WO2024058746A1 - A low-e coated glass with reduced angular color change - Google Patents

A low-e coated glass with reduced angular color change Download PDF

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Publication number
WO2024058746A1
WO2024058746A1 PCT/TR2023/050586 TR2023050586W WO2024058746A1 WO 2024058746 A1 WO2024058746 A1 WO 2024058746A1 TR 2023050586 W TR2023050586 W TR 2023050586W WO 2024058746 A1 WO2024058746 A1 WO 2024058746A1
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WO
WIPO (PCT)
Prior art keywords
glass
low
dielectric layer
layer
coated
Prior art date
Application number
PCT/TR2023/050586
Other languages
French (fr)
Inventor
Sinem ERASLAN AVCIOGLU
Tuncay TURUTOGLU
Nagihan SEZGIN
Ocal TUNA
Utku ER
Elcin CAKAR
Original Assignee
Turkiye Sise Ve Cam Fabrikalari A.S.
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Application filed by Turkiye Sise Ve Cam Fabrikalari A.S. filed Critical Turkiye Sise Ve Cam Fabrikalari A.S.
Publication of WO2024058746A1 publication Critical patent/WO2024058746A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens

Definitions

  • the present invention relates to a low-emission (low-e) coated glass which transmits visible light in an efficient manner and which provides heat control at the same time.
  • One of the factors which differentiates optic characteristics of glasses is coating applications realized on glass surface.
  • One of the coating applications is magnetic field supported sputtering method in vacuum medium. This method is frequently applied in production of architectural and automotive coatings which have low-e feature. The transmittance and reflection values existing at the visible, near infrared and infrared region of the glasses, coated by means of said method, can be obtained at the targeted levels.
  • the total solar energy transmittance (g) value is also an important parameter in coated glasses which can be used in architecture and automotive sectors. Highness of the total solar energy transmittance (g) value of coatings can be preferred for the purpose of decreasing heating loads in cold climate geographies.
  • the number of Ag layers where the coatings include total solar energy transmittance (g) values can be kept at the targeted levels by means of the used coring layer type and parametric optimizations of layers.
  • the present invention relates to a low-e coated glass embodiment with medium level of transmittance, for eliminating the abovementioned disadvantages and for bringing new advantages to the related technical field.
  • the main object of the present invention is to provide a low-e coated glass with medium level of transmittance. Another object of the present invention is to provide a low-e coated glass with reduced angular color change.
  • Another object of the present invention is to provide a low-e coated glass with reduced emissivity value.
  • Another object of the present invention is to provide a low-e coated glass which can be thermally processed.
  • the present invention is a low-e coated glass comprising at least one infrared reflective layer having single glass daylight transmittance value between 45% and 55% and having high external reflection and having neutral color values in order to be used in architecture and automotive glasses.
  • the subject matter invention is characterized by comprising a first dielectric structure positioned under said infrared reflective layer, and a second dielectric structure positioned on the infrared reflective layer; and the proportion of the total thickness of the first dielectric structure to the total thickness of the second dielectric structure is between 1 .5 and 1 .6 in order to provide fixing of the angular color change in external reflection up to 60°.
  • the proportion of the thickness of a second barrier layer positioned on the infrared reflective layer to the thickness of a first barrier layer positioned under the infrared reflective layer is between 1 .8 and 2.2.
  • said first dielectric structure comprises at least one dielectric layer.
  • the first dielectric structure comprises at least one of Si x N y , SiO x N y , ZnAI, ZnAIO x ZnSnO x , TiO x , TiN x , ZrN x .
  • the first dielectric structure comprises a first dielectric layer and a second dielectric layer positioned on said first dielectric layer.
  • said second dielectric structure comprises at least one dielectric layer. In another preferred embodiment of the present invention, said second dielectric structure comprises at least one of SiO x N y , ZnAI, ZnAIO x ZnSnO x , TiO x , TiN x , ZrN x .
  • said second dielectric structure respectively comprises a third dielectric layer; a fourth dielectric layer; and a protective layer.
  • the first dielectric layer and the second dielectric layer comprise at least one of Si x N y , SiO x N y , ZnAI, ZnAIO x ZnSnO x , TiO x , TiN x , ZrN x .
  • the first dielectric layer comprises Si x N y
  • the second dielectric layer comprises ZnAIO x .
  • said third dielectric layer; said fourth dielectric layer and said protective layer comprise at least one of Si x N y , SiO x N y , ZnAI, ZnAIO x ZnSnO x , TiO x , TiN x , ZrN x .
  • said third dielectric layer comprises ZnAIO x
  • the fourth dielectric layer comprises Si x N y
  • the protective layer comprises SiO x N y .
  • low-e coated (20) glasses (10) for architecture and automotive is realized by means of sputter method.
  • the present invention essentially relates to single silver low-e coated (20) glasses (10) used as daylight transmitting and thermal insulating glass (10) and which have high thermal process resistance, and relates to the content and application of said low-e coating (20).
  • the subject matter low-e coated (20) glass (10) can be used in laminated structures and thermal glass unit for architecture and automotive sectors.
  • a low-e coated (20) glass (10) designed to have a level showing minimum angular color change and which can be thermally processed and which has medium level of visible light transmittance in order to be applied onto the surface of a glass (10)
