CN1819255A - 基于微型发光二极管的高压交直流指示灯 - Google Patents
基于微型发光二极管的高压交直流指示灯 Download PDFInfo
- Publication number
- CN1819255A CN1819255A CNA2005100982576A CN200510098257A CN1819255A CN 1819255 A CN1819255 A CN 1819255A CN A2005100982576 A CNA2005100982576 A CN A2005100982576A CN 200510098257 A CN200510098257 A CN 200510098257A CN 1819255 A CN1819255 A CN 1819255A
- Authority
- CN
- China
- Prior art keywords
- high voltage
- indicator lamp
- lamp according
- micro
- led
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 239000004065 semiconductor Substances 0.000 claims description 36
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 229910002601 GaN Inorganic materials 0.000 claims description 13
- 238000005538 encapsulation Methods 0.000 claims description 11
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 9
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- AJGDITRVXRPLBY-UHFFFAOYSA-N aluminum indium Chemical compound [Al].[In] AJGDITRVXRPLBY-UHFFFAOYSA-N 0.000 claims description 8
- 230000004888 barrier function Effects 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 8
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 8
- 230000007704 transition Effects 0.000 claims description 7
- 239000011810 insulating material Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 239000004411 aluminium Substances 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229920001721 polyimide Polymers 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- FTWRSWRBSVXQPI-UHFFFAOYSA-N alumanylidynearsane;gallanylidynearsane Chemical compound [As]#[Al].[As]#[Ga] FTWRSWRBSVXQPI-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 description 8
- 238000009413 insulation Methods 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 6
- 230000003321 amplification Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 241000191291 Abies alba Species 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
- F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Led Devices (AREA)
Abstract
本发明公开了基于微型发光二极管阵列的交直流指示灯。该指示灯可由标准高电压交流或直流电源供电。指示灯的功率消耗低。微型发光二极管串联连接在衬底上,总的器件面积和功率消耗与标准直流低电压发光二极管相一致。多个指示灯可以并联连接形成指示灯串。
Description
技术领域
本发明涉及发光二极管(LED),尤其涉及包含有串联连接的微型尺寸的发光二极管(Micro-LEDs)的指示灯,指示灯中的这些微型发光二极管都集成在一个芯片上。这种结构的指示灯可以直接由交流电压(即110/120V或220/240V输电网)或直流高电压供电,不需要电源变压器。
背景技术
小型的发光二极管指示灯广泛应用于电子产品、电动玩具、布景装饰和显示屏中。这些以氮化铝镓铟(AlInGaN)或磷化铝镓铟(AlInGaP)为基础的标准或普通的发光二极管典型的芯片面积(或芯片尺寸)约为0.3mm×0.3mm。这些发光二极管指示灯通常的工作状态为直流电流20毫安。根据发光二极管使用的半导体材料的不同,相应的直流电压为2V至4V。T1或T1-3/4型封装的标准指示灯的最大输入功率大约可达0.1W。
虽然标准的发光二极管指示灯固有的低电压和直流电流特性,使得可以非常便利地将其加入到电子设计中,但它也会在其它应用中成为不方便的因素。例如,为了在圣诞树装饰中使用这些标准指示灯,发光二极管灯串必须采用各个发光二极管并联连接的方式,并且必须使用大容量的降压变压器和整流器转换模式。发光二极管灯串也可采用各个发光二极管指示灯的串联连接,此时发光二极管指示灯的数量多少则取决于交流电源的电压。在串联连接的灯串中,发光二极管指示灯的数量不能随意更改,而且如果其中一个灯出现故障引起断路,整个灯串都将不能工作。
标准尺寸的发光二极管阵列可以集成在同一个衬底上,使用120V交流电源供电,整个器件的尺寸约为1mm×1mm到2mm×2mm或更大。该器件工作电流约为20mA或更高,以获得高亮度,主要用于家庭照明等应用场合。这种交流发光二极管需要特殊的封装和散热模式,因为相对较大的芯片尺寸和高温生产工艺,使其不适应于低功耗指示灯的封装要求。这些大功率交流发光二极管不适于代替标准的小型发光二极管指示灯。
在美国专利6,410,940号中,公开了一种微型尺寸的发光二极管(micro-LED)阵列。它以点阵格式排列,主要使用在微型显示屏等应用场合;其阵列也可排列为平行格式,与标准大面积发光二极管相比较,可以强化光输出。基本上,这些微型发光二极管阵列仍然工作在直流低电压(几个伏特)条件下,典型的电流水平为几十个毫安。
单个的微型发光二极管的典型尺寸比标准发光二极管要小几百倍,而且其面积甚至小于标准发光二极管的接触面积。因此,器件的几何布置设计和制造工艺都极大地不同。适用于高压交直流应用场合的微型发光二极管阵列也与标准尺寸的发光二极管阵列不同。对微型尺寸的发光二极管阵列的需求仍然存在,这种发光二极管阵列通过标准高电压交直流电源供电,并可用于代替普通的直流低电压指示灯。
发明内容
本发明提供一种微型发光二极管阵列,串联连接,含有两个输出引线用于连接高压交直流电源。该阵列具有与普通发光二极管指示灯等同的总体芯片尺寸和功率消耗,因此这种微型发光二极管阵列可以直接在用于标准发光二极管指示灯的外壳中封装。其效果是具有与标准发光二极管指示灯相同或类似的外部物理特性的高电压交直流指示灯。根据详细设计的不同,高电压交直流指示灯的电源电压可为12V、24V、36V、48V或其它直流电压,也可以是类似于110/120V或220/240V的交流电压。
普通的发光二极管指示灯可以用串联连接的微型发光二极管阵列代替。该阵列的其中一个微型发光二极管的p触点(阳极)与相邻的微型发光二极管的n触点(阴极)相连,其效果是整个阵列的外加电压等于作用在每个微型发光二极管上的电压之和。例如,如果每个微型发光二极管的工作电压为3V,对于120V的电源电压,该阵列中应串联连接40个微型发光二极管。因为只有当阳极和阴极的压降为正电压时,二极管中才有电流和光发射。对于交流电源供电,以上的阵列只有在交流电源的正半周期才会有光发射。可以使用第二个阵列,与第一个阵列并联连接,但按照电流的反方向排列,这样在每个半周期都会有一个阵列发光。在这种模式下,考虑到绝缘和相互连接所需要的额外空间,可以使用包含有80个微型发光二极管、尺寸小于25μm×25μm的阵列代替尺寸为0.3mm×0.3mm的普通发光二极管。
微型发光二极管阵列可以集成在同一个衬底上。每个微型发光二极管之间的绝缘可以通过刻蚀沟槽到绝缘衬底上、或者刻蚀到夹在微型发光二极管结构与导电或绝缘的衬底之间的绝缘层上,以去除导电材料而实现。这个绝缘层可以外延性植在衬底上,应选择其合适的成份与厚度,使随后的微型发光二极管材料结构足够薄(例如,小于2.5μm),以保证简便地完成绝缘刻蚀沟槽和相邻微型发光二极管之间的金属导体连接。我们也提出了另外一种基于“旋压”聚合物或沉积绝缘体的表面平面化的方法来实现每个微型发光二极管之间的绝缘。
与标准直流发光二极管指示灯尺寸相当的集成微型发光二极管阵列,可以采用与标准指示灯相似的外壳和相似的功率消耗。因为输入电压要高得多,本发明中的指示灯的工作电流比标准指示灯要小得多。如果设计为120V交流电压,该指示灯可以直接在标准家庭用功率下工作。多个指示灯可以并联连接组成非常可靠性的发光二极管灯串。
附图说明
图1为实施例1所述的微型发光二极管交直流指示灯的放大剖面视图。
图2为实施例2微型发光二极管交直流指示灯的放大剖面视图。
图3为实施例3微型发光二极管的交直流指示灯的放大剖面视图。该指示灯建在导电衬底上,具有绝缘外延层和薄型发光二极管结构。
图4为微型发光二极管的交直流指示灯的封装放大剖面视图。
图5为并联型的微型发光二极管的交流灯串的图例。
具体实施方式
实施例1
如图1所示,数字10所指示的即为本发明中以氮化铝镓铟(AlInGaN)半导体材料为基础的微型发光二极管。微型发光二极管10可生长在绝缘蓝宝石衬底12上,并包含有过渡层14、n型半导体层16、活性区域层18和p型半导体层20。在120V交流电压的应用场合,每个微型发光二极管10的尺寸大约可为25μm×25μm或相似的尺寸,可以通过以下方法制备出来:首先在衬底12上生长出整片的过渡层14、n型半导体层16、活性区域层18和p型半导体层20,然后通过等离子体刻蚀方式,对过渡层14、n型半导体层16、活性区域层18和p型半导体层20进行刻蚀,直到绝缘衬底12上,从而形成多个相互独立的微型发光二极管10。p触点(阳极)22和n触点(阴极)24分别在p型半导体层20和n型半导体层16上成形。应用于标准大面积发光二极管中的电流散布层也可以应用在本发明的微型发光二极管中,但是由于本发明的微型发光二极管的尺寸极小,在本发明中的微型发光二极管中,应用于标准大面积发光二极管中的电流散布层也可以不需采用。
