CN111584647A - Yellow front plate glass for photovoltaic module and yellow photovoltaic module prepared from same - Google Patents
Yellow front plate glass for photovoltaic module and yellow photovoltaic module prepared from same Download PDFInfo
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- CN111584647A CN111584647A CN202010454362.3A CN202010454362A CN111584647A CN 111584647 A CN111584647 A CN 111584647A CN 202010454362 A CN202010454362 A CN 202010454362A CN 111584647 A CN111584647 A CN 111584647A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/0488—Double glass encapsulation, e.g. photovoltaic cells arranged between front and rear glass sheets
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02S—GENERATION OF ELECTRIC POWER BY CONVERSION OF INFRARED RADIATION, VISIBLE LIGHT OR ULTRAVIOLET LIGHT, e.g. USING PHOTOVOLTAIC [PV] MODULES
- H02S20/00—Supporting structures for PV modules
- H02S20/20—Supporting structures directly fixed to an immovable object
- H02S20/22—Supporting structures directly fixed to an immovable object specially adapted for buildings
- H02S20/26—Building materials integrated with PV modules, e.g. façade elements
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B10/00—Integration of renewable energy sources in buildings
- Y02B10/10—Photovoltaic [PV]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Abstract
The invention belongs to the field of solar cells, and particularly relates to yellow front plate glass for a photovoltaic module, and further discloses a yellow photovoltaic module prepared from the yellow front plate glass. According to the yellow front plate glass, materials with different refractive indexes are deposited to form alternately superposed high refractive index layers and low refractive index layers, the thickness matching between the layers is adjusted to form a required yellow dielectric film block, and the yellow front plate glass can be deposited on the surface of a glass substrate to form the yellow front plate glass for a photovoltaic module. The yellow front plate glass has high transmittance, good weather resistance and water resistance in the range of sunlight wave band, has excellent color uniformity in the range of angle with the reflection angle not more than 60 degrees and color saturation higher than 20 in the range of angle with the reflection angle close to the normal line, can effectively improve the appearance effect of a photovoltaic module, effectively solves the problem of single color of the traditional photovoltaic module, and can meet the requirement of photovoltaic building integration on appearance color.
Description
Technical Field
The invention belongs to the field of solar cells, and particularly relates to yellow front plate glass for a photovoltaic module, and further discloses a yellow photovoltaic module prepared from the yellow front plate glass.
Background
With the rapid development of economy, the demand for energy is stronger and stronger. As a large amount of toxic and harmful substances are discharged from traditional fossil fuels such as coal, petroleum, natural gas and the like in the using process, water, soil and atmosphere are seriously polluted, even greenhouse effect and acid rain are formed, and the living environment and the body health of human beings are seriously harmed, renewable clean energy sources are paid more and more attention. Solar energy is a direction of key development in the current energy field due to the advantages of being clean, pollution-free, inexhaustible and the like.
The photovoltaic Building Integrated PV (PV) technology is a technology for integrating solar power generation (photovoltaic) products into buildings, and is a new concept for applying solar power generation. Different from the form that a photovoltaic system is attached to a building, the photovoltaic building integration is that a solar photovoltaic power generation square matrix is installed on the outer surface of an envelope structure of the building to provide electric power in short, the building, the ecology and the scientific technology are integrated, the requirement of building functions is met, and the utilization of solar energy is realized.
Along with the development of society, the aesthetic of masses of consumers is constantly promoted, and the designer also has higher and higher requirements for appearance color, and the single power generation function of traditional BIPV photovoltaic module can't satisfy the demand, needs have diversity, aesthetic property element to integrate into the photovoltaic building, shows the individual character of BIPV building. However, the color of the conventional solar cell chip is single, so that the color of the photovoltaic module is also single, and the requirements of various performances of a photovoltaic building cannot be met. In addition, the surfaces of the traditional crystalline silicon photovoltaic module and the thin film solar cell module have obvious metal grid lines and etched grid lines, and when the crystalline silicon photovoltaic module and the thin film solar cell module are applied to a BIPV product, the surfaces of the crystalline silicon photovoltaic module and the thin film solar cell module can observe the thin metal grid lines and the etched grid lines, so that the attractiveness of the BIPV product is influenced. Moreover, the traditional photovoltaic module front plate uses ultra-white glass, glare can exist under a specific angle, light pollution is generated, strong visual impact is generated on passing vehicles and pedestrians, and traffic accidents are easily caused. Therefore, the development of the photovoltaic module with smooth appearance and various colors has positive significance for the development of BIPV products.
