CN107226625A - Low radiation coated glass and preparation method thereof and equipment - Google Patents
Low radiation coated glass and preparation method thereof and equipment Download PDFInfo
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- CN107226625A CN107226625A CN201710533743.9A CN201710533743A CN107226625A CN 107226625 A CN107226625 A CN 107226625A CN 201710533743 A CN201710533743 A CN 201710533743A CN 107226625 A CN107226625 A CN 107226625A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention provides a kind of low radiation coated glass and preparation method thereof and equipment, the low radiation coated glass is at least included in first medium layer, the first barrier layer, functional layer, the second barrier layer and the second dielectric layer set gradually on glassy layer, and the first medium layer and second dielectric layer are all respectively selected from Si3N4, any one or a few in TiO, SnO, ZnO or ZnSnO；First barrier layer and the second barrier layer are all respectively selected from any one or a few in Ni, Cr, NiCr or NiCrO；The functional layer is silver；The thickness of the first medium layer is 15 ~ 40nm；The thickness on first barrier layer is 0.5 ~ 10nm；The thickness of the functional layer is 7 ~ 11nm；The thickness on second barrier layer is 0.5 ~ 10nm；The thickness of the second dielectric layer is 25 ~ 50nm.Low radiation coated glass of the present invention has good optical property and thermal property.
Description
Technical field
The present invention relates to a kind of coated glass field, and in particular to a kind of low radiation coated glass and preparation method thereof and sets
It is standby.
Background technology
Low radiation coated glass refers to that the method sputtered by magnetron vacuum is plated by nano level nitridation in glass surface
The mixed membranous layer of the compositions such as thing, oxidation film and the metal film with low-E.Glass surface radiance is greatly reduced,
It has certain optically and thermally performance, has been widely used in building field.Low radiation coated glass has heat transfer coefficient
The features such as low and reflection infrared ray.The hollow product combined by low radiation coated glass, it is seen that light can effectively pass through film
System and glass, invisible infrared ray more than 80% are reflected by membrane system.With advocating for energy-saving and emission-reduction policy, market is to low
The requirement of radiation film coating glass also more and more higher, it is not required nothing more than has good optically and thermally performance, also require that its is attractive in appearance,
It is environmentally friendly, the secondary pollution of light is not caused.
The production isolating coefficient of traditional low radiation coated glass is low, and vacuum environment is poor, the low problem of cooling effectiveness, can be tight
Ghost image rings the film quality prepared.
The content of the invention
The shortcoming of prior art in view of the above, it is an object of the invention to provide a kind of low radiation coated glass and its
Preparation method, for solving the problems of the prior art.
In order to achieve the above objects and other related objects, the present invention provides a kind of low radiation coated glass, the Low emissivity
Coated glass be at least included in the first medium layer set gradually on glassy layer, the first barrier layer, functional layer, the second barrier layer with
And second dielectric layer,
The thickness of the first medium layer is 15~40nm, and its material is selected from Si3N4, in TiO, SnO, ZnO or ZnSnO
Any one or a few mixing；
First barrier layer thickness is 0.5~10nm, its any one of material in Ni, Cr, NiCr or NiCrO
Or several mixing；
The functional layer thickness is 7~11nm, contains silver；
The thickness on second barrier layer is 0.5~10nm；Its material is any one in Ni, Cr, NiCr or NiCrO
Plant or several mixing；
The thickness of the second dielectric layer is 25~50nm；Its material is selected from Si3N4, in TiO, SnO, ZnO or ZnSnO
Any one or a few mixing.
Preferably, the thickness of the first medium layer is 25~30nm；The thickness on first barrier layer is 3~10nm；
The thickness of the functional layer is 7~8nm；The thickness on second barrier layer is 3~5nm；The thickness of the second dielectric layer is
36~40nm.
Another aspect provides the preparation method of above-mentioned low radiation coated glass, at least comprise the following steps：
(1) glass is put into magnetron sputtering apparatus and carries out magnetron sputtering；
(2) first medium layer, the first barrier layer, functional layer, the second barrier layer and second Jie are sputtered successively on glass
Matter layer.