通过沉积不同的金属,然后在不同的温度和外部环境下进行退火热处理,形成阳极和阴极。例如,阳极可以由镍(Ni)和金(Au)金属层片,在含氧环境下退火成形;而阴极可以由钛(Ti)和铝(Al)金属层片,在含氮环境下退火成形。也可使用在p型半导体层20上大量掺杂的n+半导体层和p+半导体层组成的隧道PN结,以减少制造工序的步骤。在这种情况下,阳极和阴极的成形工序步骤相同,使用相同的钛(Ti)和铝(Al)金属层片,分别在n+和n半导体上形成。
相邻的微型发光二极管10之间的相互连接结构26可以有不同的方式。首选的连接结构26是通过以下方式实现:先把上述的刻蚀微过程中,在各型发光二极管之间形成的空隙用聚合物28填平,然后铺上金属。聚合物28对可见光是透明的,但可以被深紫外线(DUV)光子作用而被显影剂腐蚀。聚合物28可以通过“旋涂”的方法涂覆在微型发光二极管之间的空隙。然后采用深紫外线光刻蚀法,将聚合物28部分去除,而与p型触点22和n型触点24成一平面。再用热处理方法形成坚硬的聚酰亚胺膜(polyimide)。表面平整化后,连接结构26的金属沉积就很容易实施了。聚合物28还具有钝化微型发光二极管的表面和刻蚀侧壁的功能,以减少非辐射重组率,并提高器件的可靠性。如果选择高折射率的聚合物28,可以增强器件10的发光度。绝缘电介质材料,比如各种氧化物和氮化物材料,可以用作聚合物的替代材料。例如,二氧化硅或氮化硅厚膜可以沉积到微型发光二极管之间的深沟槽中,这些沟槽就会被填平,以形成表面。
实施例2
如图2所示,微型发光二极管30的制作过程没有上文所述的表面平整化步骤。各个微型发光二极管之间的隔离是通过使用准各向同性等离子体刻蚀的方法,刻蚀一个深至绝缘衬底12的沟槽31上来实现的。这样,在侧壁32就会有一个有一定倾斜角度的倾斜面,该倾斜角一般为40°到80°。沿着倾斜侧壁,沉积出一个绝缘电介质材料薄层34,然后在绝缘电介质材料薄层34上再覆盖连接金属线36。绝缘材料34可以是二氧化硅、氮化硅或其它绝缘体,它将金属线36与半导体侧壁32隔离,并钝化侧壁上的悬空键(dangling bonds)。倾斜侧壁32减少了微型发光二极管30的有效面积。但是,由于有了倾斜侧壁,绝缘材料34和连接金属线36可以在平面表面和侧壁上沉积出均匀的厚度;而且倾斜侧壁32加强了微型发光二极管30的发光度。因为通常半导体具有很大的折射率,产生的大部分光都被封闭在半导体内,形成定向波,无法逸出。有了倾斜侧壁的外形,定向光波就会有更多的机会从侧壁32没有被金属线36覆盖的区域逸出。由于在侧壁上只有很小的部分覆盖着连接金属线36,其结果是微型发光二极管30就会有更高的光效率。
实施例3
如图3所示,标记40所指的是本发明中以氮化铝镓铟(AlInGaN)半导体材料为基础的微型发光二极管。微型发光二极管40可以生长在不同的衬底42上,比如碳化硅(SiC)、硅(Si)、氮化镓(GaN)、氮化铝(AlN)、砷化镓(GaAs)、磷化铟(InP)和蓝宝石(Al2O3)等。没有典型的低温缓冲层,半导体的生成直接开始于高温生成的并具有高电阻率的氮化铝(AlN)。其它半导体也可以被采用,比如氮化铝镓(AlGaN)和氮化铝镓铟(AlInGaN)。这个绝缘层通过改变氮化铝镓(AlGaN)或氮化铝镓铟(AlInGaN)的合金成份,逐渐转变成n型氮化镓(GaN)半导体层44。接着生成活性层46,然后是p型半导体层48。此外,还包括隧道PN结,该隧道PN结由在p型半导体层48上由含有大量掺杂的n+半导体层和p+半导体层组成,这样阳极和阴极就可以在同一步骤中成形。
在不牺牲器件的最终性能的情况下,微型发光二极管的结构层44、46和48(不包括绝缘层)都很薄,比如说小于2.5μm,而不是通常大于5μm的厚度。这种薄型结构以及绝缘层42联合使用的好处是导电或半导电的衬底50,例如碳化硅(SiC)、硅(Si)、氮化镓(GaN)、砷化镓(GaAs)和磷化铟(InP),也可以用在高电压交直流指示灯40中。而且,隔离沟槽52只需用准各向同性的刻蚀方法来刻蚀到沉积绝缘层42上,因此沟槽深度很浅,并且带有斜坡,而且涂覆在侧壁上的连接金属线54和电介质隔离层56很容易成形,不需要复杂的工艺步骤。隔离层56可以是二氧化硅、氮化硅、其它氧化物、氮化物或聚酰亚胺等。
如图4所示,器件封装60可包括标准的3mm、5mm、10mm,或其它直径的透镜尺寸,分别为我们通常所说的T1、T1-3/4和T3-1/4封装。这些都是用于标准的发光二极管指示灯的封装。器件封装60包括环氧树脂透镜或穹顶62、微型发光二极管阵列64、反射镜杯66,引线接头68和70,以及两个金属引线72和74。封装60的散热是通过这两个薄金属引线72和74,因此具有较高的热阻和有限的散热能力。这种封装的最大输入功率约为0.1W,或者对于120V交流指示灯,其最大电流约小于1mA。考虑到标准的0.3mm×0.3mm发光二极管指示灯工作电流为20mA,电流密度为22A/cm2,每个面积为25μm×25μm的微型发光二极管的工作电流密度应为44A/cm2,或工作电流0.3mA。即使是考虑有两个微型发光二极管阵列64并联连接,导电方向相反,120V交流指示灯总的输入功率还是小于最大限值,可保证其可靠性,不会出现过热现象。
指示灯60发出的光波的波长依赖于在器件活性区域的半导体的能带隙能量。例如,如果氮化镓铟(InGaN)用于活性区域,通过改变氮化镓铟(InGaN)合金内铟(In)的成分来改变带隙能量,所发出的光波将涵盖紫外线(UV)、蓝色光和绿色光的波长范围。要生成白色光,可以使用磷光体转换颜色。例如,铝酸钇黄磷光体(Yttrium Aluminate yellow phosphor)可以吸收蓝色光,辐射黄色光。引线接合后,磷光体膏剂可填充在杯66内,然后是环氧树脂透镜或穹顶62封装。如果微型发光二极管阵列64发出蓝色光,与黄磷光体相结合,微型发光二极管阵列发出的蓝色光和磷光体发出的黄色光合并将产生出白色光。
表面安装的封装也可用于封装微型发光二极管阵列。而且,使用更大的封装容器,由不同半导体制成的几个红色、绿色和蓝色微型发光二极管阵列可以封装在同一个外壳中。红色、绿色和蓝色相混合,就成为一个高电压交直流白色光发射体。
交流指示灯60可以简单地直接连接110V/120V电源,用于指示和发信号。例如,几乎所有电力带动的机器或仪器,在电源开关旁边(或内部)都装有普通发光二极管,用以指示电源是否接通。这种标准指示发光二极管必须由直流低电压驱动。如果使用交流指示灯60代替普通发光二极管,就可以直接用110V/120V电源驱动,不需要任何附加电路。另外一个关于圣诞树装饰的例子,如图5所示,标记80所指的是一个并联的交流发光二极管灯串。因为每个灯60的工作电流约为1mA,对连接在灯串80中的指示灯数量几乎没有限制,而且灯串可以直接接入家庭用交流电源,不需要任何变压器或整流器。为安全起见,熔断器82可以与灯串80串联,在部分指示灯损坏而形成短路时,用作过电流保护。在这种情况下,可以去除短路的灯,并更换新的熔断器82就可以了。如果灯故障或接触不良引起断路,并联灯串80仍会正常工作,不需要更换。为避免电源电网中的电力冲击引起的损坏,可在电源端子间连接变阻器(图中未标示)。如果出现电力冲击,变阻器就会触发,从旁路通过冲击电流,以保护指示灯60。
虽然氮化铝镓铟(AlInGaN)半导体发射体是作为本发明中说明的例子,应该理解基于其它半导体材料如砷化镓(GaAs)和磷化铟(InP)的交直流光发射器件同样也是可以构建的。取决于半导体材料的带隙能量,微型发光二极管可以发出红色、蓝色、绿色、黄色或白色光。白色光可以通过混合红色、蓝色和绿色光获得,或通过磷光体转换波长获得。
应该理解虽然阐述和说明了本发明的一种形式,我们只对已包括在下面的权利要求中的内容采取限制。
Claims (25)
1.高压交直流指示灯包括:
串联连接的微型发光二极管阵列,具有一定的电流方向和正负极端子,上述每个微型发光二极管在p型半导体和n型半导体之间具有一个活性区域;
所述串联连接的微型发光二极管阵列生长在衬底上;
所述端子用于与电源连接,给上述串联连接的微型发光二极管阵列供电。
2.权利要求1所述的高压交直流指示灯,其特征在于:所述的电源可以从下面的集合中选择:12V直流、24V直流、36V直流、48V直流、110V交流、120V交流、220V交流和240V交流电源。
3.根据权利要求1所述的高压交直流指示灯,其特征在于:还包括在上述p型半导体层上由大量掺杂的n+半导体层和p+半导体层组成的隧道PN结。
4.根据权利要求1所述的高压交直流指示灯,其特征在于:所述的微型发光二极管通过刻蚀沟槽相互隔离,上述沟槽中由聚合物、氧化物、氮化物或其它绝缘材料填平,形成一平面。
5.根据权利要求1所述的高压交直流指示灯,其特征在于:所述微型发光二极管包括刻蚀沟槽和侧壁,所述的侧壁用绝缘材料覆盖。
6.根据权利要求5所述的高压交直流指示灯,其特征在于:所述的绝缘材料是二氧化硅、氮化硅、其它氧化物、氮化物或聚酰亚胺。
7.根据权利要求5所述的高压交直流指示灯,其特征在于:所述的侧壁为一斜面,以加强发光度以及绝缘材料和连接金属线的保形沉积。
8.根据权利要求1所述的高压交直流指示灯,其特征在于:还包括一个串联连接的微型发光二极管次级阵列,生长在上述衬底上,与上述串联连接的微型发光二极管阵列以串联方式连接或并联方式连接。
9.根据权利要求1所述的高压交直流指示灯,其特征在于:所述衬底为绝缘衬底,衬底材料从以下选择:蓝宝石(Al2O3)、氮化铝(AlN)、碳化硅(SiC)、硅(Si)、氮化镓(GaN)、砷化镓(GaAs)或磷化铟(InP)。
10.根据权利要求1所述的高压交直流指示灯,其特征在于:所述的衬底为导电或半导电衬底,该衬底材料选自碳化硅(SiC)、硅(Si)、氮化镓(GaN)、砷化镓(GaAs)或磷化铟(InP)。
11.根据权利要求1所述的高压交直流指示灯,其特征在于:在所述的衬底和n型半导体之间还设置有一绝缘层。
12.根据权利要求11所述的高压交直流指示灯,其特征在于:所述的绝缘层材料选自氮化铝(AlN)、氮化铝镓(AlGaN)、或氮化铝镓铟(AlInGaN)。
13.根据权利要求11所述的高压交直流指示灯,其特征在于:在所述的绝缘层与衬底之间的还有一过渡层。
14.根据权利要求13所述的高压交直流指示灯,其特征在于:所述的过渡层厚度为0~10μm。
15.根据权利要求1所述的高压交直流指示灯,其特征在于:在所述的绝缘层与n型半导体之间有一过渡层。
16.根据权利要求15所述的高压交直流指示灯,其特征在于:所述的过渡层厚度为0~10μm。
17.根据权利要求1所述的高压交直流指示灯,其特征在于:所述的微型发光二极管采用的半导体材料是氮化铝镓铟(AlInGaN)、磷化铝镓铟(AlInGaP)或铝砷化镓(AlGaAs)。
18.根据权利要求1所述的高压交直流指示灯,其特征在于:还包括用于封装所述阵列的外壳。
19.根据权利要求18所述的高压交直流指示灯,其特征在于:所述的封装外壳是T1、T1-3/4或T3-1/4封装外壳。
20.根据权利要求19所述的高压交直流指示灯,其特征在于:还包括多个并联连接的所述的指示灯。
21.根据权利要求20所述的高压交直流指示灯,其特征在于:所述的指示灯发出相同或不同的颜色。
22.根据权利要求18所述的高压交直流指示灯,其特征在于:所述的封装为表面安装式封装。
23.根据权利要求1所述的高压交直流指示灯,其特征在于:所述的微型发光二极管阵列通过磷光体转换波长,以发出白色光。
24.根据权利要求1所述的高压交直流指示灯,其特征在于:所述的微型发光二极管阵列通过混合红色、蓝色和绿色光,以发出白色光。
25.根据权利要求1所述的高压交直流指示灯,其特征在于:所述的微型发光二极管阵列的芯片尺寸小于1mm×1mm。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US64982705P | 2005-02-03 | 2005-02-03 | |
