CN1690852B - 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板 - Google Patents

银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板 Download PDF

Info

Publication number
CN1690852B
CN1690852B CN2005100678025A CN200510067802A CN1690852B CN 1690852 B CN1690852 B CN 1690852B CN 2005100678025 A CN2005100678025 A CN 2005100678025A CN 200510067802 A CN200510067802 A CN 200510067802A CN 1690852 B CN1690852 B CN 1690852B
Authority
CN
China
Prior art keywords
weight
glass composition
silver paste
composition
photosensitive silver
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2005100678025A
Other languages
English (en)
Chinese (zh)
Other versions
CN1690852A (zh
Inventor
铃木信之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
Original Assignee
Taiyo Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Holdings Co Ltd filed Critical Taiyo Holdings Co Ltd
Publication of CN1690852A publication Critical patent/CN1690852A/zh
Application granted granted Critical
Publication of CN1690852B publication Critical patent/CN1690852B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/22—Electrodes, e.g. special shape, material or configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Conductive Materials (AREA)
  • Glass Compositions (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN2005100678025A 2004-04-26 2005-04-26 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板 Active CN1690852B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004129764A JP4789426B2 (ja) 2004-04-26 2004-04-26 銀ペースト用ガラス組成物及びそれを用いた感光性銀ペースト及び電極パターン
JP2004-129764 2004-04-26
JP2004129764 2004-04-26

Publications (2)

Publication Number Publication Date
CN1690852A CN1690852A (zh) 2005-11-02
CN1690852B true CN1690852B (zh) 2012-01-18

Family

ID=35346368

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005100678025A Active CN1690852B (zh) 2004-04-26 2005-04-26 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板

Country Status (3)

Country Link
JP (1) JP4789426B2 (ko)
KR (1) KR101113473B1 (ko)
CN (1) CN1690852B (ko)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090004597A1 (en) * 2006-01-12 2009-01-01 Takenori Ueoka Photosensitive Composition, Display Member, and Process for Producing The Same
JP4714633B2 (ja) * 2006-04-25 2011-06-29 シャープ株式会社 太陽電池電極用導電性ペースト
WO2007125879A1 (ja) * 2006-04-25 2007-11-08 Sharp Corporation 太陽電池電極用導電性ペースト
JP4714634B2 (ja) * 2006-04-25 2011-06-29 シャープ株式会社 太陽電池電極用導電性ペースト
KR101040002B1 (ko) * 2006-08-29 2011-06-09 히다치 가세고교 가부시끼가이샤 도전성 접착 필름 및 태양 전지 모듈
KR100829667B1 (ko) 2006-09-07 2008-05-16 엘지전자 주식회사 전극용 페이스트 조성물, 이를 이용하여 제조된 플라즈마디스플레이 패널의 상판구조 및 그 제조방법
CN101593570B (zh) * 2008-05-29 2012-02-22 四川虹欧显示器件有限公司 黑色导电浆料和使用该浆料的等离子显示器
CN101728148B (zh) * 2009-01-05 2011-09-14 四川虹欧显示器件有限公司 电极浆料及利用其制造的电极和它们的制造方法以及具有该电极的pdp显示屏
CN102317227A (zh) * 2009-02-24 2012-01-11 日本电气硝子株式会社 电极形成用玻璃组合物和电极形成材料
KR20100109791A (ko) * 2009-04-01 2010-10-11 주식회사 동진쎄미켐 저온소성 가능한 전극 또는 배선 형성용 페이스트 조성물
JP2012523366A (ja) * 2009-04-09 2012-10-04 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 光起電力セル用の導体中に使用されるガラス組成物
CN102103895B (zh) * 2010-11-23 2012-02-29 湖南威能新材料科技有限公司 一种太阳能电池正面电极及栅线用银浆料及其制备方法和含该银浆料制备的太阳能电池
CN101984494B (zh) * 2010-12-09 2012-05-23 东南大学 防沉降感光性银浆料及其制备方法
CN102097183B (zh) * 2011-02-24 2012-05-30 苏州晶银新材料股份有限公司 一种晶体硅太阳能电池正面电极用导电浆料的制备工艺
CN102768464B (zh) * 2011-05-04 2013-11-13 上海鑫力新材料科技有限公司 感光导电银浆及制备方法
KR101431509B1 (ko) * 2011-12-21 2014-08-22 주식회사 동진쎄미켐 태양전지 전극형성용 페이스트 조성물
CN102584505A (zh) * 2012-01-16 2012-07-18 南京理工大学 一种改善防潮性能的模块化无烟烟花药及其制备方法
CN102831958B (zh) * 2012-08-24 2014-09-10 合肥中南光电有限公司 无铅环保型晶体硅太阳能电池正面银浆及其制备方法
JP6814237B2 (ja) * 2018-03-23 2021-01-13 株式会社ノリタケカンパニーリミテド 感光性組成物とその利用
CN109277723B (zh) * 2018-10-06 2021-08-03 天津大学 一种高温环境下耐银电迁移的Ag-SiO2纳米焊膏的制备方法
CN111929989B (zh) * 2020-08-28 2022-03-15 乾宇电子材料（深圳）有限公司 感光性树脂组合物及其制备方法、感光性有机载体及黄光浆料