Disclosure of Invention
Therefore, the technical problem to be solved by the invention is to provide yellow front plate glass for a photovoltaic module, so as to solve the problem of single color of the photovoltaic module in the prior art;
the second technical problem to be solved by the present invention is to provide a yellow photovoltaic module to solve the problems of poor appearance and single color of the photovoltaic module in the prior art.
In order to solve the technical problem, the yellow front plate glass for the photovoltaic module comprises a glass substrate and a yellow dielectric film block deposited on the surface of the glass substrate;
the yellow dielectric film block comprises a high-refraction layer H formed by a high-refraction-index material and a low-refraction layer L formed by a low-refraction-index material, the high-refraction layer H and the low-refraction layer L are alternately arranged at intervals, and the yellow dielectric film block is yellow by adjusting the number of the high-refraction layer H and the low-refraction layer L and the thickness of each high-refraction layer H and the low-refraction layer L.
Specifically, the refractive index of the high-refractive-index material at 550nm is 1.8<nH<2.6, the refractive index of the low-refractive-index material at 550nm is 1.4<nL<2.0。
Specifically, the yellow front plate glass comprises the following structures:
3, designing a layer structure: air// glass substrate// high refractive index layer H having a thickness of 90 + -20 nm// low refractive index layer L having a thickness of 110 + -20 nm// high refractive index layer H having a thickness of 90 + -20 nm// organic polymer, wherein 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
3, designing a layer structure: air// glass substrate// high refractive index layer H having a thickness of 90 + -20 nm// low refractive index layer L having a thickness of 30 + -10 nm// high refractive index layer H having a thickness of 100 + -20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0；
Alternatively, the first and second electrodes may be,
and 5, designing a structure: air// glass substrate// high refractive index layer H with a thickness of 40 + -20 nm// low refractive index layer L with a thickness of 65 + -20 nm// high refractive index layer H with a thickness of 110 + -20 nm// low refractive index layer L with a thickness of 100 + -20 nm// high refractive index layer H with a thickness of 100 + -20 nm// organic polymer, wherein 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
and 5, designing a structure: air// glass substrate// high refractive index layer H with a thickness of 95 + -20 nm// low refractive index layer L with a thickness of 70 + -20 nm// high refractive index layer H with a thickness of 40 + -20 nm// low refractive index layer L with a thickness of 40 + -20 nm// high refractive index layer H with a thickness of 40 + -20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0。
Specifically, the glass substrate is made of ultra-white toughened glass, and a front surface treatment layer with rough textures is formed on the front surface of the glass substrate, which is in contact with air, so that the mirror glass glare phenomenon is eliminated. Preferably, the roughness of the pretreatment surface is controlled to be not less than 0.3 μm, the haze is controlled to be not less than 50%, and the glass with the pretreatment surface is obtained, so that irradiated incident light can be scattered, glare of mirror glass is eliminated, and light pollution caused by reflected light on the surface of the glass is solved.
Preferably, the refractive index of the ultra-white toughened glass at 550nm is 1.4<nH<1.6, and its transmittanceNot less than 88%.
Specifically, the performances of the yellow front plate glass for the photovoltaic module comprise:
the average light transmittance of the yellow front plate glass in the sunlight wave band is not lower than 80%;
the color saturation of the yellow front plate glass at a near-normal reflection angle is higher than 20;
the yellow front plate glass has good color uniformity in the range of the reflection angle not more than 60 degrees.
The invention also discloses a method for preparing the yellow front plate glass for the photovoltaic module, which comprises the following steps:
(1) cleaning and pretreating the selected glass substrate;
(2) and according to the structure of the selected yellow dielectric film block, respectively depositing the selected high-refractive-index material and the low-refractive-index material on the surface of the glass substrate by adopting a vacuum coating technology to obtain the required yellow front plate glass.
Specifically, the vacuum coating technology comprises conventional technologies such as a magnetron sputtering coating technology, a vacuum evaporation coating technology, a low-pressure plasma deposition technology and the like.