US60/649,827 | 2005-02-03 | ||
US11/102,273 | 2005-04-08 | ||
US11/102,273 US7535028B2 (en) | 2005-02-03 | 2005-04-08 | Micro-LED based high voltage AC/DC indicator lamp |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1819255A true CN1819255A (zh) | 2006-08-16 |
CN1819255B CN1819255B (zh) | 2010-06-02 |
Family
ID=36755582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005100982576A Active CN1819255B (zh) | 2005-02-03 | 2005-09-05 | 基于微型发光二极管的高压交直流指示灯 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7535028B2 (zh) |
CN (1) | CN1819255B (zh) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008052459A1 (en) * | 2006-10-30 | 2008-05-08 | Hong Kong Applied Science and Technology Research Institute Co. Ltd | Light emitting diode matrix |
US7525246B2 (en) | 2006-08-16 | 2009-04-28 | Industrial Technology Research Institute | Alternating current light-emitting device |
CN102148322A (zh) * | 2010-02-08 | 2011-08-10 | Lg伊诺特有限公司 | 发光器件和具有发光器件的发光器件封装 |
CN102270727A (zh) * | 2010-06-07 | 2011-12-07 | 株式会社东芝 | 半导体发光装置及其制造方法 |
CN102368516A (zh) * | 2011-10-10 | 2012-03-07 | 映瑞光电科技(上海)有限公司 | 高压led器件及其制造方法 |
CN102468318A (zh) * | 2010-11-04 | 2012-05-23 | 上海蓝光科技有限公司 | 一种高压直流发光二极管芯片结构及其制造方法 |
CN102723415A (zh) * | 2012-06-25 | 2012-10-10 | 钟伟荣 | 一种倒装型高压交/直流发光二极管及其制作方法 |
CN102983147A (zh) * | 2012-09-24 | 2013-03-20 | 杭州士兰明芯科技有限公司 | 一种发光二极管芯片及其制造方法 |
CN103022276A (zh) * | 2011-09-26 | 2013-04-03 | 比亚迪股份有限公司 | 一种ac led芯片的制备方法 |
CN103187494A (zh) * | 2013-03-21 | 2013-07-03 | 中国科学院半导体研究所 | 高压发光二极管芯片及其制造方法 |
CN103208503A (zh) * | 2012-01-13 | 2013-07-17 | 华夏光股份有限公司 | 发光二极管数组及其制造方法 |
CN103730479A (zh) * | 2013-11-29 | 2014-04-16 | 南京大学扬州光电研究院 | 一种多发光子区GaN基LED集成芯片 |
CN103855180A (zh) * | 2012-12-06 | 2014-06-11 | Lg伊诺特有限公司 | 发光器件 |
CN104409605A (zh) * | 2014-11-28 | 2015-03-11 | 杭州士兰明芯科技有限公司 | 一种高压芯片led结构及其制作方法 |
CN104737310A (zh) * | 2012-10-15 | 2015-06-24 | 首尔伟傲世有限公司 | 半导体装置及其制造方法 |
CN104766914A (zh) * | 2015-04-20 | 2015-07-08 | 电子科技大学 | 一种高取光率的高压led芯片结构 |
CN106783818A (zh) * | 2016-12-20 | 2017-05-31 | 复旦大学 | 基于低功耗微米led的可视化光电标签及其制备方法 |
CN108630720A (zh) * | 2012-09-06 | 2018-10-09 | 晶元光电股份有限公司 | 发光二极管阵列 |
CN110071198A (zh) * | 2019-04-17 | 2019-07-30 | 深圳市华星光电半导体显示技术有限公司 | 一种发光元件及其制作方法、阵列基板 |
CN110088919A (zh) * | 2018-05-04 | 2019-08-02 | 厦门三安光电有限公司 | 发光元件、发光元件阵列及其发光装置 |
WO2020001636A1 (en) * | 2018-06-30 | 2020-01-02 | Jin Wei | Semiconductor device, semiconductor apparatus and method of manufacturing the same |
US10607961B2 (en) | 2011-11-18 | 2020-03-31 | Apple Inc. | Micro device transfer head heater assembly and method of transferring a micro device |
Families Citing this family (135)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6957899B2 (en) * | 2002-10-24 | 2005-10-25 | Hongxing Jiang | Light emitting diodes for high AC voltage operation and general lighting |
US7213942B2 (en) * | 2002-10-24 | 2007-05-08 | Ac Led Lighting, L.L.C. | Light emitting diodes for high AC voltage operation and general lighting |
US10499465B2 (en) | 2004-02-25 | 2019-12-03 | Lynk Labs, Inc. | High frequency multi-voltage and multi-brightness LED lighting devices and systems and methods of using same |
JP3802910B2 (ja) * | 2004-09-13 | 2006-08-02 | ローム株式会社 | 半導体発光装置 |
US7723736B2 (en) * | 2004-12-14 | 2010-05-25 | Seoul Opto Device Co., Ltd. | Light emitting device having a plurality of light emitting cells and package mounting the same |
US7525248B1 (en) | 2005-01-26 | 2009-04-28 | Ac Led Lighting, L.L.C. | Light emitting diode lamp |
WO2006095949A1 (en) * | 2005-03-11 | 2006-09-14 | Seoul Semiconductor Co., Ltd. | Led package having an array of light emitting cells coupled in series |
US8272757B1 (en) | 2005-06-03 | 2012-09-25 | Ac Led Lighting, L.L.C. | Light emitting diode lamp capable of high AC/DC voltage operation |
WO2006137711A1 (en) * | 2005-06-22 | 2006-12-28 | Seoul Opto-Device Co., Ltd. | Light emitting device and method of manufacturing the same |
KR100599012B1 (ko) * | 2005-06-29 | 2006-07-12 | 서울옵토디바이스주식회사 | 열전도성 기판을 갖는 발광 다이오드 및 그것을 제조하는방법 |
WO2007081092A1 (en) | 2006-01-09 | 2007-07-19 | Seoul Opto Device Co., Ltd. | Del à couche d'ito et son procédé de fabrication |
US7994514B2 (en) * | 2006-04-21 | 2011-08-09 | Koninklijke Philips Electronics N.V. | Semiconductor light emitting device with integrated electronic components |
JP2007305708A (ja) * | 2006-05-10 | 2007-11-22 | Rohm Co Ltd | 半導体発光素子アレイおよびこれを用いた照明用器具 |
US8350279B2 (en) * | 2006-09-25 | 2013-01-08 | Seoul Opto Device Co., Ltd. | Light emitting diode having AlInGaP active layer and method of fabricating the same |
US9111950B2 (en) * | 2006-09-28 | 2015-08-18 | Philips Lumileds Lighting Company, Llc | Process for preparing a semiconductor structure for mounting |
US7714348B2 (en) * | 2006-10-06 | 2010-05-11 | Ac-Led Lighting, L.L.C. | AC/DC light emitting diodes with integrated protection mechanism |
US8242484B2 (en) * | 2006-10-18 | 2012-08-14 | Nitek, Inc. | Vertical deep ultraviolet light emitting diodes |