  • a low-e coating (20) has been developed which is formed by pluralities of metal, metal oxide and metal nitride/oxy-nitride layers positioned on the glass (10) surface by using sputtering method. Said layers are respectively accumulated one on the other in vacuum medium.
  • the thermal process at least one and/or a number of tempering, partial tempering, annealing, lamination and bending processes can be used.
  • the subject matter low-e coated (20) glass (10) can be used as architecture and automotive glass (10).
  • the optic performance term mentioned in the invention describes solar energy transmittance, visible region light transmittance, internal and external reflection values, L-a-b color values of low-e coated (20) glass (10).
  • the refraction indexes of all layers have been determined by using methods with calculation through optic constants obtained from the taken single layer measurements. Said refraction indexes are the refraction index data at 550 nm. The following data is detected as a result of experimental studies for developing a low-e coating (20) arrangement preferred in terms of production easiness and optic characteristics.
  • the subject matter low-e coating (20) comprises an infrared reflective layer (23) which provides transmitting of solar energy spectrum visible region (hereafter, it will be called T V is%) at the targeted level and which provides reflecting (by less transmitting) of thermal radiation which is in the infrared region.
  • Ag layer is used as the infrared reflective layer (23), and thermal radiation thereof is low.
  • the first dielectric structure (21 ) is used in a manner contacting the glass (10).
  • Said first dielectric structure (21 ) comprises at least one of or a number of Si x N y , SiO x N y , ZnAI, ZnAIOxZnSnOx, TiO x , TiN x , ZrN x .
  • the first dielectric structure (21 ) comprises a first dielectric layer (211 ) and a second dielectric layer (212).
  • Said first dielectric layer (21 1 ) comprises at least one of Si x N y , SiO x N y , ZnAI, ZnAIO x ZnSnO x , TiO x , TiN x , ZrN x .
  • the first dielectric layer (21 1 ) comprises Si x N y .
  • the first dielectric layer (211 ) comprising Si x N y behaves like a diffusion barrier and serves for prevention of alkali ion migration which becomes easier at high temperature.
  • the first dielectric layer (211 ) comprising Si x N y supports the resistance of the low-e coating (20) against thermal processes.
  • the changing range for the refraction index of the first dielectric layer (211 ) comprising Si x N y is between 2.00 and 2.15. In the preferred structure, the changing range for the refraction index of the first dielectric layer (211 ) comprising Si x N y is between 2.02 and 2.12.
  • Said second dielectric layer (212) comprises at least one of Si x N y , SiO x N y , ZnAI, ZnAIO x ZnSnOx, TiOx, TiN x , ZrN x .
  • the second dielectric layer (212) comprises ZnAIOx.
  • the changing range for the refraction index of the second dielectric layer (212) comprising ZnAIOx is between 2.0 and 2.15. In the preferred structure, the changing range for the refraction index of the second dielectric layer (212) comprising ZnAIOx is between 2.0 and 2.12.
  • the thickness of the first dielectric layer (21 1 ) comprising Si x N y is between 12 nm and 30 nm. In the preferred application, the thickness of the first dielectric layer (21 1 ) comprising Si x N y is between 15 nm and 27 nm. In a further preferred application, the thickness of the first dielectric layer (21 1 ) comprising Si x N y is between 18 nm and 24 nm. Since the first dielectric layer (21 1 ) comprising Si x N y has the mentioned thicknesses, the low-e coated (20) glass (10) is enabled to be more resistant against temper. In case the first dielectric layer (211 ) comprising Si x N y and which is in contact with the glass (10) is thinner than the mentioned thickness values, deteriorations may occur in the low-e coating (20) during tempering.
  • the second dielectric layer (212) including ZnAIO x is positioned on the first dielectric layer (211 ).
  • the thickness of the second dielectric layer (212) comprising ZnAIOx is between 8 nm and 24 nm. In the preferred application, the thickness of the second dielectric layer (212) comprising ZnAIOx is between 11 nm and 21 nm. In a further preferred application, the thickness of the second dielectric layer (212) comprising ZnAIOx is between 14 nm and 18 nm.
  • the first barrier layer (22) is positioned on the second dielectric layer (212) comprising ZnAIOx. At least one of NiCr, NiCrO x , Ti, TiO x , ZnAIOx, ZnO x is used as said first barrier layer. In the preferred application, one of NiCr or NiCrOx is used.
  • the thickness of the first barrier layer (22) is between 1 nm and 10 nm. In the preferred application, the thickness of the first barrier layer (22) is between 1 nm and 7 nm. In a further preferred application, the thickness of the first barrier layer (22) is between 1 nm and 4 nm.
  • Infrared reflective layer (23) is positioned on the first barrier layer (22). Ag layer is used as the infrared reflective layer (23).
  • the thickness of said infrared reflective layer (23) is between 10 nm and 22 nm. In the preferred application, the thickness of the infrared reflective layer (23) is between 12 nm and 20 nm. Most preferably, the thickness of the infrared reflective layer (23) is between 14 nm and 18 nm.
  • a second barrier layer (24) is positioned on the infrared reflective layer (23). At least one of NiCr, NiCrOx, TiO x , ZnSnO x , ZnAIOx, ZnO x is used as the barrier layer (24). In the preferred application, the barrier layer (24) comprises one of NiCr or NiCrOx. In an application of the present invention, NiCr is used as the barrier layer (24). In other alternative application of the present invention, NiCrOx is used as the barrier layer (24).
