CN111477710A - Blue front plate glass for photovoltaic module and blue photovoltaic module prepared from same - Google Patents
Blue front plate glass for photovoltaic module and blue photovoltaic module prepared from same Download PDFInfo
- Publication number
- CN111477710A CN111477710A CN202010485133.8A CN202010485133A CN111477710A CN 111477710 A CN111477710 A CN 111477710A CN 202010485133 A CN202010485133 A CN 202010485133A CN 111477710 A CN111477710 A CN 111477710A
- Authority
- CN
- China
- Prior art keywords
- blue
- glass
- refractive index
- thickness
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000005357 flat glass Substances 0.000 title claims abstract description 55
- 239000011521 glass Substances 0.000 claims abstract description 115
- 239000000758 substrate Substances 0.000 claims abstract description 94
- 239000000463 material Substances 0.000 claims abstract description 46
- 238000002834 transmittance Methods 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 71
- 238000004140 cleaning Methods 0.000 claims description 43
- 238000003486 chemical etching Methods 0.000 claims description 22
- 238000013461 design Methods 0.000 claims description 17
- 229920000620 organic polymer Polymers 0.000 claims description 16
- 239000002335 surface treatment layer Substances 0.000 claims description 15
- 239000002313 adhesive film Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 239000005341 toughened glass Substances 0.000 claims description 13
- 238000005516 engineering process Methods 0.000 claims description 11
- 238000004806 packaging method and process Methods 0.000 claims description 10
- 238000005488 sandblasting Methods 0.000 claims description 10
- 239000008393 encapsulating agent Substances 0.000 claims description 6
- 230000004313 glare Effects 0.000 claims description 5
- 238000001771 vacuum deposition Methods 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 238000005422 blasting Methods 0.000 claims description 2
- 238000009826 distribution Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 5
- 230000010354 integration Effects 0.000 abstract description 3
- 239000002346 layers by function Substances 0.000 description 60
- 239000010408 film Substances 0.000 description 42
- 239000007789 gas Substances 0.000 description 36
- 239000013077 target material Substances 0.000 description 32
- 238000004544 sputter deposition Methods 0.000 description 23
- 239000012495 reaction gas Substances 0.000 description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 15
- 238000013084 building-integrated photovoltaic technology Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 229910052681 coesite Inorganic materials 0.000 description 7
- 229910052906 cristobalite Inorganic materials 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 229910052682 stishovite Inorganic materials 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 229910052905 tridymite Inorganic materials 0.000 description 7
- 229910052581 Si3N4 Inorganic materials 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229920006280 packaging film Polymers 0.000 description 4
- 239000012785 packaging film Substances 0.000 description 4
- 238000010248 power generation Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 241000282414 Homo sapiens Species 0.000 description 1
- 206010039203 Road traffic accident Diseases 0.000 description 1
- 238000003916 acid precipitation Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000002803 fossil fuel Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/0488—Double glass encapsulation, e.g. photovoltaic cells arranged between front and rear glass sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02S—GENERATION OF ELECTRIC POWER BY CONVERSION OF INFRARED RADIATION, VISIBLE LIGHT OR ULTRAVIOLET LIGHT, e.g. USING PHOTOVOLTAIC [PV] MODULES
- H02S20/00—Supporting structures for PV modules
- H02S20/20—Supporting structures directly fixed to an immovable object
- H02S20/22—Supporting structures directly fixed to an immovable object specially adapted for buildings
- H02S20/26—Building materials integrated with PV modules, e.g. façade elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B10/00—Integration of renewable energy sources in buildings
- Y02B10/10—Photovoltaic [PV]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
The invention belongs to the field of solar cells, and particularly relates to blue front plate glass for a photovoltaic module, and further discloses a blue photovoltaic module prepared from the blue front plate glass. According to the blue front plate glass, materials with different refractive indexes are deposited to form high refractive index layers and low refractive index layers which are alternately superposed, the thickness matching between the layers is adjusted to form a required blue dielectric film block, and the blue front plate glass which can be used for a photovoltaic module is formed by depositing the blue dielectric film block on the surface of a glass substrate. The blue front plate glass has high transmittance, good weather resistance and water resistance in the sunlight wave band range, has excellent color uniformity in the angle range of the reflection angle not more than 60 degrees, has color saturation higher than 20 in the near-normal reflection angle, can effectively improve the appearance effect of a photovoltaic module, effectively solves the problem of single color of the traditional photovoltaic module, and can meet the requirement of photovoltaic building integration on appearance color.
Description
Technical Field
The invention belongs to the field of solar cells, and particularly relates to blue front plate glass for a photovoltaic module, and further discloses a blue photovoltaic module prepared from the blue front plate glass.
Background
With the rapid development of economy, the demand for energy is stronger and stronger. As a large amount of toxic and harmful substances are discharged from traditional fossil fuels such as coal, petroleum, natural gas and the like in the using process, water, soil and atmosphere are seriously polluted, even greenhouse effect and acid rain are formed, and the living environment and the body health of human beings are seriously harmed, renewable clean energy sources are paid more and more attention. Solar energy is a direction of key development in the current energy field due to the advantages of being clean, pollution-free, inexhaustible and the like.