US8680551B1 (en) | 2006-10-18 | 2014-03-25 | Nitek, Inc. | High power ultraviolet light sources and method of fabricating the same |
TWI371870B (en) * | 2006-11-08 | 2012-09-01 | Epistar Corp | Alternate current light-emitting device and fabrication method thereof |
WO2008075797A1 (en) * | 2006-12-18 | 2008-06-26 | Seoul Opto Device Co., Ltd. | Light emitting device having isolating insulative layer for isolating light emitting cells from each other and method of fabricating the same |
US7687816B2 (en) * | 2007-03-20 | 2010-03-30 | International Business Machines Corporation | Light emitting diode |
US20080303033A1 (en) * | 2007-06-05 | 2008-12-11 | Cree, Inc. | Formation of nitride-based optoelectronic and electronic device structures on lattice-matched substrates |
JP2009071220A (ja) * | 2007-09-18 | 2009-04-02 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子 |
US10986714B2 (en) | 2007-10-06 | 2021-04-20 | Lynk Labs, Inc. | Lighting system having two or more LED packages having a specified separation distance |
US9157167B1 (en) | 2008-06-05 | 2015-10-13 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
US8097081B2 (en) | 2008-06-05 | 2012-01-17 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
US8871024B2 (en) | 2008-06-05 | 2014-10-28 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
US10036099B2 (en) | 2008-08-07 | 2018-07-31 | Slt Technologies, Inc. | Process for large-scale ammonothermal manufacturing of gallium nitride boules |
US8021481B2 (en) | 2008-08-07 | 2011-09-20 | Soraa, Inc. | Process and apparatus for large-scale manufacturing of bulk monocrystalline gallium-containing nitride |
US8430958B2 (en) | 2008-08-07 | 2013-04-30 | Soraa, Inc. | Apparatus and method for seed crystal utilization in large-scale manufacturing of gallium nitride |
US8979999B2 (en) | 2008-08-07 | 2015-03-17 | Soraa, Inc. | Process for large-scale ammonothermal manufacturing of gallium nitride boules |
US7976630B2 (en) | 2008-09-11 | 2011-07-12 | Soraa, Inc. | Large-area seed for ammonothermal growth of bulk gallium nitride and method of manufacture |
US8354679B1 (en) | 2008-10-02 | 2013-01-15 | Soraa, Inc. | Microcavity light emitting diode method of manufacture |
KR100999689B1 (ko) * | 2008-10-17 | 2010-12-08 | 엘지이노텍 주식회사 | 반도체 발광소자 및 그 제조방법, 이를 구비한 발광장치 |
US8455894B1 (en) | 2008-10-17 | 2013-06-04 | Soraa, Inc. | Photonic-crystal light emitting diode and method of manufacture |
USRE47114E1 (en) | 2008-12-12 | 2018-11-06 | Slt Technologies, Inc. | Polycrystalline group III metal nitride with getter and method of making |
US8461071B2 (en) | 2008-12-12 | 2013-06-11 | Soraa, Inc. | Polycrystalline group III metal nitride with getter and method of making |
US8987156B2 (en) | 2008-12-12 | 2015-03-24 | Soraa, Inc. | Polycrystalline group III metal nitride with getter and method of making |
US9543392B1 (en) | 2008-12-12 | 2017-01-10 | Soraa, Inc. | Transparent group III metal nitride and method of manufacture |
US8878230B2 (en) | 2010-03-11 | 2014-11-04 | Soraa, Inc. | Semi-insulating group III metal nitride and method of manufacture |
KR20100076083A (ko) * | 2008-12-17 | 2010-07-06 | 서울반도체 주식회사 | 복수개의 발광셀들을 갖는 발광 다이오드 및 그것을 제조하는 방법 |
TWI473246B (zh) * | 2008-12-30 | 2015-02-11 | Epistar Corp | 發光二極體晶粒等級封裝 |
TWI466266B (zh) * | 2009-02-24 | 2014-12-21 | Epistar Corp | 陣列式發光元件及其裝置 |
US8247886B1 (en) | 2009-03-09 | 2012-08-21 | Soraa, Inc. | Polarization direction of optical devices using selected spatial configurations |
US8299473B1 (en) | 2009-04-07 | 2012-10-30 | Soraa, Inc. | Polarized white light devices using non-polar or semipolar gallium containing materials and transparent phosphors |
US8791499B1 (en) | 2009-05-27 | 2014-07-29 | Soraa, Inc. | GaN containing optical devices and method with ESD stability |
FR2949278B1 (fr) | 2009-08-18 | 2012-11-02 | Commissariat Energie Atomique | Procede de fabrication d'un dispositif d'emission de lumiere a base de diodes electroluminescentes |
US9000466B1 (en) | 2010-08-23 | 2015-04-07 | Soraa, Inc. | Methods and devices for light extraction from a group III-nitride volumetric LED using surface and sidewall roughening |
DE102009039891A1 (de) * | 2009-09-03 | 2011-03-10 | Osram Opto Semiconductors Gmbh | Optoelektronisches Modul aufweisend zumindest einen ersten Halbleiterkörper mit einer Strahlungsaustrittsseite und einer Isolationsschicht und Verfahren zu dessen Herstellung |
US9583678B2 (en) | 2009-09-18 | 2017-02-28 | Soraa, Inc. | High-performance LED fabrication |
US8933644B2 (en) | 2009-09-18 | 2015-01-13 | Soraa, Inc. | LED lamps with improved quality of light |
US9293644B2 (en) | 2009-09-18 | 2016-03-22 | Soraa, Inc. | Power light emitting diode and method with uniform current density operation |
WO2011035265A1 (en) | 2009-09-18 | 2011-03-24 | Soraa, Inc. | Power light emitting diode and method with current density operation |
US8435347B2 (en) | 2009-09-29 | 2013-05-07 | Soraa, Inc. | High pressure apparatus with stackable rings |
