSnOx layer 335 with a thickness of 50nm, layer 6 ZnO layer
336 with a thickness of 6nm, layer 7 Ag layer 337 with a thickness of 5nm, the 8th layer of NiCr alloy-layer 338 with a thickness of 1.5nm, the 9th
Layer ZnSnOx layer 339 with a thickness of 38nm, the tenth layer of ZnO layer 3310 with a thickness of 12nm, the thickness of eleventh floor Ag layer 3311
For 7nm, Floor 12 AZO layer 3312 with a thickness of 6nm, the 13rd layer of SiNx layer 3313 with a thickness of 50nm, the 14th layer
SiOx layer 3314 with a thickness of 35nm, the 15th layer of TiOx3315 with a thickness of 30nm, the 16th layer of SiOx3316 with a thickness of
55nm。
Through detecting, the ultraviolet reflectivity 40~85% of above-mentioned hollow glass product, ultraviolet ray transmissivity 5~25%, radiation
Rate is 0.05~0.02, has good function of heat insulation.
Comparative example 4
The comparative example is arranged referring to embodiment 3, and the difference with embodiment 3 is: ultraviolet isolating Low emissivity is compound
In the film layer structure of functional film layer 3: the 4th layer of 334 thickness of AZO layer is changed to 30nm；8th layer of 338 thickness of NiCr alloy-layer is changed to
10nm；3312 thickness of Floor 12 AZO layer is changed to 30nm；13rd layer of 3313 thickness of SiNx layer is changed to 20nm；14th layer
SiOx layer 3314 is with a thickness of 100nm；16th layer of SiOx3316 is with a thickness of 120nm.Remaining technical characteristic remains unchanged, and obtains
Empty coated glass product.
<test case 1>
The hollow film-plated glass product that will be prepared in embodiment 1-3 and comparative example 1-4 is divided in UV-3600 ultraviolet
Data are measured on photometer, carry out major optical performance test, test result is as follows table according to JGJ/T 151-2018 standard
It is shown.
The optical performance test result of 1 hollow film-plated glass product of table
| Performance indicator | Tvis | Rout | UV trans/% | UV ref/% | Radiance |
| Embodiment 1 | 0.64 | 0.07 | 15 | 73 | 0.09 |
| Embodiment 2 | 0.48 | 0.25 | 6.5 | 81 | 0.05 |
| Embodiment 3 | 0.5 | 0.27 | 14 | 62 | 0.02 |
| Comparative example 1 | 0.23 | 0.6 | 20 | 50 | 0.1 |
| Comparative example 2 | 0.29 | 0.57 | 25 | 51 | 0.1 |
| Comparative example 3 | 0.35 | 0.34 | 21 | 29 | 0.05 |
| Comparative example 4 | 0.14 | 0.66 | 12 | 32 | 0.02 |
Tvis: visible light transmittance；Rout: the reflectivity of visible light glass surface.
UV trans: ultraviolet ray transmissivity %；UV ref: ultraviolet reflection rate %.
Pass through the optical performance test for hollow film-plated glass product, it may be determined that embodiment and comparative example preparation
Hollow film-plated glass product reaches design object to visible light transmittance rate, and UV light reflectivity is higher, can be good at every
Exhausted ultraviolet light enhances birds for the sensing capability of corresponding glass product, the contingency of bird strikes glass is avoided to occur.
<test case 2>
Hollow film-plated glass product prepared by embodiment 1-3, with existing common 6mm float glass and commercially available certain is domestic
PVB film type ultraviolet protection laminated glass (sample structure 6/1.52/6, the white glass of float glass process/PVB/ float glass process of PVB producer production
White glass mm) it carries out carrying out the test of black light visible transmission performance according to national standard method.
The test result of corresponding glass product is shown as near ultraviolet ray transmission of visible light curve, specifically as shown in figures 5-9.
Fig. 5 is common 6mm float glass black light visible transmission curve.Fig. 6 is the near ultraviolet of PVB type ultraviolet ray intercepting glass product
Light visible transmission curve.Fig. 7 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 1.Fig. 8 is to implement
The near ultraviolet visible light transmission curve of hollow glass product prepared by example 2.Fig. 9 is the close of hollow glass product prepared by embodiment 3
UV, visible light transmission curve.
By test gained transmittance graph it is found that for simple glass product UVB wave band (275~320nm of wavelength)
Ultraviolet light can obstruct completely substantially, but for UVA wave band (320~420nm of wavelength) with wavelength increase obstructing capacity
The ultraviolet light of quick rapid decay, a large amount of UVA wave bands can pass through common 6mm float glass.Existing PVB type shown in fig. 6 is anti-
Vitaglass product can be very good the ultraviolet light of barrier UVA wave band, but the infrared ray of wavelength 760nm or more is lacked
Necessary obstructing capacity.The hollow film-plated glass product of Fig. 7-9 illustrated embodiment 1-3 preparation, for the ultraviolet light of UVA wave band
With good barrier action, it is provided simultaneously with the barrier action of the wave band of infrared radiation thermal energy, for the infrared of 760nm or more
Line has significant insulating effect, has good function of heat insulation.It is produced by the hollow glass prepared for embodiment 1-3
The comparison of product and Conventional glass, existing PVB resin ultraviolet ray intercepting glass product could be aware that plated film antiultraviolet of the invention is made
Low emissivity energy-saving glass has both antiultraviolet and thermal insulation function simultaneously, has reached invention and has been expected, and may be implemented long-term
Quality stability and have both anti-infrared, antiultraviolet effect.
