CN112047642A - Yellow cover plate glass for building integrated photovoltaic and preparation method thereof - Google Patents
Yellow cover plate glass for building integrated photovoltaic and preparation method thereof Download PDFInfo
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- CN112047642A CN112047642A CN202010981568.1A CN202010981568A CN112047642A CN 112047642 A CN112047642 A CN 112047642A CN 202010981568 A CN202010981568 A CN 202010981568A CN 112047642 A CN112047642 A CN 112047642A
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- 239000005357 flat glass Substances 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 239000011521 glass Substances 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 36
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 31
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 30
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000000463 material Substances 0.000 claims abstract description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 24
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052593 corundum Inorganic materials 0.000 claims abstract description 23
- 229910001845 yogo sapphire Inorganic materials 0.000 claims abstract description 23
- 230000010354 integration Effects 0.000 claims abstract description 18
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 15
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 12
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 12
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 12
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 12
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 12
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 36
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 229910052786 argon Inorganic materials 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000006059 cover glass Substances 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 11
- 239000013077 target material Substances 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 230000007704 transition Effects 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 239000005329 float glass Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims 1
- 230000002238 attenuated effect Effects 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 5
- 239000005038 ethylene vinyl acetate Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- 229910007717 ZnSnO Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000000985 reflectance spectrum Methods 0.000 description 2
- 239000005341 toughened glass Substances 0.000 description 2
- 238000000411 transmission spectrum Methods 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to the technical field of photovoltaic modules, in particular to yellow cover plate glass for building integration and a preparation method thereof. The yellow cover plate glass for the photovoltaic building integration is composed of a glass substrate and a multilayer film interference color layer which are arranged from bottom to top; the film material of the multilayer film interference color layer is SiO2、TiO2、ZnO、Si3N4、ZrO2、MgF2、SnO2、Nb2O5、Al2O3ZrN and AlN, and the total thickness is 140-500 nm. According to the yellow cover plate glass for building integrated photovoltaic, disclosed by the invention, a solar cell module can be enabled to present a yellow appearance by using the glass, and the efficiency of a solar cell is not obviously attenuated; the invention also provides a preparation method of the composition.
Description
Technical Field
The invention relates to the technical field of photovoltaic modules, in particular to yellow cover plate glass for building integration and a preparation method thereof.
Background
Building glass curtain walls are typically coated to reflect and absorb some of the light in the mid and near infrared regions of the spectrum, thereby reducing the brightness and heat inside the building. Transparent solar panels can utilize these energy sources to reduce the power demand within a building without wasting it. The building integrated photovoltaic system can meet aesthetic requirements, lighting requirements, safety performance requirements and requirements of convenience in installation of buildings, has the advantages of long service life and green and environment-friendly effect, and can effectively reduce building energy consumption and realize building energy conservation.
The current Building Integrated Photovoltaic (BIPV) industry mainly aims to improve the conversion efficiency of the module continuously, but the photovoltaic module needs to meet the requirements of transparency and aesthetics besides the power generation function, so that the social value of the building is improved, and the green concept effect is brought. For photovoltaic products as building materials, the building needs to be decorated according to the color liked by customers, and the characteristics of the building are revealed.
At present, a method of adding a color film in the middle is adopted to change the color of the solar cell, but the effect is not obvious, particularly for monocrystalline silicon and amorphous silicon solar cells, the effect of changing the color is not ideal, and the introduction of the film causes the reduction of the conversion efficiency.
For example, patent CN201010279438X discloses a method for manufacturing a color solar photovoltaic module, which comprises sequentially laying a PVB film, a color solar cell sheet electrically connected to the PVB film, and a PVB film on a flat-laid common toughened glass sheet, laying an ultra-white toughened glass sheet, laminating, curing, and annealing to obtain a color solar photovoltaic module; different colors are realized by using single crystal silicon or polycrystalline silicon color solar cells.