The photovoltaic Building Integrated PV (PV) technology is a technology for integrating solar power generation (photovoltaic) products into buildings, and is a new concept for applying solar power generation. Different from the form that a photovoltaic system is attached to a building, the photovoltaic building integration is that a solar photovoltaic power generation square matrix is installed on the outer surface of an envelope structure of the building to provide electric power in short, the building, the ecology and the scientific technology are integrated, the requirement of building functions is met, and the utilization of solar energy is realized.
Along with the development of society, the aesthetic of masses of consumers is constantly promoted, and the designer also has higher and higher requirements for appearance color, and the single power generation function of traditional BIPV photovoltaic module can't satisfy the demand, needs have diversity, aesthetic property element to integrate into the photovoltaic building, shows the individual character of BIPV building. However, the color of the conventional solar cell chip is single, so that the color of the photovoltaic module is also single, and the requirements of various performances of a photovoltaic building cannot be met. In addition, the surfaces of the traditional crystalline silicon photovoltaic module and the thin film solar cell module have obvious metal grid lines and etched grid lines, and when the crystalline silicon photovoltaic module and the thin film solar cell module are applied to a BIPV product, the surfaces of the crystalline silicon photovoltaic module and the thin film solar cell module can observe the thin metal grid lines and the etched grid lines, so that the attractiveness of the BIPV product is influenced. Moreover, the traditional photovoltaic module front plate uses ultra-white glass, glare can exist under a specific angle, light pollution is generated, strong visual impact is generated on passing vehicles and pedestrians, and traffic accidents are easily caused. Therefore, the development of the photovoltaic module with smooth appearance and various colors has positive significance for the development of BIPV products.
Disclosure of Invention
Therefore, the technical problem to be solved by the invention is to provide a blue front plate glass for a photovoltaic module, so as to solve the problem of single color of the photovoltaic module in the prior art;
the second technical problem to be solved by the present invention is to provide a blue photovoltaic module to solve the problems of poor appearance and single color of the photovoltaic module in the prior art.
In order to solve the technical problem, the blue front plate glass for the photovoltaic module comprises a glass substrate and a blue dielectric film block deposited on the surface of the glass substrate;
the blue dielectric film block comprises a high-refraction layer H formed by a high-refraction-index material and a low-refraction layer L formed by a low-refraction-index material, the high-refraction layer H and the low-refraction layer L are arranged at intervals, and the blue dielectric film block is enabled to be blue by adjusting the number of the high-refraction layer H and the low-refraction layer L and the thickness of each high-refraction layer H and the low-refraction layer L.
Specifically, the refractive index of the high-refractive-index material at 550nm is 1.8<nH<2.6, the refractive index of the low-refractive-index material at 550nm is 1.4<nL<2.0。
Specifically, the structure of the blue front plate glass comprises:
3 layers of structural design, air// glass substrate// high refractive index layer with thickness of 50 + -20 nm H// low refractive index layer with thickness of 60 + -20 nm L// high refractive index layer with thickness of 60 + -20 nmLayer H// organic Polymer, in which 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
3 layers of structural design, air// glass substrate// high refractive index layer H with thickness of 70 +/-20 nm// low refractive index layer L with thickness of 30 +/-10 nm// high refractive index layer H with thickness of 45 +/-20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0；
Alternatively, the first and second electrodes may be,
a 5-layer structure design of air// glass substrate// high refractive index layer H with thickness of 50 +/-20 nm// low refractive index layer L with thickness of 80 +/-20 nm// high refractive index layer H with thickness of 60 +/-20 nm// low refractive index layer L with thickness of 80 +/-20 nm// high refractive index layer H with thickness of 30 +/-10 nm// organic polymer, wherein, 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
a 5-layer structure design of air// glass substrate// high refractive index layer H with thickness of 30 +/-10 nm// low refractive index layer L with thickness of 40 +/-10 nm// high refractive index layer H with thickness of 70 +/-20 nm// low refractive index layer L with thickness of 30 +/-10 nm// high refractive index layer H with thickness of 80 +/-20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0。
Specifically, the glass substrate is made of ultra-white toughened glass, and a front surface treatment layer with rough textures is formed on the front surface of the glass substrate, which is in contact with air, so that the mirror glass glare phenomenon is eliminated. Preferably, the roughness of the pretreatment surface is controlled to be not less than 0.3 μm, the haze is controlled to be not less than 50%, and the glass with the pretreatment surface is obtained, so that irradiated incident light can be scattered, glare of mirror glass is eliminated, and light pollution caused by reflected light on the surface of the glass is solved.
Specifically, the performances of the blue front plate glass for the photovoltaic module comprise:
the average light transmittance of the blue front plate glass in a sunlight wave band is not lower than 80%;
the color saturation of the blue front plate glass at a near-normal reflection angle is higher than 20;
the blue front plate glass has good color uniformity in the range of the reflection angle not more than 60 degrees.
Preferably, the refractive index of the ultra-white toughened glass at 550nm is 1.4<nH<1.6, and the transmittance is not lower than 88 percent.
The invention also discloses a method for preparing the blue front plate glass for the photovoltaic module, which comprises the following steps:
(1) cleaning and pretreating the selected glass substrate;
(2) and according to the structure of the selected blue dielectric film block, respectively depositing the selected high-refractive-index material and the low-refractive-index material on the surface of the glass substrate by adopting a vacuum coating technology to obtain the required blue front plate glass.