The step (1) further comprises a step of forming the front surface treatment layer on the front surface of the glass substrate by means of chemical etching and/or physical sand blasting; wherein the content of the first and second substances,
the step of forming the front surface treatment layer by means of chemical etching comprises:
(1) carrying out film pasting treatment on the other surface of the selected glass substrate;
(2) cleaning and pretreating the film-coated glass substrate;
(3) carrying out chemical etching treatment on the cleaned glass;
(4) cleaning the glass after the chemical etching treatment, and removing the back film to obtain a rough pretreatment surface;
the step of forming the front surface treatment layer by means of physical blasting includes:
(1) selecting gravel with proper grain size distribution, and putting the gravel into a sand blasting machine;
(2) adjusting the pressure of the air compressor;
(3) carrying out sand blasting treatment on the surface of the glass to be treated;
(4) and cleaning the glass subjected to sand blasting to obtain a rough pretreatment surface.
The invention also discloses a yellow photovoltaic module which comprises the glass back plate, the first packaging adhesive film, the solar cell, the second packaging adhesive film and the yellow front plate glass which are laminated in sequence.
Specifically, the first adhesive packaging film and/or the second adhesive packaging film are independent of each other and are selected from at least one of PVB, EVA, and POE, and preferably, the thickness of the first adhesive packaging film and/or the second adhesive packaging film is 0.3-2.88 mm.
Specifically, the solar cell includes a monocrystalline silicon solar cell, a polycrystalline silicon solar cell, an amorphous silicon solar cell, a cadmium telluride thin-film solar cell, a copper indium gallium selenide thin-film solar cell, a gallium arsenide solar cell, and the like.
The invention also discloses a method for preparing the yellow photovoltaic module, which comprises the steps of laminating the selected glass back plate, the first packaging adhesive film, the solar cell, the second packaging adhesive film and the yellow front plate glass, and carrying out high-pressure treatment on the laminated module.
According to the yellow front plate glass, materials with different refractive indexes are deposited to form alternately superposed high refractive index layers and low refractive index layers, the thickness matching between the layers is adjusted to form a required yellow dielectric film block, and the yellow front plate glass can be deposited on the surface of a glass substrate to form the yellow front plate glass for a photovoltaic module. The yellow front plate glass has high transmittance (not less than 80%) in a sunlight wave band range, can effectively reduce the power loss of the assembly, has good weather resistance and water resistance, has excellent color uniformity in a range of a reflection angle not greater than 60 degrees and color saturation higher than 20 at a near-normal reflection angle, can effectively reduce the defect of uneven assembly color caused by large-angle color deviation, can effectively improve the appearance effect of a photovoltaic assembly, effectively solves the problem of single color of the traditional photovoltaic assembly, and can meet the requirement of photovoltaic building integration on appearance color. The yellow front plate glass has the advantages of simple structural design of the yellow medium module, less film layers, simple preparation process and low cost, and is suitable for large-scale popularization and production.
According to the yellow front plate glass, the ultra-white toughened glass is selected as the glass substrate, and the front surface treatment layer with rough textures is formed on the front surface of the glass substrate, which is in contact with air, through a vacuum coating technology in a chemical etching and/or physical sand blasting mode, so that irradiated incident light can be scattered, glare of mirror glass is eliminated, the anti-glare effect is achieved, and light pollution caused by reflected light on the surface of the glass and light pollution of a building curtain wall are effectively solved.
The yellow photovoltaic module is prepared by laminating the yellow front plate glass conventionally, so that the photovoltaic module presents diversified colors, the attractiveness of the appearance of a BIPV product is further realized, the defect of single color of the traditional BIPV product is effectively overcome, the requirements of consumers on diversity and attractiveness are met, new elements are added for the BIPV building, and the product quality is effectively improved. Meanwhile, the yellow film block of the yellow front plate glass and the glass substrate after surface roughening treatment can effectively shield the grid line of the solar cell, so that the whole photovoltaic module is good in appearance uniformity and high in attractiveness, and the whole attractiveness of the photovoltaic module is effectively improved.
Drawings
In order that the present disclosure may be more readily and clearly understood, the following detailed description of the present disclosure is provided in connection with specific embodiments thereof and the accompanying drawings, in which,
FIG. 1 is a schematic structural diagram of a yellow photovoltaic module according to the present invention;
the reference numbers in the figures denote: 1-a front surface treatment layer, 2-a glass substrate, 3-a yellow dielectric film block, 4-a second packaging adhesive film, 5-a solar cell, 6-a first packaging adhesive film and 7-a glass back plate.