US9175418B2 (en) | 2009-10-09 | 2015-11-03 | Soraa, Inc. | Method for synthesis of high quality large area bulk gallium based crystals |
US8963178B2 (en) | 2009-11-13 | 2015-02-24 | Seoul Viosys Co., Ltd. | Light emitting diode chip having distributed bragg reflector and method of fabricating the same |
KR20110056866A (ko) * | 2009-11-23 | 2011-05-31 | 삼성전자주식회사 | 질화물 발광소자 및 그 제조방법 |
TW201132222A (en) | 2009-12-28 | 2011-09-16 | Lynk Labs Inc | High frequency multi-voltage and multi-brightness LED lighting devices and systems and methods of using same |
US8905588B2 (en) | 2010-02-03 | 2014-12-09 | Sorra, Inc. | System and method for providing color light sources in proximity to predetermined wavelength conversion structures |
US8740413B1 (en) | 2010-02-03 | 2014-06-03 | Soraa, Inc. | System and method for providing color light sources in proximity to predetermined wavelength conversion structures |
US10147850B1 (en) | 2010-02-03 | 2018-12-04 | Soraa, Inc. | System and method for providing color light sources in proximity to predetermined wavelength conversion structures |
EP2367203A1 (en) * | 2010-02-26 | 2011-09-21 | Samsung LED Co., Ltd. | Semiconductor light emitting device having multi-cell array and method for manufacturing the same |
JP4814394B2 (ja) | 2010-03-05 | 2011-11-16 | シャープ株式会社 | 発光装置の製造方法 |
US8193546B2 (en) * | 2010-06-04 | 2012-06-05 | Pinecone Energies, Inc. | Light-emitting-diode array with polymer between light emitting devices |
JP5343040B2 (ja) * | 2010-06-07 | 2013-11-13 | 株式会社東芝 | 半導体発光装置 |
US8471282B2 (en) | 2010-06-07 | 2013-06-25 | Koninklijke Philips Electronics N.V. | Passivation for a semiconductor light emitting device |
US9450143B2 (en) | 2010-06-18 | 2016-09-20 | Soraa, Inc. | Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices |
US9564320B2 (en) | 2010-06-18 | 2017-02-07 | Soraa, Inc. | Large area nitride crystal and method for making it |
US20120007102A1 (en) * | 2010-07-08 | 2012-01-12 | Soraa, Inc. | High Voltage Device and Method for Optical Devices |
JP2012028749A (ja) * | 2010-07-22 | 2012-02-09 | Seoul Opto Devices Co Ltd | 発光ダイオード |
PT2535640E (pt) | 2010-09-08 | 2015-02-27 | Zhejiang Ledison Optoelectronics Co Ltd | Lâmpada de led e barra de iluminação de led capazes de emitirem uma luz superior a 4 pi |
FR2975532B1 (fr) | 2011-05-18 | 2013-05-10 | Commissariat Energie Atomique | Connexion electrique en serie de nanofils emetteurs de lumiere |
US9070851B2 (en) | 2010-09-24 | 2015-06-30 | Seoul Semiconductor Co., Ltd. | Wafer-level light emitting diode package and method of fabricating the same |
US8729559B2 (en) | 2010-10-13 | 2014-05-20 | Soraa, Inc. | Method of making bulk InGaN substrates and devices thereon |
US8193015B2 (en) * | 2010-11-17 | 2012-06-05 | Pinecone Energies, Inc. | Method of forming a light-emitting-diode array with polymer between light emitting devices |
US8530909B2 (en) | 2010-12-27 | 2013-09-10 | Micron Technology, Inc. | Array assemblies with high voltage solid state lighting dies |
US8786053B2 (en) | 2011-01-24 | 2014-07-22 | Soraa, Inc. | Gallium-nitride-on-handle substrate materials and devices and method of manufacture |
US8536594B2 (en) * | 2011-01-28 | 2013-09-17 | Micron Technology, Inc. | Solid state lighting devices with reduced dimensions and methods of manufacturing |
TW201234574A (en) * | 2011-02-01 | 2012-08-16 | Pinecone En Inc | Light-emitting-diode array and manufacturing method thereof |
KR101209163B1 (ko) * | 2011-04-19 | 2012-12-06 | 주식회사 세미콘라이트 | 반도체 발광소자 |
CN102194808B (zh) * | 2011-05-10 | 2013-04-10 | 江西科技师范学院 | 功率型电极上下设置的led集成封装器件及其封装方法 |
TWI438932B (zh) * | 2011-05-27 | 2014-05-21 | Nat Univ Tsing Hua | 準直性發光元件與其製造方法 |
US8492185B1 (en) | 2011-07-14 | 2013-07-23 | Soraa, Inc. | Large area nonpolar or semipolar gallium and nitrogen containing substrate and resulting devices |
CN102231421B (zh) * | 2011-07-15 | 2013-01-23 | 中国科学院半导体研究所 | 发光二极管封装结构的制作方法 |
CN102903804B (zh) * | 2011-07-25 | 2015-12-16 | 财团法人工业技术研究院 | 发光元件的转移方法以及发光元件阵列 |
US9299742B2 (en) | 2011-08-15 | 2016-03-29 | Micron Technology, Inc. | High-voltage solid-state transducers and associated systems and methods |
US8686431B2 (en) | 2011-08-22 | 2014-04-01 | Soraa, Inc. | Gallium and nitrogen containing trilateral configuration for optical devices |
US9331252B2 (en) | 2011-08-23 | 2016-05-03 | Micron Technology, Inc. | Wavelength converters, including polarization-enhanced carrier capture converters, for solid state lighting devices, and associated systems and methods |
US9694158B2 (en) | 2011-10-21 | 2017-07-04 | Ahmad Mohamad Slim | Torque for incrementally advancing a catheter during right heart catheterization |
US10029955B1 (en) | 2011-10-24 | 2018-07-24 | Slt Technologies, Inc. | Capsule for high pressure, high temperature processing of materials and methods of use |
US8912025B2 (en) | 2011-11-23 | 2014-12-16 | Soraa, Inc. | Method for manufacture of bright GaN LEDs using a selective removal process |
WO2013097132A1 (en) * | 2011-12-29 | 2013-07-04 | GE Lighting Solutions, LLC | Light emitting diode lamp |