Disclosure of Invention
The invention aims to provide yellow cover plate glass for building integrated photovoltaic, which can enable a solar cell module to show yellow appearance and the efficiency of a solar cell to be not obviously attenuated; the invention also provides a preparation method of the composition.
The yellow cover plate glass for the photovoltaic building integration is composed of a glass substrate and a multilayer film interference color layer which are arranged from bottom to top.
The film material of the multilayer film interference color layer is SiO2、TiO2、ZnO、Si3N4、ZrO2、MgF2、SnO2、Nb2O5、Al2O3ZrN and AlN.The total thickness of the multilayer film interference color layer is 140-500 nm, preferably 200-400 nm.
The multilayer film interference color layer is composed of a plurality of dielectric layers with different refractive indexes, and the dielectric layers are made of different dielectric materials.
Preferably, the multilayer film interference color layer is composed of 3 or 4 dielectric layers.
When the dielectric layers of the multilayer film interference color layer are 3 layers, the materials and the thicknesses of the dielectric layers are as follows in sequence:
the first layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the materials are mixed, and the thickness is 50-100 nm;
the second layer is MgF2、SiO2、Al2O3One or more of the materials are mixed, and the thickness is 150-200 nm;
the third layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、AlN、ZrO2、Nb2O5One or more of them are mixed, 15-50 nm.
Or,
the first layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the above materials are mixed, and the thickness is 100-200 nm;
the second layer is MgF2、SiO2、Al2O3One or more of the materials are mixed, and the thickness is 10-50 nm;
the third layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、AlN、ZrO2、Nb2O5One or more of them are mixed, 100-200 nm.
When the dielectric layers of the multilayer film interference color layer are 4 layers, the materials and the thicknesses of the dielectric layers are as follows in sequence:
first of allThe layer material is TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the materials are mixed, and the thickness is 80-120 nm;
the second layer is MgF2、SiO2、Al2O3One or more of the materials are mixed, and the thickness is 10-50 nm;
the third layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the materials are mixed, and the thickness is 70-110 nm;
the fourth layer is MgF2、SiO2、Al2O3One or more of the above materials are mixed, and the thickness is 30-70 nm.
Through the interference combination of different film layers, the appearance of the glass and the solar cell piece is yellow after combination, and simultaneously, the solar transmittance is more than 80%.
The glass substrate is one of common glass, high-quality float glass, ultra-white figured glass and acid etched glass; preferably, the glass is one of ultra-white glass, ultra-white figured glass and acid-etched glass.
The thickness of the glass substrate is 3.2-15 mm, preferably 6-8 mm.
The preparation method of the yellow cover plate glass for the photovoltaic building integration adopts a magnetron sputtering method to prepare the multilayer film interference color layer on the glass substrate.
The method comprises the following steps:
(1) cleaning and drying a glass substrate by using deionized water, and carrying out pre-vacuum transition;
(2) and (3) conveying the glass substrate to a coating cavity of the magnetron sputtering equipment, and introducing process gas into the cavity with the configured target material in sequence to prepare the multilayer film interference color layer.
The linear speed of the pre-vacuum and coating chamber in the steps (1) and (2) is 1-12 m/min.
The process gas in the step (2) is argon, or a mixed gas of argon and oxygen, or a mixed gas of argon and nitrogen, or a mixed gas of argon, nitrogen and oxygen.
When the composite material is used for preparing a solar cell, the composite material is sequentially arranged into yellow cover plate glass, EVA (ethylene vinyl acetate), the solar cell, EVA and a back plate from top to bottom.
Compared with the prior art, the invention has the following beneficial effects:
the yellow cover plate glass for the photovoltaic building integration, which is prepared by the invention, has yellow reflection color, color coordinates of a (2-5) and b (35-45) of the reflection color, is used for a photovoltaic solar cell, the solar transmittance (380 nm-1100 nm) is more than 80%, and the efficiency of the solar cell is basically unchanged.
