CN1947254B - 光电子器件上的微光学元件 - Google Patents
光电子器件上的微光学元件 Download PDFInfo
- Publication number
- CN1947254B CN1947254B CN2005800133746A CN200580013374A CN1947254B CN 1947254 B CN1947254 B CN 1947254B CN 2005800133746 A CN2005800133746 A CN 2005800133746A CN 200580013374 A CN200580013374 A CN 200580013374A CN 1947254 B CN1947254 B CN 1947254B
- Authority
- CN
- China
- Prior art keywords
- optical
- layer
- wafer
- replication
- optoelectronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/026—Wafer-level processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
- Optical Integrated Circuits (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Hybrid Cells (AREA)
- Optical Measuring Cells (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04405110.0 | 2004-02-27 | ||
| EP04405110A EP1569276A1 (en) | 2004-02-27 | 2004-02-27 | Micro-optics on optoelectronics |
| PCT/CH2005/000109 WO2005083789A2 (en) | 2004-02-27 | 2005-02-25 | Micro-optics on optoelectronics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1947254A CN1947254A (zh) | 2007-04-11 |
| CN1947254B true CN1947254B (zh) | 2010-12-29 |
Family
ID=34746192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2005800133746A Expired - Lifetime CN1947254B (zh) | 2004-02-27 | 2005-02-25 | 光电子器件上的微光学元件 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7457490B2 (https=) |
| EP (2) | EP1569276A1 (https=) |
| JP (1) | JP4903685B2 (https=) |
| KR (1) | KR101194452B1 (https=) |
| CN (1) | CN1947254B (https=) |
| AT (1) | ATE498910T1 (https=) |
| DE (1) | DE602005026367D1 (https=) |
| TW (1) | TWI362058B (https=) |
| WO (1) | WO2005083789A2 (https=) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6297548B1 (en) | 1998-06-30 | 2001-10-02 | Micron Technology, Inc. | Stackable ceramic FBGA for high thermal applications |
| JP2009516913A (ja) * | 2005-11-22 | 2009-04-23 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 発光モジュール及びその製造方法 |
| JP2007258672A (ja) * | 2006-02-22 | 2007-10-04 | Sharp Corp | 発光ダイオード及びその製造方法 |
| JP4765663B2 (ja) * | 2006-02-23 | 2011-09-07 | パナソニック電工株式会社 | 赤外線通信用モジュールの製造方法 |
| US7785915B2 (en) * | 2006-10-30 | 2010-08-31 | Aptina Imaging Corporation | Wafer level method of locating focal plane of imager devices |
| US20080181558A1 (en) * | 2007-01-31 | 2008-07-31 | Hartwell Peter G | Electronic and optical circuit integration through wafer bonding |
| US7754600B2 (en) | 2007-03-01 | 2010-07-13 | Hewlett-Packard Development Company, L.P. | Methods of forming nanostructures on metal-silicide crystallites, and resulting structures and devices |
| US20090032925A1 (en) * | 2007-07-31 | 2009-02-05 | England Luke G | Packaging with a connection structure |
| US20100323105A1 (en) | 2007-08-31 | 2010-12-23 | Shigeru Hosoe | Molding method, optical element manufacturing method, and arrayed optical element |
| ES2347023T3 (es) * | 2007-11-13 | 2010-10-22 | Oy M. Haloila Ab | Dispositivo de suministro de pelicula y uso del mismo. |
| TWI478808B (zh) | 2007-12-19 | 2015-04-01 | Heptagon Micro Optics Pte Ltd | 製造光學元件的方法 |
| TWI481496B (zh) | 2007-12-19 | 2015-04-21 | Heptagon Micro Optics Pte Ltd | 製造光學元件的方法 |
| SG142321A1 (en) | 2008-04-24 | 2009-11-26 | Micron Technology Inc | Pre-encapsulated cavity interposer |
| GB2460822A (en) * | 2008-06-03 | 2009-12-16 | Cambridge Display Tech Ltd | Organic electroluminescent device |
| US7920342B2 (en) * | 2008-07-01 | 2011-04-05 | Aptina Imaging Corporation | Over-molded glass lenses and method of forming the same |
| US8542310B2 (en) | 2008-07-04 | 2013-09-24 | Konica Minolta Opto, Inc. | Imaging lens, manufacturing method and imaging unit therefor |
| CN101364568B (zh) * | 2008-07-10 | 2011-11-30 | 旭丽电子(广州)有限公司 | 镜头模块的制造方法及以该方法所制成的镜头模块 |
| TWI419557B (zh) * | 2008-07-11 | 2013-12-11 | Lite On Electronics Guangzhou | 鏡頭模組、其製作方法及形成多個鏡頭模組的晶圓結構 |
| WO2010020062A1 (en) | 2008-08-20 | 2010-02-25 | Heptagon Oy | Method of manufacturing a pluralty of optical devices |
| JP5715747B2 (ja) * | 2008-09-30 | 2015-05-13 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 回路装置およびその製造方法 |
| US20110187878A1 (en) * | 2010-02-02 | 2011-08-04 | Primesense Ltd. | Synchronization of projected illumination with rolling shutter of image sensor |
| WO2011156926A1 (en) | 2010-06-14 | 2011-12-22 | Heptagon Oy | Method of manufacturing a plurality of optical devices |
| CN103975436B (zh) | 2011-07-19 | 2019-05-10 | 新加坡恒立私人有限公司 | 制造无源光学器件和包含该无源光学器件的装置的方法 |
| SG193151A1 (en) | 2011-07-19 | 2013-09-30 | Heptagon Micro Optics Pte Ltd | Opto-electronic modules and methods of manufacturing the same and appliances and devices comprising the same |
| WO2013020238A1 (en) * | 2011-08-10 | 2013-02-14 | Heptagon Micro Optics Pte. Ltd. | Opto-electronic module and method for manufacturing the same |
| DE102011113483B4 (de) * | 2011-09-13 | 2023-10-19 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen einer Mehrzahl von optoelektronischen Bauelementen und optoelektronisches Bauelement |
| CN103959465B (zh) * | 2011-10-06 | 2019-06-07 | 新加坡恒立私人有限公司 | 用于物体的晶片级制造的方法以及相应的中间产品 |
| CN104106135B (zh) * | 2011-12-22 | 2018-02-23 | 新加坡恒立私人有限公司 | 光电模块、尤其是闪光灯模块及其制造方法 |
| JP5985661B2 (ja) | 2012-02-15 | 2016-09-06 | アップル インコーポレイテッド | 走査深度エンジン |
| US9329080B2 (en) | 2012-02-15 | 2016-05-03 | Aplle Inc. | Modular optics for scanning engine having beam combining optics with a prism intercepted by both beam axis and collection axis |
| US9634051B2 (en) | 2012-07-17 | 2017-04-25 | Heptagon Micro Optics Pte. Ltd. | Optical devices, in particular computational cameras, and methods for manufacturing the same |
| TW201417250A (zh) * | 2012-07-17 | 2014-05-01 | 海特根微光學公司 | 光學模組,特別是光電模組,及其製造方法 |
| TWI707483B (zh) | 2012-07-17 | 2020-10-11 | 新加坡商新加坡恒立私人有限公司 | 發射可變強度分布的光線的光電模組 |
| TWM448798U (zh) * | 2012-08-10 | 2013-03-11 | 麥瑟半導體股份有限公司 | 光學元件封裝模組 |
| DE102012109183A1 (de) * | 2012-09-27 | 2014-03-27 | Osram Opto Semiconductors Gmbh | Optoelektronische Vorrichtung |
| US8606057B1 (en) | 2012-11-02 | 2013-12-10 | Heptagon Micro Optics Pte. Ltd. | Opto-electronic modules including electrically conductive connections for integration with an electronic device |
| US10403671B2 (en) * | 2013-12-10 | 2019-09-03 | Ams Sensors Singapore Pte. Ltd. | Wafer-level optical modules and methods for manufacturing the same |
| WO2016068876A1 (en) | 2014-10-28 | 2016-05-06 | Hewlett Packard Enterprise Development Lp | Photonic interposer with wafer bonded microlenses |