US8482104B2 (en) | 2012-01-09 | 2013-07-09 | Soraa, Inc. | Method for growth of indium-containing nitride films |
EP2823515A4 (en) | 2012-03-06 | 2015-08-19 | Soraa Inc | LIGHT-EMITTING DIODES WITH MATERIAL LAYERS WITH LOW BREAKING INDEX TO REDUCE LIGHT PIPE EFFECTS |
TWI575722B (zh) * | 2012-03-12 | 2017-03-21 | 晶元光電股份有限公司 | 發光二極體元件 |
TWI549278B (zh) * | 2012-03-12 | 2016-09-11 | 晶元光電股份有限公司 | 發光二極體元件 |
KR20130109319A (ko) * | 2012-03-27 | 2013-10-08 | 삼성전자주식회사 | 반도체 발광장치, 발광모듈 및 조명장치 |
TW201347141A (zh) * | 2012-05-04 | 2013-11-16 | Chi Mei Lighting Tech Corp | 發光二極體結構及其製造方法 |
CN103700682A (zh) * | 2012-05-04 | 2014-04-02 | 奇力光电科技股份有限公司 | 发光二极管结构及其制造方法 |
US8933433B2 (en) | 2012-07-30 | 2015-01-13 | LuxVue Technology Corporation | Method and structure for receiving a micro device |
US8971368B1 (en) | 2012-08-16 | 2015-03-03 | Soraa Laser Diode, Inc. | Laser devices having a gallium and nitrogen containing semipolar surface orientation |
US9171826B2 (en) | 2012-09-04 | 2015-10-27 | Micron Technology, Inc. | High voltage solid-state transducers and solid-state transducer arrays having electrical cross-connections and associated systems and methods |
US9978904B2 (en) | 2012-10-16 | 2018-05-22 | Soraa, Inc. | Indium gallium nitride light emitting devices |
US8558254B1 (en) | 2012-11-29 | 2013-10-15 | Hong Kong Applied Science and Technology Research Institute Company Limited | High reliability high voltage vertical LED arrays |
ITBA20120076A1 (it) * | 2012-11-30 | 2014-05-31 | Haisenlux Srl | Illuminazione stradale led al alta potenza (superiore ai 38w) realizzato con microled con corrente inferiore a 60ma per illuminazione stradale. |
US9159700B2 (en) | 2012-12-10 | 2015-10-13 | LuxVue Technology Corporation | Active matrix emissive micro LED display |
US9029880B2 (en) | 2012-12-10 | 2015-05-12 | LuxVue Technology Corporation | Active matrix display panel with ground tie lines |
US9178123B2 (en) | 2012-12-10 | 2015-11-03 | LuxVue Technology Corporation | Light emitting device reflective bank structure |
US8802471B1 (en) | 2012-12-21 | 2014-08-12 | Soraa, Inc. | Contacts for an n-type gallium and nitrogen substrate for optical devices |
US9252375B2 (en) * | 2013-03-15 | 2016-02-02 | LuxVue Technology Corporation | Method of fabricating a light emitting diode display with integrated defect detection test |
US9484504B2 (en) * | 2013-05-14 | 2016-11-01 | Apple Inc. | Micro LED with wavelength conversion layer |
ES2952036T3 (es) | 2013-06-12 | 2023-10-26 | Rohinni Inc | Teclado de retroiluminación con fuentes generadoras de luz depositadas |
US8987765B2 (en) | 2013-06-17 | 2015-03-24 | LuxVue Technology Corporation | Reflective bank structure and method for integrating a light emitting device |
US9111464B2 (en) | 2013-06-18 | 2015-08-18 | LuxVue Technology Corporation | LED display with wavelength conversion layer |
US8928021B1 (en) | 2013-06-18 | 2015-01-06 | LuxVue Technology Corporation | LED light pipe |
US20170271548A1 (en) | 2013-06-26 | 2017-09-21 | Epistar Corporation | Light-emitting device and manufacturing method thereof |
US8994033B2 (en) | 2013-07-09 | 2015-03-31 | Soraa, Inc. | Contacts for an n-type gallium and nitrogen substrate for optical devices |
US9419189B1 (en) | 2013-11-04 | 2016-08-16 | Soraa, Inc. | Small LED source with high brightness and high efficiency |
US9105813B1 (en) * | 2014-05-30 | 2015-08-11 | Mikro Mesa Technology Co., Ltd. | Micro-light-emitting diode |
US9231153B2 (en) * | 2014-05-30 | 2016-01-05 | Mikro Mesa Technology Co., Ltd. | Micro-light-emitting diode |
US9219197B1 (en) * | 2014-05-30 | 2015-12-22 | Mikro Mesa Technology Co., Ltd. | Micro-light-emitting diode |
GB2541970B (en) | 2015-09-02 | 2020-08-19 | Facebook Tech Llc | Display manufacture |
GB2549734B (en) | 2016-04-26 | 2020-01-01 | Facebook Tech Llc | A display |
GB2544728B (en) * | 2015-11-17 | 2020-08-19 | Facebook Tech Llc | Redundancy in inorganic light emitting diode displays |
KR102412409B1 (ko) * | 2015-10-26 | 2022-06-23 | 엘지전자 주식회사 | 반도체 발광 소자를 이용한 디스플레이 장치 및 이의 제조방법 |
CN108770368B (zh) | 2016-01-15 | 2022-04-12 | 罗茵尼公司 | 透过设备上的罩盖进行背光照明的设备和方法 |
ES2627558B1 (es) * | 2016-01-19 | 2018-06-14 | Microplus World Corporation, S.L. | Dispositivo emisor de luz para luminarias con microled de alta eficiencia. |
US10923023B1 (en) * | 2016-01-26 | 2021-02-16 | Apple Inc. | Stacked hybrid micro LED pixel architecture |
CN205944139U (zh) | 2016-03-30 | 2017-02-08 | 首尔伟傲世有限公司 | 紫外线发光二极管封装件以及包含此的发光二极管模块 |
US10304375B2 (en) * | 2016-09-23 | 2019-05-28 | Hong Kong Beida Jade Bird Display Limited | Micro display panels with integrated micro-reflectors |
US11205677B2 (en) * | 2017-01-24 | 2021-12-21 | Goertek, Inc. | Micro-LED device, display apparatus and method for manufacturing a micro-LED device |
US10174438B2 (en) | 2017-03-30 | 2019-01-08 | Slt Technologies, Inc. | Apparatus for high pressure reaction |