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06223617A (ja) * 1993-01-27 1994-08-12 Sumitomo Metal Mining Co Ltd 導電ペースト用組成物
JPH06295615A (ja) * 1993-04-07 1994-10-21 Sumitomo Metal Mining Co Ltd 厚膜抵抗体組成物
JP3297531B2 (ja) * 1994-06-27 2002-07-02 京セラ株式会社 導電性ペースト
JPH08153415A (ja) * 1994-11-29 1996-06-11 Futaba Corp 導電ペースト
TW367504B (en) * 1996-05-21 1999-08-21 Du Pont Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer
JP3520721B2 (ja) * 1997-05-28 2004-04-19 東レ株式会社 感光性導電ペーストおよび電極の製造方法
JP2000232031A (ja) * 1999-02-12 2000-08-22 Murata Mfg Co Ltd 導電ペーストおよびこれを用いた積層セラミックコンデンサ
JP3534684B2 (ja) * 2000-07-10 2004-06-07 Ｔｄｋ株式会社 導電ペーストおよび外部電極とその製造方法
JP2002352702A (ja) * 2001-05-28 2002-12-06 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルの製造方法
JP2003226549A (ja) * 2001-11-30 2003-08-12 Matsushita Electric Ind Co Ltd 電極材料、誘電体材料、電極ペースト、誘電体ペーストおよびこれらを用いたプラズマディスプレイパネル

Also Published As

Publication number Publication date
JP2005306699A (ja) 2005-11-04
JP4789426B2 (ja) 2011-10-12
KR20060045846A (ko) 2006-05-17
CN1690852A (zh) 2005-11-02
KR101113473B1 (ko) 2012-03-13

Similar Documents

Publication Publication Date Title
CN1690852B (zh) 银浆用玻璃组合物、使用该组合物的感光性银浆、电极图形和等离子体显示板
CN100409371C (zh) 感光性导电组合物和等离子显示板
CN101752162B (zh) 感光性导电糊剂及使用其形成的电极和等离子体显示板
JP4870959B2 (ja) 感光性ペーストの製造方法及びプラズマディスプレイパネル
CN101765899A (zh) 等离子体显示屏用电极浆料和等离子显示屏用黑色汇流电极
CN100474491C (zh) 等离子体显示器
CN102308257A (zh) 感光浆料和使用感光浆料产生图案的方法
JP2012079458A (ja) 導電性樹脂組成物及び電子回路基板
CN100334654C (zh) 感光性导电糊及使用其形成的导电体图案
JP4411113B2 (ja) 感光性導電ペースト及びそれを用いて形成した導電体パターン
TWI298073B (ko)
JP5421523B2 (ja) 導電性樹脂組成物、それを用いて得られる導電性パターンを有する基板
JP2008108724A (ja) 感光性導電ペースト及びその焼成物から形成された導電体パターン
JP2012216286A (ja) 導電性樹脂組成物及び電子回路基板
JP2003100208A (ja) 電極パターンの形成方法および該電極パターンを形成したプラズマディスプレイパネル
KR101380471B1 (ko) 감광성 도전 페이스트 및 그의 소성물로 형성된 도전체패턴
CN102265373A (zh) Pdp正面电极
JP2003280181A (ja) 感光性導電ペースト及びそれを用いて形成した導電体パターン
JP4278312B2 (ja) 導電回路パターンの形成方法
JP4685462B2 (ja) 感光性ペースト及びそれを用いて形成した焼成物パターン
CN102436146B (zh) 感光性树脂组合物
JP2004053628A (ja) 光硬化性黒色組成物及びそれを用いて形成したバス電極
TWI267698B (en) Method for preparing photosensitive aqueous developable thick film composition
CN101464630B (zh) 糊剂组合物和烧成物图案
KR100785539B1 (ko) 감광성 페이스트 및 이것을 사용하여 얻어지는 소성물 패턴

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant