CN1808282B - 曝光设备及器件制造方法 - Google Patents

曝光设备及器件制造方法 Download PDF

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Publication number
CN1808282B
CN1808282B CN2006100064047A CN200610006404A CN1808282B CN 1808282 B CN1808282 B CN 1808282B CN 2006100064047 A CN2006100064047 A CN 2006100064047A CN 200610006404 A CN200610006404 A CN 200610006404A CN 1808282 B CN1808282 B CN 1808282B
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China
Prior art keywords
light source
exposure
optical system
image
basic
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Expired - Fee Related
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CN2006100064047A
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English (en)
Chinese (zh)
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CN1808282A (zh
Inventor
杉田充朗
近江和明
米原隆夫
辻俊彦
寺师孝昭
香田彻
筒井慎二
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Canon Inc
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Canon Inc
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Publication of CN1808282A publication Critical patent/CN1808282A/zh
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    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
    • A01K1/00—Housing animals; Equipment therefor
    • A01K1/0047—Air-conditioning, e.g. ventilation, of animal housings
    • A01K1/0052—Arrangement of fans or blowers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental Sciences (AREA)
  • Zoology (AREA)
  • Animal Husbandry (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2006100064047A 2005-01-20 2006-01-20 曝光设备及器件制造方法 Expired - Fee Related CN1808282B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005-013033 2005-01-20
JP2005013033A JP4587170B2 (ja) 2005-01-20 2005-01-20 露光装置及びデバイスの製造方法
JP2005013033 2005-01-20

Publications (2)

Publication Number Publication Date
CN1808282A CN1808282A (zh) 2006-07-26
CN1808282B true CN1808282B (zh) 2011-11-16

Family

ID=36683423

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006100064047A Expired - Fee Related CN1808282B (zh) 2005-01-20 2006-01-20 曝光设备及器件制造方法

Country Status (5)

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US (1) US8035668B2 (enExample)
JP (1) JP4587170B2 (enExample)
KR (1) KR100724637B1 (enExample)
CN (1) CN1808282B (enExample)
TW (1) TWI342985B (enExample)

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CN108646521A (zh) * 2018-06-19 2018-10-12 上海频微电子科技有限公司 一种光源直接成像聚焦光刻装置及光刻方法

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US7802910B2 (en) * 2008-01-29 2010-09-28 Dymax Corporation Light guide exposure device
JP5131129B2 (ja) * 2008-09-30 2013-01-30 ウシオ電機株式会社 光源ユニット及び該光源ユニットを具備した露光装置
JP5345443B2 (ja) * 2009-04-21 2013-11-20 株式会社日立ハイテクノロジーズ 露光装置、露光光照射方法、及び表示用パネル基板の製造方法
KR20120056094A (ko) * 2010-11-24 2012-06-01 삼성전기주식회사 노광 파장 조절 장치 및 그를 이용한 노광기
KR20120060018A (ko) * 2010-12-01 2012-06-11 삼성전자주식회사 마스크리스 노광 장치
JP2012174810A (ja) * 2011-02-18 2012-09-10 Fuji Xerox Co Ltd 発光部品、プリントヘッドおよび画像形成装置
KR101532352B1 (ko) * 2013-10-30 2015-06-29 주식회사 인피테크 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템
US20160327433A1 (en) * 2014-09-08 2016-11-10 Empire Technology Development Llc Title: integrated packaging for multi-component sensors
KR101689836B1 (ko) * 2015-09-25 2016-12-27 주식회사 리텍 고출력 uv led 광원의 펄스제어를 이용한 dmd 과열 저감 시스템
JP6406201B2 (ja) * 2015-10-02 2018-10-17 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
CN106502059A (zh) * 2016-12-30 2017-03-15 俞庆平 一种适用于曲面手机玻璃的直写曝光系统及方法
CN106647185A (zh) * 2016-12-31 2017-05-10 江苏九迪激光装备科技有限公司 一种丝网印刷直接制版系统及制版方法
KR102688206B1 (ko) * 2017-11-16 2024-07-24 고쿠리츠다이가쿠호진 나가오카기쥬츠가가쿠다이가쿠 광 발생 장치, 광 발생 장치를 구비하는 노광 장치, 노광 시스템, 광 발생 방법, 및 노광 포토 레지스트 제조 방법
US10901253B2 (en) * 2018-10-02 2021-01-26 Aristocrat Technologies Australia Pty Limited Button deck assembly for an electronic gaming machine and method for making the same
US11288912B2 (en) 2020-03-04 2022-03-29 Aristocrat Technologies, Inc. Electronic gaming machine including hybrid virtual and physical button area
CN112051711A (zh) * 2020-08-20 2020-12-08 江苏迪盛智能科技有限公司 一种曝光设备
KR20250036881A (ko) 2022-08-18 2025-03-14 가부시키가이샤 니콘 광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법
CN119948408A (zh) 2022-10-24 2025-05-06 株式会社尼康 合成光学元件、照明单元、曝光装置、以及曝光方法
WO2024209586A1 (ja) 2023-04-05 2024-10-10 株式会社ニコン 光源ユニット、照明ユニット、露光装置、及び露光方法
JP2025037489A (ja) * 2023-09-06 2025-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置
WO2025094252A1 (ja) * 2023-10-31 2025-05-08 株式会社ニコン 露光装置

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US6121944A (en) * 1986-07-07 2000-09-19 Texas Digital Systems, Inc. Method of indicating and evaluating measured value
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
CN1379866A (zh) * 1999-11-17 2002-11-13 微激光系统公司 在微刻写入中的射束定位
CN1573576A (zh) * 2003-05-30 2005-02-02 Asml荷兰有限公司 光刻装置和器件制造方法

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JP2585083Y2 (ja) * 1993-08-27 1998-11-11 大日本スクリーン製造株式会社 画像出力装置
JP2942230B2 (ja) * 1998-01-12 1999-08-30 キヤノン株式会社 画像形成装置及び発光装置
JP4892128B2 (ja) * 2000-09-25 2012-03-07 ジーエルサイエンス株式会社 液体クロマトグラフィーの試料導入方法及び装置
JP4310056B2 (ja) * 2001-09-25 2009-08-05 株式会社オーク製作所 露光装置
US6927018B2 (en) * 2001-10-29 2005-08-09 Hewlett-Packard Development Company, L.P. Three dimensional printing using photo-activated building materials
CN101446773A (zh) 2001-11-07 2009-06-03 应用材料有限公司 无掩膜光子电子点格栅阵列光刻机
IL164483A0 (en) * 2002-04-10 2005-12-18 Fujinon Corp Exposure head, exposure apparatus, and applicationthereof
JP4546019B2 (ja) 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
JP2004109658A (ja) * 2002-09-19 2004-04-08 Ricoh Co Ltd 光走査装置及び光路調整方法並びに画像形成装置
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2004327660A (ja) * 2003-04-24 2004-11-18 Nikon Corp 走査型投影露光装置、露光方法及びデバイス製造方法
CN1637589A (zh) * 2003-12-26 2005-07-13 富士胶片株式会社 图像曝光方法和装置
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6121944A (en) * 1986-07-07 2000-09-19 Texas Digital Systems, Inc. Method of indicating and evaluating measured value
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
CN1379866A (zh) * 1999-11-17 2002-11-13 微激光系统公司 在微刻写入中的射束定位
CN1573576A (zh) * 2003-05-30 2005-02-02 Asml荷兰有限公司 光刻装置和器件制造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108646521A (zh) * 2018-06-19 2018-10-12 上海频微电子科技有限公司 一种光源直接成像聚焦光刻装置及光刻方法

Also Published As

Publication number Publication date
CN1808282A (zh) 2006-07-26
KR100724637B1 (ko) 2007-06-04
JP2006201476A (ja) 2006-08-03
JP4587170B2 (ja) 2010-11-24
US20060158504A1 (en) 2006-07-20
US8035668B2 (en) 2011-10-11
TW200636393A (en) 2006-10-16
TWI342985B (en) 2011-06-01
KR20060084800A (ko) 2006-07-25

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