Preferably, the step (1) is cleaned and dried to glass before glass is put into magnetron sputtering apparatus.
Another aspect provides a kind of plated film of low radiation coated glass section, the plated film section at least includes：
Some isolation chambers, transmission unit, gas barrier unit, cathode targets, vacuum unit and cooling unit；
Each isolation chamber is sequentially connected, and the top of each isolation chamber sets openable cover plate；
The inside of each isolation chamber sets gas barrier unit or cathode targets；
The transmission unit is arranged on the bottom in separate cavities room and all isolation chambers of insertion；
Vacuum extractor each is set on the cover plate on the isolation chamber equipped with the gas barrier unit；
The isolation chamber interior for being provided with the cathode targets also sets up cooling unit.
Plated film section described in the present invention is the groundwork unit of magnetron sputtering apparatus, before and after plated film section
Also set up some other working cells, such as complete production line includes automatic sheet-feeding platform, cleaning machine, transporting rail, enter piece room,
Surge chamber, transition chamber, plated film section, transition chamber, surge chamber, slice room, transporting rail, automatic bottom sheet platform.
Preferably, the gas barrier unit includes the lateral partitions laterally set and longitudinally disposed longitudinal baffle, institute
The top that lateral partitions are located at transmission unit is stated, the longitudinal baffle upper end reaches the top of isolation chamber, and lower end reaches transverse direction
Dividing plate.
Preferably, the cooling unit includes the cooling water pipeline for being arranged on bottom in the second separate cavities room, the cooling
Waterpipe is connected with external water source.
Preferably, the cathode targets be selected from SiAl targets, TiO targets, SnAl targets, ZnAl targets, ZnSn targets,
Any one or a few in AZO targets, Ni targets, Cr targets, NiCr targets, Ag targets.
As described above, low radiation coated glass of the present invention and preparation method thereof, has the advantages that：
Prepared on float-glass substrate surface by multilayer dielectricity layer/barrier layer/functional layer Ag/ barrier layers/multilayer dielectricity layer
The film structure of composition, makes it not only have good optically and thermally performance (U values are less than 1.5), be also equipped with it is attractive in appearance, to environment
Close friend, does not result in the secondary pollution of light.U values are the heat transfer coefficients of glass assembly.U values are lower, pass through the heat output of glass
It is lower.
Brief description of the drawings
Fig. 1 is shown as the basic structure schematic diagram of the embodiment of the present invention 1.
Fig. 2 is shown as the schematic enlarged-scale view of the 4th isolation chamber in embodiment 1.
Fig. 3 is shown as the structural representation of coated glass.
1 glass
101 first mediums layer
102 first barrier layers
103 functional layers
104 second barrier layers
105 second dielectric layer
2 the 2nd isolation chambers
3 the 3rd isolation chambers
4 the 4th isolation chambers
41 cover plates
42 vacuum units
43 bleeding points
44 CD feeding ports
45 rollers
46 T-shaped dividing plates
403 longitudinal baffles
404 lateral partitions
7 the 7th isolation chambers
8 the 8th isolation chambers
11 the 11st isolation chambers
13 the 13rd isolation chambers
15 the 15th isolation chambers
33 the 33rd isolation chambers
34 the 34th isolation chambers
38 the 38th isolation chambers
39 the 39th isolation chambers
Embodiment
Embodiments of the present invention are illustrated by particular specific embodiment below, those skilled in the art can be by this explanation
Content disclosed by book understands other advantages and effect of the present invention easily.