  • the thickness of the second barrier layer (24) is between 1 nm and 9 nm. In the preferred application, the thickness of the second barrier layer (24) is between 1.5 nm and 7 nm. Most preferably, the thickness of the second barrier layer (24) is between 2 nm and 5 nm.
  • the second dielectric structure (25) comprises at least three of the materials Si x N y , SiO x N y , ZnSnOx, ZnAIOx, TiZrOx, TiO x , TiN x , ZrN x .
  • the second dielectric structure (25) respectively comprises a third dielectric layer (251 ); fourth dielectric layer (252) and a protective layer (253).
  • the third dielectric layer (251) comprises at least one of Si x N y , SiO x N y , ZnSnO x , ZnAIOx, TiZrO x , TiO x , TiN x , ZrN x .
  • ZnAIO x is used as the third dielectric layer (251).
  • the thickness of the third dielectric layer (251 ) is between 10 nm and 27 nm. In the preferred application, the thickness of the third dielectric layer (251 ) is between 13 nm and 24 nm. Most preferably, the thickness of the third dielectric layer (251 ) is between 15 nm and 21 nm.
  • the fourth dielectric layer (252) comprises at least one of Si x N y , SiO x N y , ZnSnO x , ZnAIOx, TiZrO x , TiOx, TiN x , ZrN x .
  • Si x N y is used as the fourth dielectric layer (252).
  • the thickness of the fourth dielectric layer (252) is between 8 nm and 25 nm. In the preferred application, the thickness of the fourth dielectric layer (252) is between 11 nm and 22 nm. Most preferably, the thickness of the fourth dielectric layer (252) is between 13 nm and 19 nm.
  • the fifth dielectric layer (253) comprises at least one of Si x N y , SiO x N y , ZnSnOx, ZnAIOx, TiZrOx, TiOx, TiN x , ZrN x .
  • SiO x N y is used as the fifth dielectric layer (253).
  • the thickness of the fifth dielectric layer (253) is between 14 nm and 32 nm. In the preferred application, the thickness of the fifth dielectric layer (253) is between 17 nm and 29 nm. Most preferably, the thickness of the fifth dielectric layer (253) is between 20 nm and 26 nm.
  • the total thickness of the first dielectric structure (21) which is under the infrared reflective layer (23) existing in the subject matter low-e coating (20) is lower than the total thickness of the second dielectric structure (25) which is on the infrared reflective layer (23).
  • color values can be obtained at desired levels through the optic performance values of the low-e coated (20) glass (10) which is the final product.
  • the total thickness of the first dielectric structure (21) is between 20 nm and 54 nm. In the preferred application, the total thickness of the first dielectric structure (21) is between 23 nm and 51 nm. Most preferably, the total thickness of the first dielectric structure (21 ) is between 26 nm and 48 nm.
  • the total thickness of the second dielectric structure (25) is between 32 nm and 84 nm. In the preferred application, the total thickness of the second dielectric structure (25) is between 35 nm and 81 nm. Most preferably, the total thickness of the second dielectric structure (25) is between 38 nm and 78 nm.
  • the proportion of the total thickness of the second dielectric structure (25) which is over the infrared reflective layer (23) to the total thickness of the first dielectric structure (21) which is under the infrared reflective layer (23) is kept at a level between 1 .5 and 1 .6. By means of this, the angular color change of the low-e coated (20) glass (10) is provided to stay fixed up to 60° at the external reflection.
  • the external reflection color values of the subject matter low-e coated (20) glasses (10) is preferred to be neutral in IGU.
  • layer arrangement and thicknesses in low-e coating (20) are optimized in a manner obtaining glass side reflection a* value between (0.0) and (3.0) and the b* value between (0.5) and (3.2) after thermal process in single glass applications.
  • the glass side reflection a* value after thermal process in single glass applications is between (0.3) and (2.5), and the b* value is between (1 .2) and (2.8).
  • the glass side reflection a* value after thermal process in single glass applications is between (1.0) and (2.0), and the b* value is between (1.5) and (2.5).
  • a* value obtained after IGU applications is between (-1 .0) and (1 .9), b* value is between (1 .0) and (3.0).
  • a* value obtained after IGU applications is between (- 0.5) and (1.3), b* value is between (1.3) and (2.5).
  • a* value obtained after IGU applications is between (0.0) and (1 .0), b* value is between (1 .6) and (2.1).
  • the thicknesses of the first barrier layer (22) and the second barrier layer (24) are effective on reflection values. Since the second barrier layer (24) is thicker than the first barrier layer (22), the internal reflection is lower than the external reflection after the thermal process.
  • the internal reflection value of single glass after thermal process is between 20% and 25%.
  • the external reflection value of single glass after thermal process is between 30% and 35%. In IGU applications, after the thermal process, the internal reflection value is between 23% and 28%, the external reflection value is between 33% and 38%.
  • the proportion of the thickness of the second barrier layer (24) at the low-e coating (20) to the thickness of the first barrier layer (22) is between 1.8 and 2.2.
  • the emissivity value before the thermal process is between 0.043 and 0.047, and the emissivity value after the thermal process is between 0.030 and 0.035.
  • the single glass daylight transmittance value after the thermal process of the subject matter low-e coated (20) glass (10) is between 45% and 55%.
  • the daylight transmittance value after thermal process is between 40% and 50%.
  • the daylight transmittance value of the low-e coated (20) glass (10) after thermal process is 43%.
  • the structure is in the form of
  • the structure is in the form of Glass/SixNy/ZnAIOx/NiCr/Ag/ NiCr/ZnAIOx/SixNy/SiOxNy.
  • the structure is in the form of Glass/SixNy/ZnAIOx/ NiCr/Ag/ NiCrOx/ZnAIOx/SixNy/SiOxNy.
  • the structure is in the form of Glass/SixNy/ZnAIOx/ NiCrOx/Ag/ NiCr/ZnAIOx/SixNy/SiO x N y .

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  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
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  • Geochemistry & Mineralogy (AREA)
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  • Surface Treatment Of Glass (AREA)

Abstract

The present invention is a low-e coated (20) glass (10) comprising at least one infrared reflective layer (23) having single glass daylight transmittance value between 45% and 55% and having high external reflection and having neutral color values in order to be used in architecture and automotive glasses, characterized in that the proportion of the total thickness of a first dielectric structure (21), positioned between the glass (10) and said infrared reflective layer (23), to the total thickness of a second dielectric structure (25), positioned on the infrared reflective layer (23), is between 1.5 and 1.6 in order to provide fixing of the angular color change in external reflection up to 60°.

Description

A LOW-E COATED GLASS WITH REDUCED ANGULAR COLOR CHANGE
TECHNICAL FIELD
The present invention relates to a low-emission (low-e) coated glass which transmits visible light in an efficient manner and which provides heat control at the same time.
PRIOR ART
One of the factors which differentiates optic characteristics of glasses is coating applications realized on glass surface. One of the coating applications is magnetic field supported sputtering method in vacuum medium. This method is frequently applied in production of architectural and automotive coatings which have low-e feature. The transmittance and reflection values existing at the visible, near infrared and infrared region of the glasses, coated by means of said method, can be obtained at the targeted levels.
Besides visible region transmittance and reflection values, the total solar energy transmittance (g) value is also an important parameter in coated glasses which can be used in architecture and automotive sectors. Highness of the total solar energy transmittance (g) value of coatings can be preferred for the purpose of decreasing heating loads in cold climate geographies. The number of Ag layers where the coatings include total solar energy transmittance (g) values can be kept at the targeted levels by means of the used coring layer type and parametric optimizations of layers.
As a result, because of the abovementioned problems, an improvement is required in the related technical field.
BRIEF DESCRIPTION OF THE INVENTION
The present invention relates to a low-e coated glass embodiment with medium level of transmittance, for eliminating the abovementioned disadvantages and for bringing new advantages to the related technical field.
The main object of the present invention is to provide a low-e coated glass with medium level of transmittance. Another object of the present invention is to provide a low-e coated glass with reduced angular color change.
Another object of the present invention is to provide a low-e coated glass with reduced emissivity value.
Another object of the present invention is to provide a low-e coated glass which can be thermally processed.
In order to realize the abovementioned objects and the objects which are to be deducted from the detailed description below, the present invention is a low-e coated glass comprising at least one infrared reflective layer having single glass daylight transmittance value between 45% and 55% and having high external reflection and having neutral color values in order to be used in architecture and automotive glasses. Accordingly, the subject matter invention is characterized by comprising a first dielectric structure positioned under said infrared reflective layer, and a second dielectric structure positioned on the infrared reflective layer; and the proportion of the total thickness of the first dielectric structure to the total thickness of the second dielectric structure is between 1 .5 and 1 .6 in order to provide fixing of the angular color change in external reflection up to 60°.
In a preferred embodiment of the present invention, in order to provide emissivity values to be between 0.043 and 0.047 before thermal process, the proportion of the thickness of a second barrier layer positioned on the infrared reflective layer to the thickness of a first barrier layer positioned under the infrared reflective layer is between 1 .8 and 2.2.
In another preferred embodiment of the present invention, said first dielectric structure comprises at least one dielectric layer.
In another preferred embodiment of the present invention, the first dielectric structure comprises at least one of SixNy, SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx.
In a preferred embodiment of the present invention, the first dielectric structure comprises a first dielectric layer and a second dielectric layer positioned on said first dielectric layer.
In another preferred embodiment of the present invention, said second dielectric structure comprises at least one dielectric layer. In another preferred embodiment of the present invention, said second dielectric structure comprises at least one of SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx.