Specifically, the vacuum coating technology comprises conventional technologies such as a magnetron sputtering coating technology, a vacuum evaporation coating technology, a low-pressure plasma deposition technology and the like.
The step (1) further comprises a step of forming the front surface treatment layer on the front surface of the glass substrate by means of chemical etching and/or physical sand blasting; wherein the content of the first and second substances,
the step of forming the front surface treatment layer by means of chemical etching comprises:
(1) carrying out film pasting treatment on the other surface of the selected glass substrate;
(2) cleaning and pretreating the film-coated glass substrate;
(3) carrying out chemical etching treatment on the cleaned glass;
(4) cleaning the glass after the chemical etching treatment, and removing the back film to obtain a rough pretreatment surface;
the step of forming the front surface treatment layer by means of physical blasting includes:
(1) selecting gravel with proper grain size distribution, and putting the gravel into a sand blasting machine;
(2) adjusting the pressure of the air compressor;
(3) carrying out sand blasting treatment on the surface of the glass to be treated;
(4) and cleaning the glass subjected to sand blasting to obtain a rough pretreatment surface.
The invention also discloses a blue photovoltaic module which comprises a glass back plate, a first packaging adhesive film, a solar cell, a second packaging adhesive film and the blue front plate glass which are laminated in sequence.
Specifically, the first adhesive packaging film and/or the second adhesive packaging film are independent of each other and are selected from at least one of PVB, EVA, and POE, and preferably, the thickness of the first adhesive packaging film and/or the second adhesive packaging film is 0.3-2.88 mm.
Specifically, the solar cell includes a monocrystalline silicon solar cell, a polycrystalline silicon solar cell, an amorphous silicon solar cell, a cadmium telluride thin-film solar cell, a copper indium gallium selenide thin-film solar cell, a gallium arsenide solar cell, and the like.
The invention also discloses a method for preparing the blue photovoltaic module, which comprises the steps of laminating the selected glass back plate, the first packaging adhesive film, the solar cell, the second packaging adhesive film and the blue front plate glass, and carrying out high-pressure treatment on the laminated module.
According to the blue front plate glass, materials with different refractive indexes are deposited to form high refractive index layers and low refractive index layers which are alternately superposed, the thickness matching between the layers is adjusted to form a required blue dielectric film block, and the blue front plate glass which can be used for a photovoltaic module is formed by depositing the blue dielectric film block on the surface of a glass substrate. The blue front plate glass has high transmittance (not less than 80%) in a sunlight wave band range, can effectively reduce the power loss of the assembly, has good weather resistance and water resistance, has excellent color uniformity in a range of a reflection angle not greater than 60 degrees and color saturation higher than 20 at a near-normal reflection angle, can effectively reduce the defect of uneven assembly color caused by large-angle color deviation, can effectively improve the appearance effect of a photovoltaic assembly, effectively solves the problem of single color of the traditional photovoltaic assembly, and can meet the requirement of photovoltaic building integration on appearance color. The blue front plate glass has the advantages of simple structural design of the blue medium module, less film layers, simple preparation process and low cost, and is suitable for large-scale popularization and production.
According to the blue front plate glass, the ultra-white toughened glass is selected as the glass substrate, and the front surface treatment layer with rough textures is formed on the front surface of the glass substrate, which is in contact with air, through a vacuum coating technology in a chemical etching and/or physical sand blasting mode, so that irradiated incident light can be scattered, glare of mirror glass is eliminated, the anti-glare effect is achieved, and light pollution caused by reflected light on the surface of the glass and light pollution of a building curtain wall are effectively solved.
According to the blue photovoltaic module, the blue front plate glass is prepared through conventional lamination, so that the photovoltaic module presents diversified colors, the attractiveness of the appearance of a BIPV product is further realized, the defect of single color of the traditional BIPV product is effectively overcome, the requirements of consumers on diversity and attractiveness are met, new elements are added for BIPV buildings, and the product quality is effectively improved. Meanwhile, the blue film block of the blue front plate glass and the glass substrate after surface roughening treatment can effectively shield the grid line of the solar cell, so that the whole photovoltaic module is good in appearance uniformity and high in attractiveness, and the whole attractiveness of the photovoltaic module is effectively improved.
Drawings
In order that the present disclosure may be more readily and clearly understood, the following detailed description of the present disclosure is provided in connection with specific embodiments thereof and the accompanying drawings, in which,
FIG. 1 is a schematic structural diagram of a blue photovoltaic module according to the present invention;
the reference numbers in the figures denote: 1-a front surface treatment layer, 2-a glass substrate, 3-a blue dielectric film block, 4-a second packaging adhesive film, 5-a solar cell, 6-a first packaging adhesive film and 7-a glass back plate.
Detailed Description
In the following embodiments of the invention, the treatment of the front surface of the glass substrate is carried out by adopting a conventional chemical etching or physical sand blasting method and treating the front surface of the glass substrate to required parameters according to a conventional method; alternatively, the glass substrate with the matching parameters may be purchased directly for use.