Drawings
FIG. 1 is a schematic view of the use structure of yellow cover glass for building integrated photovoltaic of the present invention;
in the figure: 1. a glass substrate; 2. multilayer interference color layers; 3. an EVA layer; 4. a solar cell sheet; 5. an EVA layer; 6. a back plate;
FIG. 2 is a transmittance spectrum of 300-2500nm of the yellow cover glass for building integration of photovoltaic prepared in example 1 of the present invention;
FIG. 3 is a reflectance spectrum of 300-2500nm of the yellow cover glass for building integration of photovoltaic prepared in example 1 of the present invention;
FIG. 4 is a transmittance spectrum of 300-2500nm of the yellow cover glass for building integration of photovoltaic prepared in example 2 of the present invention;
FIG. 5 is a reflectance spectrum of 300-2500nm of the yellow cover glass for building integration of photovoltaic prepared in example 2 of the present invention.
Detailed Description
The present invention will be further described with reference to the following examples.
Example 1
Yellow cover plate glass for building integrated photovoltaic comprises a glass substrate and multilayer film interference color layers which are arranged from bottom to top; the glass substrate is super white glass with the thickness of 3.2mm, and the multilayer film interference color layers are sequentially as follows: glass/AZO74nm/SiAlOx180nm/ZrO215nm。
The preparation method comprises the following steps:
(1) cleaning the glass substrate with ultrapure water, wherein the linear speed is set to be 2.0 m/min;
(2) transferring the glass substrate into a coating chamber after pre-vacuum transition, wherein the background vacuum of the coating chamber is less than 1 × 10- 5mbar, installing a Zn target doped with Al with the mass percent of 2% by using magnetron sputtering coating equipment, introducing argon with the purity of more than 99.99%, enabling the flow rate to be 400sccm, enabling the oxygen with the purity of more than 99.99%, enabling the flow rate to be 1000sccm, and enabling the working pressure to be 2-5 multiplied by 10-3mbar, setting the total power of the target to be 180KW, and plating an AZO film layer of 74nm on the glass substrate by adopting a radio frequency magnetron sputtering method;
(3) the magnetron sputtering coating equipment is provided with a SiAl target, the mass ratio of Si to Al is 9:1, the purity of argon is higher than 99.99 percent, the flow rate is 800sccm, the purity of oxygen is higher than 99.99 percent, the flow rate is 400sccm, and the working pressure is 2-5 multiplied by 10-3mbar, setting the total power of the target material to be 480KW, and plating SiO on the glass substrate by adopting a magnetron sputtering method2The film layer is 180 nm;
(4) ZrO incompletely oxidized during installation of magnetron sputtering coating equipmentxThe purity of argon gas is more than 99.99 percent, the flow rate is 800sccm, the purity of oxygen is more than 99.99 percent, the flow rate is 20sccm, the total power of the target material is set to be 15KW, and a magnetron sputtering method is adopted to plate ZrO on a glass substrate2The film layer is 15 nm.
The solar transmittance of the prepared sample was 81.4%, the reflection a was 2.24, and b was 39.15.
