CN217868650U - Single silver layer HTLE glass - Google Patents
Single silver layer HTLE glass Download PDFInfo
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- CN217868650U CN217868650U CN202220901839.2U CN202220901839U CN217868650U CN 217868650 U CN217868650 U CN 217868650U CN 202220901839 U CN202220901839 U CN 202220901839U CN 217868650 U CN217868650 U CN 217868650U
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Abstract
The utility model discloses a single silver layer HTLE glass, including the toughened glass base plate, toughened glass base plate upper surface magnetron sputtering has first rete dielectric layer, second rete functional layer and third rete dielectric layer from inside to outside in proper order, first rete dielectric layer is zinc oxide rete, silicon nitride rete or zinc aluminum oxide rete, second rete functional layer is silver-copper alloy rete, silver rete or silver aluminum alloy rete, third rete dielectric layer is zinc oxide rete, silicon nitride rete or zinc aluminum oxide rete.
Description
Technical Field
The utility model relates to a low emissivity glass especially relates to a HTLE glass of single silver film layer.
Background
In recent years, to improve the thermal insulation effect, low-emissivity (Low-e) hollow glass is generally used for one glass or two glass substrates to reduce the radiation heat transfer, and a Low-e film is positioned on the opposite side of the two glasses. In order to realize low radiation of the glass, on-line low-e glass or double silver layer low-e glass is generally adopted as a glass substrate. The on-line low-e glass is prepared by spraying chemical solution with tin salt as main component onto the surface of hot glass to form single layer of tin oxide (SnO 2) compound film with certain low radiation performance. The visible light transmittance of the on-line low-e glass is generally about 0.7, the film layer is firm and durable, and the main defects of the technology are as follows: the film material of the on-line low-e glass is semiconductor oxide, the infrared emissivity of the on-line low-e glass is about 0.2, while the emissivity of a common metal film (such as a silver film) is less than 0.1, so the on-line low-e glass has still a space for improving the heat-insulating property; and (II) the toughening process of the on-line low-e glass is membrane-toughened, and the problems of color change, deformation and the like can be caused in the toughening process, so that the on-line low-e glass is not adopted in the all-toughened hollow glass, and the strength and the safety performance of the non-all-toughened hollow glass have certain defects. The double silver layer low-e hollow glass is generally coated with a double silver multilayer film structure on the surface of the glass by adopting a magnetron sputtering coating process, wherein the low-e film structure is generally a glass substrate/medium/silver/shielding layer/medium, the emissivity of the low-e film is lower and is generally 0.05-0.1, but the visible light transmittance is lower and is generally 0.4-0.5 because the metal layer in the film structure is thicker.
Therefore, there is a strong need for a glass with high strength, high visible light transmittance, low emissivity and good heat-insulating property to meet the market demand.
SUMMERY OF THE UTILITY MODEL
The technical insufficiency that exists to the aforesaid, the utility model aims at providing a single silver layer HTLE glass to solve the problem that proposes in the background art.
In order to solve the technical problem, the utility model adopts the following technical scheme:
the utility model provides a single silver layer HTLE glass, including the toughened glass base plate, the toughened glass base plate surface has first rete dielectric layer, second rete functional layer and third rete dielectric layer in proper order earth magnetron sputtering from inside to outside, first rete dielectric layer is zinc oxide rete, silicon nitride rete or zinc aluminum oxide rete, second rete functional layer is silver-copper alloy rete, silver rete or silver-colored aluminum alloy rete, third rete dielectric layer is zinc oxide rete, silicon nitride rete or zinc aluminum oxide rete.
Preferably, the thickness of the first film layer dielectric layer is 35-45 nm, the thickness of the second film layer functional layer is 10-20 nm, and the thickness of the third film layer dielectric layer is 30-40 nm.
The mass ratio of zinc oxide to aluminum oxide in the zinc-aluminum oxide film layer is 98.
The beneficial effects of the utility model reside in that:
1. the utility model discloses a toughened glass has improved HTLE glass's structural strength as the base plate effectively for glass is difficult broken, even can not drop to cause the injury to the people after broken yet, has improved its security.
2. The coating layer is sputtered on the toughened glass substrate by adopting a magnetron sputtering method and an electron beam evaporation process, the binding force between the coating layer and the toughened glass substrate is strong, and the coating layer is compact and uniform.
3. The HTLE film is of a single silver layer structure, the thickness of the silver film layer is about 15nm, the HTLE film is lower than that of a double silver layer low-e structure (the sum of the thicknesses of two silver layers is more than 20 nm), the infrared reflectivity can be more than 90%, and therefore low radiance is achieved. The dielectric layers on the two sides can reduce the reflectivity of the film layer and improve the transmittance, so that the single silver layer structure can have high visible light transmittance and low radiance, the visible light transmittance of the glass of the HTLE film structure exceeds 0.75, and the radiance is as low as 0.05.
4. The radiation heat exchange coefficient of the ordinary glass and indoor space under the room temperature environment is about 5.4W/(m 2K), and the HTLE glass can be reduced to 0.42W/(m 2K). HTLE glass reduces radiation heat loss, improves the heat insulation performance of the glass and reduces energy consumption. Therefore, the utility model can realize the high strength, high light transmittance, low radiation rate and good heat-insulating performance of single-layer glass.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural view of a single silver layer HTLE glass according to an embodiment of the present invention;
description of reference numerals:
the manufacturing method comprises the following steps of 1-a toughened glass substrate, 2-a first film layer dielectric layer, 3-a second film layer functional layer and 4-a third film layer dielectric layer.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
Example (b):
as shown in fig. 1, the utility model provides a single silver layer HTLE glass, which comprises a toughened glass substrate 1, wherein a first film dielectric layer 2, a second film functional layer 3 and a third film dielectric layer 4 are sequentially formed on the surface of the toughened glass substrate 1 through magnetron sputtering from inside to outside; the first film layer dielectric layer 2 is a zinc oxide film layer, a silicon nitride film layer or a zinc aluminum oxide film layer, the second film layer functional layer 3 is a silver-copper alloy film layer, a silver film layer or a silver-aluminum alloy film layer, and the third film layer dielectric layer 4 is a zinc oxide film layer, a silicon nitride film layer or a zinc aluminum oxide film layer.
The thickness of the first film layer dielectric layer 2 is 35-45 nm, the thickness of the second film layer functional layer 3 is 10-20 nm, and the thickness of the third film layer dielectric layer 4 is 30-40 nm.
The mass ratio of zinc oxide to aluminum oxide in the zinc-aluminum oxide film layer is 98 percent
The preparation method of the single silver layer HTLE glass comprises the following steps:
step 1: cleaning and drying the toughened glass substrate, and placing the toughened glass substrate in a vacuum sputtering area;
step 2: depositing a zinc oxide layer on a toughened glass substrate by adopting process technologies including but not limited to magnetron sputtering, electron beam evaporation and the like in a manner of magnetron sputtering, wherein the used target material is a zinc oxide round target, the purity of zinc oxide is 99.999 percent, a power supply is a radio frequency power supply, the power is 150-250W, process gas is pure argon, the air pressure is 3mTorr, and the zinc oxide round target is deposited at room temperature.
And step 3: depositing a silver layer on the zinc oxide layer by adopting a magnetron sputtering mode, wherein the used target material is an Ag round target, the purity of the silver is 99.99 percent, the power supply is a direct-current power supply, the power is 150-250W, the process gas is pure argon, the air pressure is 3mTorr, and the deposition is carried out at room temperature;
and 4, step 4: depositing a zinc oxide layer on the silver layer by adopting a magnetron sputtering mode, wherein the used target material is a zinc oxide round target, the purity of the zinc oxide is 99.999 percent, the power supply is a radio frequency power supply, the power is 150-250W, the process gas is pure argon, the air pressure is 3mTorr, and the deposition is carried out at room temperature.
The toughened glass substrate is coated by magnetron sputtering, but not limited to magnetron sputtering, and electron beam evaporation and other methods.
The detection results of the single three-layer film HTLE glass are as follows:
the first layer of the three HTLE films is zinc oxide, and the thickness of the film layer is 35-45 nm; the second layer is silver, and the thickness of the film layer is 10-20 nm; the third layer is zinc oxide, and the thickness of the film layer is 30-40 nm.
The visible light transmittance of the HTLE glass was measured by a spectrophotometer to be about 0.76. The emissivity of the HTLE glass was measured to be 0.05 using a fourier infrared spectrometer.
To sum up, the utility model discloses under the condition of single-layer glass application, can adopt HTLE three-layer membrane technology, under the state of guaranteeing the high luminousness of low radiance, realize producing the long-term stability of product performance.
It will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (2)
1. The utility model provides a single silver layer HTLE glass, includes toughened glass base plate (1), its characterized in that, toughened glass base plate (1) upper surface magnetron sputtering has first rete dielectric layer (2), second rete functional layer (3) and third rete dielectric layer (4) from inside to outside in proper order, first rete dielectric layer (2) are zinc oxide rete, silicon nitride rete or zinc aluminum oxide rete, second rete functional layer (3) are silver-copper alloy rete, silver rete or silver-aluminum alloy rete, third rete dielectric layer (4) are zinc oxide rete, silicon nitride rete or zinc aluminum oxide rete.
2. The single-ag layer HTLE glass according to claim 1, wherein said first film dielectric layer (2) has a thickness of 35-45 nm, said second film functional layer (3) has a thickness of 10-20 nm, and said third film dielectric layer (4) has a thickness of 30-40 nm.
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CN202220901839.2U CN217868650U (en) | 2022-04-18 | 2022-04-18 | Single silver layer HTLE glass |
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CN114591004A (en) * | 2022-04-18 | 2022-06-07 | 邓凯 | Single silver layer HTLE glass |
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