CN1630551A - 生产光致抗蚀剂组合物用成膜树脂的方法 - Google Patents
生产光致抗蚀剂组合物用成膜树脂的方法 Download PDFInfo
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- CN1630551A CN1630551A CNA028080858A CN02808085A CN1630551A CN 1630551 A CN1630551 A CN 1630551A CN A028080858 A CNA028080858 A CN A028080858A CN 02808085 A CN02808085 A CN 02808085A CN 1630551 A CN1630551 A CN 1630551A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
- B01J20/28033—Membrane, sheet, cloth, pad, lamellar or mat
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28002—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their physical properties
- B01J20/28004—Sorbent size or size distribution, e.g. particle size
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
- B01J20/28028—Particles immobilised within fibres or filaments
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
- B01J20/2803—Sorbents comprising a binder, e.g. for forming aggregated, agglomerated or granulated products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28054—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their surface properties or porosity
- B01J20/28078—Pore diameter
- B01J20/28085—Pore diameter being more than 50 nm, i.e. macropores
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J47/00—Ion-exchange processes in general; Apparatus therefor
- B01J47/018—Granulation; Incorporation of ion-exchangers in a matrix; Mixing with inert materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J47/00—Ion-exchange processes in general; Apparatus therefor
- B01J47/12—Ion-exchange processes in general; Apparatus therefor characterised by the use of ion-exchange material in the form of ribbons, filaments, fibres or sheets, e.g. membranes
- B01J47/133—Precoat filters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/14—Treatment of polymer emulsions
- C08F6/16—Purification
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
金属离子 | 过滤前浓度(ppb) | 过滤后浓度(ppb) |
Na | 101 | 4 |
K | 29 | 1 |
金属离子 | 过滤前的浓度(ppb) | 滤过40Q之后的浓度(ppb) | 滤过020EC之后的浓度(ppb) |
Na | 129 | 6 | 12 |
K | 34 | 2 | 2 |
Fe | 40 | 29 | 6 |
Cr | 10 | 1 | 2 |
Cu | 9 | 3 | 4 |
Ni | 28 | 14 | 13 |
Ca | 35 | 5 | 4 |
Al | 5 | 1 | <1 |
Mg | 15 | 5 | 2 |
Mn | 12 | 1 | 3 |
Zn | 4 | 1 | <1 |
Pb | 14 | 3 | 2 |
金属离子 | 过滤前的浓度(ppb) | 滤过020EC之后的浓度(ppb) | 滤过40Q之后的浓度(ppb) |
Na | 80 | 74 | 16 |
K | 5 | 9 | 5 |
Fe | 19 | 10 | 11 |
Cr | 1 | <1 | 1 |
Cu | 2 | <1 | 2 |
Ni | 3 | 2 | 2 |
Ca | 12 | 8 | 6 |
Al | 3 | 2 | 2 |
Mg | 1 | 3 | 5 |
Mn | <1 | <1 | <1 |
Zn | 28 | 14 | 8 |
金属离子 | 过滤前的浓度(ppb) | 滤过020EC之后的浓度(ppb) | 滤过40Q之后的浓度(ppb) |
Na | 62 | 5 | 2 |
K | 14 | 1 | <1 |
Fe | 152 | 41 | 61 |
Cr | 10 | 7 | 6 |
Cu | 3 | 2 | <1 |
Ni | 14 | 9 | 9 |
Ca | 8 | 2 | 2 |
Al | 3 | 2 | <1 |
Mg | 1 | 3 | 1 |
Mn | 3 | 2 | 1 |
Zn | 12 | 5 | 4 |
金属离子 | 过滤前的浓度(ppb) | 滤过020EC之后的浓度(ppb) | 滤过40Q之后的浓度(ppb) |
Na | 70 | 4 | 5 |
K | 2 | <1 | <1 |
Fe | 5 | 4 | 3 |
Cr | <1 | <1 | <1 |
Cu | 2 | 2 | 2 |
Ni | 3 | 3 | 2 |
Ca | 3 | 2 | 2 |
Al | 1 | 2 | 1 |