Example 1
The blue front plate glass comprises a glass substrate and a blue dielectric film block with a 3-layer structural design, wherein the specific structural design is air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): namely ZnO (n at 550 nm) as high refractive index materialH2.01) with a thickness of 50 nm;
a second functional layer (L) of SiO, a material with low refractive index2(n at 550 nm)L1.45) and a low refractive index layer L having a thickness of 60 nm;
third functional layer (H): namely ZnO (n at 550 nm) as high refractive index materialH2.01) and has a thickness of 60 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasted glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, and removing the back film pasting to obtain a rough pretreatment surface. In this embodiment, the surface roughness of the treated front surface is controlled to be 0.8 to 1 μm, and the haze is controlled to be 70% to 80%.
The organic polymer (i.e. adhesive film) is PVB and has a thickness of 1.14 mm.
The preparation method of the blue front plate glass specifically comprises the following steps:
(1) substrate pretreatment
Adopting neutral washing liquid and deionized water to preliminarily wash and dry the glass substrate; then put into a transition chamber of coating equipment and bombarded by an ion sourceThe secondary cleaning of the substrate surface comprises the following specific technological parameters that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99 percent, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the blue dielectric film block
The first functional layer H (ZnO) is prepared by selecting Zn target material (Al content is 8 wt%) with purity of 99.9%, the pretreated glass substrate is fed into coating chamber, vacuum-pumping is carried out, vacuum degree is up to 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when the background vacuum of mTorr is adopted, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 2.5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 50nm on the pretreated glass substrate with the flow rate of 25 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2A second functional layer L was prepared on the first functional layer at a thickness of 60nm, at a flow rate of 30 sccm;
the third functional layer H (ZnO) is prepared by selecting Zn target material with the purity of 99.9 percent (Al content is 8 weight percent) and the vacuum degree of the equipment background reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 2.5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2And preparing a third functional layer H with the thickness of 60nm on the second functional layer at the flow rate of 25sccm to obtain the blue front plate glass containing the blue dielectric film block with the 3-layer structure.
Example 2
The blue front plate glass comprises a glass substrate and a blue dielectric film block with a 3-layer structural design, wherein the specific structural design is air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 70 nm;
a second functional layer (L) of SiO, a material with low refractive index2(n at 550 nm)L1.45) with a thickness of 30 nm;
third functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 45 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasting glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, removing the back film pasting to obtain a rough pretreatment surface, and controlling the surface roughness to be 0.3-0.5 mu m and the haze to be 50-60%.
The organic polymer is PVB (namely adhesive film), and the thickness is 1.52 mm.
The preparation method of the blue front plate glass specifically comprises the following steps:
(1) substrate pretreatment
Adopting neutral washing liquid and deionized water to preliminarily wash and dry the glass substrate; then putting the substrate into a transition chamber of coating equipment, and performing secondary cleaning on the surface of the substrate by using ion source bombardment, wherein the specific process is as followsThe sputtering power of the radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99 percent, the flow rate is 50sccm, and the working gas pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the blue dielectric film block
First functional layer H (TiO)2): selecting a Ti target material with the purity of 99.9 percent to carry out TiO2The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when the background vacuum of mTorr is adopted, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 70nm on the pretreated glass substrate with the flow rate of 20 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2A second functional layer L was prepared on the first functional layer at a thickness of 30nm, at a flow rate of 30 sccm;
third functional layer H (TiO)2): selecting a Ti target material with the purity of 99.9 percent to carry out TiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2And preparing a third functional layer H with the thickness of 45nm on the second functional layer at the flow rate of 20sccm to obtain the blue front plate glass containing the blue dielectric film block with the 3-layer structure.
Example 3
The blue front plate glass comprises a glass substrate and a blue dielectric film block with 5-layer structural design, wherein the specific structural design is air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 50 nm;
a second functional layer (L) of SiO, a material with low refractive index2(n at 550 nm)L1.45) and a low refractive index layer L of 80nm thickness;
third functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) with a thickness of 60 nm;
a fourth functional layer (L) of SiO, a low refractive index material2(n at 550 nm)L1.45) and a low refractive index layer L of 80nm thickness;
fifth functional layer (H): i.e. made of high refractive index material Si3N4(n at 550 nm)H1.92) was formed to a thickness of 30 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasting glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, removing the back film pasting to obtain a rough pretreatment surface, and controlling the surface roughness to be 0.5-0.7 mu m and the haze to be 60-70%.
The organic polymer is PVB (namely adhesive film), and the thickness is 1.14 mm.
The preparation method of the blue front plate glass specifically comprises the following steps:
(1) substrate pretreatment
The method comprises the steps of firstly cleaning and drying the glass substrate by using neutral cleaning solution and deionized water, then placing the glass substrate into a transition chamber of coating equipment, and performing secondary cleaning on the surface of the substrate by using ion source bombardment, wherein the specific process parameters comprise that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99%, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, the sputtering time is 300s, and the pretreated substrate is obtained through ion bombardment secondary cleaning for later use;
(2) depositing to form the blue dielectric film block
First functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 50nm on the pretreated glass substrate with the flow rate of 24 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2A second functional layer L was prepared on the first functional layer at a thickness of 80nm, at a flow rate of 30 sccm;
third functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4Preparing; the vacuum degree of the equipment reaches 5.0×10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a third functional layer H with the thickness of 60nm on the second functional layer with the flow rate of 24 sccm;
fourth functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2A fourth functional layer L was prepared on the third functional layer at a thickness of 80nm, at a flow rate of 30 sccm;
fifth functional layer H (Si)3N4): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out Si3N4The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas N with the purity of 99.99 percent2Preparing a fifth functional layer H with the thickness of 30nm on the fourth functional layer at the flow rate of 24 sccm; thus obtaining the blue front plate glass containing the blue dielectric film block with the 5-layer structure.
