CN212199019U

CN212199019U - High-transparency single-silver low-radiation coated glass

Info

Publication number: CN212199019U
Application number: CN202020661687.4U
Authority: CN
Inventors: 熊建; 蒲军; 宋宇; 杨清华; 江维
Original assignee: Xianning CSG Energy Saving Glass Co Ltd
Current assignee: Xianning CSG Energy Saving Glass Co Ltd
Priority date: 2020-04-27
Filing date: 2020-04-27
Publication date: 2020-12-22
Anticipated expiration: 2030-04-27

Abstract

The utility model provides a high-transparency single-silver low-emissivity coated glass, which belongs to the technical field of coated glass. The high-transmittance single-silver low-radiation coated glass comprises a glass substrate layer and a coating layer, wherein the coating layer is sequentially compounded with eight film layers from the glass substrate layer to the outside, wherein the first layer is a SiNx layer, the second layer is a ZnAl layer, the third layer is an Ag layer, the fourth layer is a NiCr layer, the fifth layer is a ZnAl layer, the sixth layer is a ZnSn layer, the seventh layer is a SiNx layer, and the eighth layer is a ZrOx layer; the first layer and the second layer are first dielectric medium combined layers, the third layer is a low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer and the sixth layer are second dielectric medium combined layers, and the seventh layer is a film protective layer. The utility model has the advantages of high light transmittance, good oxidation resistance and the like.

Description

High-transparency single-silver low-radiation coated glass

Technical Field

The utility model belongs to the technical field of coated glass, a high-transparency single-silver low-emissivity coated glass is related to.

Background

As an excellent building material, glass has the functions of light transmission and wind and snow resistance due to good permeability, and is widely applied to buildings. With the development of modern technology level, glass is endowed with various new connotations, wherein the low-E glass is widely applied to the field of building curtain walls by virtue of beautiful and elegant color, better texture and excellent energy-saving characteristic. The Low-E glass is also called Low-emissivity glass, and a magnetron sputtering method is commonly used to deposit a nano film layer on the surface of a glass substrate, so that the optical, electrical, mechanical and chemical properties of the glass are changed, and the purposes of decoration, energy conservation, environmental protection and the like are achieved.

As an energy-saving building material, compared with common glass and heat reflection coated glass, the Low-E glass has the energy-saving characteristic of Low-E glass, and has extremely high reflectivity to far infrared radiation. Can keep the indoor temperature stable, reduce the energy consumption of building heating or refrigeration, play very outstanding energy saving and consumption reduction effect. The high-permeability type Low-E glass has high visible light transmittance while guaranteeing excellent heat preservation performance, so that the lighting effect is good, the high-permeability type Low-E glass is suitable for high-permeability buildings in northern cold areas and partial areas, and the natural lighting effect is prominent.

Through retrieval, chinese patent 201811478740.0 discloses a high-transmittance low-emissivity coated glass, which comprises a glass substrate and a film layer coated on one surface of the glass substrate, wherein the film layer sequentially comprises from inside to outside from one side of the glass substrate: the first layer of protective layer, the second layer of connecting layer, the third layer of functional layer, the fourth layer of barrier layer, the fifth layer of connecting layer, the sixth layer of protective layer, the seventh layer of anti-oxidation protective layer. The first layer of protective layer is made of metal nitride, silicon nitride or a nitride composition of the metal nitride and the silicon; the material of the second layer connecting layer is ZnAlOx or AZO material in a ceramic state; the third layer of functional layer is made of Ag, the fourth layer of barrier layer is made of NiCr, and the fifth layer of connecting layer is made of AZO in a ceramic state; the sixth layer of protective layer is made of SiAlNx; the seventh oxidation-resistant protective layer is made of ZrOx in a ceramic state.

The technical scheme has the following problems or characteristics:

1) the data provided by the method shows that the highest light transmittance of single ZrOx can only reach about 80%, and the highest light transmittance can only reach 65% after other films are compounded.

2) The existing high-transparency single-silver low-radiation coated glass has poor processing resistance and oxidation resistance, so that the storage time of single glass sheets is short, the interval between the single glass sheets and subsequent processing cannot be too long, and the requirements on the adjustment, transportation and coordination of a processing workshop are high.

3) AZO is used as a connecting layer, so that the film system is light blue, the light transmittance is low, and the outdoor reflection of the high-transmittance single-silver low-emissivity coated glass is blue.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a high-transparency single-silver low-radiation coated glass aiming at the above problems existing in the prior art, which aims to solve the technical problem of how to improve the light transmittance and the oxidation resistance.

The purpose of the utility model can be realized by the following technical proposal: the high-transparency single-silver low-radiation coated glass is characterized by comprising a glass substrate layer and a coating layer, wherein the coating layer is sequentially compounded with eight film layers from the glass substrate layer to the outside, the first layer is a SiNx layer, the second layer is a ZnAl layer, the third layer is an Ag layer, the fourth layer is a NiCr layer, the fifth layer is a ZnAl layer, the sixth layer is a ZnSn layer, the seventh layer is a SiNx layer, and the eighth layer is a ZrOx layer;

the first layer and the second layer are first dielectric medium combined layers, the third layer is a low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer and the sixth layer are second dielectric medium combined layers, and the seventh layer is a film protective layer.