Mg | 3 | 2 | 3 |
Mn | <1 | 4 | 2 |
Zn | 14 | 12 | 9 |
Pb | 4 | 3 | 2 |
金属离子 | 过滤前的浓度(ppb) | 滤过40Q之后的浓度(ppb) |
Na | 21 | 2 |
K | 8 | <1 |
Fe | 4 | 4 |
Cr | <1 | <1 |
Cu | 4 | 2 |
Ni | 2 | <1 |
Ca | 8 | <1 |
Al | 2 | <1 |
Mg | <1 | 1 |
Mn | <1 | <1 |
Zn | 3 | 3 |
Pb | <1 | <1 |
金属离子 | 过滤前的浓度(ppb) | 滤过40Q之后的浓度(pp.) |
Na | 21 | 1 |
K | 8 | <1 |
Fe | 4 | 3 |
Kr | <1 | <1 |
Cu | 4 | 3 |
In | 2 | <1 |
Ca | 8 | <1 |
Al | 2 | <1 |
Mg | <1 | <1 |
Mn | <1 | <1 |
Zn | 3 | 3 |
Pb | <1 | <1 |
Claims (46)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/833,226 | 2001-04-11 | ||
US09/833,226 US6610465B2 (en) | 2001-04-11 | 2001-04-11 | Process for producing film forming resins for photoresist compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1630551A true CN1630551A (zh) | 2005-06-22 |
CN1321737C CN1321737C (zh) | 2007-06-20 |
Family
ID=25263794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028080858A Expired - Fee Related CN1321737C (zh) | 2001-04-11 | 2002-03-19 | 生产光致抗蚀剂组合物用成膜树脂的方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6610465B2 (zh) |
EP (1) | EP1379331A2 (zh) |
JP (1) | JP4072063B2 (zh) |
KR (1) | KR100806649B1 (zh) |
CN (1) | CN1321737C (zh) |
MY (1) | MY122854A (zh) |
TW (1) | TWI241462B (zh) |
WO (1) | WO2002084402A2 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103246162A (zh) * | 2012-02-08 | 2013-08-14 | 株式会社田村制作所 | 固化性树脂组合物 |
CN110730790A (zh) * | 2017-06-05 | 2020-01-24 | 中央硝子株式会社 | 含氟单体、含氟聚合物与使用其的图案形成用组合物、及其图案形成方法 |
CN111155349A (zh) * | 2020-01-09 | 2020-05-15 | 浙江理工大学 | 一种负性光刻胶用纤维素基成膜树脂的制备方法 |
CN111155350A (zh) * | 2020-01-13 | 2020-05-15 | 浙江理工大学 | 一种正性光刻胶用纤维素基成膜树脂的制备方法 |
CN115873175A (zh) * | 2021-09-28 | 2023-03-31 | 上海新阳半导体材料股份有限公司 | 一种duv光刻用底部抗反射涂层及其制备方法和应用 |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
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US6878501B2 (en) * | 2000-04-27 | 2005-04-12 | Shin-Etsu Chemical Co., Ltd. | Polymer, chemically amplified resist composition and patterning process |
US6773872B2 (en) * | 2000-12-29 | 2004-08-10 | Shipley Company, L.L.C. | Reduction of inorganic contaminants in polymers and photoresist compositions comprising same |
AU2002255598A1 (en) * | 2001-02-25 | 2002-09-12 | Shipley Company, L.L.C. | Polymers and photoresist compositions |
US6531267B2 (en) * | 2001-04-11 | 2003-03-11 | Clariant Finance (Bvi) Limited | Process for producing acid sensitive liquid composition containing a carbonate |
DE10131670A1 (de) | 2001-06-29 | 2003-01-16 | Infineon Technologies Ag | Fotoresists mit Reaktionsankern für eine chemische Nachverstärkung von Resiststrukturen für Belichtungen bei 157 nm |
JP4216494B2 (ja) * | 2001-09-21 | 2009-01-28 | 富士フイルム株式会社 | 平版印刷版原版 |
TWI300165B (en) * | 2003-08-13 | 2008-08-21 | Tokyo Ohka Kogyo Co Ltd | Resin for resist, positive resist composition and resist pattern formation method |
JP4979945B2 (ja) * | 2003-09-30 | 2012-07-18 | 日本メジフィジックス株式会社 | 放射性フッ素化合物の製造方法 |
US7488565B2 (en) * | 2003-10-01 | 2009-02-10 | Chevron U.S.A. Inc. | Photoresist compositions comprising diamondoid derivatives |
TWI291473B (en) | 2004-06-08 | 2007-12-21 | Tokyo Ohka Kogyo Co Ltd | Polymer, positive resist composition, and method for forming resist pattern |
US20060014887A1 (en) * | 2004-07-19 | 2006-01-19 | 3M Innovative Properties Company | Method of hydrolyzing a dispersion of ionic fluoropolymer |
US7304101B2 (en) * | 2004-07-19 | 2007-12-04 | 3M Innovative Properties Company | Method of purifying a dispersion of ionic fluoropolymer |
KR100689401B1 (ko) * | 2004-07-30 | 2007-03-08 | 주식회사 하이닉스반도체 | 포토레지스트 중합체 및 이를 함유하는 포토레지스트 조성물 |
JP4577172B2 (ja) * | 2004-09-28 | 2010-11-10 | 住友化学株式会社 | 化学増幅型レジスト組成物 |
KR20060051603A (ko) * | 2004-09-28 | 2006-05-19 | 스미또모 가가꾸 가부시키가이샤 | 화학 증폭 레지스트 조성물 |
US20060102554A1 (en) * | 2004-11-12 | 2006-05-18 | Munirathna Padmanaban | Process for producing film forming resins for photoresist compositions |
JP4881566B2 (ja) * | 2005-03-10 | 2012-02-22 | 丸善石油化学株式会社 | ポジ型感光性樹脂、その製造方法及びポジ型感光性樹脂を含むレジスト組成物 |
JP5002137B2 (ja) * | 2005-07-28 | 2012-08-15 | 富士フイルム株式会社 | 化学増幅型レジスト組成物及びその製造方法 |
US20070065756A1 (en) * | 2005-09-16 | 2007-03-22 | Quantiscript Inc., Universite De Sherbrooke | High sensitivity electron beam resist processing |
KR101186740B1 (ko) | 2006-02-17 | 2012-09-28 | 삼성전자주식회사 | 뱅크형성 방법 및 이에 의해 형성된 뱅크를 함유하는 유기박막 트랜지스터 |
US20070248913A1 (en) * | 2006-04-24 | 2007-10-25 | Rahman M Dalil | Process for producing film forming resins for photoresist compositions |
JP4979300B2 (ja) * | 2006-08-04 | 2012-07-18 | 三菱レイヨン株式会社 | 重合体湿粉、重合体湿粉の製造方法、および重合体の製造方法 |
KR101429790B1 (ko) * | 2007-01-23 | 2014-08-18 | 미츠비시 레이온 가부시키가이샤 | (메트)아크릴계 중합체 입자, 그 제조 방법, (메트)아크릴계 중합체 입자를 이용한 플라스티졸 조성물 및 이것을 이용한 물품 |
US20100136477A1 (en) * | 2008-12-01 | 2010-06-03 | Ng Edward W | Photosensitive Composition |
JP5282015B2 (ja) * | 2008-12-09 | 2013-09-04 | 住友化学株式会社 | 樹脂溶解液の精製方法、取得方法及び化学増幅型フォトレジスト組成物の製造方法 |
WO2012122022A1 (en) | 2011-03-10 | 2012-09-13 | 3M Innovative Properties Company | Filtration media |
JP2013061426A (ja) * | 2011-09-12 | 2013-04-04 | Nomura Micro Sci Co Ltd | フォトレジスト膜形成用樹脂溶液の不純物除去方法、不純物除去用濾過部材及び不純物除去用濾過装置 |
JP6297269B2 (ja) * | 2012-06-28 | 2018-03-20 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ポリマー組成物、このポリマー組成物を含むフォトレジスト、およびこのフォトレジストを含むコーティングされた物品 |
JP6241038B2 (ja) * | 2013-01-15 | 2017-12-06 | 住友ベークライト株式会社 | ポリマーの製造方法 |
TWI559082B (zh) | 2014-07-07 | 2016-11-21 | 財團法人工業技術研究院 | 生質材料與其形成方法與印刷電路板 |
JP6445382B2 (ja) * | 2015-04-24 | 2018-12-26 | 信越化学工業株式会社 | リソグラフィー用塗布膜形成用組成物の製造方法及びパターン形成方法 |
KR102168680B1 (ko) * | 2017-12-06 | 2020-10-21 | 주식회사 엘지화학 | 포토폴리머 조성물 |
JP7258420B2 (ja) * | 2019-01-18 | 2023-04-17 | 株式会社ディスコ | レーザーダイシング用保護膜剤、レーザーダイシング用保護膜剤の製造方法及びレーザーダイシング用保護膜剤を用いた被加工物の加工方法 |
KR102603722B1 (ko) | 2021-10-25 | 2023-11-17 | 한국기계연구원 | 계단 승강 휠체어 |
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EP0635145B1 (en) * | 1992-03-06 | 1998-08-19 | Clariant Finance (BVI) Limited | Photoresists having a low level of metal ions |