Example 4
The blue front panel glass comprises a glass substrate and a blue dielectric film block with 5-layer structural design, wherein the specific structural design is air// glass substrate// high refractive index material H// low refractive index material L// high refractive index material H// low refractive index material L// high refractive index material H// organic polymer, wherein:
first functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 30 nm;
a second functional layer (L) of SiO, a material with low refractive index2(n at 550 nm)L1.45) with a thickness of 40 nm;
third functional layer (H): i.e. made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 70 nm;
fourth functional layer (H): i.e. from a low refractive index material SiO2(n at 550 nm)L1.45) with a thickness of 30 nm;
a fifth functional layer (L) made of high refractive index material TiO2(n at 550 nm)H2.32) with a thickness of 80 nm.
The glass substrate is made of ultra-white toughened glass, the thickness of the glass substrate is 5mm, and the refractive index is 1.4 at 550nm<nH<1.6, and the light transmittance is not less than 88%.
The non-film-coated surface (namely the surface in contact with air) of the ultra-white toughened glass substrate can be roughened in a conventional chemical etching mode, so that the front surface treatment layer is formed to reduce surface reflection, and the specific steps comprise: carrying out film pasting treatment on the other surface of the selected glass substrate, carrying out cleaning pretreatment on the film pasting glass substrate, carrying out chemical etching treatment on the cleaned glass, cleaning the glass after the chemical etching treatment, removing the back film pasting to obtain a rough pretreatment surface, and controlling the surface roughness to be 1-1.3 mu m and the haze to be 80-90%.
The organic polymer is PVB (namely adhesive film), and the thickness is 1.52 mm.
The preparation method of the blue front plate glass specifically comprises the following steps:
(1) substrate pretreatment
The method comprises the steps of firstly cleaning and drying the glass substrate by using neutral cleaning solution and deionized water, then placing the glass substrate into a transition chamber of coating equipment, and performing secondary cleaning on the surface of the substrate by using ion source bombardment, wherein the specific process parameters comprise that the sputtering power of a radio frequency power supply is 300w, the working gas is Ar with the purity of 99.99%, the flow rate is 50sccm, and the working pressure is 9.0 × 10-2mTorr, sputter time 300s, performing ion bombardment secondary cleaning to obtain a pretreated substrate for later use;
(2) depositing to form the blue dielectric film block
First functional layer H (TiO)2): selecting a Ti target material with the purity of 99.9 percent to carry out TiO2The pretreated glass substrate enters a film coating chamber, and is vacuumized until the vacuum degree reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when the background vacuum of mTorr is adopted, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a first functional layer H with the thickness of 30nm on the pretreated glass substrate with the flow rate of 20 sccm;
second functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 2000w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 5mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2A second functional layer L was prepared on the first functional layer at a thickness of 40nm, at a flow rate of 30 sccm;
third functional layer H (TiO)2): selecting a Ti target material with the purity of 99.9 percent to carry out TiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a third functional layer H with the thickness of 70nm on the second functional layer at the flow rate of 20 sccm;
fourth functional layer L (SiO)2): selecting Si target material with the purity of 99.7 percent (Al content is 10 weight percent) to carry out SiO2The background vacuum degree of the equipment reaches 5.0 × 10-5At mTorr, the sputtering power of a pulse direct current power supply is set to be 2000w, and inert gas with the purity of 99.99 percent is introducedThe flow rate of the working gas Ar is 50sccm, the working pressure is 5mTorr, the surface of the target material is cleaned, and then the reaction gas O with the purity of 99.99 percent is introduced2A fourth functional layer L was prepared on the third functional layer at a thickness of 30nm, at a flow rate of 30 sccm;
fifth functional layer H (TiO)2): selecting a Ti target material with the purity of 99.9 percent to carry out TiO2The background vacuum degree of the equipment reaches 5.0 × 10-5Setting the sputtering power of a pulse direct current power supply to be 1500w when mTorr, introducing inert working gas Ar with the purity of 99.99 percent, the flow of the inert working gas Ar is 50sccm, the working pressure is 3mTorr, cleaning the surface of the target material, and then introducing reaction gas O with the purity of 99.99 percent2Preparing a fifth functional layer H with the thickness of 80nm on the fourth functional layer at the flow rate of 20 sccm; thus obtaining the blue front plate glass containing the blue dielectric film block with the 5-layer structure.
Examples of the experiments
The properties of the blue front glass prepared in the above examples 1 to 4, including transmittance and color saturation, were measured, and the specific test results are shown in table 1.
TABLE 1 Performance test results for blue front glass
| Transmittance/% (solar band) | Color saturation | |
| Example 1 | 87.1 | 27.3 |
| Example 2 | 82.8 | 30.8 |
| Example 3 | 88 | 33.1 |
| Example 4 | 82.4 | 34.5 |
As can be seen from the data in Table 1, the average light transmittance of the blue front plate glass prepared in the examples 1-4 in the sunlight wave band range is 82.4-88%, and is more than 80%, and the blue front plate glass has high light transmittance, so that the power loss of the assembly can be effectively reduced; and the tested color saturation is between 27.3 and 34.5, the color saturation is high, and the required color can be well realized.
