CN1855570B - 半导体装置以及其制造方法 - Google Patents

半导体装置以及其制造方法 Download PDF

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Publication number
CN1855570B
CN1855570B CN2006100680532A CN200610068053A CN1855570B CN 1855570 B CN1855570 B CN 1855570B CN 2006100680532 A CN2006100680532 A CN 2006100680532A CN 200610068053 A CN200610068053 A CN 200610068053A CN 1855570 B CN1855570 B CN 1855570B
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semiconductor layer
organic semiconductor
layer
organic
semiconductor device
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Expired - Fee Related
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CN2006100680532A
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Chinese (zh)
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CN1855570A (zh
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古川忍
今林良太
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/484—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions
    • H10K10/486—Insulated gate field-effect transistors [IGFETs] characterised by the channel regions the channel region comprising two or more active layers, e.g. forming pn heterojunctions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/211—Fullerenes, e.g. C60
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/311—Phthalocyanine
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/649—Aromatic compounds comprising a hetero atom
    • H10K85/655—Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Thin Film Transistor (AREA)
  • Electroluminescent Light Sources (AREA)
CN2006100680532A 2005-03-24 2006-03-24 半导体装置以及其制造方法 Expired - Fee Related CN1855570B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005087133 2005-03-24
JP2005087133 2005-03-24
JP2005-087133 2005-03-24

Publications (2)

Publication Number Publication Date
CN1855570A CN1855570A (zh) 2006-11-01
CN1855570B true CN1855570B (zh) 2010-06-23

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US (3) US7671448B2 (enExample)
JP (1) JP4989907B2 (enExample)
KR (2) KR101240325B1 (enExample)
CN (1) CN1855570B (enExample)

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US7781801B2 (en) * 2006-09-25 2010-08-24 Alcatel-Lucent Usa Inc. Field-effect transistors whose gate electrodes are over semiconductor heterostructures and parts of source and drain electrodes
US7768000B2 (en) 2006-09-29 2010-08-03 Samsung Electronics Co., Ltd. Thin film transistor array panel and manufacturing method thereof
US20080134961A1 (en) * 2006-11-03 2008-06-12 Zhenan Bao Single-crystal organic semiconductor materials and approaches therefor
JP5084236B2 (ja) * 2006-11-30 2012-11-28 東京エレクトロン株式会社 デバイス製造装置およびデバイス製造方法
US8129714B2 (en) * 2007-02-16 2012-03-06 Idemitsu Kosan Co., Ltd. Semiconductor, semiconductor device, complementary transistor circuit device
GB2450381B (en) * 2007-06-22 2009-11-11 Cambridge Display Tech Ltd Organic thin film transistors
KR101270172B1 (ko) 2007-08-29 2013-05-31 삼성전자주식회사 산화물 박막 트랜지스터 및 그 제조 방법
JP5180723B2 (ja) * 2008-07-30 2013-04-10 出光興産株式会社 有機薄膜トランジスタ
JP2009081265A (ja) * 2007-09-26 2009-04-16 Idemitsu Kosan Co Ltd 有機薄膜トランジスタ
EP2194582A4 (en) * 2007-09-26 2012-01-04 Idemitsu Kosan Co ORGANIC THIN-LAYER TRANSISTOR
WO2009084078A1 (ja) * 2007-12-27 2009-07-09 Pioneer Corporation 有機半導体素子、有機太陽電池及び表示パネル
JP5636626B2 (ja) * 2007-12-27 2014-12-10 ソニー株式会社 半導体薄膜の形成方法および薄膜半導体装置の製造方法
WO2009084307A1 (ja) * 2007-12-27 2009-07-09 Sony Corporation 薄膜半導体装置および電界効果トランジスタ
FR2934716B1 (fr) * 2008-07-31 2010-09-10 Commissariat Energie Atomique Diode electroluminescente en materiau semiconducteur et son procede de fabrication
KR101638978B1 (ko) 2009-07-24 2016-07-13 삼성전자주식회사 박막 트랜지스터 및 그 제조방법
TW201117446A (en) * 2009-11-12 2011-05-16 Nat Univ Tsing Hua Method for forming organic layer of electronic device by contact printing
JP5651961B2 (ja) * 2010-02-03 2015-01-14 ソニー株式会社 薄膜トランジスタおよびその製造方法、ならびに電子機器
JP2012038924A (ja) * 2010-08-06 2012-02-23 Sony Corp 半導体装置、表示装置、および電子機器
CN102560632B (zh) * 2010-12-21 2016-06-29 长春富乐玻显示技术有限公司 用于非平面酞菁薄膜弱外延生长的固熔体诱导层
CN102723439A (zh) * 2011-03-29 2012-10-10 中国科学院微电子研究所 基于有机场效应晶体管的存储单元、存储器及其制备方法
JP6675193B2 (ja) * 2011-03-31 2020-04-01 ユー・ディー・シー アイルランド リミテッド 有機電界発光素子のホスト材料、有機電界発光素子、発光装置、表示装置、及び照明装置
CN102779942B (zh) * 2011-05-24 2015-11-25 京东方科技集团股份有限公司 一种有机薄膜晶体管阵列基板及其制作方法
JP2013080896A (ja) * 2011-09-22 2013-05-02 Sumitomo Chemical Co Ltd 複合基板の製造方法および複合基板
KR20130066247A (ko) * 2011-12-12 2013-06-20 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
TWI493765B (zh) 2012-08-07 2015-07-21 E Ink Holdings Inc 有機半導體元件及其製作方法
WO2014102625A1 (en) * 2012-12-24 2014-07-03 Indian Institute Of Technology Kanpur Thin film transistor with a current-induced channel
JP5990121B2 (ja) 2013-03-19 2016-09-07 富士フイルム株式会社 有機半導体素子の製造方法
JP6116018B2 (ja) * 2015-01-29 2017-04-19 国立大学法人 東京大学 有機半導体素子
CN104849336B (zh) * 2015-04-22 2018-01-19 电子科技大学 有机场效应晶体管气体传感器及其制备方法
KR102106732B1 (ko) * 2019-06-17 2020-05-06 연세대학교 산학협력단 유기 트랜지스터, 유기 커패시터, 유기 전자 소자의 제조 방법 및 유기 트랜지스터의 제조 방법

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Also Published As

Publication number Publication date
KR20060103241A (ko) 2006-09-28
US7671448B2 (en) 2010-03-02
JP2006303459A (ja) 2006-11-02
US20100136740A1 (en) 2010-06-03
US20110111555A1 (en) 2011-05-12
US8501530B2 (en) 2013-08-06
JP4989907B2 (ja) 2012-08-01
CN1855570A (zh) 2006-11-01
KR20110036900A (ko) 2011-04-12
US7875494B2 (en) 2011-01-25
KR101139716B1 (ko) 2012-04-26
US20060214160A1 (en) 2006-09-28
KR101240325B1 (ko) 2013-03-07

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