In conjunction with the reflection ratio in above-mentioned test case 1 for ultraviolet light, antiultraviolet effect of the invention can be determined
Low emissivity energy-saving glass product can satisfy heat-insulated, antiultraviolet, reflection ultraviolet light, improve glass product for the visual of birds
Property, avoid the effect of birds accidental impact exterior wall glass.
It is only presently preferred embodiments of the present invention that it is described, which to provide more than one, for this implementation, is not intended to limit the invention,
Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in of the invention
Within protection scope.
Claims (10)
1. a kind of Low emissivity energy conservation hollow glass with ultraviolet isolating effect, including two panels glass substrate, and the two panels
Glass substrate complements one another to form hollow structure, wherein
There is the Low emissivity complex function film layer of ultraviolet isolating effect at least a piece of glass substrate surface setting.
2. Low emissivity energy conservation hollow glass according to claim 1, which is characterized in that be vacuum inside the hollow structure.
3. Low emissivity energy conservation hollow glass according to claim 1, which is characterized in that described with ultraviolet isolating effect
Low emissivity complex function film layer is arranged on glass substrate outer surface, and the outer surface refers to the outer surface far from hollow structure.
4. Low emissivity energy conservation hollow glass according to claim 1, which is characterized in that the Low emissivity complex function film layer,
It from inside to outside successively include bottom SiNx layer, second layer ZnO layer, third layer NiCr alloy-layer, the since glass substrate surface
Four layers Ag layers, NiCr layers of layer 5, layer 6 SiNx layer, SiOx layers of layer 7, the 8th layer TiOx layers, the 9th layer SiOx layers.
5. Low emissivity energy conservation hollow glass according to claim 1, which is characterized in that the Low emissivity complex function film layer,
It from inside to outside successively include bottom SiNx layer, second layer ZnO layer, Ag layers of third layer, the 4th layer of Cu since glass substrate surface
Layer, layer 5 NiCr alloy-layer, ZnSnOx layers of layer 6, layer 7 ZnO layer, the 8th layer Ag layers, the 9th layer AZO layers, the tenth layer
SiNx layer, SiOx layers of eleventh floor, TiOx layers and the 13rd layer SiOx layers of Floor 12.
6. Low emissivity energy conservation hollow glass according to claim 1, which is characterized in that the Low emissivity complex function film layer,
It from inside to outside successively include bottom SiNx layer, second layer ZnO layer, Ag layers of third layer, the 4th layer since glass substrate surface
AZO layers, ZnSnOx layers of layer 5, layer 6 ZnO layer, Ag layers of layer 7, the 8th layer of NiCr alloy-layer, the 9th layer ZnSnOx layers,
Tenth layer of ZnO layer, Ag layers of eleventh floor, AZO layers, the 13rd layer SiNx layer of Floor 12, the 14th layer SiOx layers, the 15th layer
TiOx layers, the 16th layer SiOx layers.
7. according to any Low emissivity energy conservation hollow glass of claim 4-6, which is characterized in that the thickness of film layer are as follows: be located at
The SiNx of bottom with a thickness of 5-25nm, positioned at middle layer SiNx with a thickness of 30-70nm, ZnO layer with a thickness of 5-20nm,
The thick bottom of NiCr alloy-layer is 0.1-5nm, and ZnSnOx layers of thickness range is 30-75nm, is arranged on SiNx layer surface
SiOx layers of thickness range is 25-60nm, the thickness range of the SiOx layer in TiOx layer surface is arranged in as 40-110nm, Cu layers
Thickness range be 0 ~ 15nm, TiOx layer of thickness range is 20 ~ 60nm, and Ag layers of thickness range is 5 ~ 20nm, AZO layers of thickness
Degree range is 5-15nm.
8. Low emissivity energy conservation hollow glass according to claim 4, which is characterized in that the ultraviolet reflectivity of hollow glass product
30 ~ 85%, ultraviolet ray transmissivity 10 ~ 50%, radiance is 0.05 ~ 0.12, has good function of heat insulation.
9. Low emissivity energy conservation hollow glass according to claim 5, which is characterized in that the ultraviolet reflectivity of hollow glass product
45 ~ 85%, ultraviolet ray transmissivity 5 ~ 20%, radiance is 0.08 ~ 0.02, has good function of heat insulation.
10. Low emissivity energy conservation hollow glass according to claim 6, which is characterized in that the ultraviolet reflectance of hollow glass product
Rate 40 ~ 85%, ultraviolet ray transmissivity 5 ~ 25%, radiance are 0.05 ~ 0.02, have good function of heat insulation.
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