The results of the color uniformity tests at a reflection angle of not more than 60 ° for the blue front glasses prepared in the above examples 1 to 4, respectively, are shown in tables 2 to 5, respectively.
TABLE 2 color coordinates (x, y) under CIE-D65 illuminant for example 1 for different angles of reflection
| Angle of reflection/° | x | y | Colour(s) |
| 0 | 0.2271 | 0.2559 | Blue color |
| 10 | 0.2261 | 0.2543 | Blue color |
| 20 | 0.2234 | 0.2497 | Blue color |
| 30 | 0.22 | 0.243 | Blue color |
| 40 | 0.218 | 0.2366 | Blue color |
| 50 | 0.2216 | 0.2354 | Blue color |
| 60 | 0.2373 | 0.2477 | Blue color |
TABLE 3 color coordinates (x, y) under CIE-D65 illuminant for example 2 for different reflection angles
| Angle of reflection/° | x | y | Colour(s) |
| 0 | 0.2153 | 0.2511 | Blue color |
| 10 | 0.2143 | 0.2493 | Blue color |
| 20 | 0.2116 | 0.2444 | Blue color |
| 30 | 0.2083 | 0.2372 | Blue color |
| 40 | 0.2066 | 0.2301 | Blue color |
| 50 | 0.2105 | 0.2279 | Blue color |
| 60 | 0.2266 | 0.2387 | Blue color |
TABLE 4 color coordinates (x, y) under CIE-D65 illuminant for example 3 for different angles of reflection
TABLE 5 color coordinates (x, y) under CIE-D65 illuminant for example 4 for different reflection angles
| Angle of reflection/° | x | y | Colour(s) |
| 0 | 0.2121 | 0.2381 | Blue color |
| 10 | 0.212 | 0.2358 | Blue color |
| 20 | 0.2126 | 0.2295 | Blue color |
| 30 | 0.2153 | 0.2217 | Blue color |
| 40 | 0.222 | 0.2165 | Blue color |
| 50 | 0.2347 | 0.2197 | Light purple blue |
| 60 | 0.2541 | 0.2371 | Light purple blue |
As can be seen from the data in tables 2 to 5, the blue front plate glasses prepared in examples 1 to 4 have excellent color uniformity within an angle range of a reflection angle of not more than 60 degrees, and can meet the requirements of the building integrated photovoltaic products on color uniformity effects.
Application example
The blue photovoltaic module structure as shown in fig. 1 comprises a blue front glass, a second encapsulant 4, a solar cell 5, a first encapsulant 6 and a glass back plate 7, which are laminated in sequence, wherein the blue front glass comprises a glass substrate 2 and a blue dielectric film block 3 which is arranged on the surface of the glass substrate 2 and formed by deposition, and a front surface treatment layer 1 is formed on the surface of one side of the glass substrate 2 away from the blue dielectric film block 3 (i.e. the side of the glass substrate 2 which is in contact with air).
Specifically, the solar cell includes a monocrystalline silicon solar cell, a polycrystalline silicon solar cell, an amorphous silicon solar cell, a cadmium telluride thin-film solar cell, a copper indium gallium selenide thin-film solar cell, a gallium arsenide solar cell, and the like.
The preparation of the blue photovoltaic module can be realized by adopting a common method in the prior art, namely, laminating a selected glass back plate (ultra-white toughened glass), a first packaging adhesive film, a solar cell, a second packaging adhesive film and the blue front plate glass by a set program, and placing the laminated module in an autoclave for high-pressure treatment.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.
Claims (10)
1. The blue front plate glass for the photovoltaic module is characterized by comprising a glass substrate and a blue dielectric film block deposited on the surface of the glass substrate;
the blue dielectric film block comprises a high-refraction layer H formed by a high-refraction-index material and a low-refraction layer L formed by a low-refraction-index material, the high-refraction layer H and the low-refraction layer L are arranged at intervals, and the blue dielectric film block is enabled to be blue by adjusting the number of the high-refraction layer H and the low-refraction layer L and the thickness of each high-refraction layer H and the low-refraction layer L.