Example 2
Yellow cover plate glass for building integrated photovoltaic comprises a glass substrate and multilayer film interference color layers which are arranged from bottom to top; the glass substrate is super white glass with the thickness of 3.2mm, and the multilayer film interference color layers are sequentially as follows: glass/SiAlNx(100nm)/SiAlOx(35nm)/SiAlNx(90nm)/SiAlOx(50nm)。
The preparation method comprises the following steps:
(1) cleaning the glass substrate with ultrapure water, wherein the linear speed is set to be 2.0 m/min;
(2) passing a glass substrate throughTransferring the pre-vacuum transition into a coating chamber, installing an SiAl target on the magnetron sputtering coating equipment, wherein the Si/Al mass ratio is 9:1, introducing argon with the purity of more than 99.99 percent, the flow rate of 400sccm, the purity of nitrogen with the flow rate of more than 99.99 percent, the flow rate of 800sccm and the working pressure of 2-5 multiplied by 10-3Setting the total power of the target material at 240KW, and plating Si on the glass substrate by magnetron sputtering3N4The film layer is 100 nm;
(3) the magnetron sputtering coating equipment is provided with a SiAl target, the mass ratio of Si to Al is 9:1, the purity of argon is higher than 99.99 percent, the flow rate is 800sccm, the purity of oxygen is higher than 99.99 percent, the flow rate is 400sccm, and the working pressure is 2-5 multiplied by 10-3mbar, the total power of the target is set to be 250KW, and SiO is plated on the glass substrate by adopting a magnetron sputtering method2The film layer is 35 nm;
(4) the magnetron sputtering coating equipment is provided with a SiAl target, and the mass ratio of Si to Al is 9:1, introducing argon with the purity of more than 99.99 percent, the flow rate of 400sccm, the purity of nitrogen with the flow rate of more than 99.99 percent, the flow rate of 800sccm and the working pressure of 2-5 multiplied by 10-3mbar, total power of the target is set to be 220KW, and SiAlN is plated on the glass substrate by adopting a magnetron sputtering methodxThe film layer is 90 nm;
(5) the magnetron sputtering coating equipment is provided with a SiAl target, the mass ratio of Si to Al is 9:1, the purity of argon is higher than 99.99 percent, the flow rate is 800sccm, the purity of oxygen is higher than 99.99 percent, the flow rate is 400sccm, and the working pressure is 2-5 multiplied by 10-3mbar, setting the total power of the target material to be 320KW, and plating SiO on the glass substrate by adopting a magnetron sputtering method2And obtaining the yellow cover plate glass for the photovoltaic building integration by the film layer of 50 nm.
The solar transmittance of the prepared sample was 82.28%, the reflection a was 4.05, and b was 39.68.
Example 3
Yellow cover plate glass for building integrated photovoltaic comprises a glass substrate and multilayer film interference color layers which are arranged from bottom to top; the glass substrate is ultra-white figured glass with the thickness of 6mm, and the multilayer film interference color layers are sequentially as follows: glass/ZnSnO2(147nm)/SiO2(20nm)/ZnSnO2(182nm)。
The preparation method comprises the following steps:
(1) cleaning the glass substrate with ultrapure water, wherein the linear speed is set to be 1.0 m/min;
(2) transferring the glass substrate into a coating chamber after pre-vacuum transition, wherein the background vacuum of the coating chamber is less than 1 × 10- 5mbar, installing a ZnSn target on the magnetron sputtering coating equipment, wherein the Zn/Sn ratio is 1:1, introducing argon with the purity of more than 99.99 percent, the flow rate of 400sccm, the oxygen with the purity of more than 99.99 percent, the flow rate of 800sccm, and the working pressure of 2-5 multiplied by 10-3mbar, total power of the target is set to be 150KW, and ZnSnO is plated on the glass substrate by adopting a magnetron sputtering method2The film layer is 46 nm;
(3) the magnetron sputtering coating equipment is provided with a Si target with the purity of 99.99 percent, argon is introduced with the purity of more than 99.99 percent, the flow rate is 800sccm, the oxygen purity is more than 99.99 percent, the flow rate is 400sccm, and the working pressure is 2-5 multiplied by 10-3mbar, total power of the target material is set to be 30KW, and SiO is plated on the glass substrate by adopting a magnetron sputtering method2The film layer is 15 nm;
(4) the magnetron sputtering coating equipment is provided with a ZnSn target, Zn/Sn is 1:1, the purity of argon is more than 99.99 percent, the flow rate is 400sccm, the purity of oxygen is more than 99.99 percent, the flow rate is 800sccm, and the working pressure is 2-5 multiplied by 10-3mbar, setting the total power of the target material to be 190KW, and plating ZnSnO on the glass substrate by adopting a magnetron sputtering method2The film layer is 63 nm; and obtaining the yellow cover plate glass for building integration.
