CN1641066A - 用于升华材料的蒸发装置 - Google Patents
用于升华材料的蒸发装置 Download PDFInfo
- Publication number
- CN1641066A CN1641066A CNA2004100323466A CN200410032346A CN1641066A CN 1641066 A CN1641066 A CN 1641066A CN A2004100323466 A CNA2004100323466 A CN A2004100323466A CN 200410032346 A CN200410032346 A CN 200410032346A CN 1641066 A CN1641066 A CN 1641066A
- Authority
- CN
- China
- Prior art keywords
- groove
- lid
- evaporation unit
- described evaporation
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 21
- 230000008016 vaporization Effects 0.000 title abstract 3
- 230000008022 sublimation Effects 0.000 title 1
- 238000000859 sublimation Methods 0.000 title 1
- 238000009834 vaporization Methods 0.000 title 1
- 238000010438 heat treatment Methods 0.000 claims abstract description 35
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 4
- 238000001704 evaporation Methods 0.000 claims description 31
- 230000008020 evaporation Effects 0.000 claims description 29
- 230000002459 sustained effect Effects 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 7
- 238000009434 installation Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000000576 coating method Methods 0.000 abstract description 7
- 239000005083 Zinc sulfide Substances 0.000 abstract description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052984 zinc sulfide Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06C—DIGITAL COMPUTERS IN WHICH ALL THE COMPUTATION IS EFFECTED MECHANICALLY
- G06C1/00—Computing aids in which the computing members form at least part of the displayed result and are manipulated directly by hand, e.g. abacuses or pocket adding devices
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F7/00—Apparatus for measuring unknown time intervals by non-electric means
- G04F7/04—Apparatus for measuring unknown time intervals by non-electric means using a mechanical oscillator
- G04F7/06—Apparatus for measuring unknown time intervals by non-electric means using a mechanical oscillator running only during the time interval to be measured, e.g. stop-watch
- G04F7/065—Apparatus for measuring unknown time intervals by non-electric means using a mechanical oscillator running only during the time interval to be measured, e.g. stop-watch with start-stop control arrangements
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Theoretical Computer Science (AREA)
- Computing Systems (AREA)
- Computer Hardware Design (AREA)