Detailed Description
In the following embodiments of the invention, the treatment of the front surface of the glass substrate is carried out by adopting a conventional chemical etching or physical sand blasting method and treating the front surface of the glass substrate to required parameters according to a conventional method; alternatively, the glass substrate with the matching parameters may be purchased directly for use.
Example 1
This embodiment yellow front bezel glass includes glass substrate and 3 layers structural design's yellow dielectric film piece, and specific structural design is: air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 90 nm;
second functional layer (L): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) and a thickness of 110 nm;
third functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 90 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasted glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, and removing the back film pasting to obtain a rough pretreatment surface. In this embodiment, the surface roughness of the treated front surface is controlled to be 0.8 to 1 μm, and the haze is controlled to be 70% to 80%.
The organic polymer (i.e. adhesive film) is PVB and has a thickness of 1.14 mm.
The preparation method of the yellow front plate glass specifically comprises the following steps:
(1) substrate pretreatment
The method comprises the steps of firstly cleaning and drying the glass substrate by using neutral cleaning solution and deionized water, then placing the glass substrate into a transition chamber of coating equipment, and performing secondary cleaning on the surface of the substrate by using ion source bombardment, wherein the specific process parameters comprise that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99%, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the yellow dielectric film block
First functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 90nm on the pretreated glass substrate with the flow rate of 24 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a second functional layer L with the thickness of 110nm on the first functional layer with the flow rate of 30 sccm;
third functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The background vacuum degree of the equipment reaches 5.0 × 10-5At mTorr, set pulse DC power sourceThe jet power is 2000w, inert working gas Ar with the purity of 99.99 percent is introduced, the flow rate is 50sccm, the working pressure is 5mTorr, the surface of the target material is cleaned, and then reaction gas N with the purity of 99.99 percent is introduced2And preparing a third functional layer H with the thickness of 90nm on the second functional layer at the flow rate of 24sccm to obtain the yellow front plate glass containing the yellow dielectric film block with the 3-layer structure.
Example 2
This embodiment yellow front bezel glass includes glass substrate and 3 layers structural design's yellow dielectric film piece, and specific structural design is: air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 90 nm;
second functional layer (L): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) with a thickness of 30 nm;
third functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 100 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasting glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, removing the back film pasting to obtain a rough pretreatment surface, and controlling the surface roughness to be 0.3-0.5 mu m and the haze to be 50-60%.
The organic polymer is PVB (namely adhesive film), and the thickness is 1.52 mm.
The preparation method of the yellow front plate glass specifically comprises the following steps:
(1) substrate pretreatment
The method comprises the steps of firstly cleaning and drying the glass substrate by using neutral cleaning solution and deionized water, then placing the glass substrate into a transition chamber of coating equipment, and performing secondary cleaning on the surface of the substrate by using ion source bombardment, wherein the specific process parameters comprise that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99%, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the yellow dielectric film block
First functional layer H (TiO)2): selecting a Ti target material with the purity of 99.5 percent to carry out TiO2The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when the background vacuum of mTorr is adopted, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 90nm on the pretreated glass substrate with the flow rate of 25 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a second functional layer L with the thickness of 30nm on the first functional layer with the flow rate of 30 sccm;
third functional layer H (TiO)2): selecting a Ti target material with the purity of 99.5 percent to carry out TiO2The background vacuum degree of the equipment reaches 5.0 × 10-5At mTorr, the sputtering power of the pulse direct current power supply is set to be 1500w, and the introduced purity is 99.99% inert working gas Ar with the flow of 50sccm and the working pressure of 3mTorr is used for cleaning the surface of the target material, and then reaction gas O with the purity of 99.99 percent is introduced2And preparing a third functional layer H with the thickness of 100nm on the second functional layer at the flow rate of 25sccm to obtain the yellow front plate glass containing the yellow dielectric film block with the 3-layer structure.
Example 3
This embodiment yellow front bezel glass includes glass substrate and 5 layers structural design's yellow dielectric film piece, and specific structural design is: air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 40 nm;
second functional layer (L): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) and a thickness of 65 nm;
third functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 110 nm;
fourth functional layer (L): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) and a thickness of 100 nm;
fifth functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 100 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasting glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, removing the back film pasting to obtain a rough pretreatment surface, and controlling the surface roughness to be 0.5-0.7 mu m and the haze to be 60-70%.
The organic polymer is PVB (namely adhesive film), and the thickness is 1.14 mm.