2. The blue front sheet glass for photovoltaic modules according to claim 1, wherein the high refractive index material is at 550nmRefractive index of 1.8<nH<2.6, the refractive index of the low-refractive-index material at 550nm is 1.4<nL<2.0。
3. The blue front sheet glass for photovoltaic modules according to claim 1 or 2, wherein the structure of the blue front sheet glass comprises:
3 layers of structural design, air// glass substrate// high refractive index layer H with thickness of 50 + -20 nm// low refractive index layer L with thickness of 60 + -20 nm// high refractive index layer H with thickness of 60 + -20 nm// organic polymer, wherein, 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
3 layers of structural design, air// glass substrate// high refractive index layer H with thickness of 70 +/-20 nm// low refractive index layer L with thickness of 30 +/-10 nm// high refractive index layer H with thickness of 45 +/-20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0；
Alternatively, the first and second electrodes may be,
a 5-layer structure design of air// glass substrate// high refractive index layer H with thickness of 50 +/-20 nm// low refractive index layer L with thickness of 80 +/-20 nm// high refractive index layer H with thickness of 60 +/-20 nm// low refractive index layer L with thickness of 80 +/-20 nm// high refractive index layer H with thickness of 30 +/-10 nm// organic polymer, wherein, 1.8<nH<2.2，1.4<nL<1.8；
Alternatively, the first and second electrodes may be,
a 5-layer structure design of air// glass substrate// high refractive index layer H with thickness of 30 +/-10 nm// low refractive index layer L with thickness of 40 +/-10 nm// high refractive index layer H with thickness of 70 +/-20 nm// low refractive index layer L with thickness of 30 +/-10 nm// high refractive index layer H with thickness of 80 +/-20 nm// organic polymer, wherein 2.0<nH<2.6，1.4<nL<2.0。
4. The blue front sheet glass for photovoltaic modules according to any one of claims 1 to 3, wherein the glass substrate is ultra-white tempered glass, and a front surface treatment layer with a rough texture is formed on the front surface of the glass substrate, which is in contact with air, so as to eliminate the glare phenomenon of mirror glass.
5. The blue front sheet glass for photovoltaic modules according to any one of claims 1 to 4,
the average light transmittance of the blue front plate glass in a sunlight wave band is not lower than 80%;
the color saturation of the blue front plate glass at a near-normal reflection angle is higher than 20;
the blue front plate glass has good color uniformity in the range of the reflection angle not more than 60 degrees.
6. A method for preparing a blue front sheet glass for photovoltaic modules according to any one of claims 1 to 5, comprising the steps of:
(1) cleaning and pretreating the selected glass substrate;
(2) and according to the structure of the selected blue dielectric film block, respectively depositing the selected high-refractive-index material and the low-refractive-index material on the surface of the glass substrate by adopting a vacuum coating technology to obtain the required blue front plate glass.
7. The method for preparing the blue front glass for the photovoltaic module according to claim 6, wherein the step (1) further comprises the step of forming the front surface treatment layer on the front surface of the glass substrate by means of chemical etching and/or physical sand blasting; wherein the content of the first and second substances,
the step of forming the front surface treatment layer by means of chemical etching comprises:
(1) carrying out film pasting treatment on the other surface of the selected glass substrate;
(2) cleaning and pretreating the film-coated glass substrate;
(3) carrying out chemical etching treatment on the cleaned glass;
(4) cleaning the glass after the chemical etching treatment, and removing the back film to obtain a rough pretreatment surface;
the step of forming the front surface treatment layer by means of physical blasting includes:
(1) selecting gravel with proper grain size distribution, and putting the gravel into a sand blasting machine;
(2) adjusting the pressure of the air compressor;
(3) carrying out sand blasting treatment on the surface of the glass to be treated;
(4) and cleaning the glass subjected to sand blasting to obtain a rough pretreatment surface.
8. A blue photovoltaic module, which is characterized by comprising a glass back plate, a first packaging adhesive film, a solar cell, a second packaging adhesive film and the blue front plate glass as claimed in any one of claims 1 to 5 which are sequentially laminated.
9. The blue photovoltaic module according to claim 8, wherein the first encapsulant film and/or the second encapsulant film are independent of each other and are selected from at least one of PVB, EVA or POE.
10. A method for preparing the blue photovoltaic module according to claim 8 or 9, comprising the steps of laminating the selected glass back sheet, the first encapsulant film, the solar cell, the second encapsulant film and the blue front sheet glass, and subjecting the laminated module to high pressure treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010485133.8A CN111477710A (en) | 2020-06-01 | 2020-06-01 | Blue front plate glass for photovoltaic module and blue photovoltaic module prepared from same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010485133.8A CN111477710A (en) | 2020-06-01 | 2020-06-01 | Blue front plate glass for photovoltaic module and blue photovoltaic module prepared from same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111477710A true CN111477710A (en) | 2020-07-31 |
Family
ID=71765480
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010485133.8A Pending CN111477710A (en) | 2020-06-01 | 2020-06-01 | Blue front plate glass for photovoltaic module and blue photovoltaic module prepared from same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111477710A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112071930A (en) * | 2020-09-17 | 2020-12-11 | 山东金晶科技股份有限公司 | Blue cover plate glass for building integrated photovoltaic and preparation method thereof |
