CN211284525U - 用于施加薄膜涂层的真空设备 - Google Patents
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Abstract
本实用新型提供一种用于施加薄膜涂层的真空设备，其包括安装在框架上并且设置有技术装置的至少一个处理室；安装在运输系统上的至少一个负载锁定室，所述运输系统配置为将负载锁定室从装载/卸载位置移动到处理室下方的操作位置；基板保持架，其用于将基板定位在其上以施加薄膜涂层，所述基板保持架可以绕其轴线旋转；用于将基板保持架从负载锁定室转移到处理室的进给装置；真空门，其位于所述处理室和负载锁定室之间并且配置为将所述负载锁定室和处理室的内部空间分开；以及处理和负载锁定室对接装置；其中，在处理室的上部安装有夹具，其配置为在基板表面处理期间将基板保持架固定在处理室的内部空间内并且使基板保持架绕其轴线旋转。
Description
技术领域
本实用新型涉及用于施加涂层的技术设备领域，即用于施加具有特定光学、电学和其它特性的薄膜涂层的真空技术设备。
背景技术
从现有技术中已知用于将薄膜涂层施加到工件上的各种装置。
与本实用新型的最接近的类似物是国际申请WO2017/156614(2017年9月21日公布)中公开的用于施加薄膜涂层的真空设备，其包括安装在框架上并且设置有技术装置的至少一个处理室；安装在运输系统上的至少一个负载锁定室，所述运输系统配置为将负载锁定室从装载/卸载位置移动到处理室下方的操作位置；基板保持架，其用于将基板定位在其上以施加薄膜涂层，所述基板保持架可以绕其轴线旋转；用于将基板保持架从负载锁定室转移到处理室的进给装置；真空门，其位于所述室之间并且配置为将所述负载锁定室和处理室的内部空间分开。其中，进给装置能够将基板保持架转移到处理室中直到其与旋转驱动装置连接，因此，在基板保持架的随后旋转期间，进给装置不会返回到负载锁定室中，而且负载锁定室与处理室之间的真空门保持打开状态。
所述结构的缺点在于增加了工艺流程的时间，由于在工艺流程期间必须在处理室和负载锁定室中均提供真空，因为室的内部空间保持不分开。此外，在将薄膜涂层施加到基板上的工艺流程期间，处理室中进给装置的存在会导致涂层质量下降。
实用新型内容
本实用新型的主要目的是开发一种施加薄膜涂层的真空装置，其结构可以确保技术效果的实现，包括缩短工艺流程的时间，以及提高所获得的薄膜涂层的质量。
通过开发一种用于施加薄膜涂层的真空设备来解决所设定的目标，所述真空设备包括安装在框架上并且设置有技术装置的至少一个处理室；安装在运输系统上的至少一个负载锁定室，所述运输系统配置为将负载锁定室从装载/卸载位置移动到处理室下方的操作位置；基板保持架，其用于将基板定位在其上以施加薄膜涂层，所述基板保持架可以绕其轴线旋转；用于将基板保持架从负载锁定室转移到处理室的进给装置；真空门，其位于所述室之间并且配置为将所述负载锁定室和处理室的内部空间分开；以及处理和负载锁定室对接装置；其中，在处理室的上部安装有夹具，其配置为在基板表面处理期间将基板保持架固定在处理室的内部空间内并且使基板保持架绕其轴线旋转。
由于所述设计，即由于夹具的存在，在工艺流程期间可以通过关闭真空门和进一步旋转基板保持架来分开处理室和负载锁定室的内部空间以提供基板表面处理。因此，缩短了工艺流程的时间，因为将被提供真空的内部空间减小了；提高了获得的薄膜涂层的质量，因为在处理室中获得薄膜涂层时，在工艺流程中没有直接分离的结构元件，结构元件的直接分离可能导致操作空间的污染。
在一个可能的实施例中，安装在处理室的上部的夹具包括板、通过可移动连接与所述板连接的基座、气动驱动装置，所述基座设置有配置为固定所述基板保持架的一组夹紧机构，所述气动驱动装置配置为在所述板上传递力以致动夹紧机构。
优选地，基板保持架制成为中空的，通常为规则的N边形棱柱形式，并且设置有可拆卸的接收装置，用于安装各种典型尺寸的基板。