Refer to Fig. 1.It should be clear that structure, ratio, size depicted in this specification institute accompanying drawings etc., only to coordinate
Content disclosed in specification, so that those skilled in the art understands and reads, is not limited to the present invention enforceable
Qualifications, therefore do not have technical essential meaning, the modification of any structure, the change of proportionate relationship or the adjustment of size,
Do not influence under effect of the invention that can be generated and the purpose that can reach, all should still fall in disclosed technology contents
Obtain in the range of covering.Meanwhile, cited such as " on ", " under ", "left", "right", " centre " and " one " in this specification
Term, be merely convenient to understanding for narration, and be not used to limit enforceable scope of the invention, the change of its relativeness or
Adjustment, under without essence change technology contents, when being also considered as enforceable category of the invention.
Embodiment 1 is as shown in Fig. 1~2, and the present invention provides a kind of plated film section for being used to produce coated glass, described to be used to give birth to
The plated film section for producing coated glass includes but is not limited to：40 isolation chambers, each isolation chambers use standardized designs, are all rule
6 face bodies then, therefore, size is identical, and shape is consistent.Each isolation the chamber long 3900mm, wide 900mm, high 1000mm.When
So, the number of the isolation chamber can be adjusted as needed, and its size and specific shape are also to adjust.
In other embodiments, the isolation chamber totally 40, and be sequentially connected, wherein the 2nd isolation chamber 2 and the 3rd
Individual isolation chamber 3, the 7th isolation chamber 7, the 8th isolation chamber 8, the 11st isolation chamber 11, the 13rd isolation chamber 13 are pacified
Dress, the 15th isolation chamber 15, the 18th isolation chamber, the 19th isolation chamber, the 22nd isolation chamber, the 23rd isolation
Chamber, the 26th isolation chamber, the 28th isolation chamber, the 30th isolation chamber, the 33rd isolation chamber 33, the 34th every
Cathode targets are installed from chamber 34, the 38th isolation chamber 38, the 39th isolation chamber 39, gas is installed in remaining isolation chamber
Body isolated location.
Fig. 2 is shown in the structural representation of the 4th isolation chamber 4.Because other isolation chambers are similar with its structure,
It therefore, it can as reference.It can be seen that the lower section of each isolation chamber sets CD feeding port 44.Between two adjacent isolation chambers
Also set up bleeding point 43.The area of the CD feeding port is about 0.07m2, the area of the aspirating hole is about 0.24m2.Therefore it is adjacent
Two isolation chambers connected by CD feeding port with bleeding point.
The top of each isolation chamber sets openable cover plate 41, and each size of cover plate 41 is equal.
Preferably, it is additionally provided with sealing ring between the cover plate and the isolation chamber so that sealing effectiveness is more preferable.
In the bottom of the inside of each isolation chamber, transmission unit is set, thus during the transmission unit insertion it is all every
From chamber, (also setting up piece mouth in last isolation chamber).In the present embodiment, the transmission unit uses biography
Defeated roller-way, the transmission roller channel includes several rollers 45, and each roller is horizontal to be arranged under isolation chamber CD feeding port
Side, it is ensured that the glass come in from CD feeding port can be transferred to next isolation chamber.In the present embodiment, chamber is each isolated
Lower section is installed by 3 rollers.
In other embodiments, the transmission unit can also use transmission belt.
General, the order and number of the installation of above-mentioned target are adjusted according to the required glass prepared.Such as
2 and the 3rd installations are SiAl targets, and are continuously installed, but can only be mounted with one in other embodiments
SiAl targets, can also install more SiAl targets, now can discontinuously install.
In the present invention, it is equal in magnitude due to cover plate, therefore can arbitrarily adjust.
The species and number for the cathode targets typically installed are as needed and adjusted.According to the present invention it is possible to
Plated film is carried out on glass successively.
General, the cathode targets can be planar cathode, can be rotating cathode.Wherein rotating cathode can be prepared
The dielectric layer of coated glass, plays the effect such as anti-reflection, anti-reflection；Planar cathode can prepare metal level and functional layer, and metal level rises
To the effect of defencive function layer, functional layer can play reduction radiance effect.