- Mathematical Physics (AREA)
- Physical Vapour Deposition (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
本发明涉及蒸发装置,它最好被用在真空涂覆设备中。该蒸发装置包括一个由两部分构成的壳体,即它包括一个槽(3)和一个所属的盖(8),在盖上设有用于待蒸发材料的流出缝(16)。在槽(3)上,横向分布着多个加热棒(5),它们从外面被接通且其辐射功率加热了在槽里的待蒸发材料如硫化锌并使其蒸发。该装置的构造比较简单并且容易进行拆卸、清洗和重新组装,如果多个这样的装置串联的话,则该装置也可被用于均匀涂覆很宽的薄膜。
Description
技术领域
本发明涉及一种如权利要求1前序部分所述的、用于升华材料的蒸发装置。
背景技术
这样的蒸发装置已在GB 2339800A中描述了。该蒸发装置例如要用在真空涂覆设备里,以便在薄膜上涂上某种薄层材料如硫化锌。这样的真空涂覆设备包括一个可被抽真空的容器,在该容器里有一个长条形井道,通过该井道并借助各种各样的辊来输送待涂覆的薄膜或薄膜幅材。在井道里装有该蒸发装置,因而使从蒸发装置里出来的蒸气能够以薄层形式淀积在该薄膜上。
蒸发装置主要包括用于容纳待蒸发材料的长长的槽和一个加热装置。GB 2339800尤其规定了,加热装置由辐射加热器构成,这些加热器布置在槽下面并且加热槽底部并因而间接加热待蒸发材料,由此使其蒸发。其它一些装置设有电阻加热装置,它们与槽直接接触并因而通过对流来传导热量。
通常,存在这样的问题,即蒸发装置必须能够容纳比较多的待蒸发材料,从而使涂覆设备能够尽可能长时间地连续运转。而另一方面,必须定期进行清洗,因为待蒸发材料不仅淀积在薄膜上,也淀积在蒸发装置和涂覆装置的其它部位上。因此,蒸发装置必须可以比较容易卸下来并可在清洗之后容易地重新装上去。此外,必须在薄膜宽度范围里,也就是在蒸发装置长度范围里有尽可能均匀的蒸气流出速率,从而能够均匀地涂覆薄膜。
发明内容
为满足上述要求,本发明在一种如权利要求1前序部分所述的蒸发装置中建议,辐射加热器成加热棒形式,它们位于槽之上,因而发出的热量直接对准在槽里的待涂覆材料。
这样一来,首先可以非常均匀地输入热量,因为热量分布不会因槽内热量变化而受到影响。另外,恰好加热在槽内靠上的材料块,因而没有出现因热量经过底部和在槽里的底层材料而造成的热量传输损失。
通常用一个盖将该槽封闭起来,该盖具有一个用于使蒸气流出的流出缝。
由于加热装置位于槽之上而在盖之下,所以它们位于由槽和盖所形成的壳体内。辐射加热器的辐射功率因而也作用于盖的内表面上,这就阻止了材料又会在盖壁上升华。
通常,槽的长度远大于其宽度,其中,在这种情况下,多个加热棒横向于槽的延伸纵向地布置。
此外,加热棒在两侧被保持在一个由高温陶瓷制成的支承环里。这就允许甚至用一种导电的并因而一般也能良好导热的材料如钼来制造槽和盖,因此,支承环可以实现加热棒相对壳体的电绝缘。
为了简单安装,套装到加热棒上的支承环被安放在槽口边缘上。盖或槽在其外壁上具有包围支承边缘的缺口,从而该壳体除了用于使蒸气流出的流出缝外全被封闭起来,这尤其造成使蒸气毫无例外地通过流出缝流向薄膜。这样一来,获得了良好的收益。
这些加热棒略长于槽宽度,因而,它们可以朝向槽的两边突出并且从外面被导电接通。
为此,涂覆设备的蒸镀室具有带电接点的侧杆,其中至少一侧的杆可以横向移动,因而它们能够跨过从蒸镀室壁到蒸发装置的距离。
附图说明
以下根据一个实施例对本发明进行详细说明。所示为:
图1:装有本发明蒸发装置的一个敞开的涂覆设备;
图2:取下盖的一个蒸发装置;
图3:表示图1所示涂覆设备的横断面。
具体实施方式
首先参见图1。人们可以看到一个涂覆设备的蒸镀室1,它成井状分布在设备的宽度范围里。借助未示出的辊,可使待涂覆薄膜幅材经过蒸镀室开口。在蒸镀室1里有一个蒸发装置2,它由两个长长的槽3构成,这些槽的短边相互接触。在槽3里有待蒸发材料4,在这里是硫化锌颗粒,它们作为散料被装入该槽里。在每个槽3上设有三个加热棒5,它们彼此等间距地布置着。它们由支承环6固定住,其中加热棒5的两端侧伸出槽3外并能与从蒸镀室壁里伸出去的接点杆7接通。槽3借助盖被关闭,在此图中未示出盖,但在图2中详细示出了盖。该图示出了槽3,在这里,为清楚起见而将对应的盖8从侧面取下。
槽3是一个长方体形中空体,其上表面完全敞开,因而有一个矩形环绕的槽边缘9,它由槽3的短侧壁和长侧壁10的边缘构成。
如上已述,最好由石墨制成的加热棒5被固定在支承环6里。支承环成矩形并有一个适应于加热棒5横断面的内孔11,加热棒5的各端穿过该内孔11。支承环6的外边缘有一个环绕的槽12,其宽度约等于制成槽3和盖8的板的厚度。加热棒5安放在槽3上,其中,槽边缘9被装入支承环6的槽12里。
在槽3旁边画出的盖8成双坡屋顶房子的形状,也就是说,它有两个矩形侧壁板13、两个屋顶斜坡14和两个山墙壁15。屋顶斜坡14在双坡屋顶的屋脊处合在一起,除了留有一道缝隙外,该缝隙作为在壳体中产生的蒸气的流出缝16。
盖8的侧壁板13的高度大致与支承环6一样并具有矩形的边缘敞开的相应缺口17,它们适配于支承环6的形状,因此,如果装上了盖,则缺口17的边缘就伸入支承环6的槽12里。因此,在装上盖8时,就出现一个封闭的壳体,三根加热棒5横向穿过该壳体并且在上表面上有一道用于使所产生的蒸气流出的流出缝16。
为了再表达清楚一些,图3表示蒸发装置2的一个横截面。由一个槽3和一个盖8构成的壳体的轮廓的横截面成矩形状,在其短边上接上一个三角形。在矩形壳体区的上三分之一处,从壳体中穿出加热棒5,这些加热棒的横断面成矩形并以其平的面指向下。图3的左侧示出一个固定的接点杆7a,它用于接通由壳体里伸出来的加热棒5的一端。在另一面上是一个可移动的接点杆7b,它抵靠在从壳体里伸出的加热棒5的另一端上。通过接点杆使加热棒5连到供电线路上,它通过流过的电流发热,其中,热能以辐射功率的形式特别是被输出给槽3内的材料4,然后使材料蒸发。