示例性实施例之一是鼓型基板保持架，其具有配置为用于在其上安装挠性基板的圆柱形表面。
所述进给装置位于所述负载锁定室和处理室之外。这有助于避免室内操作空间的污染，这又界定了所获得的薄膜涂层的高质量。
为了减小本实用新型设备中的泵送量，所述负载锁定室具有与所述基板保持架的内部形状对应的形状。
在特定的实施例中，运输系统是可旋转的运输系统。由于缩短了工艺周期的时间，这种结构允许本实用新型的设备用于大规模生产。
所公开的用于将薄膜涂层施加到各种典型尺寸的基板上的真空设备适用于复杂且长期的工艺流程，能够使用各种技术和工艺装置。
附图说明
本实用新型结合以下附图材料公开。
图1是用于施加薄膜涂层的真空设备的全貌图。
图2是用于施加薄膜涂层的真空设备的具有旋转驱动装置的夹具的全貌图。
具体实施方式
图1示出了作为本实用新型一实施例的用于施加薄膜涂层的真空设备的全貌图，其包括安装在框架2上并且设置有技术装置3的至少一个处理室1，以及安装在运输系统(图中未示出)上的至少一个负载锁定室4，所述运输系统配置为将负载锁定室4从装载/卸载位置移动到处理室1下方的操作位置。所述设备包括基板保持架5，其用于将基板定位在其上以施加薄膜涂层，所述基板保持架可以绕其轴线旋转；用于将基板保持架5从负载锁定室4转移到处理室1的进给装置6；真空门7，其位于所述室之间并且配置为将所述室1和4的内部空间分开。在处理室1的上部安装有夹具8，该夹具8配置为在基板表面处理期间将基板保持架5固定在处理室1的内部空间内并且通过旋转驱动装置9使基板保持架5绕其轴线旋转。图1中还示出了对接装置10和空间分隔件11。
图2示出了作为本实用新型一实施例的用于施加薄膜涂层的真空设备的夹具8的全貌图，其包括连接到基座13的可移动板12，所述基座13设置有一组夹紧机构14，所述夹紧机构14配置为固定基板保持架5。此外，图中示出了一气动驱动装置19，其包括气缸15、真空馈通部16、推杆17、驱动弹簧18，其配置为在可移动板12上传递力以致动夹紧机构14。
优选地，基板保持架5制成为中空的，通常为规则的N边形棱柱形式。基板保持架5的特征在于具有可拆卸的接收装置，用于安装各种典型尺寸的基板。在最优选的实施例中，规则的棱柱形式的基板保持架具有六个侧矩形面而且用于安装基板的可拆卸接收装置附接在每个面上。
在本实用新型的设备中，可以使用鼓型基板保持架5，其具有配置为用于在其上安装挠性基板的圆柱形表面。
在负载锁定室4的装载/卸载位置，在基板保持架5上，可以更换基板，可以更换接收装置和基板，或者可以更换基板保持架本身，这样可以缩短工艺流程的时间。所述设计使得可以在真空设备中处理各种典型尺寸的挠性(箔、玻璃、金属)和实心平的(铌酸锂、钽酸锂、玻璃、硅、蓝宝石、微晶玻璃等)基板。
当执行处理操作时，基板保持架5位于处理室1内部，而且技术装置3位于处理室1的周围，围绕基板保持架5的垂直旋转轴线。在基板保持架5被进给到处理室中并且被固定在夹具8中后，基板保持架5与夹具8一起通过旋转驱动装置9旋转。
本实用新型的设备可以包括等离子体生成系统、清除和蚀刻离子源、蒸发系统、磁控管等作为技术装置3。
用于使基板保持架5绕其轴线旋转的旋转驱动装置9和用于将其转移到处理室1的装置6位于处理室1和负载锁定室4的外部，这有助于避免室内操作空间的污染，这又限定了获得的薄膜涂层的高质量。
为了减小本实用新型设备中的泵送量，负载锁定室4具有与基板保持架5的内部形状对应的形状并且可以安装在运输系统的线性引导件上，以便进行从装载/卸载位置到处理室1下方操作位置以及反过来的往复运动。
在另一个可能的实施方案中，运输系统是可旋转运输系统，包括：例如具有杆的可旋转机构，其上安装有两个负载锁定室4。当其中一个负载锁定室与处理室连接时，另一个负载锁定室处于装载/卸载位置。所描述的运输系统的结构允许本实用新型的设备由于技术周期的缩短而用于大规模生产。
为了减小本实用新型设备中的泵送量，负载锁定室4具有与基板保持架5的内表面相对应的形状。此外，为了减小负载锁定室4中的“寄生”泵送量，可以使用安装在负载锁定室4中的空间分隔件11，其优选地是中性材料的插入件。
本实用新型的用于施加薄膜涂层的真空设备操作如下。
基板预先附接到负载锁定室4外的基板保持架5上，然后通过进给装置6，垂直位置的基板保持架5自动下降到附接到运输系统的负载锁定室4中。然后，通过传送系统，带有基板保持架5的负载锁定室4从装载位置向内转移到处理室1下方的操作位置。通过对接装置10，负载锁定室4被紧紧地压到真空门7上，然后在真空门7关闭时，使用泵送装置(图中未示出)，先对负载锁定室4进行低真空泵送，然后对负载锁定室4进行高真空泵送。当达到所需的真空时，真空门7打开，并且通过进给装置6，基板保持架5被转移到夹具8区域中的处理室1。气动驱动装置19被致动，并且来自气缸15的、经由真空馈通部16的力通过推杆17传递到可移动板12上，该板通过铰链机构与设置有至少三个夹紧装置机构14的基座13连接。所述夹紧机构14松开，并且基板保持架5与夹具8的基座13接触，于是推杆17返回其初始位置，而且在驱动弹簧18的作用下，夹紧机构14闭合，从而夹紧并固定基板保持架5。随后进给装置6向下移动到负载锁定室4中，并且真空门7关闭。处理室1被泵送到所需的操作压力，带有基板保持架5的夹具8通过旋转驱动装置9旋转，技术装置3被打开并且附着在基板保持架5上的基板的表面被分别处理，以在其上施加具有所需性能的薄膜涂层。
在施加具有所需性能的薄膜涂层之后，停止基板保持架5的旋转，打开真空门7并使进给装置6进入处理室1。在进给装置6与基板保持架5连接之后，在基板保持架5中，基板保持架5从夹具8释放，其中通过使用推杆17的气动驱动装置19，力再次被传递到可移动板12上，可移动板12通过铰链机构与基座13连接。因此，可以松开夹紧机构14，并相应地释放基板保持架5。然后，进给装置6将基板保持架5移动到负载锁定室4中。真空门7关闭，并且空气被压入负载锁定室4中。压力均衡，然后带有基板保持架5的负载锁定室4通过对接装置10与处理室1脱离，并通过运输系统被转移到装载/卸载区域，在那里更换基板。
因此，开发了用于施加薄膜涂层的真空设备，其结构确保了技术效果的实现，包括缩短工艺流程的时间，以及提高所获得的薄膜涂层的质量。
Claims (8)
1.一种用于施加薄膜涂层的真空设备，其包括安装在框架上并且设置有技术装置的至少一个处理室；安装在运输系统上的至少一个负载锁定室，所述运输系统配置为将负载锁定室从装载/卸载位置移动到处理室下方的操作位置；基板保持架，其用于将基板定位在其上以施加薄膜涂层，所述基板保持架可以绕其轴线旋转；用于将基板保持架从负载锁定室转移到处理室的进给装置；真空门，其位于所述处理室和负载锁定室之间并且配置为将所述负载锁定室和处理室的内部空间分开；以及处理和负载锁定室对接装置；其中，在处理室的上部安装有夹具，其配置为在基板表面处理期间将基板保持架固定在处理室的内部空间内并且使基板保持架绕其轴线旋转。
2.根据权利要求1所述的设备，其中，所述夹具包括板、基座、气动驱动装置，所述基座通过可移动连接与所述板连接并且设置有配置为固定所述基板保持架的一组夹紧机构，所述气动驱动装置配置为在所述板上传递力以致动夹紧机构。
3.根据权利要求1所述的设备，其中，所述基板保持架制成为中空的并且通常为规则的N边形棱柱形式。
4.根据权利要求3所述的设备，其中，所述基板保持架设置有可拆卸的接收装置，用于安装各种典型尺寸的基板。
5.根据权利要求1所述的设备，其中，使用鼓型基板保持架，其具有配置为用于在其上安装挠性基板的圆柱形表面。
6.根据权利要求1所述的设备，其中，所述进给装置位于所述负载锁定室和处理室之外。
7.根据权利要求1所述的设备，其中，所述负载锁定室具有与所述基板保持架的内部形状对应的形状。
8.根据权利要求1所述的设备，其中，所述运输系统是可旋转的。
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