In the present embodiment, in the lower section installing handle target fixture of cover plate, cathode targets or rotary target material pass through target
Material fixture is arranged on the lower section of cover plate.In the present embodiment, the target fixture includes 4 terminations, and each two termination is
One group, respectively the two ends positioned at cover plate cathode targets are fixed.Transmission component is contained in the termination, can fixed negative pole target and with
Cavity cover plate insulate.
Vacuum unit 42 each is set on the cover plate on the isolation chamber equipped with the gas barrier unit.In this implementation
Vacuum unit selects molecular pump (purchased in market) described in example.Be mounted with four molecular pumps altogether in the present embodiment, it is general can be with
1~6 molecular pump is installed.The molecular pump can will isolate chamber vacuum state.
In another embodiment, the gas barrier unit includes the lateral partitions 404 laterally set and longitudinally disposed
Longitudinal baffle 403, the lateral partitions are located at the top of transmission unit, and the longitudinal baffle upper end reaches the top of isolation chamber
Portion, lower end reaches lateral partitions.Gas isolator will isolate chamber and be divided into the two completely isolated spaces in left and right, will can be passed through
Process gas it is relative be sealed in insulating space, prevent process gas between mutual play, influence adjacent film layers quality.It is horizontal
It is fixed on to the two ends of dividing plate using screw on divider wall, longitudinal baffle is stood in using clamping plate and separate cavities are fixed in lateral partitions
In room.The lateral partitions level is arranged on place above CD feeding port, the middle position that longitudinal baffle makes positioned at separate cavities, therefore
Isolation chamber is divided into the insulating space of two almost identical sizes.
In another embodiment, the isolation chamber interior for being provided with the cathode targets also sets up cooling unit, described cold
But unit includes being arranged on the second separate cavities room in the cooling water pipeline (not shown) of lower section, the cooling water pipeline with outside
Portion water source is connected.The cooling water pipeline is coiled between rod.The cooling unit can reduce the temperature of isolation chamber interior
Degree so that more uniform during plated film.
In the present embodiment, the T-shaped dividing plate 46 that cross section is T-shaped is set between roller.The longitudinal component insertion of T-shaped dividing plate
Between roller, lateral part is located between two adjacent rollers, and the T-shaped dividing plate is sealed the hole between roller,
Improve the sealing property of whole device.The horizontal component of the T-shaped dividing plate is slightly below the peak of roller.
In another embodiment, the water distribution pipe is made using copper material, because the heat conductivility of copper is preferably, therefore
Function with preferable transmission heat.
It, for the plated film section to coated glass plated film, is one of whole Coated Glass Line that plated film section above, which is,
Point.
Such as Fig. 3 of embodiment 2, first medium layer 101 of the invention selects Si3N4And TiO2, functional layer is Ag, second medium
Layer 104 selects ZnO and Si3N4, the first barrier layer 102, the second barrier layer 105 selection NiCr.Specifically film layer structure is：Glass/
Si3N4/TiO2/NiCr/Ag/NiCr/ZnO/Si3N4.Coated glass, the present embodiment are produced using the equipment provided in embodiment 1
Production method is：
(1) cleaning glass substrate；
(2) after drying, into magnetron sputtering area；
(3) rotating cathode installs SiAl targets, prepares Si3N4Dielectric layer, sputter gas Ar is 600~800sccm, reaction
Gas N2For 700~900sccm, deposit thickness is 15-20nm.
(4) rotating cathode installs TiO targets, prepares TiO dielectric layers, and sputter gas Ar is 600~800sccm, reaction gas
Body O2 is 50-100sccm, and deposit thickness is 5-10nm.
(5) planar cathode installs NiCr targets, prepares NiCr barrier layers, and sputter gas Ar is 800~1000sccm, deposition
Thickness is 1.5-2.5nm.
(6) planar cathode installs Ag targets, prepares Ag functional layers, and sputter gas Ar is 800~1000sccm, deposit thickness
For 7-10nm.
(7) planar cathode installs NiCr targets, prepares NiCr barrier layers, and sputter gas Ar is 800~1000sccm, deposition
Thickness is 2-3nm.
