CN1695201A - 存储单元 - Google Patents
存储单元 Download PDFInfo
- Publication number
- CN1695201A CN1695201A CN 03825092 CN03825092A CN1695201A CN 1695201 A CN1695201 A CN 1695201A CN 03825092 CN03825092 CN 03825092 CN 03825092 A CN03825092 A CN 03825092A CN 1695201 A CN1695201 A CN 1695201A
- Authority
- CN
- China
- Prior art keywords
- sic
- diode
- transistor
- grid
- mosfet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015654 memory Effects 0.000 title claims abstract description 54
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 82
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 80
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 24
- 239000010703 silicon Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000003990 capacitor Substances 0.000 claims description 46
- 238000007667 floating Methods 0.000 claims description 25
- 238000003860 storage Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 18
- 230000014759 maintenance of location Effects 0.000 claims description 16
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 16
- 229920005591 polysilicon Polymers 0.000 claims description 16
- 230000006798 recombination Effects 0.000 claims description 15
- 238000005215 recombination Methods 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 150000002500 ions Chemical class 0.000 claims description 13
- 238000002161 passivation Methods 0.000 claims description 8
- 230000005669 field effect Effects 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910021332 silicide Inorganic materials 0.000 claims description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 238000002955 isolation Methods 0.000 abstract description 15
- 230000001066 destructive effect Effects 0.000 abstract description 2
- 238000003491 array Methods 0.000 abstract 1
- 238000007599 discharging Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 21
- 238000005530 etching Methods 0.000 description 13
- 238000001259 photo etching Methods 0.000 description 13
- 210000004027 cell Anatomy 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 238000000137 annealing Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000005036 potential barrier Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 244000287680 Garcinia dulcis Species 0.000 description 1
- 241000511976 Hoya Species 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 210000000352 storage cell Anatomy 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Images
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- Semiconductor Memories (AREA)
Abstract
Description
Claims (24)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2002951339 | 2002-09-12 | ||
AU2002951339A AU2002951339A0 (en) | 2002-09-12 | 2002-09-12 | Non volatile memory cell |
AU2003900911 | 2003-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1695201A true CN1695201A (zh) | 2005-11-09 |
CN100452235C CN100452235C (zh) | 2009-01-14 |
Family
ID=27792613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB038250926A Expired - Fee Related CN100452235C (zh) | 2002-09-12 | 2003-09-12 | 存储单元 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN100452235C (zh) |
AU (1) | AU2002951339A0 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103119718A (zh) * | 2010-08-31 | 2013-05-22 | 美光科技公司 | 存储器单元结构和方法 |
CN106531211A (zh) * | 2015-09-09 | 2017-03-22 | 爱思开海力士有限公司 | Eprom单元及其制造方法、包括其的eprom单元阵列 |
CN110291585A (zh) * | 2017-03-22 | 2019-09-27 | 英特尔公司 | 采用自对准的顶栅薄膜晶体管的嵌入式存储器 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3099887B2 (ja) * | 1990-04-12 | 2000-10-16 | 株式会社東芝 | 不揮発性半導体記憶装置 |
US5465249A (en) * | 1991-11-26 | 1995-11-07 | Cree Research, Inc. | Nonvolatile random access memory device having transistor and capacitor made in silicon carbide substrate |
US5986931A (en) * | 1997-01-02 | 1999-11-16 | Caywood; John M. | Low voltage single CMOS electrically erasable read-only memory |
-
2002
- 2002-09-12 AU AU2002951339A patent/AU2002951339A0/en not_active Abandoned
-
2003
- 2003-09-12 CN CNB038250926A patent/CN100452235C/zh not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103119718A (zh) * | 2010-08-31 | 2013-05-22 | 美光科技公司 | 存储器单元结构和方法 |
CN103119718B (zh) * | 2010-08-31 | 2016-04-13 | 美光科技公司 | 存储器单元结构和方法 |
CN106531211A (zh) * | 2015-09-09 | 2017-03-22 | 爱思开海力士有限公司 | Eprom单元及其制造方法、包括其的eprom单元阵列 |
CN106531211B (zh) * | 2015-09-09 | 2020-10-30 | 爱思开海力士有限公司 | Eprom单元及其制造方法、包括其的eprom单元阵列 |
CN110291585A (zh) * | 2017-03-22 | 2019-09-27 | 英特尔公司 | 采用自对准的顶栅薄膜晶体管的嵌入式存储器 |
Also Published As
Publication number | Publication date |
---|---|
CN100452235C (zh) | 2009-01-14 |
AU2002951339A0 (en) | 2002-09-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SHUNT SEMICONDUCTOR AUSTRALIA PTY LTD Free format text: FORMER OWNER: GRIFFITH UNIVERSITY Effective date: 20100317 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20100317 Address after: Australia Patentee after: Split semiconductor Bp Australia Limited Address before: Queensland, Australia Patentee before: Griffith University |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090114 Termination date: 20110912 |