In a preferred embodiment of the present invention, said second dielectric structure respectively comprises a third dielectric layer; a fourth dielectric layer; and a protective layer.
In another preferred embodiment of the present invention, the first dielectric layer and the second dielectric layer comprise at least one of SixNy, SiOxNy, ZnAI, ZnAIOx ZnSnOx, TiOx, TiNx, ZrNx.
In another preferred embodiment of the present invention, the first dielectric layer comprises SixNy, and the second dielectric layer comprises ZnAIOx.
In another preferred embodiment of the present invention, said third dielectric layer; said fourth dielectric layer and said protective layer comprise at least one of SixNy, SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx.
In another preferred embodiment of the present invention, said third dielectric layer comprises ZnAIOx, the fourth dielectric layer comprises SixNy; and the protective layer comprises SiOxNy.
BRIEF DESCRIPTION OF THE FIGURE
In Figure 1 , a representative view of the low-e coated glass is given.
REFERENCE NUMBERS
10 Glass
20 Low-e coating
21 First dielectric structure
211 First dielectric layer
212 Second dielectric layer
22 First barrier layer
23 Infrared reflective layer
24 Second barrier layer
25 Second dielectric structure
251 Third dielectric layer 252 Fourth dielectric layer
253 Protective layer
DETAILED DESCRIPTION OF THE INVENTION
In this detailed description, the subject matter low-e coated (20) glass (10) is explained with references to examples without forming any restrictive effect only in order to make the subject more understandable.
Production of low-e coated (20) glasses (10) for architecture and automotive is realized by means of sputter method. The present invention essentially relates to single silver low-e coated (20) glasses (10) used as daylight transmitting and thermal insulating glass (10) and which have high thermal process resistance, and relates to the content and application of said low-e coating (20). The subject matter low-e coated (20) glass (10) can be used in laminated structures and thermal glass unit for architecture and automotive sectors.
In the present invention; in order to be able to obtain a low-e coated (20) glass (10) designed to have a level showing minimum angular color change and which can be thermally processed and which has medium level of visible light transmittance in order to be applied onto the surface of a glass (10), a low-e coating (20) has been developed which is formed by pluralities of metal, metal oxide and metal nitride/oxy-nitride layers positioned on the glass (10) surface by using sputtering method. Said layers are respectively accumulated one on the other in vacuum medium. As the thermal process, at least one and/or a number of tempering, partial tempering, annealing, lamination and bending processes can be used. The subject matter low-e coated (20) glass (10) can be used as architecture and automotive glass (10).
The optic performance term mentioned in the invention describes solar energy transmittance, visible region light transmittance, internal and external reflection values, L-a-b color values of low-e coated (20) glass (10).
In the subject matter low-e coated (20) glass (10), the refraction indexes of all layers have been determined by using methods with calculation through optic constants obtained from the taken single layer measurements. Said refraction indexes are the refraction index data at 550 nm. The following data is detected as a result of experimental studies for developing a low-e coating (20) arrangement preferred in terms of production easiness and optic characteristics.
The subject matter low-e coating (20) comprises an infrared reflective layer (23) which provides transmitting of solar energy spectrum visible region (hereafter, it will be called TVis%) at the targeted level and which provides reflecting (by less transmitting) of thermal radiation which is in the infrared region. Ag layer is used as the infrared reflective layer (23), and thermal radiation thereof is low.
In the subject matter low-e coating (20); the first dielectric structure (21 ) is used in a manner contacting the glass (10). Said first dielectric structure (21 ) comprises at least one of or a number of SixNy, SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx. In the preferred application, the first dielectric structure (21 ) comprises a first dielectric layer (211 ) and a second dielectric layer (212).
Said first dielectric layer (21 1 ) comprises at least one of SixNy, SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx. In the preferred application, the first dielectric layer (21 1 ) comprises SixNy. The first dielectric layer (211 ) comprising SixNy behaves like a diffusion barrier and serves for prevention of alkali ion migration which becomes easier at high temperature. Thus, the first dielectric layer (211 ) comprising SixNy supports the resistance of the low-e coating (20) against thermal processes. The changing range for the refraction index of the first dielectric layer (211 ) comprising SixNy is between 2.00 and 2.15. In the preferred structure, the changing range for the refraction index of the first dielectric layer (211 ) comprising SixNy is between 2.02 and 2.12.
Said second dielectric layer (212) comprises at least one of SixNy, SiOxNy, ZnAI, ZnAIOx ZnSnOx, TiOx, TiNx, ZrNx. In the preferred application, the second dielectric layer (212) comprises ZnAIOx. The changing range for the refraction index of the second dielectric layer (212) comprising ZnAIOx is between 2.0 and 2.15. In the preferred structure, the changing range for the refraction index of the second dielectric layer (212) comprising ZnAIOx is between 2.0 and 2.12.
The thickness of the first dielectric layer (21 1 ) comprising SixNy is between 12 nm and 30 nm. In the preferred application, the thickness of the first dielectric layer (21 1 ) comprising SixNy is between 15 nm and 27 nm. In a further preferred application, the thickness of the first dielectric layer (21 1 ) comprising SixNy is between 18 nm and 24 nm. Since the first dielectric layer (21 1 ) comprising SixNy has the mentioned thicknesses, the low-e coated (20) glass (10) is enabled to be more resistant against temper. In case the first dielectric layer (211 ) comprising SixNy and which is in contact with the glass (10) is thinner than the mentioned thickness values, deteriorations may occur in the low-e coating (20) during tempering.
The second dielectric layer (212) including ZnAIOx is positioned on the first dielectric layer (211 ). The thickness of the second dielectric layer (212) comprising ZnAIOx is between 8 nm and 24 nm. In the preferred application, the thickness of the second dielectric layer (212) comprising ZnAIOx is between 11 nm and 21 nm. In a further preferred application, the thickness of the second dielectric layer (212) comprising ZnAIOx is between 14 nm and 18 nm.
The first barrier layer (22) is positioned on the second dielectric layer (212) comprising ZnAIOx. At least one of NiCr, NiCrOx, Ti, TiOx, ZnAIOx, ZnOx is used as said first barrier layer. In the preferred application, one of NiCr or NiCrOx is used. The thickness of the first barrier layer (22) is between 1 nm and 10 nm. In the preferred application, the thickness of the first barrier layer (22) is between 1 nm and 7 nm. In a further preferred application, the thickness of the first barrier layer (22) is between 1 nm and 4 nm.
Infrared reflective layer (23) is positioned on the first barrier layer (22). Ag layer is used as the infrared reflective layer (23). The thickness of said infrared reflective layer (23) is between 10 nm and 22 nm. In the preferred application, the thickness of the infrared reflective layer (23) is between 12 nm and 20 nm. Most preferably, the thickness of the infrared reflective layer (23) is between 14 nm and 18 nm.
A second barrier layer (24) is positioned on the infrared reflective layer (23). At least one of NiCr, NiCrOx, TiOx, ZnSnOx, ZnAIOx, ZnOx is used as the barrier layer (24). In the preferred application, the barrier layer (24) comprises one of NiCr or NiCrOx. In an application of the present invention, NiCr is used as the barrier layer (24). In other alternative application of the present invention, NiCrOx is used as the barrier layer (24). The thickness of the second barrier layer (24) is between 1 nm and 9 nm. In the preferred application, the thickness of the second barrier layer (24) is between 1.5 nm and 7 nm. Most preferably, the thickness of the second barrier layer (24) is between 2 nm and 5 nm.
There is a second dielectric structure (25) on the second barrier layer (24). The second dielectric structure (25) comprises at least three of the materials SixNy, SiOxNy, ZnSnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. The second dielectric structure (25) respectively comprises a third dielectric layer (251 ); fourth dielectric layer (252) and a protective layer (253). The third dielectric layer (251) comprises at least one of SixNy, SiOxNy, ZnSnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. In the preferred application, ZnAIOx is used as the third dielectric layer (251). The thickness of the third dielectric layer (251 ) is between 10 nm and 27 nm. In the preferred application, the thickness of the third dielectric layer (251 ) is between 13 nm and 24 nm. Most preferably, the thickness of the third dielectric layer (251 ) is between 15 nm and 21 nm.
The fourth dielectric layer (252) comprises at least one of SixNy, SiOxNy, ZnSnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. In the preferred application, SixNy is used as the fourth dielectric layer (252). The thickness of the fourth dielectric layer (252) is between 8 nm and 25 nm. In the preferred application, the thickness of the fourth dielectric layer (252) is between 11 nm and 22 nm. Most preferably, the thickness of the fourth dielectric layer (252) is between 13 nm and 19 nm.
The fifth dielectric layer (253) comprises at least one of SixNy, SiOxNy, ZnSnOx, ZnAIOx, TiZrOx, TiOx, TiNx, ZrNx. In the preferred application, SiOxNy is used as the fifth dielectric layer (253). The thickness of the fifth dielectric layer (253) is between 14 nm and 32 nm. In the preferred application, the thickness of the fifth dielectric layer (253) is between 17 nm and 29 nm. Most preferably, the thickness of the fifth dielectric layer (253) is between 20 nm and 26 nm.
The total thickness of the first dielectric structure (21) which is under the infrared reflective layer (23) existing in the subject matter low-e coating (20) is lower than the total thickness of the second dielectric structure (25) which is on the infrared reflective layer (23). Thus, color values can be obtained at desired levels through the optic performance values of the low-e coated (20) glass (10) which is the final product.
The total thickness of the first dielectric structure (21) is between 20 nm and 54 nm. In the preferred application, the total thickness of the first dielectric structure (21) is between 23 nm and 51 nm. Most preferably, the total thickness of the first dielectric structure (21 ) is between 26 nm and 48 nm.
The total thickness of the second dielectric structure (25) is between 32 nm and 84 nm. In the preferred application, the total thickness of the second dielectric structure (25) is between 35 nm and 81 nm. Most preferably, the total thickness of the second dielectric structure (25) is between 38 nm and 78 nm. The proportion of the total thickness of the second dielectric structure (25) which is over the infrared reflective layer (23) to the total thickness of the first dielectric structure (21) which is under the infrared reflective layer (23) is kept at a level between 1 .5 and 1 .6. By means of this, the angular color change of the low-e coated (20) glass (10) is provided to stay fixed up to 60° at the external reflection.
The external reflection color values of the subject matter low-e coated (20) glasses (10) is preferred to be neutral in IGU. In order to provide this, layer arrangement and thicknesses in low-e coating (20) are optimized in a manner obtaining glass side reflection a* value between (0.0) and (3.0) and the b* value between (0.5) and (3.2) after thermal process in single glass applications. In the preferred application, the glass side reflection a* value after thermal process in single glass applications is between (0.3) and (2.5), and the b* value is between (1 .2) and (2.8). Most preferably, the glass side reflection a* value after thermal process in single glass applications is between (1.0) and (2.0), and the b* value is between (1.5) and (2.5). a* value obtained after IGU applications is between (-1 .0) and (1 .9), b* value is between (1 .0) and (3.0). In the preferred application, a* value obtained after IGU applications is between (- 0.5) and (1.3), b* value is between (1.3) and (2.5). Most preferably, a* value obtained after IGU applications is between (0.0) and (1 .0), b* value is between (1 .6) and (2.1).
The thicknesses of the first barrier layer (22) and the second barrier layer (24) are effective on reflection values. Since the second barrier layer (24) is thicker than the first barrier layer (22), the internal reflection is lower than the external reflection after the thermal process. The internal reflection value of single glass after thermal process is between 20% and 25%. The external reflection value of single glass after thermal process is between 30% and 35%. In IGU applications, after the thermal process, the internal reflection value is between 23% and 28%, the external reflection value is between 33% and 38%.
The proportion of the thickness of the second barrier layer (24) at the low-e coating (20) to the thickness of the first barrier layer (22) is between 1.8 and 2.2. By means of this, the emissivity value before the thermal process is between 0.043 and 0.047, and the emissivity value after the thermal process is between 0.030 and 0.035.
The single glass daylight transmittance value after the thermal process of the subject matter low-e coated (20) glass (10) is between 45% and 55%. In IGU applications, the daylight transmittance value after thermal process is between 40% and 50%. Preferably, in IGU applications, the daylight transmittance value of the low-e coated (20) glass (10) after thermal process is 43%.
In another preferred application of the present invention, the structure is in the form of
Glass/SixNy/ZnAIOx/NiCrOx/Ag/ NiCrOx/ZnAIOx/SixNy/SiOxNy.
In another preferred application of the present invention, the structure is in the form of Glass/SixNy/ZnAIOx/NiCr/Ag/ NiCr/ZnAIOx/SixNy/SiOxNy.
In another preferred application of the present invention, the structure is in the form of Glass/SixNy/ZnAIOx/ NiCr/Ag/ NiCrOx/ZnAIOx/SixNy/SiOxNy.
In another preferred application of the present invention, the structure is in the form of Glass/SixNy/ZnAIOx/ NiCrOx/Ag/ NiCr/ZnAIOx/SixNy/SiOxNy.
The protection scope of the present invention is set forth in the annexed claims and cannot be restricted to the illustrative disclosures given above, under the detailed description. It is because a person skilled in the relevant art can obviously produce similar embodiments under the light of the foregoing disclosures, without departing from the main principles of the present invention.