在盖8的斜坡上还有带穿孔的盖板18,它虽然允许蒸气通过,但阻止材料碎块被排到蒸镀室1中。
附图标记一览表
1.蒸镀室;2.蒸发装置;3.槽;4.材料;5.加热棒;6.支承环;7.接点杆;8.盖;9.边缘;10.侧壁板;11.内孔;12.槽;13.侧壁板;14.屋顶斜板;15.山墙壁;16.流出缝;17.边缘敞开的缺口;18.盖板;
Claims (8)
1.一种蒸发装置,它尤其用在用于薄膜的真空涂覆设备里,它包括至少一个用于容纳待蒸发材料(4)的槽(3)和一个由辐射加热器构成的加热装置,其特征在于,该辐射加热器被设计成加热棒(5)的形状,它们位于该槽(3)的上方。
2.按权利要求1所述的蒸发装置,其特征在于,在该槽(3)上有一个盖(2),该盖具有一个用于已蒸发材料的流出缝(16),其中,该加热棒(5)本身位于由该盖(8)和该槽(3)构成的壳体里。
3.按权利要求1或2所述的蒸发装置,其特征在于,该壳体的长度大于宽度并且在纵向上各有多个横向于该槽(3)的延伸纵向地布置的加热棒(5)。
4.按上述权利要求之一所述的蒸发装置,其特征在于,每个加热棒(5)在两侧被固定在各一个由高温陶瓷制成的支承环(6)里。
5.按权利要求4所述的蒸发装置,其特征在于,这些支承环(6)安置在槽边缘(9)上并穿过相应的边缘敞开的缺口(17)地伸入该盖(8)或该槽(3)里。
6.按上述权利要求之一所述的蒸发装置,其特征在于,所述加热棒(5)的正面侧伸出到该壳体外。
7.按上述权利要求之一所述的蒸发装置,其特征在于,这些加热棒(5)成扁平状并最好具有矩形横断面,其中该平坦侧面指向该槽(3)。
8.按上述权利要求之一所述的蒸发装置,其特征在于,这些支承环(6)有一个环绕的槽(12),该槽(3)或该盖(8)的边缘插入此槽(12)内。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004001884A DE102004001884A1 (de) | 2004-01-14 | 2004-01-14 | Verdampfungseinrichtung für sublimierende Materialien |
DE102004001884.7 | 2004-01-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1641066A true CN1641066A (zh) | 2005-07-20 |
CN1333104C CN1333104C (zh) | 2007-08-22 |
Family
ID=34609530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100323466A Withdrawn - After Issue CN1333104C (zh) | 2004-01-14 | 2004-04-02 | 用于升华材料的蒸发装置 |
Country Status (10)
Country | Link |
---|---|
US (1) | US20050150975A1 (zh) |
EP (1) | EP1555334B1 (zh) |
JP (1) | JP2005200767A (zh) |
KR (1) | KR100642057B1 (zh) |
CN (1) | CN1333104C (zh) |
AT (1) | ATE394520T1 (zh) |
DE (2) | DE102004001884A1 (zh) |
PL (1) | PL1555334T3 (zh) |
RU (1) | RU2307877C2 (zh) |
TW (1) | TWI269816B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105132866A (zh) * | 2015-09-08 | 2015-12-09 | 京东方科技集团股份有限公司 | 一种蒸镀机的加热源装置及蒸镀机 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5361467B2 (ja) * | 2009-03-13 | 2013-12-04 | 東京エレクトロン株式会社 | 気化器 |
KR20140025795A (ko) * | 2012-08-22 | 2014-03-05 | 에스엔유 프리시젼 주식회사 | 선택적 선형 증발 장치 |
KR102227546B1 (ko) * | 2014-01-20 | 2021-03-15 | 주식회사 선익시스템 | 대용량 증발원 및 이를 포함하는 증착장치 |
CN104404451A (zh) * | 2014-12-16 | 2015-03-11 | 合肥鑫晟光电科技有限公司 | 蒸镀源和蒸镀装置 |
WO2018114373A1 (en) * | 2016-12-22 | 2018-06-28 | Flisom Ag | Linear source for vapor deposition with at least three electrical heating elements |
CN108330444A (zh) * | 2018-02-11 | 2018-07-27 | 常德金德新材料科技股份有限公司 | 一种制备硫化锌膜的方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3041493A (en) * | 1950-08-30 | 1962-06-26 | Sylvania Electric Prod | Electron discharge device |
US3027150A (en) * | 1958-03-10 | 1962-03-27 | Hoerder Huettenunion Ag | Apparatus for treating steel melts |
JPS5048855U (zh) * | 1973-09-04 | 1975-05-14 | ||
JPS5224050U (zh) * | 1975-08-08 | 1977-02-19 | ||
US4045638A (en) * | 1976-03-09 | 1977-08-30 | Bing Chiang | Continuous flow heat treating apparatus using microwaves |
DE2723581C2 (de) * | 1977-03-08 | 1984-11-29 | Techtransfer GmbH, 7000 Stuttgart | Verfahren zum aeroben Verrotten von tierischen Exkrementen oder Klärschlamm sowie Anlage zur Durchführung des Verfahrens |
JPS5943872A (ja) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸発材料収容器 |
JPH0269961U (zh) * | 1988-11-17 | 1990-05-28 | ||
JPH0762239B2 (ja) * | 1990-09-28 | 1995-07-05 | 三菱重工業株式会社 | 真空蒸着装置 |
JP2583159B2 (ja) * | 1991-02-08 | 1997-02-19 | 株式会社小松製作所 | 流体加熱器 |
DE4104415C1 (zh) * | 1991-02-14 | 1992-06-04 | 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De | |
JPH04308076A (ja) * | 1991-04-03 | 1992-10-30 | Mitsubishi Heavy Ind Ltd | 昇華性物質真空蒸着装置 |
FR2693480B1 (fr) * | 1992-07-08 | 1994-08-19 | Icbt Roanne | Dispositif de chauffage d'un fil en mouvement. |
JPH11246963A (ja) * | 1998-03-05 | 1999-09-14 | Nikon Corp | 蒸着用ボートとそれを用いて成膜した光学薄膜 |
JP2000248358A (ja) * | 1999-03-01 | 2000-09-12 | Casio Comput Co Ltd | 蒸着装置および蒸着方法 |
US20050034847A1 (en) * | 2003-08-11 | 2005-02-17 | Robert Graham | Monolithic tube sheet and method of manufacture |
-
2004
- 2004-01-14 DE DE102004001884A patent/DE102004001884A1/de not_active Ceased
- 2004-03-03 DE DE502004007046T patent/DE502004007046D1/de not_active Expired - Lifetime
- 2004-03-03 AT AT04004928T patent/ATE394520T1/de not_active IP Right Cessation
- 2004-03-03 PL PL04004928T patent/PL1555334T3/pl unknown
- 2004-03-03 EP EP04004928A patent/EP1555334B1/de not_active Expired - Lifetime
- 2004-03-08 TW TW093106035A patent/TWI269816B/zh not_active IP Right Cessation
- 2004-04-02 CN CNB2004100323466A patent/CN1333104C/zh not_active Withdrawn - After Issue
- 2004-04-21 KR KR1020040027333A patent/KR100642057B1/ko not_active IP Right Cessation
- 2004-12-01 US US11/001,528 patent/US20050150975A1/en not_active Abandoned
- 2004-12-22 RU RU2004137526/02A patent/RU2307877C2/ru active
-
2005
- 2005-01-13 JP JP2005006628A patent/JP2005200767A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105132866A (zh) * | 2015-09-08 | 2015-12-09 | 京东方科技集团股份有限公司 | 一种蒸镀机的加热源装置及蒸镀机 |
CN105132866B (zh) * | 2015-09-08 | 2018-02-16 | 京东方科技集团股份有限公司 | 一种蒸镀机的加热源装置及蒸镀机 |
Also Published As
Publication number | Publication date |
---|---|
DE102004001884A1 (de) | 2005-08-11 |
JP2005200767A (ja) | 2005-07-28 |
RU2307877C2 (ru) | 2007-10-10 |
RU2004137526A (ru) | 2006-06-10 |
EP1555334A1 (de) | 2005-07-20 |
KR100642057B1 (ko) | 2006-11-10 |
TWI269816B (en) | 2007-01-01 |
DE502004007046D1 (de) | 2008-06-19 |
US20050150975A1 (en) | 2005-07-14 |
KR20050074882A (ko) | 2005-07-19 |
CN1333104C (zh) | 2007-08-22 |
TW200523382A (en) | 2005-07-16 |
ATE394520T1 (de) | 2008-05-15 |
EP1555334B1 (de) | 2008-05-07 |
PL1555334T3 (pl) | 2008-10-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4681498B2 (ja) | 蒸着装置 | |
EP1135542B1 (en) | Vapor source having linear aperture and coating process | |
CN1333104C (zh) | 用于升华材料的蒸发装置 | |
US6719848B2 (en) | Chemical vapor deposition system | |
US20070022956A1 (en) | Evaporator device | |
TW200304171A (en) | Elongated thermal physical vapor deposition source with plural apertures for making an organic light-emitting device | |
JP2007500794A (ja) | 薄膜蒸着エバポレーター | |
KR102260572B1 (ko) | 복수의 증발원을 갖는 박막 증착장치 | |
KR20040043360A (ko) | 다증발원을 이용한 동시증착에서 균일하게 혼합된 박막의증착을 위한 증발 영역조절장치 | |
CN101041891A (zh) | 汽相淀积源和汽相淀积装置 | |
WO2005083145A2 (en) | Vapor deposition source with minimized condensation effects | |
DE102017003516A1 (de) | Beschichtungsvorrichtung und Verfahren zur reaktiven Dampfphasenabscheidung unter Vakuum auf einem Substrat | |
JP2019508571A (ja) | 材料堆積装置、真空堆積システム、及び真空堆積を行う方法 | |
CN111655898A (zh) | 用于蒸发源材料的蒸发器、材料沉积源、沉积装置及其方法 | |
CN1421542A (zh) | 有机材料蒸发源 | |
WO2012059439A1 (de) | Verfahren und vorrichtung zum kontinuierlichen beschichten von substraten | |
TWI689616B (zh) | 用於塗佈大型基板之裝置 | |
KR102080764B1 (ko) | 리니어소스 및 그를 가지는 박막증착장치 | |
TWI704244B (zh) | 用於沈積已蒸發材料於一基板上的蒸發源、沈積設備、測量蒸發源之蒸汽壓力的方法、用以決定一已蒸發材料的一蒸發率的方法、及測量蒸汽壓力差的方法 | |
WO2019197418A1 (de) | Labortemperiervorrichtungen | |
DE102009058038B4 (de) | Anordnung zum Temperieren von bandförmigen Substraten | |
KR102672457B1 (ko) | 증착 장치 | |
US20140076362A1 (en) | Continuous substrate treatment plant and cleaning method | |
CN112912534B (zh) | 真空蒸镀装置用蒸镀源 | |
CN219731042U (zh) | 一种真空蒸镀设备 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
AV01 | Patent right actively abandoned | ||
AV01 | Patent right actively abandoned | ||
C20 | Patent right or utility model deemed to be abandoned or is abandoned |