CN1839351A - 光掩模涂层 - Google Patents

光掩模涂层 Download PDF

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Publication number
CN1839351A
CN1839351A CNA2004800239943A CN200480023994A CN1839351A CN 1839351 A CN1839351 A CN 1839351A CN A2004800239943 A CNA2004800239943 A CN A2004800239943A CN 200480023994 A CN200480023994 A CN 200480023994A CN 1839351 A CN1839351 A CN 1839351A
Authority
CN
China
Prior art keywords
photomask
phosphine
phosphorus
acid esters
fluoridizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800239943A
Other languages
English (en)
Chinese (zh)
Inventor
卢道隆
马克·J·佩莱里特
理查德·M·弗林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN1839351A publication Critical patent/CN1839351A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Plasma & Fusion (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CNA2004800239943A 2003-08-21 2004-06-30 光掩模涂层 Pending CN1839351A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/645,020 US7189479B2 (en) 2003-08-21 2003-08-21 Phototool coating
US10/645,020 2003-08-21

Publications (1)

Publication Number Publication Date
CN1839351A true CN1839351A (zh) 2006-09-27

Family

ID=34194211

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800239943A Pending CN1839351A (zh) 2003-08-21 2004-06-30 光掩模涂层

Country Status (6)

Country Link
US (2) US7189479B2 (cg-RX-API-DMAC7.html)
EP (1) EP1656588A2 (cg-RX-API-DMAC7.html)
JP (1) JP2007503016A (cg-RX-API-DMAC7.html)
KR (1) KR20060080182A (cg-RX-API-DMAC7.html)
CN (1) CN1839351A (cg-RX-API-DMAC7.html)
WO (1) WO2005024520A2 (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107429086A (zh) * 2015-04-03 2017-12-01 莫克斯泰克公司 疏水性膦酸酯和硅烷化学物质
CN111766656A (zh) * 2015-04-03 2020-10-13 莫克斯泰克公司 线栅起偏器的氧化和水分屏障层
CN114326304A (zh) * 2021-12-30 2022-04-12 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶

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ATE346852T1 (de) * 2003-08-21 2006-12-15 3M Innovative Properties Co Perfluorpolyetheramidgebundene phosphonate, phosphate und derivate davon
CN101010632A (zh) * 2004-05-28 2007-08-01 奥布杜卡特公司 用于压印工艺中的改性金属模
EP1998833B1 (en) * 2006-03-24 2012-12-26 3M Innovative Properties Company Medicinal formulation container with a treated metal surface
US8337959B2 (en) * 2006-11-28 2012-12-25 Nanonex Corporation Method and apparatus to apply surface release coating for imprint mold
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
CN101952047A (zh) * 2007-12-31 2011-01-19 3M创新有限公司 施用可涂覆型材料的方法
EP2269116A4 (en) * 2008-03-11 2011-09-07 3M Innovative Properties Co PHOTOGRAPHIC MASKS HAVING PROTECTIVE LAYER
CN102015122A (zh) * 2008-03-26 2011-04-13 3M创新有限公司 坡流涂布两种或更多种流体的方法
JP5491492B2 (ja) * 2008-03-26 2014-05-14 スリーエム イノベイティブ プロパティズ カンパニー 複数ユニットポリマー前駆体を含有するスライド塗布液の方法
JP5519629B2 (ja) * 2008-03-26 2014-06-11 スリーエム イノベイティブ プロパティズ カンパニー ２種以上の流体をスライド塗布する方法
WO2010080353A2 (en) * 2008-12-18 2010-07-15 3M Innovative Properties Company Method of contacting hydrocarbon-bearing formations with fluorinated phosphate and phosphonate compositions
US9096712B2 (en) 2009-07-21 2015-08-04 3M Innovative Properties Company Curable compositions, method of coating a phototool, and coated phototool
KR101768237B1 (ko) 2009-09-16 2017-08-14 쓰리엠 이노베이티브 프로퍼티즈 컴파니 플루오르화된 코팅 및 그로 제조된 포토툴
CN102686642B (zh) 2009-09-16 2016-06-29 3M创新有限公司 氟化涂料和用其制作的底片
US8420281B2 (en) 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
JP5617239B2 (ja) * 2009-12-25 2014-11-05 富士通株式会社 保護膜付きレジストパターン形成用部材とその製造方法、及びレジストパターンの製造方法
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
US10108086B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
US10105883B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation Imprint lithography system and method for manufacturing
US10534120B2 (en) 2015-04-03 2020-01-14 Moxtek, Inc. Wire grid polarizer with protected wires
US9995864B2 (en) 2015-04-03 2018-06-12 Moxtek, Inc. Wire grid polarizer with silane protective coating
EP3410214B1 (en) * 2016-01-27 2025-07-30 LG Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
KR102126110B1 (ko) 2016-01-27 2020-06-24 주식회사 엘지화학 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴
JP7365086B1 (ja) 2023-04-04 2023-10-19 株式会社ハーベス パーフルオロポリエーテル基含有ホスホネート化合物、表面処理剤、及び該表面処理剤で処理された物品

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107429086A (zh) * 2015-04-03 2017-12-01 莫克斯泰克公司 疏水性膦酸酯和硅烷化学物质
CN111766656A (zh) * 2015-04-03 2020-10-13 莫克斯泰克公司 线栅起偏器的氧化和水分屏障层
CN114326304A (zh) * 2021-12-30 2022-04-12 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶
CN114326304B (zh) * 2021-12-30 2024-08-20 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶

Also Published As

Publication number Publication date
WO2005024520A3 (en) 2005-09-09
JP2007503016A (ja) 2007-02-15
US20050042553A1 (en) 2005-02-24
US7189479B2 (en) 2007-03-13
EP1656588A2 (en) 2006-05-17
WO2005024520A2 (en) 2005-03-17
KR20060080182A (ko) 2006-07-07
US20070128557A1 (en) 2007-06-07

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Effective date of abandoning: 20060927

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