US5656413A (en) * | 1995-09-28 | 1997-08-12 | Hoechst Celanese Corporation | Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom |
US5962183A (en) * | 1995-11-27 | 1999-10-05 | Clariant Finance (Bvi) Limited | Metal ion reduction in photoresist compositions by chelating ion exchange resin |
JP3765060B2 (ja) * | 1996-07-30 | 2006-04-12 | キュノ インコーポレーテッド | フィルターシート |
TW536666B (en) | 1998-02-02 | 2003-06-11 | Clariant Int Ltd | Process for producing a photoresist composition having a reduced tendency to produce particles |
KR100403325B1 (ko) * | 1998-07-27 | 2004-03-24 | 주식회사 하이닉스반도체 | 포토레지스트중합체및이를이용한포토레지스트조성물 |
JP4046258B2 (ja) * | 1999-05-31 | 2008-02-13 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
US6447980B1 (en) * | 2000-07-19 | 2002-09-10 | Clariant Finance (Bvi) Limited | Photoresist composition for deep UV and process thereof |
US6531267B2 (en) * | 2001-04-11 | 2003-03-11 | Clariant Finance (Bvi) Limited | Process for producing acid sensitive liquid composition containing a carbonate |
-
2001
- 2001-04-11 US US09/833,226 patent/US6610465B2/en not_active Expired - Fee Related
-
2002
- 2002-03-01 TW TW091103760A patent/TWI241462B/zh not_active IP Right Cessation
- 2002-03-19 CN CNB028080858A patent/CN1321737C/zh not_active Expired - Fee Related
- 2002-03-19 WO PCT/EP2002/002997 patent/WO2002084402A2/en active Application Filing
- 2002-03-19 JP JP2002582086A patent/JP4072063B2/ja not_active Expired - Fee Related
- 2002-03-19 EP EP02742860A patent/EP1379331A2/en not_active Withdrawn
- 2002-03-19 KR KR1020037013303A patent/KR100806649B1/ko not_active IP Right Cessation
- 2002-04-09 MY MYPI20021284A patent/MY122854A/en unknown
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103246162A (zh) * | 2012-02-08 | 2013-08-14 | 株式会社田村制作所 | 固化性树脂组合物 |
CN103246162B (zh) * | 2012-02-08 | 2018-07-24 | 株式会社田村制作所 | 固化性树脂组合物 |
CN110730790A (zh) * | 2017-06-05 | 2020-01-24 | 中央硝子株式会社 | 含氟单体、含氟聚合物与使用其的图案形成用组合物、及其图案形成方法 |
CN110730790B (zh) * | 2017-06-05 | 2021-06-15 | 中央硝子株式会社 | 含氟单体、含氟聚合物与使用其的图案形成用组合物、及其图案形成方法 |
CN111155349A (zh) * | 2020-01-09 | 2020-05-15 | 浙江理工大学 | 一种负性光刻胶用纤维素基成膜树脂的制备方法 |
CN111155350A (zh) * | 2020-01-13 | 2020-05-15 | 浙江理工大学 | 一种正性光刻胶用纤维素基成膜树脂的制备方法 |
CN115873175A (zh) * | 2021-09-28 | 2023-03-31 | 上海新阳半导体材料股份有限公司 | 一种duv光刻用底部抗反射涂层及其制备方法和应用 |
CN115873175B (zh) * | 2021-09-28 | 2023-09-12 | 上海新阳半导体材料股份有限公司 | 一种duv光刻用底部抗反射涂层及其制备方法和应用 |
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KR20040030576A (ko) | 2004-04-09 |
JP4072063B2 (ja) | 2008-04-02 |
JP2004523806A (ja) | 2004-08-05 |
EP1379331A2 (en) | 2004-01-14 |
KR100806649B1 (ko) | 2008-02-26 |
CN1321737C (zh) | 2007-06-20 |
MY122854A (en) | 2006-05-31 |
US6610465B2 (en) | 2003-08-26 |
WO2002084402A3 (en) | 2002-12-12 |
TWI241462B (en) | 2005-10-11 |
US20020197555A1 (en) | 2002-12-26 |
WO2002084402A2 (en) | 2002-10-24 |
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