The solar transmittance of the prepared sample was 83.5%, the reflection a was 3.88, and b was 44.63.
Claims (10)
1. The utility model provides a yellow cover plate glass for building integrated photovoltaics which characterized in that: the glass substrate comprises a plurality of interference color layers of glass substrates arranged from bottom to top; the film material of the multilayer film interference color layer is SiO2、TiO2、ZnO、Si3N4、ZrO2、MgF2、SnO2、Nb2O5、Al2O3ZrN and AlN, and the total thickness is 140-500 nm.
2. The yellow cover glass for building integration according to claim 1, wherein: the glass substrate is one of common glass, high-quality float glass, ultra-white figured glass and acid etched glass.
3. The yellow cover glass for building integration according to claim 2, wherein: the thickness of the glass substrate is 3.2-15 mm.
4. The yellow cover glass for building integration according to claim 1, wherein: the total thickness of the multilayer film interference color layer is 200-400 nm.
5. The yellow cover glass for building integration according to claim 1, wherein: the multilayer film interference color layer is composed of 3 or 4 medium layers.
6. The yellow cover glass for building integration according to claim 5, wherein: the multilayer film interference color layer is composed of 3 dielectric layers, and the materials and the thicknesses of the dielectric layers are as follows in sequence:
the first layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the materials are mixed, and the thickness is 50-100 nm;
the second layer is MgF2、SiO2、Al2O3One or more of the materials are mixed, and the thickness is 150-200 nm;
the third layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、AlN、ZrO2、Nb2O5One or more of the above materials are mixed, and the particle size is 15-50 nm;
or,
the first layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the above materials are mixed, and the thickness is 100-200 nm;
the second layer is MgF2、SiO2、Al2O3One or more of the materials are mixed, and the thickness is 10-50 nm;
the third layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、AlN、ZrO2、Nb2O5One or more of them are mixed, 100-200 nm.
7. The yellow cover glass for building integration according to claim 5, wherein: the multilayer film interference color layer consists of 4 dielectric layers, and the materials and the thicknesses of the dielectric layers are as follows in sequence:
the first layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the materials are mixed, and the thickness is 80-120 nm;
the second layer is MgF2、SiO2、Al2O3One or more of the materials are mixed, and the thickness is 10-50 nm;
the third layer is made of TiO2、Si3N4、ZnO、SnO2、Al2O3、ZrO2、Nb2O5One or more of the materials are mixed, and the thickness is 70-110 nm;
the fourth layer is MgF2、SiO2、Al2O3One or more of the above materials are mixed, and the thickness is 30-70 nm.
8. The preparation method of the yellow cover glass for building integrated photovoltaics, according to any one of claims 1 to 7, is characterized in that: the method comprises the following steps:
(1) cleaning and drying a glass substrate by using deionized water, and carrying out pre-vacuum transition;
(2) and (3) conveying the glass substrate to a coating cavity of the magnetron sputtering equipment, and introducing process gas into the cavity with the configured target material in sequence to prepare the multilayer film interference color layer.
9. The method for preparing yellow cover plate glass for building integrated photovoltaics according to claim 8, wherein the method comprises the following steps: the linear speed of the pre-vacuum and coating chambers in the steps (1) and (2) is 1-12 m/min.
10. The method for preparing yellow cover plate glass for building integrated photovoltaics according to claim 8, wherein the method comprises the following steps: the process gas in the step (2) is argon, or a mixed gas of argon and oxygen, or a mixed gas of argon and nitrogen, or a mixed gas of argon, nitrogen and oxygen.
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| CN114262162A (en) * | 2021-12-21 | 2022-04-01 | 夏能科技(北京)有限公司 | Design method of long-acting photovoltaic glass with decoration function |
| CN115073019A (en) * | 2022-07-11 | 2022-09-20 | 咸宁南玻节能玻璃有限公司 | High-anti-gold sunlight-control coated glass and preparation method thereof |
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