| DE102014116134A1 (de) | 2014-11-05 | 2016-05-12 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines optoelektronischen Bauelements und optoelektronisches Bauelement |
| EP3243119A1 (de) | 2015-01-06 | 2017-11-15 | Huf Hülsbeck & Fürst GmbH & Co. KG | Optische vorrichtung zur belichtung einer sensorvorrichtung für ein fahrzeug |
| RU2713080C1 (ru) | 2015-10-01 | 2020-02-03 | Конинклейке Филипс Н.В. | Светоизлучающее устройство |
| DE102016103123A1 (de) * | 2016-02-23 | 2017-08-24 | Vishay Semiconductor Gmbh | Optoelektronische Vorrichtung |
| CN109155258B (zh) | 2016-04-08 | 2022-04-26 | 赫普塔冈微光有限公司 | 具有孔径的薄光电模块及其制造 |
| DE102017100997A1 (de) | 2017-01-19 | 2018-07-19 | Osram Opto Semiconductors Gmbh | Halbleiterlaser und Verfahren zur Herstellung eines solchen Halbleiterlasers |
| KR102698883B1 (ko) * | 2019-02-22 | 2024-08-28 | 삼성디스플레이 주식회사 | 표시장치 및 그의 제조방법 |
| CN113557126B (zh) * | 2019-03-12 | 2023-12-12 | ams传感器新加坡私人有限公司 | 制造多个光学元件的方法及其产品 |
| EP3986718B1 (en) | 2019-06-24 | 2026-01-28 | Magic Leap, Inc. | Polymer patterned disk stack manufacturing |
| US10777611B1 (en) * | 2019-09-27 | 2020-09-15 | Sony Semiconductor Solutions Corporation | Image sensor |
| US11747555B2 (en) | 2021-10-04 | 2023-09-05 | Eagle Technology, Llc | Optical assembly having commonly-shaped optical modules and associated methods |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1329357A (zh) * | 2000-06-08 | 2002-01-02 | 株式会社东芝 | 对准方法、套刻检查方法和光掩模 |
| EP1389804A2 (en) * | 2002-08-13 | 2004-02-18 | Agilent Technologies Inc. (a Delaware Corporation) | CMOS image sensor using gradient index chip scale lenses |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56103483A (en) * | 1980-01-21 | 1981-08-18 | Fuji Photo Film Co Ltd | Manufacture of semiconductor device for photoelectric conversion |
| JPH07111343A (ja) * | 1993-10-13 | 1995-04-25 | Matsushita Electron Corp | 光電装置 |
| US20020053742A1 (en) * | 1995-09-01 | 2002-05-09 | Fumio Hata | IC package and its assembly method |
| US6235141B1 (en) * | 1996-09-27 | 2001-05-22 | Digital Optics Corporation | Method of mass producing and packaging integrated optical subsystems |
| JPH11340480A (ja) | 1998-05-21 | 1999-12-10 | Tokai Rika Co Ltd | プラスティックパッケージ |
| US6436265B1 (en) | 1999-03-29 | 2002-08-20 | Canon Kabushiki Kaisha | Microstructure array, and apparatus and method for forming the microstructure array, and a mold for fabricating a microstructure array |
| JP2000275405A (ja) * | 1999-03-29 | 2000-10-06 | Canon Inc | マイクロ構造体アレイの作製方法、マイクロレンズアレイ用金型の作製方法、及びこれを用いたマイクロレンズアレイの作製方法 |
| US20040012698A1 (en) * | 2001-03-05 | 2004-01-22 | Yasuo Suda | Image pickup model and image pickup device |
| JP2002353763A (ja) * | 2001-05-29 | 2002-12-06 | Mitsubishi Electric Corp | 圧電素子デバイスの製造方法 |
| JP4167443B2 (ja) | 2002-01-30 | 2008-10-15 | 日本放送協会 | 固体撮像素子 |
| JP2004063751A (ja) | 2002-07-29 | 2004-02-26 | Fuji Photo Film Co Ltd | 固体撮像素子およびその製造方法 |
| GB0213722D0 (en) * | 2002-06-14 | 2002-07-24 | Suisse Electronique Microtech | Micro electrical mechanical systems |
| JP4241457B2 (ja) * | 2003-06-26 | 2009-03-18 | 富士ゼロックス株式会社 | レンズ付き発光素子の製造方法 |
-
2004
- 2004-02-27 EP EP04405110A patent/EP1569276A1/en not_active Withdrawn
-
2005
- 2005-02-24 TW TW094105676A patent/TWI362058B/zh not_active IP Right Cessation
- 2005-02-25 JP JP2007500029A patent/JP4903685B2/ja not_active Expired - Lifetime
- 2005-02-25 AT AT05706528T patent/ATE498910T1/de not_active IP Right Cessation
- 2005-02-25 WO PCT/CH2005/000109 patent/WO2005083789A2/en not_active Ceased
- 2005-02-25 CN CN2005800133746A patent/CN1947254B/zh not_active Expired - Lifetime
- 2005-02-25 KR KR1020067019870A patent/KR101194452B1/ko not_active Expired - Lifetime
- 2005-02-25 DE DE602005026367T patent/DE602005026367D1/de not_active Expired - Lifetime
- 2005-02-25 EP EP05706528A patent/EP1719178B1/en not_active Expired - Lifetime
-
2006
- 2006-08-23 US US11/466,640 patent/US7457490B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1329357A (zh) * | 2000-06-08 | 2002-01-02 | 株式会社东芝 | 对准方法、套刻检查方法和光掩模 |
| EP1389804A2 (en) * | 2002-08-13 | 2004-02-18 | Agilent Technologies Inc. (a Delaware Corporation) | CMOS image sensor using gradient index chip scale lenses |
Non-Patent Citations (5)
| Title |
|---|
| CN 1329357 A,全文. |
| Michael T Gale.Replication technology for micro-optics and opticalmicrosystems.Proceedings of SPIE 5177.2003,(5177),113-120. |
| Michael T Gale.Replication technology for micro-optics and opticalmicrosystems.Proceedings of SPIE 5177.2003,(5177),113-120. * |
| Peter Dannberg. et al..Wafer scale integration of micro-optic and optoelectronicelements by polymer UV reaction moulding.SPIE Conference on Photonics Packaging and Integration 3631.1999,(3631),244-251. |
| Peter Dannberg. et al..Wafer scale integration of micro-optic and optoelectronicelements by polymer UV reaction moulding.SPIE Conference on Photonics Packaging and Integration 3631.1999,(3631),244-251. * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1947254A (zh) | 2007-04-11 |
| DE602005026367D1 (de) | 2011-03-31 |
| US7457490B2 (en) | 2008-11-25 |
| EP1719178A2 (en) | 2006-11-08 |
| EP1719178B1 (en) | 2011-02-16 |
| WO2005083789A2 (en) | 2005-09-09 |
| JP4903685B2 (ja) | 2012-03-28 |
| EP1569276A1 (en) | 2005-08-31 |
| JP2007524243A (ja) | 2007-08-23 |
| TW200532761A (en) | 2005-10-01 |
| KR20070004774A (ko) | 2007-01-09 |
| WO2005083789A3 (en) | 2006-05-11 |
| ATE498910T1 (de) | 2011-03-15 |
| KR101194452B1 (ko) | 2012-10-24 |
| US20070009223A1 (en) | 2007-01-11 |
| TWI362058B (en) | 2012-04-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: HEPTAGON MICRO OPTICS PTE. LTD. Free format text: FORMER OWNER: HEPTAGON OY Effective date: 20120905 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20120905 Address after: Singapore Singapore Patentee after: HEPTAGON MICRO OPTICS Pte. Ltd. Address before: Espoo, Finland Patentee before: Heptagon OY |
|
| C56 | Change in the name or address of the patentee |
Owner name: SINGAPORE HENGLI PRIVATE LTD. Free format text: FORMER NAME: HEPTAGON MICRO OPTICS PTE. LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Singapore Singapore Patentee after: HEPTAGON MICRO OPTICS Pte. Ltd. Address before: Singapore Singapore Patentee before: HEPTAGON MICRO OPTICS Pte. Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20101229 |
|
| CX01 | Expiry of patent term |