TW201305078A - Triple-silver low radiation coating glass and manufacturing method thereof - Google Patents

Abstract

A triple-silver low radiation coating glass comprises a glass body and a coating coated on the glass body. The coating comprises two dielectric combination layers, three silver layers and two spacer layer dielectric combination layers. The two dielectric combination layers are positioned below and above the coating layer. The three silver layers and the two spacer layer dielectric combination layers are sequentially and alternatively disposed between the two dielectric combination layers. The dielectric combination layers and the spacer layer dielectric combination layers all consist of one or more film layers of SSTOx, CrNx, CdO, MnO2, InSbOx, TxO, SnO2, ZnO, ZnSnOx, ZnSnPbOx, ZrO2, AZO, Si3N4, SiO2, SiOxNy, BiO2, Al2O3, Nb2O5, Ta2O5, In2O3, and MoO3. The triple-silver low radiation coating glass disclosed in the present invention eliminates the metal barrier layer in conventional film structures and uses a novel material of dielectric combination layers to protect silver layers, thereby effectively reducing the influence of film layers on the light transmittance and obtaining the higher visible light transmittance, the low radiation rate, and the excellent light-to-heat ratio. In addition, there are various selections of colors to provide a broader application scope.

Description

Three-silver low-emission coated glass and manufacturing method thereof

The invention relates to a glass, in particular to a three-silver low-emission coated glass and a manufacturing method thereof.

Low-emission coated glass (also known as LOW-E glass) is a film-based product consisting of multiple layers of metal or other compounds coated on the surface of the glass. Low-emission coated glass is a new generation that can transmit outdoor solar energy and visible light like ordinary glass, and can reflect the secondary radiant heat of objects like infrared mirrors (especially for high-intensity reflectance). Coated Glass. It can be used in any climatic environment to control sunlight, save energy and heat control and improve the environment.

Three-silver low-emissivity glass (Triple-silver LOW-E), as a high-end product in low-emission coated glass, consists of up to three layers of silver and multiple layers of metal oxide or nitride compounds, with high visible light transmission, High infrared reflectivity for excellent thermal insulation.

However, the conventional low-emission coated glass with Ag as the infrared reflective film layer usually adds a metal barrier layer before and after the Ag layer to prevent the Ag layer from being eroded. However, the light transmittance is significantly reduced due to the addition of the metal barrier layer, especially Three silver low-emission coated glass, traditional low-emissivity glass in order to obtain a lower U value (heat transfer coefficient), SC (shading coefficient) and a good photothermal ratio (LSG), it is necessary to reduce the thickness of the silver layer to reduce the film The radiance of the layer to obtain the desired LSG, but as the silver layer increases, it means that the visible light transmittance is reduced, the appearance color is disturbed, and the color selection is limited, which cannot meet the increasing demands of customers.

Therefore, a coated glass with a high visible light transmittance, a low cost, and a wide color selection range needs to be emerged.

In order to solve the problems that the existing three-silver low-emission coated glass has an excessively thick silver layer, a low visible light transmittance, and an appearance color exhibiting interference color and limited color selection when the silver layer is improved to improve the performance of the coated glass, the present invention discloses a method. Three silver low-emission coated glass for the purpose of improving visible light transmittance, improving product performance, and expanding the range of colors.

The technical solution of the present invention is as follows:

A three-silver low-emission coated glass comprising a glass body and a coating film coated on the glass body, the coating comprising two dielectric combination layers, three silver layers and two spacer dielectric layers; the two dielectric layers The combination layer is respectively located on the upper and lower layers of the coating layer, and the three layers of silver layer and the two layer spacer layer dielectric combination layers are sequentially disposed between the two layers of dielectric combination layers; the dielectric combination layer and the interval The dielectric combination layers are all composed of SSTOx, CrNx, CdO, MnO ₂ , InSbOx, TxO, SnO ₂ , ZnO, ZnSnOx, ZnSnPbOx, ZrO ₂ , AZO, Si ₃ N ₄ , SiO ₂ , SiOxNy, BiO ₂ , Al ₂ O ₃ One or more film layers of Nb ₂ O ₅ , Ta ₂ O ₅ , In ₂ O ₃ , and MoO ₃ may be provided, and each of the film layers may be provided with one or more layers. Wherein, the dielectric combination layer may have a thickness of 10 to 80 nm. The spacer layer dielectric combination layer may have a thickness of 10 to 200 nm. The silver layer may have a thickness of 5 to 40 nm.

A method for manufacturing a three-silver low-emission coated glass adopts a vacuum magnetron sputtering coating method, and the specific process steps are as follows:

(1) After the glass body is cleaned and dried, it is placed in a vacuum sputtering zone;

(2) depositing a first dielectric combination layer on the glass body;

(3) depositing a first silver layer on the first dielectric combination layer;

(4) depositing a first spacer dielectric spacer layer on the first silver layer;

(5) depositing a second silver layer on the first spacer dielectric combination layer;

(6) depositing a second spacer dielectric spacer layer on the second silver layer;

(7) depositing a third silver layer on the second spacer dielectric combination layer;

(8) depositing a second dielectric combination layer on the third silver layer;

(9) Forming a product.

The dielectric combination layer and the spacer layer dielectric combination layer may be deposited by an alternating current double rotating cathode, an intermediate frequency reactive magnetron sputtering method, or a planar cathode or DC magnetron sputtering method. The silver layer can be deposited by planar cathode and DC magnetron sputtering. The alternating double rotating cathode and medium frequency reactive magnetron sputtering method can be carried out in an argon oxygen, argon nitrogen or argon oxygen atmosphere. The planar cathode, DC magnetron sputtering method can be carried out in a pure argon, argon oxygen or argon nitrogen atmosphere.

The three-silver low-emission coated glass disclosed by the invention can eliminate the metal barrier layer in the three-silver low-emission film layer compared with the conventional coated glass, and the silver layer is protected by the dielectric combination layer of the novel material, so that the glass layer can be effectively reduced The effect of the film on the visible light transmittance, resulting in higher visible light transmittance, low emissivity, and good photothermal ratio, improving the performance of the product; and avoiding the generation of interference color to a certain extent; using a similar material to the glass material The high hardness material as the spacer dielectric layer not only can bond well between the glass body and the silver layer, but also can offset the internal stress of the composite film layer, especially in scratch resistance, wear resistance and resistance. The effect of corrosion is more obvious, and the color selection is diversified, and the scope of application is wide.

The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, but not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts are within the scope of the present invention.

The invention discloses a three-silver low-emission coated glass for the purpose of improving visible light transmittance, improving product performance and expanding the range of color selection.

As shown in FIG. 1 and FIG. 2, a three-silver low-emission coated glass comprises a glass body 1 and a coating film coated on the glass body, the coating film comprising two dielectric combination layers 1-1 and 1-2, and three silver layers 2- 1, ₂ , ₂ , 2-3 and two spacer dielectric layers 3-1, 3-2, dielectric combination layer, spacer dielectric layer are all composed of SSTOx, CrNx, CdO, MnO ₂ , InSbOx, TxO, SnO ₂ , ZnO, ZnSnOx, ZnSnPbOx, ZrO ₂ , AZO, Si ₃ N ₄ , SiO ₂ , SiOxNy, BiO ₂ , Al ₂ O ₃ , Nb ₂ O ₅ , Ta ₂ O ₅ , In ₂ O ₃ , MoO ₃ A combined layer of one or more film layers, and each film layer may be provided with one or more layers.