Claims

CLAIMS The present invention is a low-e coated (20) glass (10) comprising at least one infrared reflective layer (23) having single glass daylight transmittance value between 45% and 55% and having high external reflection and having neutral color values in order to be used in architecture and automotive glasses, characterized by comprising a first dielectric structure (21) positioned under said infrared reflective layer (23), and a second dielectric structure (25) positioned on the infrared reflective layer (23); and the proportion of the total thickness of the first dielectric structure (23) to the total thickness of the second dielectric structure (25) is between 1.5 and 1.6 in order to provide fixing of the angular color change in external reflection up to 60°. The low-e coated (20) glass (10) according to claim 1 , wherein in order to provide emissivity values to be between 0.043 and 0.047 before thermal process, the proportion of the thickness of a second barrier layer (24) positioned on the infrared reflective layer (23) to the thickness of a first barrier layer (22) positioned under the infrared reflective layer (23) is between 1 .8 and 2.2. The low-e coated (20) glass (10) according to claim 1 , wherein said first dielectric structure (21) comprises at least one dielectric layer. The low-e coated (20) glass (10) according to claim 1 , wherein the first dielectric structure (21) comprises at least one of SixNy, SiOxNy, ZnAI, ZnAIOx ZnSnOx, TiOx, TiNx, ZrNx. The low-e coated (20) glass (10) according to claim 1 , wherein the first dielectric structure (21) comprises a first dielectric layer (211 ) and a second dielectric layer (212) positioned on said first dielectric layer (211). The low-e coated (20) glass (10) according to claim 1 , wherein said second dielectric structure (25) comprises at least one dielectric layer. The low-e coated (20) glass (10) according to claim 1 , wherein said second dielectric structure (25) comprises at least one of SiOxNy, ZnAI, ZnAIOx ZnSnOx, TiOx, TiNx, ZrNx.
8. The low-e coated (20) glass (10) according to claim 1 , wherein said second dielectric structure (25) respectively comprises a third dielectric layer (251); a fourth dielectric layer (252); and a protective layer (253). 9. The low-e coated (20) glass (10) according to claim 5, wherein the first dielectric layer (211 ) and the second dielectric layer (212) comprise at least one of SixNy, SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx.
10. The low-e coated (20) glass (10) according to claim 9, wherein the first dielectric layer (211 ) comprises SixNy, and the second dielectric layer (212) comprises ZnAIOx.
11. The low-e coated (20) glass (10) according to claim 8, wherein said third dielectric layer (251 ); said fourth dielectric layer (252); and said protective layer (253) comprise at least one of SixNy, SiOxNy, ZnAI, ZnAIOxZnSnOx, TiOx, TiNx, ZrNx.
12. The low-e coated (20) glass (10) according to claim 11 , wherein said third dielectric layer (251 ) comprises ZnAIOx; the fourth dielectric layer (252) comprises SixNy; and the protective layer (253) comprises SiOxNy.
PCT/TR2023/050586 2022-09-16 2023-06-19 A low-e coated glass with reduced angular color change WO2024058746A1 (en)

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TR2022/014362A TR2022014362A2 (en) 2022-09-16 2022-09-16 A LOW-E COATED GLASS WITH ANGLE DISCOLORATION REDUCED
TR2022/014362 2022-09-16

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019098980A2 (en) * 2017-11-20 2019-05-23 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi A thermally processable low-e coating and production method thereof
WO2019209202A2 (en) * 2018-01-11 2019-10-31 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi Low-e coated glass with efficient thermal and solar control
WO2020130981A2 (en) * 2018-12-18 2020-06-25 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi A low-e coating which is applicable to laminated automotive glasses
CN212559995U (en) * 2020-09-29 2021-02-19 咸宁南玻节能玻璃有限公司 Medium-transmittance LOW-reflection temperable double-silver LOW-E glass
WO2022164407A2 (en) * 2021-01-27 2022-08-04 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi A low-e coating including double silver and with high transmittance and with increased mechanical resistance

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019098980A2 (en) * 2017-11-20 2019-05-23 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi A thermally processable low-e coating and production method thereof
WO2019209202A2 (en) * 2018-01-11 2019-10-31 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi Low-e coated glass with efficient thermal and solar control
WO2020130981A2 (en) * 2018-12-18 2020-06-25 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi A low-e coating which is applicable to laminated automotive glasses
CN212559995U (en) * 2020-09-29 2021-02-19 咸宁南玻节能玻璃有限公司 Medium-transmittance LOW-reflection temperable double-silver LOW-E glass
WO2022164407A2 (en) * 2021-01-27 2022-08-04 Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi A low-e coating including double silver and with high transmittance and with increased mechanical resistance

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