CN1808282B - 曝光设备及器件制造方法 - Google Patents

曝光设备及器件制造方法 Download PDF

Info

Publication number
CN1808282B
CN1808282B CN2006100064047A CN200610006404A CN1808282B CN 1808282 B CN1808282 B CN 1808282B CN 2006100064047 A CN2006100064047 A CN 2006100064047A CN 200610006404 A CN200610006404 A CN 200610006404A CN 1808282 B CN1808282 B CN 1808282B
Authority
CN
China
Prior art keywords
exposure
light source
optical system
light sources
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2006100064047A
Other languages
English (en)
Chinese (zh)
Other versions
CN1808282A (zh
Inventor
杉田充朗
近江和明
米原隆夫
辻俊彦
寺师孝昭
香田彻
筒井慎二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN1808282A publication Critical patent/CN1808282A/zh
Application granted granted Critical
Publication of CN1808282B publication Critical patent/CN1808282B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2006100064047A 2005-01-20 2006-01-20 曝光设备及器件制造方法 Expired - Fee Related CN1808282B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005013033 2005-01-20
JP2005-013033 2005-01-20
JP2005013033A JP4587170B2 (ja) 2005-01-20 2005-01-20 露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
CN1808282A CN1808282A (zh) 2006-07-26
CN1808282B true CN1808282B (zh) 2011-11-16

Family

ID=36683423

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006100064047A Expired - Fee Related CN1808282B (zh) 2005-01-20 2006-01-20 曝光设备及器件制造方法

Country Status (5)

Country Link
US (1) US8035668B2 (enExample)
JP (1) JP4587170B2 (enExample)
KR (1) KR100724637B1 (enExample)
CN (1) CN1808282B (enExample)
TW (1) TWI342985B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108646521A (zh) * 2018-06-19 2018-10-12 上海频微电子科技有限公司 一种光源直接成像聚焦光刻装置及光刻方法

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7802910B2 (en) * 2008-01-29 2010-09-28 Dymax Corporation Light guide exposure device
JP5131129B2 (ja) * 2008-09-30 2013-01-30 ウシオ電機株式会社 光源ユニット及び該光源ユニットを具備した露光装置
JP5345443B2 (ja) * 2009-04-21 2013-11-20 株式会社日立ハイテクノロジーズ 露光装置、露光光照射方法、及び表示用パネル基板の製造方法
KR20120056094A (ko) * 2010-11-24 2012-06-01 삼성전기주식회사 노광 파장 조절 장치 및 그를 이용한 노광기
KR20120060018A (ko) * 2010-12-01 2012-06-11 삼성전자주식회사 마스크리스 노광 장치
JP2012174810A (ja) * 2011-02-18 2012-09-10 Fuji Xerox Co Ltd 発光部品、プリントヘッドおよび画像形成装置
KR101532352B1 (ko) * 2013-10-30 2015-06-29 주식회사 인피테크 노광용 led 광원 장치 및 노광용 led 광원장치 관리시스템
US20160327433A1 (en) * 2014-09-08 2016-11-10 Empire Technology Development Llc Title: integrated packaging for multi-component sensors
KR101689836B1 (ko) * 2015-09-25 2016-12-27 주식회사 리텍 고출력 uv led 광원의 펄스제어를 이용한 dmd 과열 저감 시스템
JP6406201B2 (ja) * 2015-10-02 2018-10-17 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
CN106502059A (zh) * 2016-12-30 2017-03-15 俞庆平 一种适用于曲面手机玻璃的直写曝光系统及方法
CN106647185A (zh) * 2016-12-31 2017-05-10 江苏九迪激光装备科技有限公司 一种丝网印刷直接制版系统及制版方法
CN111356957B (zh) * 2017-11-16 2022-10-11 国立大学法人长冈技术科学大学 光产生装置、具备光产生装置的曝光装置、曝光系统、光产生方法及曝光光致抗蚀剂制造方法
US10901253B2 (en) * 2018-10-02 2021-01-26 Aristocrat Technologies Australia Pty Limited Button deck assembly for an electronic gaming machine and method for making the same
US11288912B2 (en) 2020-03-04 2022-03-29 Aristocrat Technologies, Inc. Electronic gaming machine including hybrid virtual and physical button area
CN112051711A (zh) * 2020-08-20 2020-12-08 江苏迪盛智能科技有限公司 一种曝光设备
CN119790351A (zh) 2022-08-18 2025-04-08 株式会社尼康 光源单元、照明单元、曝光装置、以及曝光方法
JPWO2024089737A1 (enExample) 2022-10-24 2024-05-02
WO2024209586A1 (ja) 2023-04-05 2024-10-10 株式会社ニコン 光源ユニット、照明ユニット、露光装置、及び露光方法
JP2025037489A (ja) * 2023-09-06 2025-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置
WO2025094252A1 (ja) * 2023-10-31 2025-05-08 株式会社ニコン 露光装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6121944A (en) * 1986-07-07 2000-09-19 Texas Digital Systems, Inc. Method of indicating and evaluating measured value
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
CN1379866A (zh) * 1999-11-17 2002-11-13 微激光系统公司 在微刻写入中的射束定位
CN1573576A (zh) * 2003-05-30 2005-02-02 Asml荷兰有限公司 光刻装置和器件制造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2585083Y2 (ja) * 1993-08-27 1998-11-11 大日本スクリーン製造株式会社 画像出力装置
JP2942230B2 (ja) * 1998-01-12 1999-08-30 キヤノン株式会社 画像形成装置及び発光装置
JP4892128B2 (ja) * 2000-09-25 2012-03-07 ジーエルサイエンス株式会社 液体クロマトグラフィーの試料導入方法及び装置
JP4310056B2 (ja) * 2001-09-25 2009-08-05 株式会社オーク製作所 露光装置
US6927018B2 (en) * 2001-10-29 2005-08-09 Hewlett-Packard Development Company, L.P. Three dimensional printing using photo-activated building materials
JP2005533365A (ja) 2001-11-07 2005-11-04 アプライド　マテリアルズ　インコーポレイテッド マスクレスの光子−電子スポット格子アレイ印刷装置
US6894712B2 (en) * 2002-04-10 2005-05-17 Fuji Photo Film Co., Ltd. Exposure head, exposure apparatus, and application thereof
JP4546019B2 (ja) 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
JP2004109658A (ja) * 2002-09-19 2004-04-08 Ricoh Co Ltd 光走査装置及び光路調整方法並びに画像形成装置
JP2004274011A (ja) * 2003-01-16 2004-09-30 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2004327660A (ja) * 2003-04-24 2004-11-18 Nikon Corp 走査型投影露光装置、露光方法及びデバイス製造方法
KR100742251B1 (ko) * 2003-12-26 2007-07-24 후지필름 가부시키가이샤 화상노광방법 및 장치
JP2005309380A (ja) * 2004-03-26 2005-11-04 Fuji Photo Film Co Ltd 画像露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6121944A (en) * 1986-07-07 2000-09-19 Texas Digital Systems, Inc. Method of indicating and evaluating measured value
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
CN1379866A (zh) * 1999-11-17 2002-11-13 微激光系统公司 在微刻写入中的射束定位
CN1573576A (zh) * 2003-05-30 2005-02-02 Asml荷兰有限公司 光刻装置和器件制造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108646521A (zh) * 2018-06-19 2018-10-12 上海频微电子科技有限公司 一种光源直接成像聚焦光刻装置及光刻方法

Also Published As

Publication number Publication date
US20060158504A1 (en) 2006-07-20
CN1808282A (zh) 2006-07-26
US8035668B2 (en) 2011-10-11
KR20060084800A (ko) 2006-07-25
KR100724637B1 (ko) 2007-06-04
JP2006201476A (ja) 2006-08-03
TW200636393A (en) 2006-10-16
TWI342985B (en) 2011-06-01
JP4587170B2 (ja) 2010-11-24

Similar Documents

Publication Publication Date Title
CN1808282B (zh) 曝光设备及器件制造方法
JP5571316B2 (ja) 複数の位置調整装置を備えるリソグラフィ装置、及び位置調整測定方法
US6040909A (en) Surface position detecting system and device manufacturing method using the same
JP6580203B2 (ja) マルチステージシステムおよびリソグラフィ装置
JP2012243863A (ja) インプリント装置、インプリント方法およびデバイス製造方法
JP4878108B2 (ja) 露光装置、デバイス製造方法、および測定装置
JP5361239B2 (ja) 露光装置及びデバイス製造方法
JP2008053618A (ja) 露光装置及び方法並びに該露光装置を用いたデバイス製造方法
SG185228A1 (en) Phase-shift mask with assist phase regions
TWI394015B (zh) 用於粗晶圓校準之標記結構及製造此標記結構之方法
JP2009065061A (ja) 露光装置及び露光方法、デバイス製造方法
JP2004207343A (ja) 照明光源、照明装置、露光装置及び露光方法
TWI915658B (zh) 光源單元、照明單元、曝光裝置、及曝光方法
JP3554243B2 (ja) 投影露光装置及びデバイス製造方法
JP2006253486A (ja) 照明装置、投影露光方法、投影露光装置、及びマイクロデバイスの製造方法
US7474383B2 (en) Mask making method, mask making device, and mask drawing device
JP2010067911A (ja) 計測装置、光源装置、露光装置及びデバイスの製造方法
TW202409743A (zh) 光源單元、照明單元、曝光裝置、及曝光方法
JP2013073976A (ja) 空間光変調器、光学装置、及び露光装置
JP2001297959A (ja) 照明装置及び露光装置
JP2007005507A (ja) 露光装置
JP2007085876A (ja) 干渉計装置、露光装置、およびデバイスの製造方法
JP2014036151A (ja) 面位置計測装置、露光装置、およびデバイス製造方法
JP2007206176A (ja) パターン描画装置及びパターン描画方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20111116

Termination date: 20170120