| CN113149458A (en) * | 2021-02-26 | 2021-07-23 | 中建材蚌埠玻璃工业设计研究院有限公司 | Cover plate glass of colored photovoltaic module and preparation method thereof |
| CN116040961A (en) * | 2022-12-29 | 2023-05-02 | 中建材玻璃新材料研究院集团有限公司 | Preparation method of structural blue glass capable of reducing influence of observation angle |
| CN116102267A (en) * | 2022-12-29 | 2023-05-12 | 中建材玻璃新材料研究院集团有限公司 | Omnidirectional reflection pure blue glass for photovoltaic building |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5891556A (en) * | 1995-02-23 | 1999-04-06 | Saint-Gobain Vitrage | Transparent substrate with antireflection coating |
| CN108642447A (en) * | 2018-05-08 | 2018-10-12 | 北京汉能光伏投资有限公司 | A kind of curved surface film-coated plate and preparation method thereof and include its solar components |
| CN108706889A (en) * | 2018-05-08 | 2018-10-26 | 北京汉能光伏投资有限公司 | A kind of film-coated plate and preparation method thereof and a kind of solar components |
| CN210429840U (en) * | 2019-07-24 | 2020-04-28 | 汉能移动能源控股集团有限公司 | Flexible thin-film solar cell packaging structure |
-
2020
- 2020-06-01 CN CN202010485133.8A patent/CN111477710A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5891556A (en) * | 1995-02-23 | 1999-04-06 | Saint-Gobain Vitrage | Transparent substrate with antireflection coating |
| CN108642447A (en) * | 2018-05-08 | 2018-10-12 | 北京汉能光伏投资有限公司 | A kind of curved surface film-coated plate and preparation method thereof and include its solar components |
| CN108706889A (en) * | 2018-05-08 | 2018-10-26 | 北京汉能光伏投资有限公司 | A kind of film-coated plate and preparation method thereof and a kind of solar components |
| CN210429840U (en) * | 2019-07-24 | 2020-04-28 | 汉能移动能源控股集团有限公司 | Flexible thin-film solar cell packaging structure |
Non-Patent Citations (1)
| Title |
|---|
| 王承遇等: "抗眩光手机玻璃的表面处理", 《玻璃搪瓷与眼镜》 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112071930A (en) * | 2020-09-17 | 2020-12-11 | 山东金晶科技股份有限公司 | Blue cover plate glass for building integrated photovoltaic and preparation method thereof |
| CN113149458A (en) * | 2021-02-26 | 2021-07-23 | 中建材蚌埠玻璃工业设计研究院有限公司 | Cover plate glass of colored photovoltaic module and preparation method thereof |
| CN113149458B (en) * | 2021-02-26 | 2023-08-22 | 中建材玻璃新材料研究院集团有限公司 | Color photovoltaic module cover plate glass and preparation method thereof |
| CN116040961A (en) * | 2022-12-29 | 2023-05-02 | 中建材玻璃新材料研究院集团有限公司 | Preparation method of structural blue glass capable of reducing influence of observation angle |
| CN116102267A (en) * | 2022-12-29 | 2023-05-12 | 中建材玻璃新材料研究院集团有限公司 | Omnidirectional reflection pure blue glass for photovoltaic building |
| CN116102267B (en) * | 2022-12-29 | 2024-03-12 | 中建材玻璃新材料研究院集团有限公司 | Omnidirectional reflection pure blue glass for photovoltaic building |
| CN116040961B (en) * | 2022-12-29 | 2024-03-12 | 中建材玻璃新材料研究院集团有限公司 | Preparation method of structural blue glass capable of reducing influence of observation angle |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111477710A (en) | Blue front plate glass for photovoltaic module and blue photovoltaic module prepared from same | |
| CN111584647A (en) | Yellow front plate glass for photovoltaic module and yellow photovoltaic module prepared from same | |
| CN111477708A (en) | Gray front plate glass for photovoltaic module and gray photovoltaic module prepared from same | |
| CN103358619B (en) | High-transparency can the two silver low-radiation coated glass of tempering and preparation method thereof | |
| KR101194257B1 (en) | Transparent substrate for solar cell having a broadband anti-reflective multilayered coating thereon and method for preparing the same | |
| CN101619445A (en) | Method for preparing transparent conductive film material | |
| CN111584652A (en) | Green front plate glass for photovoltaic module and green photovoltaic module prepared from same | |
| CN111574071B (en) | Preparation method of cover plate glass with high transmittance and wide color system | |
| CN112047641A (en) | Gray cover plate glass for building integrated photovoltaic and preparation method thereof | |
| CN101497992A (en) | Method for preparing pile face zinc oxide transparent conductive film coating glass by plasma bombardment | |
| CN112047642A (en) | Yellow cover plate glass for building integrated photovoltaic and preparation method thereof | |
| CN102683433A (en) | Conductive glass with double anti-reflective film surfaces for thin film solar battery and preparation method thereof | |
| CN101603171B (en) | Chamber system of equipment for preparing transparent conductive film and process thereof | |
| CN112071930A (en) | Blue cover plate glass for building integrated photovoltaic and preparation method thereof | |
| CN108417651A (en) | Thin-film solar cells, production method and heat-insulated solar energy doubling glass | |
| CN101654331A (en) | Method for preparing textured ZnO transparent conductive coated glass | |
| CN103526169A (en) | Preparation method of aluminum-doped zinc oxide (AZO) transparent conducting film | |
| CN202137995U (en) | Transparent conductive film glass | |
| CN102837467B (en) | Transparent conductive film glass and preparation method thereof | |
| CN216250749U (en) | Bronze front plate glass and photovoltaic module thereof | |
| CN102683436B (en) | A kind of thin-film solar cells electro-conductive glass and preparation method thereof | |
| CN101792270B (en) | Transparent electropane and manufacturing method thereof | |
| CN103137717A (en) | Copper doped tin oxide transparent conductive membrane and preparation method thereof | |
| CN102683435A (en) | Conductive glass for thin film solar battery and preparation method thereof | |
| CN111584651A (en) | Blue-green front plate glass for photovoltaic module and blue-green photovoltaic module prepared from same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20200731 |