The dielectric combination layers 1-1, 1-2 are respectively located on the upper and lower layers of the coating layer, and the silver layers 2-1, 2-2, 2-3 and the spacer dielectric combination layers 3-1, 3-2 are sequentially arranged. Between the two dielectric combination layers 1-1, 1-2. The dielectric combination layers 1-1, 1-2 have a thickness of 10-80 nm, the spacer dielectric combination layers 3-1, 3-2 have a thickness of 10-200 nm, and the silver layers 2-1, 2-2, 2-3 The thickness is 5-40 nm. The dielectric combination layers 1-1, 1-2 and the spacer dielectric combination layers 3-1, 3-2 are all formed by alternating double rotating cathode, medium frequency reactive magnetron sputtering or planar cathode, DC magnetron sputtering. The film layer, silver layer 2-1, 2-2, 2-3 is deposited by planar cathode and DC magnetron sputtering to form a film layer. The thickness of the dielectric combination layers 1-1, 1-2 may also be 15, 20, 30, 50, 70, etc., and the thickness of the spacer dielectric combination layers 3-1, 3-2 is 25, 40, 60, 80, 120, 160 nm, etc., the thickness of the silver layer is 5, 10, 16, 20, 26, 8, 35 nm and the like. The specific film thickness is determined on a case-by-case basis and is not limited herein.

AC double-rotation cathode, medium-frequency reactive magnetron sputtering is carried out in an argon, argon or argon-oxygen atmosphere. Planar cathode and DC magnetron sputtering are performed in pure argon, argon or argon atmosphere. The intermediate frequency can be 20-40KHZ.

A method for manufacturing a three-silver low-emission coated glass adopts a vacuum magnetron sputtering coating method, and the specific process steps are as follows:

(1) After the glass body 1 is cleaned and dried, it is placed in a vacuum sputtering zone;

(2) using an alternating current double rotating cathode, medium frequency reactive magnetron sputtering or planar cathode, DC magnetron sputtering method to form a first dielectric combination layer 1-1 on the glass body;

(3) using a planar cathode, DC magnetron sputtering method in the first dielectric combination layer 1-1 deposition to form a first silver layer 2-1;

(4) depositing a first spacer dielectric spacer layer 3-1 on the first silver layer 2-1 by using an alternating double rotating cathode, an intermediate frequency reactive magnetron sputtering method or a planar cathode or DC magnetron sputtering method ;

(5) using a planar cathode, DC magnetron sputtering method deposited on the first spacer dielectric layer 3-1 to form a second silver layer 2-2;

(6) depositing a second spacer dielectric layer 3-2 on the second silver layer 2-2 by using an alternating double rotating cathode, an intermediate frequency reactive magnetron sputtering method or a planar cathode or DC magnetron sputtering method. ;

(7) using a planar cathode, DC magnetron sputtering method on the second spacer layer dielectric combination layer 3-2 deposition to form a third silver layer 2-3;

(8) depositing a second dielectric combination layer 1-2 on the third silver layer 2-3 by using an alternating double rotating cathode, an intermediate frequency reactive magnetron sputtering method or a planar cathode, DC magnetron sputtering method;

(9) Forming a product.

Example 1

The invention uses a magnetron sputtering coating machine, comprising 23 alternating current rotating double cathodes, 8 direct current plane cathodes, using the process parameters listed in the following table, using 14 alternating current rotating double cathodes and 3 direct current plane cathodes. The three-silver low-emission coated glass of the present invention, the process parameters and the position of the target are listed as follows:

All of the tantalum nitride (Si ₃ N ₄ ) films in the table are made of yttrium aluminum (92:8) target, sputter deposited in an argon and nitrogen atmosphere using an alternating current double-rotation cathode and medium frequency reactive magnetron sputtering. 20-110kw, frequency is 20-40kHz; all yttrium oxynitride (SiOxNy) films in the table use yttrium aluminum (92:8) target, using AC double rotating cathode, medium frequency reactive magnetron sputtering in argon, nitrogen Sputter deposition in an oxygen atmosphere with a power of 20-80kw and a frequency of 20-30kHz; all zinc oxide (ZnO) films in the table use a zinc-aluminum (98:2) target, using an alternating double rotating cathode, intermediate frequency reaction The magnetron sputtering method is sputter deposited in an argon and oxygen atmosphere with a power of 10-50kw and a frequency of 20-40kHz. All AZO films in the table use AZO targets, using AC double-rotating cathode, medium-frequency reactive magnetron sputtering. The sputtering method is sputter deposited in a pure argon atmosphere with a power of 2-10kw and a frequency of 20-40kHz. All the functional layer Ag layers in the table are silver targets, using planar cathode and DC magnetron sputtering in pure argon atmosphere. In sputter deposition, the power is 2-10kw.