The preparation method of the yellow front plate glass specifically comprises the following steps:
(1) substrate pretreatment
The method comprises the steps of firstly cleaning and drying the glass substrate by using neutral cleaning solution and deionized water, then placing the glass substrate into a transition chamber of coating equipment, and performing secondary cleaning on the surface of the substrate by using ion source bombardment, wherein the specific process parameters comprise that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99%, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the yellow dielectric film block
First functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 40nm on the pretreated glass substrate with the flow rate of 24 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, and performing target material surface measurementSurface cleaning, and introducing reaction gas O with purity of 99.99%2Preparing a second functional layer L with the thickness of 65nm on the first functional layer with the flow rate of 30 sccm;
third functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a third functional layer H with the thickness of 110nm on the second functional layer at the flow rate of 24 sccm;
fourth functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a fourth functional layer L with the thickness of 100nm on the third functional layer with the flow rate of 30 sccm;
fifth functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a fifth functional layer H with the thickness of 100nm on the fourth functional layer at the flow rate of 24 sccm; and obtaining the yellow front plate glass containing the yellow dielectric film block with the 5-layer structure.
Example 4
This embodiment yellow front bezel glass includes glass substrate and 5 layers structural design's yellow dielectric film piece, and specific structural design is: air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer; wherein:
first functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 95 nm;
second functional layer (L): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) with a thickness of 70 nm;
third functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 40 nm;
fourth functional layer (L): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) with a thickness of 40 nm;
fifth functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 40 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasting glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, removing the back film pasting to obtain a rough pretreatment surface, and controlling the surface roughness to be 1-1.3 mu m and the haze to be 80-90%.
The organic polymer is PVB (namely adhesive film), and the thickness is 1.52 mm.
The preparation method of the yellow front plate glass specifically comprises the following steps:
(1) substrate pretreatment
Sequence of eventsThe method comprises the steps of adopting neutral cleaning solution and deionized water to primarily clean and dry the glass substrate, then putting the glass substrate into a transition chamber of coating equipment, and utilizing ion source bombardment to secondarily clean the surface of the substrate, wherein the specific technological parameters are that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99 percent, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the yellow dielectric film block
First functional layer H (TiO)2): selecting a Ti target material with the purity of 99.5 percent to carry out TiO2The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when the background vacuum of mTorr is adopted, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 95nm on the pretreated glass substrate with the flow rate of 25 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a second functional layer L with the thickness of 70nm on the first functional layer with the flow rate of 30 sccm;
third functional layer H (TiO)2): selecting a Ti target material with the purity of 99.5 percent to carry out TiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Flow rate ofPreparing a third functional layer H with the thickness of 40nm on the second functional layer at 25 sccm;
fourth functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a fourth functional layer L with the thickness of 40nm on the third functional layer with the flow rate of 30 sccm;
fifth functional layer H (TiO)2): selecting a Ti target material with the purity of 99.5 percent to carry out TiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a fifth functional layer H with the thickness of 40nm on the fourth functional layer with the flow rate of 25 sccm; and obtaining the yellow front plate glass containing the yellow dielectric film block with the 5-layer structure.
Examples of the experiments
The properties of the yellow front glass prepared in examples 1 to 4 were measured, including transmittance and color saturation, and the specific test results are shown in table 1.
TABLE 1 Performance test results for yellow front glass
| Transmittance/% (solar band) | Color saturation | |
| Example 1 | 87.3 | 31.5 |
| Example 2 | 81.7 | 32.0 |
| Example 3 | 87.0 | 32.0 |
| Example 4 | 83.1 | 34.5 |
As can be seen from the data in Table 1, the average light transmittance of the yellow front plate glass prepared in the examples 1 to 4 in the sunlight wave band range is 81.7 to 87.3 percent, and is more than 80 percent, and the yellow front plate glass has higher light transmittance, so that the power loss of the component can be effectively reduced; and the tested color saturation is between 31.5 and 34.5, the color saturation is high, and the required color can be well realized.
The results of the color uniformity tests at a reflection angle of not more than 60 ° for the yellow front glasses prepared in the above examples 1 to 4, respectively, are shown in tables 2 to 5, respectively.
TABLE 2 color coordinates (x, y) under CIE-D65 illuminant of example 1 for different reflection angles
| Angle of reflection/° | x | y | Colour(s) |
| 0 | 0.4354 | 0.4227 | Yellow colour |
| 10 | 0.4334 | 0.4239 | Yellow colour |
| 20 | 0.4268 | 0.4263 | Yellow colour |
| 30 | 0.4137 | 0.426 | Yellow colour |
| 40 | 0.3937 | 0.4188 | Yellow colour |
| 50 | 0.369 | 0.4027 | Light green yellow |
| 60 | 0.3447 | 0.3799 | Light green yellow |
TABLE 3 color coordinates (x, y) under CIE-D65 illuminant of example 2 for different reflection angles
| Angle of reflection/° | x | y | Colour(s) |
| 0 | 0.4358 | 0.4296 | Yellow colour |
| 10 | 0.4347 | 0.431 | Yellow colour |
| 20 | 0.4313 | 0.4346 | Yellow colour |
| 30 | 0.4247 | 0.4387 | Yellow colour |
| 40 | 0.4137 | 0.4403 | Yellow colour |
| 50 | 0.3974 | 0.4351 | Yellow colour |
| 60 | 0.3754 | 0.418 | Light green yellow |
TABLE 4 color coordinates (x, y) under CIE-D65 illuminant of example 3 for different reflection angles
TABLE 5 color coordinates (x, y) under CIE-D65 illuminant of example 4 for different reflection angles
| Angle of reflection/° | x | y | Colour(s) |
| 0 | 0.4358 | 0.4296 | Yellow colour |
| 10 | 0.4347 | 0.431 | Yellow colour |
| 20 | 0.4313 | 0.4346 | Yellow colour |
| 30 | 0.4247 | 0.4387 | Yellow colour |
| 40 | 0.4137 | 0.4403 | Yellow colour |
| 50 | 0.3974 | 0.4351 | Yellow colour |
| 60 | 0.3754 | 0.418 | Light green yellow |
As can be seen from the data in tables 2 to 5, the yellow front plate glasses prepared in examples 1 to 4 have excellent color uniformity within an angle range of a reflection angle of not more than 60 degrees, and can meet the requirements of the building integrated photovoltaic products on color uniformity effects.
Application example
The yellow photovoltaic module structure as shown in fig. 1 comprises a yellow front glass, a second encapsulant film 4, a solar cell 5, a first encapsulant film 6 and a glass back plate 7, which are sequentially laminated, wherein the yellow front glass comprises a glass substrate 2 and a yellow dielectric film block 3 which is arranged on the surface of the glass substrate 2 and formed by deposition, and a front surface treatment layer 1 is formed on the surface of one side of the glass substrate 2 away from the yellow dielectric film block 3 (i.e. the side of the glass substrate 2 contacting with air).
Specifically, the solar cell includes a monocrystalline silicon solar cell, a polycrystalline silicon solar cell, an amorphous silicon solar cell, a cadmium telluride thin-film solar cell, a copper indium gallium selenide thin-film solar cell, a gallium arsenide solar cell, and the like.
The preparation of the yellow photovoltaic module can be realized by adopting a common method in the prior art, namely, laminating a selected glass back plate (ultra-white toughened glass), a first packaging adhesive film, a solar cell, a second packaging adhesive film and the yellow front plate glass by a set program, and placing the laminated module in a high-pressure kettle for high-pressure treatment.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.
Claims (10)
1. The yellow front plate glass for the photovoltaic module is characterized by comprising a glass substrate and a yellow dielectric film block deposited on the surface of the glass substrate;
the yellow dielectric film block comprises a high-refraction layer H formed by a high-refraction-index material and a low-refraction layer L formed by a low-refraction-index material, the high-refraction layer H and the low-refraction layer L are alternately arranged at intervals, and the yellow dielectric film block is yellow by adjusting the number of the high-refraction layer H and the low-refraction layer L and the thickness of each high-refraction layer H and the low-refraction layer L.