US10490690B1 (en) * | 2018-06-25 | 2019-11-26 | Newgo Design Studio | Vertical cylindrical reaction chamber for micro LED epitaxy and linear luminant fabrication process |
US11637219B2 (en) | 2019-04-12 | 2023-04-25 | Google Llc | Monolithic integration of different light emitting structures on a same substrate |
CN110224049A (zh) | 2019-05-31 | 2019-09-10 | 深圳市华星光电半导体显示技术有限公司 | micro LED芯片及其制备方法 |
Family Cites Families (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900863A (en) | 1974-05-13 | 1975-08-19 | Westinghouse Electric Corp | Light-emitting diode which generates light in three dimensions |
US5216263A (en) | 1990-11-29 | 1993-06-01 | Xerox Corporation | High density, independently addressable, surface emitting semiconductor laser-light emitting diode arrays |
JPH0563233A (ja) * | 1991-09-02 | 1993-03-12 | Ricoh Co Ltd | 光プリンター光源 |
US5278432A (en) | 1992-08-27 | 1994-01-11 | Quantam Devices, Inc. | Apparatus for providing radiant energy |
EP0622858B2 (en) | 1993-04-28 | 2004-09-29 | Nichia Corporation | Gallium nitride-based III-V group compound semiconductor device and method of producing the same |
US5656832A (en) * | 1994-03-09 | 1997-08-12 | Kabushiki Kaisha Toshiba | Semiconductor heterojunction device with ALN buffer layer of 3nm-10nm average film thickness |
JPH0832110A (ja) | 1994-07-19 | 1996-02-02 | Oki Electric Ind Co Ltd | 端面発光型led、端面発光型発光素子の製造方法、端面発光型発光素子の発光特性測定方法 |
KR100268567B1 (ko) | 1994-10-11 | 2000-10-16 | 포만 제프리 엘 | 다중 파장으로 광을 발생시키기 위한 발광 다이오드의 모놀리식 어레이 및 이를 사용한 멀티 컬러 디스플레이 |
US5699073A (en) | 1996-03-04 | 1997-12-16 | Motorola | Integrated electro-optical package with carrier ring and method of fabrication |
US5773130A (en) | 1996-06-06 | 1998-06-30 | Motorola, Inc. | Multi-color organic electroluminescent device |
JP3268731B2 (ja) | 1996-10-09 | 2002-03-25 | 沖電気工業株式会社 | 光電変換素子 |
US5966393A (en) | 1996-12-13 | 1999-10-12 | The Regents Of The University Of California | Hybrid light-emitting sources for efficient and cost effective white lighting and for full-color applications |
US6740960B1 (en) | 1997-10-31 | 2004-05-25 | Micron Technology, Inc. | Semiconductor package including flex circuit, interconnects and dense array external contacts |
TW408497B (en) | 1997-11-25 | 2000-10-11 | Matsushita Electric Works Ltd | LED illuminating apparatus |
US6461019B1 (en) | 1998-08-28 | 2002-10-08 | Fiber Optic Designs, Inc. | Preferred embodiment to LED light string |
CN1079586C (zh) * | 1999-01-28 | 2002-02-20 | 北京工业大学 | 高效逐级增强高亮度发光二极管及其设计方法 |
US6410942B1 (en) * | 1999-12-03 | 2002-06-25 | Cree Lighting Company | Enhanced light extraction through the use of micro-LED arrays |
US6936885B2 (en) * | 2000-01-17 | 2005-08-30 | Samsung Electronics Co., Ltd. | NAND-type flash memory devices and methods of fabricating the same |
US6410940B1 (en) | 2000-06-15 | 2002-06-25 | Kansas State University Research Foundation | Micro-size LED and detector arrays for minidisplay, hyper-bright light emitting diodes, lighting, and UV detector and imaging sensor applications |
US20020043943A1 (en) | 2000-10-10 | 2002-04-18 | Menzer Randy L. | LED array primary display light sources employing dynamically switchable bypass circuitry |
CN1159774C (zh) * | 2000-11-10 | 2004-07-28 | 晶元光电股份有限公司 | 具有反向隧穿层的发光二极管 |
US6547249B2 (en) | 2001-03-29 | 2003-04-15 | Lumileds Lighting U.S., Llc | Monolithic series/parallel led arrays formed on highly resistive substrates |
US6455878B1 (en) | 2001-05-15 | 2002-09-24 | Lumileds Lighting U.S., Llc | Semiconductor LED flip-chip having low refractive index underfill |
JP4055405B2 (ja) * | 2001-12-03 | 2008-03-05 | ソニー株式会社 | 電子部品及びその製造方法 |
US20040223342A1 (en) * | 2001-12-31 | 2004-11-11 | Klipstein Donald L. | LED inspection lamp, cluster LED, and LED with stabilizing agents |
US6936855B1 (en) | 2002-01-16 | 2005-08-30 | Shane Harrah | Bendable high flux LED array |
JP3822545B2 (ja) | 2002-04-12 | 2006-09-20 | 士郎 酒井 | 発光装置 |
US6635902B1 (en) * | 2002-05-24 | 2003-10-21 | Para Light Electronics Co., Ltd. | Serial connection structure of light emitting diode chip |
EP2149905A3 (en) | 2002-08-29 | 2014-05-07 | Seoul Semiconductor Co., Ltd. | Light-emitting device having light-emitting diodes |
JP2004140185A (ja) * | 2002-10-17 | 2004-05-13 | Matsushita Electric Ind Co Ltd | 発光装置 |
US7213942B2 (en) * | 2002-10-24 | 2007-05-08 | Ac Led Lighting, L.L.C. | Light emitting diodes for high AC voltage operation and general lighting |
US6957899B2 (en) * | 2002-10-24 | 2005-10-25 | Hongxing Jiang | Light emitting diodes for high AC voltage operation and general lighting |
US20040206970A1 (en) * | 2003-04-16 | 2004-10-21 | Martin Paul S. | Alternating current light emitting device |
JP4598767B2 (ja) * | 2003-07-30 | 2010-12-15 | パナソニック株式会社 | 半導体発光装置、発光モジュール、および照明装置 |
JP4654670B2 (ja) * | 2003-12-16 | 2011-03-23 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
US7045965B2 (en) * | 2004-01-30 | 2006-05-16 | 1 Energy Solutions, Inc. | LED light module and series connected light modules |
KR20050093319A (ko) * | 2004-03-18 | 2005-09-23 | 삼성전기주식회사 | 발광효율이 개선된 질화물 반도체 발광소자 및 그 제조방법 |