In the above-mentioned three-silver low-emission coated glass, the dielectric composite layer 1-1 is a composite film layer composed of a SiOxNy, Si ₃ N ₄ , and ZnO three-layer film, and the combined film layer has a thickness of 25 nm; the dielectric combination layer 1-2 a composite film layer composed of a three-layer film of AZO, SiOxNy, and Si ₃ N ₄ having a combined film thickness of 34.6 nm; a spacer film dielectric composite layer 3-1 comprising a composite film of AZO, two layers of SiOxNy, and ZnO four-layer film The layer has a combined film thickness of 74.2 nm; the spacer dielectric combination layer 3-2 is a composite film layer composed of AZO, two layers of SiOxNy, and ZnO four-layer film, and the combined film layer has a thickness of 69.8 nm.

The number of layers forming the combined film layer, the order of arrangement, and the material thickness of each film layer are determined as the case may be, and are not limited herein.

The optical properties of the glass produced using the above process parameters are as follows (glass is 6 mm ordinary white glass):

a, glass visible light transmittance T = 68.0%

Visible glass surface reflectance = 11.0%

Visible light color coordinates a* value = -2.5

Visible light glass color coordinates b* value = -5.5

Visible light surface reflectance = 8.0%

Visible light surface color coordinates a*=1.0

Visible light film color coordinates b*=-5.1

Glass emissivity E=0.022

b. Using the present invention to make an insulating glass having a structure of 6 mm + 12 A + 6 mm (the inner layer of the film on the outer surface of the outdoor sheet), the data measured according to the ISO 10292 standard are as follows:

Visible light transmittance T=62%

Visible glass surface reflectance (out) = 13%

Visible glass surface reflectance (in) = 10%

Solar energy transmittance T=22%

Solar reflectance (out) = 56%

G-value=0.26

Shading coefficient SC=0.30

U value = 1.55W/m2‧K

Photothermal ratio LSG=2.38

Example 2

The rest is the same as in Embodiment 1, except that the constituent materials, the number of layers, the thickness, the process parameters and the position of the target of each combined film layer are listed as follows:

The yttrium oxide (Nb ₂ O ₅ ) layer in the table uses a yttrium oxide target, which is sputter deposited in an argon and oxygen atmosphere using an alternating double rotating cathode and medium frequency reactive magnetron sputtering. The power is 50-100 kW and the frequency is 20- 40 kHz; the titanium oxide (TiO ₂ ) layer in the table is a ceramic titanium oxide target, which is sputter deposited in an argon and oxygen atmosphere by an alternating current double-rotation cathode and medium frequency reactive magnetron sputtering. The power is 50-100 kw and the frequency is 20 -40kHz; the zinc oxide (ZnO) layer in the table is a zinc-aluminum (98:2) target, which is sputter deposited in an argon and oxygen atmosphere using an AC double-rotation cathode and medium frequency reactive magnetron sputtering. The power is 10-50kw. The frequency is 20-40 kHz; all the tantalum nitride (Si ₃ N ₄ ) layers in the table are made of yttrium aluminum (92:8) target, which adopts alternating double rotating cathode and medium frequency reactive magnetron sputtering in argon and nitrogen atmospheres. Sputter deposition, power 20-110kw, frequency 20-40kHz; all yttrium oxynitride (SiOxNy) layers in the table use yttrium aluminum (92:8) target, using AC double rotating cathode, medium frequency reactive magnetron sputtering Sputter deposition in an argon, nitrogen, oxygen atmosphere with a power of 20-80kw and a frequency of 20-30kHz; all AZO layers in the table use AZO targets, using AC double Rotating cathode and medium frequency reactive magnetron sputtering were sputter deposited in pure argon atmosphere; the zinc oxide tin (ZnSnOx) layer in the table used zinc tin (50:50) target, using AC double rotating cathode, medium frequency reactive magnetron Sputtering method is sputter deposited in argon and oxygen atmosphere, the power is 10-50kw, the frequency is 20-40kHz; all the functional layer Ag layer in the table is silver target, using planar cathode, DC magnetron sputtering in pure argon Sputter deposition in an atmosphere, the power is 2-10kw; in the above-mentioned three-silver low-emission coated glass, the dielectric composite layer 1-1 is composed of a combined film of a three-layer film of Nb ₂ O ₅ , TiO ₂ and ZnO, The combined film layer has a thickness of 25 nm; the dielectric combined layer 1-2 is composed of a combined film layer of AZO, ZnSnOx, and Si ₃ N ₄ three-layer film, and the combined film layer thickness is 34.6 nm; the spacer dielectric layer 3-1 is composed of AZO a composite film layer composed of two layers of SiOxNy and ZnO, wherein the combined film thickness is 74.2 nm; the spacer dielectric combination layer 3-2 is a composite film composed of AZO, two SiOxNy, and ZnO four-layer films. The combined film thickness was 69.8 nm.

The number of layers forming the combined film layer, the order of arrangement, and the material thickness of each film layer are determined depending on the specific conditions, and are not specifically limited.

The optical properties of the glass produced using the above process parameters are as follows (glass is 6 mm ordinary white glass):

a, glass visible light transmittance T = 72.0%

Visible glass surface reflectance = 10.1%

Visible light glass color coordinates a* value = -2.1

Visible glass color coordinates b* value = -4.8

Visible light surface reflectance = 7.2%

Visible light surface color coordinates a*=0.5

Visible light surface color coordinates b*=-6.7

Glass emissivity E=0.020

b. Using the present invention to make an insulating glass having a structure of 6 mm + 12 A + 6 mm (the inner layer of the film on the outer surface of the outdoor sheet), the data measured according to the ISO 10292 standard are as follows:

Visible light transmittance T=65%

Visible glass surface reflectance (out) = 12%

Visible glass surface reflectance (in) = 9%

Solar energy transmittance T=23%

Solar reflectance (out) = 45%

G-value=26.8

Shading coefficient SC=0.298

U value = 1.55W/m2‧K

The photothermal ratio LSG = 2.42.

This embodiment is an optimal film layer combination method of the three-silver low-emission coated glass. By adopting the film layer combination method of the embodiment, the U value (heat transfer coefficient), SC, and the photothermal ratio of the coated glass are improved. And the metal barrier layer in the coating is eliminated, and the silver layer is protected by the dielectric combination layer of the novel material, so that the influence on the visible light transmittance can be reduced, thereby obtaining excellent thermal performance; and since the metal barrier layer is not used Therefore, the interference color generation is avoided to some extent, and the control of the spectral curve of the film layer can ensure that the color of the coated product observed in the range of 0-45° is pure, no red or purple interference, and the visible light transmittance is high. The product has good performance and a wide range of colors. It has good optical stability, weather resistance and various colors, which can meet the needs of different customers. It can be widely promoted to the automotive glass and architectural glass market, and can obtain excellent thermal insulation effect.

In addition to the above embodiments, the thickness, the number of layers, the order of coating, and the like of the respective film layers constituting the plating film may be other cases, which may be determined as the case may be, and are not limited herein.

The three-silver low-emission coated glass disclosed by the invention eliminates the metal barrier layer in the traditional film structure, and protects the silver layer by using the dielectric combination layer of the novel material, so that the effect of the film layer on the visible light transmittance can be effectively reduced. Thereby obtaining a higher visible light transmittance, a low emissivity, and a good photothermal ratio; and to a certain extent, avoiding the generation of interference colors and improving the performance of the product; using a high hardness material similar to the glass material as the spacer dielectric layer The combined layer not only can achieve good adhesion between the glass body and the silver layer, but also can offset the internal stress of the composite film layer, especially in the aspects of scratch resistance, wear resistance and corrosion resistance, and the color The variety of choices has a wide range of applications.

The above description is only a few preferred embodiments of the present invention, but the technical features of the present invention are not limited thereto, and any one skilled in the art can easily think of it in the technical field of the present invention. Variations or modifications are intended to be included in the scope of the claims of the invention below.

1. . . Glass body

1-1, 1-2. . . Dielectric combination layer

2-1, 2-2, 2-3. . . Silver layer

3-1, 3-2. . . Spacer dielectric combination layer

1 is a schematic structural view of a three-silver low-emission coated glass of the present invention; and

Figure 2 is a flow chart showing the preparation process of the three-silver low-emission coated glass of the present invention.

1. . . Glass body

1-1, 1-2. . . Dielectric combination layer

2-1, 2-2, 2-3. . . Silver layer

3-1, 3-2. . . Spacer dielectric combination layer

Claims (9)

a three-silver low-emission coated glass, comprising: a glass body and a coating film coated on the glass body, the coating film comprising two layers of dielectric combination layer, three layers of silver layer and two layers of spacer layer dielectric combination layer; The two dielectric combination layers are respectively located on the upper and lower layers of the coating layer, and the three silver layers and the two spacer dielectric layers are sequentially disposed between the two dielectric combination layers; the dielectric The combined layer and the spacer dielectric layer are all composed of SSTOx, CrNx, CdO, MnO ₂ , InSbOx, TxO, SnO ₂ , ZnO, ZnSnOx, ZnSnPbOx, ZrO ₂ , AZO, Si ₃ N ₄ , SiO ₂ , SiOxNy, BiO ₂ , One or more layers of Al ₂ O ₃ , Nb ₂ O ₅ , Ta ₂ O ₅ , In ₂ O ₃ , and MoO ₃ are composed, and each of the film layers may be provided with one or more layers. The three-silver low-emission coated glass according to claim 1, wherein the dielectric combination layer has a thickness of 10 to 80 nm. The three-silver low-emission coated glass according to claim 1, wherein the spacer dielectric layer has a thickness of 10 to 200 nm. The three-silver low-emission coated glass according to claim 1, wherein the silver layer has a thickness of 5 to 40 nm. A method for manufacturing a three-silver low-emission coated glass adopts a vacuum magnetron sputtering coating method, characterized in that the specific process steps are as follows: (1) after the glass body is cleaned and dried, it is placed in a vacuum sputtering region; (2) Forming a first dielectric combination layer on the glass body; (3) depositing a first silver layer on the first dielectric combination layer; and (4) depositing a first spacer layer dielectric on the first silver layer a combination layer; (5) depositing a second silver layer on the first spacer dielectric layer; (6) depositing a second spacer dielectric layer on the second layer; (7) Depositing a second silver layer on the second spacer dielectric layer; (8) depositing a second dielectric combination layer on the third silver layer; and (9) forming a product. The method for manufacturing a three-silver low-emission coated glass according to claim 5, wherein the dielectric combination layer and the spacer dielectric layer are both an alternating double rotating cathode, an intermediate frequency reactive magnetron sputtering method or a planar cathode. , DC magnetron sputtering deposition. The method for producing a three-silver low-emission coated glass according to claim 5, wherein the silver layer is deposited by a planar cathode and a DC magnetron sputtering method. The method for producing a three-silver low-emission coated glass according to claim 6, wherein the alternating-current double-rotating cathode and the intermediate-frequency reactive magnetron sputtering method are performed in an argon-oxygen, argon-nitrogen or argon-oxygen atmosphere. . The method for producing a three-silver low-emission coated glass according to claim 6 or 7, wherein the planar cathode and the DC magnetron sputtering method are carried out in a pure argon, argon oxygen or argon nitrogen atmosphere.