2. The yellow front sheet glass for photovoltaic modules according to claim 1, wherein the high refractive index material has a refractive index of 1.8 at 550nm<nH<2.6, the refractive index of the low-refractive-index material at 550nm is 1.4<nL<2.0。
3. The yellow front glass for photovoltaic modules according to claim 1 or 2, characterized in that the structure of the yellow front glass comprises:
3, designing a layer structure: air// glass substrate// high refractive index layer H having a thickness of 90 + -20 nm// low refractive index layer L having a thickness of 110 + -20 nm// high refractive index layer H having a thickness of 90 + -20 nm// organic polymer, wherein 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
3, designing a layer structure: air// glass substrate// high refractive index layer H having a thickness of 90 + -20 nm// low refractive index layer L having a thickness of 40 + -20 nm// high refractive index layer H having a thickness of 110 + -20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0；
Alternatively, the first and second electrodes may be,
and 5, designing a structure: air// glass substrate// high refractive index layer H with a thickness of 40 + -20 nm// low refractive index layer L with a thickness of 65 + -20 nm// high refractive index layer H with a thickness of 110 + -20 nm// low refractive index layer L with a thickness of 100 + -20 nm// high refractive index layer H with a thickness of 100 + -20 nm// organic polymer, wherein 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
and 5, designing a structure: air// glass substrate// high refractive index layer H with a thickness of 95 + -20 nm// low refractive index layer L with a thickness of 70 + -20 nm// high refractive index layer H with a thickness of 40 + -20 nm// low refractive index layer L with a thickness of 40 + -20 nm// high refractive index layer H with a thickness of 40 + -20 nm// organic polymerWherein, 2.0<nH<2.6，1.4<nL<2.0。
4. The yellow front glass for photovoltaic modules according to any one of claims 1 to 3, wherein the glass substrate is ultra-white tempered glass, and a front surface treatment layer with a rough texture is formed on the front surface of the glass substrate, which is in contact with air, so as to eliminate the glare phenomenon of mirror glass.
5. The yellow front sheet glass for photovoltaic modules according to any one of claims 1 to 4, wherein:
the average light transmittance of the yellow front plate glass in the sunlight wave band is not lower than 80%;
the color saturation of the yellow front plate glass at a near-normal reflection angle is higher than 20;
the yellow front plate glass has good color uniformity in the range of the reflection angle not more than 60 degrees.
6. A method for preparing a yellow front glass for photovoltaic modules according to any one of claims 1 to 5, comprising the following steps:
(1) cleaning and pretreating the selected glass substrate;
(2) and according to the structure of the selected yellow dielectric film block, respectively depositing the selected high-refractive-index material and the low-refractive-index material on the surface of the glass substrate by adopting a vacuum coating technology to obtain the required yellow front plate glass.
7. The method for preparing the yellow front glass for photovoltaic modules according to claim 6, wherein the step (1) further comprises the step of forming the front surface treatment layer on the front surface of the glass substrate by means of chemical etching and/or physical sand blasting; wherein the content of the first and second substances,
the step of forming the front surface treatment layer by means of chemical etching comprises:
(1) carrying out film pasting treatment on the other surface of the selected glass substrate;
(2) cleaning and pretreating the film-coated glass substrate;
(3) carrying out chemical etching treatment on the cleaned glass;
(4) cleaning the glass after the chemical etching treatment, and removing the back film to obtain a rough pretreatment surface;
the step of forming the front surface treatment layer by means of physical blasting includes:
(1) selecting gravel with proper grain size distribution, and putting the gravel into a sand blasting machine;
(2) adjusting the pressure of the air compressor;
(3) carrying out sand blasting treatment on the surface of the glass to be treated;
(4) and cleaning the glass subjected to sand blasting to obtain a rough pretreatment surface.
8. A yellow photovoltaic module, which is characterized by comprising a glass back plate, a first packaging adhesive film, a solar cell, a second packaging adhesive film and the yellow front plate glass of any one of claims 1 to 5 which are sequentially laminated.
9. The yellow photovoltaic module according to claim 8, wherein the first encapsulant film and/or the second encapsulant film are independent of each other and are selected from at least one of PVB, EVA or POE.
10. A method for preparing the yellow photovoltaic module according to claim 8 or 9, comprising the steps of laminating the selected glass back sheet, the first encapsulant film, the solar cell, the second encapsulant film and the yellow front sheet glass, and subjecting the laminated module to high pressure treatment.
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| CN112047642A (en) * | 2020-09-17 | 2020-12-08 | 山东金晶科技股份有限公司 | Yellow cover plate glass for building integrated photovoltaic and preparation method thereof |
| CN114103455A (en) * | 2021-11-22 | 2022-03-01 | 北京金茂绿建科技有限公司 | Photovoltaic module and preparation method thereof |
| CN114864728A (en) * | 2022-04-27 | 2022-08-05 | 浙江合特光电有限公司 | High printing opacity coffee glass and coffee solar energy component |
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