The preparation method of the high-transparency single-silver low-emissivity coated glass is characterized by comprising the following steps of:

1) forming a magnetron sputtering coating layer;

A. magnetron sputtering of the first layer:

the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10^-3mbar; the thickness of the coating film is 10-30 nm;

B. magnetron sputtering the second layer:

the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10^-3mbar; the thickness of the coating film is 10-25 nm;

C. magnetron sputtering the third layer:

the number of the targets is as follows: 1 direct current rotating target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10^-3mbar; the thickness of the plated film is 5-20 nm;

D. magnetron sputtering the fourth layer:

the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10^-3mbar; the thickness of the coating film is 1-10 nm;

E. performing magnetron sputtering on a fifth layer:

the number of the targets is as follows: 2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10^-3mbar; the thickness of the coating film is 5-15 nm;

F. magnetron sputtering a sixth layer:

the number of the targets is as follows: 2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10^-3mbar; the thickness of the plated film is 5-10 nm;

G. magnetron sputtering a seventh layer:

the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured as silicon-aluminum (SiA)l); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10^-3mbar; the thickness of the coating film is 10-30 nm;

H. magnetron sputtering an eighth layer:

the number of the targets is as follows: 1 alternating current rotating target; the target material is configured as zirconium (ZrOx); the process gas proportion is as follows: argon and oxygen in a ratio of 1:0.4, and a sputtering pressure of 2-3 × 10^-3mbar; the thickness of the plated film is 5-20 nm;

2) the total thickness of the coating layer is controlled to be 46-135 nm, and the transmission speed of the sputtering chamber is controlled to be 4-6 m/min.

Compared with the prior art, the utility model has the advantages of it is following:

1. when the common white glass original sheet is used as a substrate for production, the whole product is colorless after outdoor observation.

2. By using a combination of zinc tin and zinc aluminum materials, the visible light transmittance of the film layer can be increased.

3. Tiox is generally used for improving the processing resistance of a film layer, but due to the fact that Tiox material is poor in compactness, not strong in adhesive force and not good in protection of subsequent processing resistance, ZrOx is used instead, oxygen proportion of a sputtering chamber is reduced, stability of the film layer is greatly improved, the retention time of a coated glass single sheet in a workshop can be prolonged to 180 hours, and the detection result is carried out in an environment with humidity being more than or equal to 70% and temperature being more than or equal to 20 ℃.

4. The obtained visible light transmittance is higher, the light transmittance of the whole glass is more than 80%, and the outdoor color is colorless and transparent.

5. The oxidation resistance of a workshop is higher than that of the traditional single-silver high-transmittance low-emissivity coated glass.

6. The transmittance of the 6mm single sheet of the product of the patent technology is 80-86%. The appearance color is colorless, wherein the transmission color a belongs to ∈ [ -1.5,0], b belongs to ∈ [1.5, 1 ]; film surface color a e-1, -3, b e-2, -5; glass surface color a E [0, -1], b E [1, -5 ]; good oxidation resistance, and the time is more than 180 hours (the humidity is more than or equal to 70 percent, and the temperature is more than or equal to 20 ℃) when the test is placed in a workshop.

Drawings

FIG. 1 is a schematic view of the laminated structure of the present coated glass.

In the figure, G, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. and an eighth layer.

Detailed Description

The following are specific embodiments of the present invention and the accompanying drawings are used to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.

The high-transmittance single-silver low-radiation coated glass comprises a glass substrate layer G and a coating layer, wherein eight film layers are sequentially compounded on the coating layer from the glass substrate layer G to the outside, wherein the first layer 1 is a SiNx layer, the second layer 2 is a ZnAl layer, the third layer 3 is an Ag layer, the fourth layer 4 is a NiCr layer, the fifth layer 5 is a ZnAl layer, the sixth layer 6 is a ZnSn layer, the seventh layer 7 is a SiNx layer, and the eighth layer 8 is a ZrOx layer;

the first layer 1 and the second layer 2 are first dielectric medium combination layers, the third layer 3 is a low-radiation functional layer, the fourth layer 4 is a first blocking protective layer, the fifth layer 5 and the sixth layer 6 are second dielectric medium combination layers, and the seventh layer 7 is a film layer protective layer.

The preparation method comprises the following steps:

1) forming a magnetron sputtering coating layer;

A. magnetron sputtering of the first layer 1:

B. magnetron sputtering of the second layer 2:

C. magnetron sputtering of the third layer 3:

the number of the targets is as follows: DC rotating target1, the number of the active ingredients is 1; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10^-3mbar; the thickness of the plated film is 5-20 nm;

D. magnetron sputtering of the fourth layer 4:

E. magnetron sputtering of the fifth layer 5:

F. magnetron sputtering the sixth layer 6:

G. magnetron sputtering of the seventh layer 7:

the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10^-3mbar; the thickness of the coating film is 10-30 nm;

H. magnetron sputtering the eighth layer 8:

The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications, additions and substitutions for the specific embodiments described herein may be made by those skilled in the art without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.

Claims

1. The high-transparency single-silver low-radiation coated glass is characterized by comprising a glass substrate layer (G) and a coating layer, wherein the coating layer is formed by compounding eight film layers outwards from the glass substrate layer (G), the first layer (1) is a SiNx layer, the second layer (2) is a ZnAl layer, the third layer (3) is an Ag layer, the fourth layer (4) is a NiCr layer, the fifth layer (5) is a ZnAl layer, the sixth layer (6) is a ZnSn layer, the seventh layer (7) is a SiNx layer, and the eighth layer (8) is a ZrOx layer;

the first layer (1) and the second layer (2) are first dielectric medium combination layers, the third layer (3) is a low-radiation functional layer, the fourth layer (4) is a first blocking protective layer, the fifth layer (5) and the sixth layer (6) are second dielectric medium combination layers, and the seventh layer (7) is a film layer protective layer.

2. The single-silver low-emissivity coated glass according to claim 1, wherein the total thickness of the coating layer is controlled to be 46-135 nm.