CN1893116A - 薄膜晶体管板及其制造方法 - Google Patents
薄膜晶体管板及其制造方法 Download PDFInfo
- Publication number
- CN1893116A CN1893116A CNA2006100903263A CN200610090326A CN1893116A CN 1893116 A CN1893116 A CN 1893116A CN A2006100903263 A CNA2006100903263 A CN A2006100903263A CN 200610090326 A CN200610090326 A CN 200610090326A CN 1893116 A CN1893116 A CN 1893116A
- Authority
- CN
- China
- Prior art keywords
- insulating barrier
- grid insulating
- gate electrode
- light doping
- doping section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 36
- 239000010409 thin film Substances 0.000 title claims abstract description 20
- 239000010410 layer Substances 0.000 claims abstract description 176
- 230000004888 barrier function Effects 0.000 claims description 166
- 239000004065 semiconductor Substances 0.000 claims description 84
- 238000000034 method Methods 0.000 claims description 61
- 239000010408 film Substances 0.000 claims description 56
- 239000011229 interlayer Substances 0.000 claims description 54
- 238000005530 etching Methods 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 32
- 239000002184 metal Substances 0.000 claims description 32
- 229920002120 photoresistant polymer Polymers 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 26
- 239000012535 impurity Substances 0.000 claims description 25
- 239000011241 protective layer Substances 0.000 claims description 23
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 11
- 239000002131 composite material Substances 0.000 claims description 10
- 238000004070 electrodeposition Methods 0.000 claims description 6
- 239000003595 mist Substances 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 230000015556 catabolic process Effects 0.000 abstract description 2
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000002355 dual-layer Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 50
- 238000003860 storage Methods 0.000 description 33
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 15
- 229920005591 polysilicon Polymers 0.000 description 15
- 230000008569 process Effects 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 6
- 238000009413 insulation Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000007850 degeneration Effects 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910001182 Mo alloy Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005224 laser annealing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1255—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs integrated with passive devices, e.g. auxiliary capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42384—Gate electrodes for field effect devices for field-effect transistors with insulated gate for thin film field effect transistors, e.g. characterised by the thickness or the shape of the insulator or the dimensions, the shape or the lay-out of the conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
- H01L29/66757—Lateral single gate single channel transistors with non-inverted structure, i.e. the channel layer is formed before the gate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
Abstract
Description
Claims (27)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2005-0058437 | 2005-06-30 | ||
KR1020050058437 | 2005-06-30 | ||
KR1020050058444 | 2005-06-30 | ||
KR10-2005-0058444 | 2005-06-30 | ||
KR1020050058444A KR101172015B1 (ko) | 2005-06-30 | 2005-06-30 | 박막 트랜지스터 기판 및 그 제조 방법 |
KR1020050058437A KR101188868B1 (ko) | 2005-06-30 | 2005-06-30 | 박막 트랜지스터 기판 및 그 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1893116A true CN1893116A (zh) | 2007-01-10 |
CN1893116B CN1893116B (zh) | 2010-05-12 |
Family
ID=37597758
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006100903263A Expired - Fee Related CN1893116B (zh) | 2005-06-30 | 2006-06-29 | 薄膜晶体管板及其制造方法 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101188868B1 (zh) |
CN (1) | CN1893116B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102104049A (zh) * | 2009-12-04 | 2011-06-22 | 三星电子株式会社 | 薄膜晶体管阵列面板及其制造方法 |
CN102136427A (zh) * | 2010-12-24 | 2011-07-27 | 苏州华芯微电子股份有限公司 | 有效的实现低阈值电压mos器件的方法 |
CN107546231A (zh) * | 2016-06-23 | 2018-01-05 | 三星显示有限公司 | 薄膜晶体管阵列面板 |
CN110571226A (zh) * | 2019-09-05 | 2019-12-13 | 深圳市华星光电半导体显示技术有限公司 | 一种显示面板及其制备方法 |
CN110600517A (zh) * | 2019-09-16 | 2019-12-20 | 深圳市华星光电半导体显示技术有限公司 | 一种显示面板及其制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5821622A (en) * | 1993-03-12 | 1998-10-13 | Kabushiki Kaisha Toshiba | Liquid crystal display device |
JP3472024B2 (ja) * | 1996-02-26 | 2003-12-02 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2001168341A (ja) * | 1999-12-09 | 2001-06-22 | Sanyo Electric Co Ltd | 半導体装置及び半導体装置の活性化方法 |
KR101018752B1 (ko) * | 2003-12-19 | 2011-03-04 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 그의 제조 방법 |
-
2005
- 2005-06-30 KR KR1020050058437A patent/KR101188868B1/ko not_active IP Right Cessation
-
2006
- 2006-06-29 CN CN2006100903263A patent/CN1893116B/zh not_active Expired - Fee Related
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102104049A (zh) * | 2009-12-04 | 2011-06-22 | 三星电子株式会社 | 薄膜晶体管阵列面板及其制造方法 |
US8865528B2 (en) | 2009-12-04 | 2014-10-21 | Samsung Display Co., Ltd. | Thin film transistor substrate and the method thereof |
CN102104049B (zh) * | 2009-12-04 | 2015-02-25 | 三星显示有限公司 | 薄膜晶体管阵列面板及其制造方法 |
US9443881B2 (en) | 2009-12-04 | 2016-09-13 | Samsung Display Co., Ltd. | Thin film transistor substrate and the method thereof |
CN102136427A (zh) * | 2010-12-24 | 2011-07-27 | 苏州华芯微电子股份有限公司 | 有效的实现低阈值电压mos器件的方法 |
CN107546231A (zh) * | 2016-06-23 | 2018-01-05 | 三星显示有限公司 | 薄膜晶体管阵列面板 |
CN107546231B (zh) * | 2016-06-23 | 2023-08-04 | 三星显示有限公司 | 薄膜晶体管阵列面板 |
CN110571226A (zh) * | 2019-09-05 | 2019-12-13 | 深圳市华星光电半导体显示技术有限公司 | 一种显示面板及其制备方法 |
WO2021042500A1 (zh) * | 2019-09-05 | 2021-03-11 | 深圳市华星光电半导体显示技术有限公司 | 一种显示面板及其制备方法 |
US11309341B2 (en) | 2019-09-05 | 2022-04-19 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Display panel and method of fabricating same |
CN110600517A (zh) * | 2019-09-16 | 2019-12-20 | 深圳市华星光电半导体显示技术有限公司 | 一种显示面板及其制备方法 |
US11380718B2 (en) | 2019-09-16 | 2022-07-05 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Display panel and method of manufacturing same |
Also Published As
Publication number | Publication date |
---|---|
KR20070002771A (ko) | 2007-01-05 |
KR101188868B1 (ko) | 2012-10-09 |
CN1893116B (zh) | 2010-05-12 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD. Effective date: 20130104 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20130104 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Display Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electronics Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100512 Termination date: 20170629 |