(8) rotating cathode installs ZnAl targets, prepares ZnO dielectric layers, and sputter gas Ar is 500~800sccm, reaction gas
Body O2 is 500~900sccm, and deposit thickness is 10~20nm.
(9) rotating cathode installs SiAl targets, prepares Si3N4Dielectric layer, sputter gas Ar is 600~800sccm, reaction
Gas N2 is 700~900sccm, and deposit thickness is 20~40nm.
By above-mentioned film structure and production method, the bluish grey colour system Low emissivity prepared on the glass substrate of 6mm thickness
Coated glass, transmitance 57.9% after testing, glass surface L* is that 37.56, a* is that -3.07, b* is -6.65, and radiance is less than
0.12, U value is less than 1.5, and the direct reflectivity of sunshine (outside) is less than 16%, and appearance looks elegant does not result in the secondary dirt of light
Dye.
Such as Fig. 3 of embodiment 3, first medium layer 101 of the invention selects Si3N4And ZnO, second dielectric layer 105 selects
ZnSnO and Si3N4, functional layer is Ag, the first barrier layer 102 and the second barrier layer 104 selection NiCr.Specifically film layer structure is：
Glass substrate/Si3N4/ZnO/Ag/NiCr/ZnSnO/Si3N4.Coated glass is produced using the equipment provided in embodiment 1, this
Embodiment production method is：
(1) cleaning glass substrate；
(2) after drying, into magnetron sputtering area；
(3) rotating cathode installs SiAl targets, prepares Si3N4 dielectric layers, and sputter gas Ar is 400~600sccm, reaction
Gas N2 is 500~800sccm, and deposit thickness is 20-25nm.
(4) rotating cathode installs ZnAl targets, prepares ZnO dielectric layers, and sputter gas Ar is 700~900sccm, reaction gas
Body O2 is 800~1000sccm, and deposit thickness is 13~15nm.
(5) planar cathode installs Ag targets, prepares Ag functional layers, and sputter gas Ar is 800~1000sccm, deposit thickness
For 7-9nm.
(6) planar cathode installs NiCr targets, prepares NiCr barrier layers, and sputter gas Ar is 800~1000sccm, deposition
Thickness is 4-6nm.
(7) rotating cathode installs ZnSn targets, prepares ZnSnO dielectric layers, and sputter gas Ar is 800~900sccm, reaction
Gas O2 is 1000~1200sccm, and deposit thickness is 17~20nm.
(8) rotating cathode installs SiAl targets, prepares Si3N4Dielectric layer, sputter gas Ar is 600~800sccm, reaction
Gas N2For 700~900sccm, deposit thickness is 33~37nm.
By above-mentioned film structure and production method, the bluish grey colour system Low emissivity prepared on the glass substrate of 6mm thickness
Coated glass, transmitance 59.3% after testing, glass surface L* is that 47.07, a* is that -3.17, b* is -6.33, and radiance is less than
0.12, U value is less than 1.5, and the direct reflectivity of sunshine (outside) is less than 16%, and appearance looks elegant does not result in the secondary dirt of light
Dye.
Such as Fig. 3 of embodiment 4, first medium layer 101 of the invention selects TiO, ZnSnO and ZnO, and second dielectric layer 105 is selected
Select ZnSnO and Si3N4, functional layer is Ag, the first barrier layer barrier layer 102, the second barrier layer selection NiCr.Specific film layer structure
For：Glass substrate/TiO2/ZnSnO/ZnO/NiCr/Ag/NiCr/ZnSnO/Si3N4.Using the equipment life provided in embodiment 1
Coated glass is produced, the present embodiment production method is：
(1) cleaning glass substrate；
(2) after drying, into magnetron sputtering area；
(3) rotating cathode installs TiO targets, prepares TiO dielectric layers, and sputter gas Ar is 700~1000sccm, reaction gas
Body O2For 50~100sccm, deposit thickness is 5~15nm.
(4) rotating cathode installs ZnSn targets, prepares ZnSnO dielectric layers, and sputter gas Ar is 500~800sccm, reaction
Gas O2For 800~900sccm, deposit thickness is 15~25nm.
(5) rotating cathode installs ZnAl targets, prepares ZnO dielectric layers, and sputter gas Ar is 700~900sccm, reaction gas
Body O2For 800~1000sccm, deposit thickness is 10~15nm.
(6) planar cathode installs NiCr targets, prepares NiCr barrier layers, and sputter gas Ar is 800~1000sccm, deposition
Thickness is 0.5-1nm.
(7) planar cathode installs Ag targets, prepares Ag functional layers, and sputter gas Ar is 800~1000sccm, deposit thickness
For 7-10nm.
(8) planar cathode installs NiCr targets, prepares NiCr barrier layers, and sputter gas Ar is 800~1000sccm, deposition
Thickness is 0.5-1nm.
(9) rotating cathode installs ZnSn targets, prepares ZnSnO dielectric layers, and sputter gas Ar is 800~900sccm, reaction
Gas O2For 1000~1200sccm, deposit thickness is 17~25nm.
(10) rotating cathode installs SiAl targets, prepares Si3N4 dielectric layers, and sputter gas Ar is 600~800sccm, instead
It is 700~900sccm to answer gas N2, and deposit thickness is 20~35nm.
By above-mentioned film structure and production method, the bluish grey colour system Low emissivity prepared on the glass substrate of 6mm thickness
Coated glass, transmitance 79.83% after testing, glass surface L* is that 31.92, a* is that -2.59, b* is -8.62, and radiance is less than
0.12, U value is less than 1.5, and the direct reflectivity of sunshine (outside) is less than 16%, and appearance looks elegant does not result in the secondary dirt of light
Dye.
So, the present invention effectively overcomes various shortcoming of the prior art and has high industrial utilization.
The above-described embodiments merely illustrate the principles and effects of the present invention, not for the limitation present invention.It is any ripe
Know the personage of this technology all can carry out modifications and changes under the spirit and scope without prejudice to the present invention to above-described embodiment.Cause
This, those of ordinary skill in the art is complete without departing from disclosed spirit and institute under technological thought such as
Into all equivalent modifications or change, should by the present invention claim be covered.
Claims (8)
1. a kind of low radiation coated glass, it is characterised in that the low radiation coated glass is at least included on glassy layer successively
First medium layer, the first barrier layer, functional layer, the second barrier layer and the second dielectric layer of setting,
The thickness of the first medium layer is 15~40nm, and its material is selected from Si3N4, it is any in TiO, SnO, ZnO or ZnSnO
One or more mixing；
First barrier layer thickness is 0.5~10nm, its material in Ni, Cr, NiCr or NiCrO any one or it is several
Plant mixing；
The functional layer thickness is 7~11nm, contains silver；
The thickness on second barrier layer is 0.5~10nm；Its material in Ni, Cr, NiCr or NiCrO any one or
Several mixing；
The thickness of the second dielectric layer is 25~50nm；Its material is selected from Si3N4, it is any in TiO, SnO, ZnO or ZnSnO
One or more mixing.
2. low radiation coated glass according to claim 1, it is characterised in that
The thickness of the first medium layer is 25~30nm；
The thickness on first barrier layer is 3~10nm；
The thickness of the functional layer is 7~8nm；
The thickness on second barrier layer is 3~5nm；
The thickness of the second dielectric layer is 36~40nm.
3. a kind of preparation method of low radiation coated glass as claimed in claim 1 or 2, it is characterised in that at least including with
Lower step：
(1) glass is put into magnetron sputtering apparatus；
(2) first medium layer, the first barrier layer, functional layer, the second barrier layer and second dielectric layer are sputtered successively on glass.
4. the preparation method of low radiation coated glass according to claim 3, it is characterised in that the step (1) is by glass
Glass is cleaned and dried to glass before being put into magnetron sputtering apparatus.
5. a kind of plated film section for producing low radiation coated glass as claimed in claim 1, it is characterised in that the plated film section is extremely
Include less：Some isolation chambers, transmission unit, gas barrier unit, cathode targets, vacuum unit and cooling unit；
Each isolation chamber is sequentially connected, and the top of each isolation chamber sets openable cover plate；
The inside of each isolation chamber sets gas barrier unit or cathode targets；
The transmission unit is arranged on the bottom in separate cavities room and all isolation chambers of insertion；
Vacuum extractor each is set on the cover plate on the isolation chamber equipped with the gas barrier unit；
The isolation chamber interior for being provided with the cathode targets also sets up cooling unit.
6. the plated film section of low radiation coated glass according to claim 5, it is characterised in that：The gas barrier unit bag
The lateral partitions and longitudinally disposed longitudinal baffle of laterally setting are included, the lateral partitions are located at the top of transmission unit, described
Longitudinal baffle upper end reaches the top of isolation chamber, and lower end reaches lateral partitions.
7. the plated film section according to claim 5 for being used to produce coated glass, it is characterised in that：The cooling unit includes
The cooling water pipeline of bottom in separate cavities room is arranged on, the cooling water pipeline is connected with external water source.
8. the plated film section according to claim 5 for being used to produce coated glass, it is characterised in that：The cathode targets are selected from
SiAl targets, TiO targets, SnAl targets, ZnAl targets, ZnSn targets, AZO targets, Ni targets, Cr targets, NiCr targets, Ag
Any one or a few in target.
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| CN201710533743.9A CN107226625A (en) | 2017-07-03 | 2017-07-03 | Low radiation coated glass and preparation method thereof and equipment |
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| CN201710533743.9A CN107226625A (en) | 2017-07-03 | 2017-07-03 | Low radiation coated glass and preparation method thereof and equipment |
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| CN109650745A (en) * | 2019-01-31 | 2019-04-19 | 四川南玻节能玻璃有限公司 | A kind of Low emissivity hollow glass with ultraviolet isolating effect |
| CN110092594A (en) * | 2019-05-31 | 2019-08-06 | 中国建材国际工程集团有限公司 | Three silver coating glass of one kind and preparation method thereof |
| CN112230309A (en) * | 2020-09-29 | 2021-01-15 | 天津津航技术物理研究所 | Optical window film with controllable thermal radiation |
| CN112624633A (en) * | 2020-12-11 | 2021-04-09 | 安徽凤阳玻璃有限公司 | Offline single-silver temperable low-emissivity coated glass and preparation process thereof |
| CN112679109A (en) * | 2020-12-11 | 2021-04-20 | 安徽凤阳玻璃有限公司 | Passive LOW-energy-consumption offline temperable LOW-E coated glass and preparation process thereof |
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| EP1293489A1 (en) * | 1997-09-16 | 2003-03-19 | Guardian Industries Corp. | High light transmission, low-e sputter-coated layer systems and insulated glass units made therefrom |
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| CN109650745A (en) * | 2019-01-31 | 2019-04-19 | 四川南玻节能玻璃有限公司 | A kind of Low emissivity hollow glass with ultraviolet isolating effect |
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| CN110092594A (en) * | 2019-05-31 | 2019-08-06 | 中国建材国际工程集团有限公司 | Three silver coating glass of one kind and preparation method thereof |
| CN112230309A (en) * | 2020-09-29 | 2021-01-15 | 天津津航技术物理研究所 | Optical window film with controllable thermal radiation |
| CN112624633A (en) * | 2020-12-11 | 2021-04-09 | 安徽凤阳玻璃有限公司 | Offline single-silver temperable low-emissivity coated glass and preparation process thereof |
| CN112679109A (en) * | 2020-12-11 | 2021-04-20 | 安徽凤阳玻璃有限公司 | Passive LOW-energy-consumption offline temperable LOW-E coated glass and preparation process thereof |
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