CN1985370A - 包含esd器件的电子器件 - Google Patents
包含esd器件的电子器件 Download PDFInfo
- Publication number
- CN1985370A CN1985370A CNA2005800235203A CN200580023520A CN1985370A CN 1985370 A CN1985370 A CN 1985370A CN A2005800235203 A CNA2005800235203 A CN A2005800235203A CN 200580023520 A CN200580023520 A CN 200580023520A CN 1985370 A CN1985370 A CN 1985370A
- Authority
- CN
- China
- Prior art keywords
- contact mat
- esd
- electronic device
- integrated circuit
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 3
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- 238000005538 encapsulation Methods 0.000 description 4
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- 238000006243 chemical reaction Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
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- 230000003068 static effect Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229910020658 PbSn Inorganic materials 0.000 description 1
- 101150071746 Pbsn gene Proteins 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
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- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
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- 230000002950 deficient Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005421 electrostatic potential Methods 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
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- 239000012535 impurity Substances 0.000 description 1
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- 229910001120 nichrome Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
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- 230000002265 prevention Effects 0.000 description 1
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- 239000000565 sealant Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/60—Protection against electrostatic charges or discharges, e.g. Faraday shields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/18—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/0557—Disposition the external layer being disposed on a via connection of the semiconductor or solid-state body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05571—Disposition the external layer being disposed in a recess of the surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05573—Single external layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Integrated Circuits (AREA)
- Emergency Protection Circuit Devices (AREA)
Abstract
Description
Claims (10)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04103327.5 | 2004-07-13 | ||
EP04103327A EP1617473A1 (en) | 2004-07-13 | 2004-07-13 | Electronic device comprising an ESD device |
PCT/IB2005/052243 WO2006008680A1 (en) | 2004-07-13 | 2005-07-06 | Electronic device comprising an esd device |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1985370A true CN1985370A (zh) | 2007-06-20 |
CN1985370B CN1985370B (zh) | 2010-09-08 |
Family
ID=35044676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800235203A Active CN1985370B (zh) | 2004-07-13 | 2005-07-06 | 包含esd器件的电子器件 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8159032B2 (zh) |
EP (2) | EP1617473A1 (zh) |
JP (1) | JP2008507124A (zh) |
CN (1) | CN1985370B (zh) |
WO (1) | WO2006008680A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101789984A (zh) * | 2009-12-28 | 2010-07-28 | 宇龙计算机通信科技(深圳)有限公司 | 一种sim卡接口电路及移动电话 |
CN103855135A (zh) * | 2012-11-30 | 2014-06-11 | 辉达公司 | 三维硅穿孔构建 |
CN104584216A (zh) * | 2012-09-28 | 2015-04-29 | 英特尔公司 | 用于静电放电(esd)保护的延伸漏极非平面mosfet |
CN105264660A (zh) * | 2013-05-21 | 2016-01-20 | 吉林克斯公司 | 用于经堆栈晶粒组件的中介物上的电荷损害保护 |
CN105279096A (zh) * | 2014-07-04 | 2016-01-27 | 群联电子股份有限公司 | 系统级封装结构与其电镀模块及存储器存储装置 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100583437C (zh) | 2005-03-02 | 2010-01-20 | Nxp股份有限公司 | 电子器件及其使用 |
JP5394617B2 (ja) * | 2006-06-16 | 2014-01-22 | 新光電気工業株式会社 | 半導体装置及び半導体装置の製造方法及び基板 |
US9070670B2 (en) | 2009-01-29 | 2015-06-30 | International Rectifier Corporation | Electrical connectivity of die to a host substrate |
US8648449B2 (en) * | 2009-01-29 | 2014-02-11 | International Rectifier Corporation | Electrical connectivity for circuit applications |
US8198736B2 (en) | 2009-04-09 | 2012-06-12 | Qualcomm Incorporated | Reduced susceptibility to electrostatic discharge during 3D semiconductor device bonding and assembly |
US8692360B1 (en) | 2010-07-06 | 2014-04-08 | International Rectifier Corporation | Electrical connectivity for circuit applications |
JP5925711B2 (ja) | 2013-02-20 | 2016-05-25 | 浜松ホトニクス株式会社 | 検出器、pet装置及びx線ct装置 |
CN205452284U (zh) | 2013-04-05 | 2016-08-10 | 株式会社村田制作所 | Esd保护器件 |
CN105652360A (zh) * | 2016-01-04 | 2016-06-08 | 合肥京东方显示光源有限公司 | 导光结构、背光源及显示装置 |
US10014268B2 (en) * | 2016-03-01 | 2018-07-03 | Advanced Semiconductor Engineering, Inc. | Semiconductor chip, semiconductor device and manufacturing process for manufacturing the same |
JP6190915B2 (ja) * | 2016-04-20 | 2017-08-30 | 浜松ホトニクス株式会社 | 検出器、pet装置及びx線ct装置 |
US11757281B2 (en) * | 2021-12-07 | 2023-09-12 | Infineon Technologies Ag | Electrostatic discharge protection device with integrated series resistors |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0629456A (ja) * | 1992-07-11 | 1994-02-04 | Hitachi Ltd | 半導体装置 |
JPH10242400A (ja) * | 1997-02-18 | 1998-09-11 | Motorola Inc | 静電気放電の保護のための回路 |
US5895978A (en) * | 1997-04-02 | 1999-04-20 | International Business Machines Corporation | High density signal multiplexing interposer |
TW367603B (en) * | 1998-06-20 | 1999-08-21 | United Microelectronics Corp | Electrostatic discharge protection circuit for SRAM |
US6180426B1 (en) * | 1999-03-01 | 2001-01-30 | Mou-Shiung Lin | High performance sub-system design and assembly |
US6400541B1 (en) * | 1999-10-27 | 2002-06-04 | Analog Devices, Inc. | Circuit for protection of differential inputs against electrostatic discharge |
JP2001185676A (ja) * | 1999-12-24 | 2001-07-06 | Sharp Corp | 半導体装置 |
NO315017B1 (no) * | 2000-06-09 | 2003-06-23 | Idex Asa | Sensorbrikke, s¶rlig for måling av strukturer i en fingeroverflate |
DE10124774B4 (de) * | 2001-05-21 | 2016-05-25 | Infineon Technologies Ag | Halbleiterbauelement mit zumindest einem Halbleiterchip auf einem als Substrat dienenden Basischip und Verfahren zu dessen Herstellung |
JP2002353396A (ja) * | 2001-05-25 | 2002-12-06 | Sharp Corp | 半導体集積回路装置 |
KR100431066B1 (ko) * | 2001-09-27 | 2004-05-12 | 삼성전자주식회사 | 정전 방전 보호 기능을 가진 반도체 장치 |
US6710990B2 (en) * | 2002-01-22 | 2004-03-23 | Lsi Logic Corporation | Low voltage breakdown element for ESD trigger device |
JP2007066922A (ja) * | 2003-11-28 | 2007-03-15 | Renesas Technology Corp | 半導体集積回路装置 |
-
2004
- 2004-07-13 EP EP04103327A patent/EP1617473A1/en not_active Withdrawn
-
2005
- 2005-07-06 US US11/632,511 patent/US8159032B2/en active Active
- 2005-07-06 WO PCT/IB2005/052243 patent/WO2006008680A1/en active Application Filing
- 2005-07-06 JP JP2007520940A patent/JP2008507124A/ja not_active Withdrawn
- 2005-07-06 CN CN2005800235203A patent/CN1985370B/zh active Active
- 2005-07-06 EP EP05766935A patent/EP1769532A1/en not_active Withdrawn
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101789984A (zh) * | 2009-12-28 | 2010-07-28 | 宇龙计算机通信科技(深圳)有限公司 | 一种sim卡接口电路及移动电话 |
CN101789984B (zh) * | 2009-12-28 | 2013-09-25 | 宇龙计算机通信科技(深圳)有限公司 | 一种sim卡接口电路及移动电话 |
CN104584216A (zh) * | 2012-09-28 | 2015-04-29 | 英特尔公司 | 用于静电放电(esd)保护的延伸漏极非平面mosfet |
US9502883B2 (en) | 2012-09-28 | 2016-11-22 | Intel Corporation | Extended drain non-planar MOSFETs for electrostatic discharge (ESD) protection |
CN104584216B (zh) * | 2012-09-28 | 2018-06-19 | 英特尔公司 | 用于静电放电(esd)保护的延伸漏极非平面mosfet |
US10103542B2 (en) | 2012-09-28 | 2018-10-16 | Intel Corporation | Extended drain non-planar MOSFETs for electrostatic discharge (ESD) protection |
CN103855135A (zh) * | 2012-11-30 | 2014-06-11 | 辉达公司 | 三维硅穿孔构建 |
CN105264660A (zh) * | 2013-05-21 | 2016-01-20 | 吉林克斯公司 | 用于经堆栈晶粒组件的中介物上的电荷损害保护 |
CN105264660B (zh) * | 2013-05-21 | 2019-01-18 | 吉林克斯公司 | 用于经堆栈晶粒组件的中介物上的电荷损害保护 |
CN105279096A (zh) * | 2014-07-04 | 2016-01-27 | 群联电子股份有限公司 | 系统级封装结构与其电镀模块及存储器存储装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2006008680A1 (en) | 2006-01-26 |
US8159032B2 (en) | 2012-04-17 |
JP2008507124A (ja) | 2008-03-06 |
US20090001607A1 (en) | 2009-01-01 |
CN1985370B (zh) | 2010-09-08 |
EP1769532A1 (en) | 2007-04-04 |
EP1617473A1 (en) | 2006-01-18 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: NXP CO., LTD. Free format text: FORMER OWNER: KONINKLIJKE PHILIPS ELECTRONICS N.V. Effective date: 20090410 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20090410 Address after: Holland Ian Deho Finn Applicant after: Koninkl Philips Electronics NV Address before: Holland Ian Deho Finn Applicant before: Koninklijke Philips Electronics N.V. |
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