TW200501464A (en) * | 2004-08-31 | 2005-01-01 | Ind Tech Res Inst | LED chip structure with AC loop |
US7221044B2 (en) | 2005-01-21 | 2007-05-22 | Ac Led Lighting, L.L.C. | Heterogeneous integrated high voltage DC/AC light emitter |
-
2005
- 2005-04-08 US US11/102,273 patent/US7535028B2/en active Active
- 2005-09-05 CN CN2005100982576A patent/CN1819255B/zh active Active
Cited By (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7525246B2 (en) | 2006-08-16 | 2009-04-28 | Industrial Technology Research Institute | Alternating current light-emitting device |
WO2008052459A1 (en) * | 2006-10-30 | 2008-05-08 | Hong Kong Applied Science and Technology Research Institute Co. Ltd | Light emitting diode matrix |
US8421112B2 (en) | 2010-02-08 | 2013-04-16 | Lg Innotek Co., Ltd. | Light emitting device and light emitting device package having the same |
CN102148322A (zh) * | 2010-02-08 | 2011-08-10 | Lg伊诺特有限公司 | 发光器件和具有发光器件的发光器件封装 |
CN102148322B (zh) * | 2010-02-08 | 2017-05-31 | Lg伊诺特有限公司 | 发光器件和具有发光器件的发光器件封装 |
CN102270727A (zh) * | 2010-06-07 | 2011-12-07 | 株式会社东芝 | 半导体发光装置及其制造方法 |
CN102270727B (zh) * | 2010-06-07 | 2014-06-04 | 株式会社东芝 | 半导体发光装置及其制造方法 |
CN102468318B (zh) * | 2010-11-04 | 2014-12-24 | 上海蓝光科技有限公司 | 一种高压直流发光二极管芯片结构及其制造方法 |
CN102468318A (zh) * | 2010-11-04 | 2012-05-23 | 上海蓝光科技有限公司 | 一种高压直流发光二极管芯片结构及其制造方法 |
CN103022276A (zh) * | 2011-09-26 | 2013-04-03 | 比亚迪股份有限公司 | 一种ac led芯片的制备方法 |
CN103022276B (zh) * | 2011-09-26 | 2015-08-26 | 比亚迪股份有限公司 | 一种ac led芯片的制备方法 |
CN102368516A (zh) * | 2011-10-10 | 2012-03-07 | 映瑞光电科技(上海)有限公司 | 高压led器件及其制造方法 |
US10607961B2 (en) | 2011-11-18 | 2020-03-31 | Apple Inc. | Micro device transfer head heater assembly and method of transferring a micro device |
US11552046B2 (en) | 2011-11-18 | 2023-01-10 | Apple Inc. | Micro device transfer head assembly |
CN103208503A (zh) * | 2012-01-13 | 2013-07-17 | 华夏光股份有限公司 | 发光二极管数组及其制造方法 |
CN102723415A (zh) * | 2012-06-25 | 2012-10-10 | 钟伟荣 | 一种倒装型高压交/直流发光二极管及其制作方法 |
CN108630720A (zh) * | 2012-09-06 | 2018-10-09 | 晶元光电股份有限公司 | 发光二极管阵列 |
CN108630720B (zh) * | 2012-09-06 | 2023-01-03 | 晶元光电股份有限公司 | 发光二极管阵列 |
CN102983147A (zh) * | 2012-09-24 | 2013-03-20 | 杭州士兰明芯科技有限公司 | 一种发光二极管芯片及其制造方法 |
CN104737310A (zh) * | 2012-10-15 | 2015-06-24 | 首尔伟傲世有限公司 | 半导体装置及其制造方法 |
CN104737310B (zh) * | 2012-10-15 | 2017-09-01 | 首尔伟傲世有限公司 | 半导体装置及其制造方法 |
CN103855180A (zh) * | 2012-12-06 | 2014-06-11 | Lg伊诺特有限公司 | 发光器件 |
CN103855180B (zh) * | 2012-12-06 | 2019-11-05 | Lg伊诺特有限公司 | 发光器件 |
CN103187494A (zh) * | 2013-03-21 | 2013-07-03 | 中国科学院半导体研究所 | 高压发光二极管芯片及其制造方法 |
CN103730479A (zh) * | 2013-11-29 | 2014-04-16 | 南京大学扬州光电研究院 | 一种多发光子区GaN基LED集成芯片 |
CN104409605A (zh) * | 2014-11-28 | 2015-03-11 | 杭州士兰明芯科技有限公司 | 一种高压芯片led结构及其制作方法 |
CN104409605B (zh) * | 2014-11-28 | 2017-10-27 | 杭州士兰明芯科技有限公司 | 一种高压芯片led结构及其制作方法 |
CN104766914A (zh) * | 2015-04-20 | 2015-07-08 | 电子科技大学 | 一种高取光率的高压led芯片结构 |
CN106783818A (zh) * | 2016-12-20 | 2017-05-31 | 复旦大学 | 基于低功耗微米led的可视化光电标签及其制备方法 |
CN110088919A (zh) * | 2018-05-04 | 2019-08-02 | 厦门三安光电有限公司 | 发光元件、发光元件阵列及其发光装置 |
WO2020001636A1 (en) * | 2018-06-30 | 2020-01-02 | Jin Wei | Semiconductor device, semiconductor apparatus and method of manufacturing the same |
CN111213241A (zh) * | 2018-06-30 | 2020-05-29 | 魏进 | 半导体器件、半导体设备及其制造方法 |
US11476325B2 (en) | 2018-06-30 | 2022-10-18 | Jin WEI | Semiconductor device |
CN111213241B (zh) * | 2018-06-30 | 2023-09-22 | 魏进 | 半导体器件、半导体设备及其制造方法 |
CN110071198A (zh) * | 2019-04-17 | 2019-07-30 | 深圳市华星光电半导体显示技术有限公司 | 一种发光元件及其制作方法、阵列基板 |
Also Published As
Publication number | Publication date |
---|---|
US20060169993A1 (en) | 2006-08-03 |
CN1819255B (zh) | 2010-06-02 |
US7535028B2 (en) | 2009-05-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1819255B (zh) | 基于微型发光二极管的高压交直流指示灯 | |
JP4101468B2 (ja) | 発光装置の製造方法 | |
US20110037083A1 (en) | Led package with contrasting face | |
JP6542509B2 (ja) | 蛍光体及びそれを含む発光素子パッケージ | |
US10418412B2 (en) | Light-emitting diode | |
KR101936312B1 (ko) | 발광소자 | |
CN109429532A (zh) | 发光器件封装和光源设备 | |
KR20140050810A (ko) | 발광소자 | |
CN109757120A (zh) | 发光器件封装 | |
CN104518060B (zh) | 发光器件及包括发光器件的发光器件封装件和照明系统 | |
KR101956048B1 (ko) | 발광소자 | |
US20170358708A1 (en) | Light emitting diode, light emitting diode package including same, and lighting system including same | |
EP3048650B1 (en) | Light emitting device | |
US8455882B2 (en) | High efficiency LEDs | |
US10510925B2 (en) | Light-emitting device and lighting system comprising same | |
KR20130019275A (ko) | 발광소자 | |
KR20170123153A (ko) | 발광 소자 패키지 및 이를 포함하는 조명 장치 | |
KR102131309B1 (ko) | 형광체 및 이를 포함하는 발광소자 패키지 | |
KR102303459B1 (ko) | 발광소자, 발광소자 패키지, 및 이를 포함하는 조명시스템 | |
CN202332853U (zh) | 大功率倒装阵列led芯片 | |
KR20130019276A (ko) | 발광소자 | |
KR20160123607A (ko) | 발광소자, 발광소자 패키지, 및 이를 포함하는 조명시스템 | |
KR20160093945A (ko) | 형광체 필름, 이를 포함하는 발광 소자 패키지 및 조명 장치 | |
KR20220051320A (ko) | 광원 모듈 및 조명 장치 | |
KR20190095749A (ko) | 반도체 소자 패키지 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |