CN1589332A - 合金的新用途 - Google Patents
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- CN1589332A CN1589332A CN02823130.9A CN02823130A CN1589332A CN 1589332 A CN1589332 A CN 1589332A CN 02823130 A CN02823130 A CN 02823130A CN 1589332 A CN1589332 A CN 1589332A
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 38
- 239000000956 alloy Substances 0.000 title claims abstract description 38
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 30
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 26
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims abstract description 20
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 15
- 239000010703 silicon Substances 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 14
- 238000005260 corrosion Methods 0.000 claims abstract description 11
- 230000007797 corrosion Effects 0.000 claims abstract description 11
- 238000005070 sampling Methods 0.000 claims abstract description 4
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 3
- -1 antimony halide Chemical class 0.000 claims abstract 2
- 239000004411 aluminium Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 4
- 238000003860 storage Methods 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 239000000376 reactant Substances 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 238000003682 fluorination reaction Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 150000004812 organic fluorine compounds Chemical class 0.000 abstract 1
- 238000003786 synthesis reaction Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910021630 Antimony pentafluoride Inorganic materials 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 4
- VBVBHWZYQGJZLR-UHFFFAOYSA-I antimony pentafluoride Chemical compound F[Sb](F)(F)(F)F VBVBHWZYQGJZLR-UHFFFAOYSA-I 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 229910000856 hastalloy Inorganic materials 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 230000002140 halogenating effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- BNIXVQGCZULYKV-UHFFFAOYSA-N pentachloroethane Chemical compound ClC(Cl)C(Cl)(Cl)Cl BNIXVQGCZULYKV-UHFFFAOYSA-N 0.000 description 2
- 229940095064 tartrate Drugs 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000004826 seaming Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/02—Alloys based on aluminium with silicon as the next major constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00245—Avoiding undesirable reactions or side-effects
- B01J2219/00247—Fouling of the reactor or the process equipment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0236—Metal based
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
- B01J2219/0277—Metal based
- B01J2219/029—Non-ferrous metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
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- Chemical & Material Sciences (AREA)
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Catalysts (AREA)
- Chemically Coating (AREA)
Abstract
本发明涉及能耐受化学腐蚀性介质,如含有氟化氢和能释放出氟化氢的介质的合金。该合金含有铝和镍或铝和硅。其能例如用于制备可用于特别是在使用有卤化锑催化剂情况下的氟化反应的设备体,如反应容器、管道、搅拌装置、取样装置等。
Description
本发明涉及合金的新用途,该合金含有镍和/或硅以及至少3.5重量%的铝。
众所周知,有些化学介质,例如化合物(如氟化氢、氢氟酸)、反应介质(如含有氟化氢或氢氟酸的蚀刻溶液或反应混合物)以及还有那些能释放出氟化氢(例如通过水解或作为反应产物)的介质,都是极具腐蚀性的。对此,如欧洲专利申请EP-A-0823412中所述,即使那些抗腐蚀材料如HastelloyTM、InconelTM和MonelTM也会被侵蚀。在欧洲公开文献中推荐将一种含有至少10重量%的铝的材料用于卤化反应中。其他优选的材料是铁、铜、锰、钴和铬。
在英国专利文本GB853297中已经公开了在卤化反应时几乎是纯的铝的耐腐蚀性。
本发明的任务在于提供适于和化学腐蚀性介质相接触的合金。
根据本发明,使用含有镍和/或硅以及至少3.5重量%的铝、优选至少4.5重量%铝的合金来制备与化学腐蚀性介质相接触的设备体。
所谓“腐蚀性介质”指的是能够腐蚀HastelloyTM、MonelTM或InconelTM的气态、液态和固态介质。在本发明中,所谓的“化学腐蚀性介质”优选是指那些含有或能释放出氟化氢来的气态、液态或固态的物质,并特别优选是除了HF外还含有卤化烃化合物。
本发明中所谓的“设备体”,广义来说是指由金属制成的某个部分或是多个相互连接着的由金属制成的部分,且其优选在工业生产中是要和化学腐蚀性介质相接触的。例如,涉及其中保存有化学腐蚀性介质的、将其置于反应中的、对其进行净化或作任意处理的设备或容器,并且也指的是那些用于操控腐蚀性介质的物件。在本发明范畴内的设备体是指,例如,存贮容器、反应容器、分析设备、泵、控制阀。此处可以是指完整的容器或设备,也可以是指它们中的一部分,如管道、搅拌装置、测量棒。
设备体可以完全由所述的合金制成,但也可以只是那些和化学腐蚀性介质直接接触的部分由所述合金制成。设备体也可以只是在表面用所述合金进行镀层。而这可以例如通过喷镀或通过金属喷雾法来实现。这里,人们自然也可以设计只是对那些相应和化学腐蚀性介质接触的设备体部分进行镀层。
如在一个实施方式中,所使用的合金含有铝和硅或优选由它们组成。特别优选所用的合金含有80~92重量%的铝和8~20重量%的硅,或优选由它们组成。倘若在另一并非最优选的实施方式中要含有别的金属,则这种有关的金属是,例如,铬。倘若所用的合金优选由铝和硅组成,则有时也会含有非理想量(优选<2重量%)的其他金属。
试验证明,特别适合的一种合金含有11~13.5重量%的硅和其余补充至100重量%的铝。至今还将这种合金用于熔接电极。
根据另一个实施方式,所使用的合金含有铝和镍或是由它们组成。如下所述,即含有至少3.5重量%铝和优选至少5重量%镍。适宜的合金含有3.5~95重量%的铝和5~96.5重量%的镍或由它们组成。优选含有至少90重量%的镍。特别适合的合金含有3.5~10重量%的铝和90~96.5重量%的镍。极其优选的合金由3.5~10重量%的铝和90~96.5重量%的镍组成。有时又会含有非理想量(优选<2重量%)的其他金属。
本发明的另一项内容在于提供可用于和化学腐蚀性介质接触并在此过程中不被腐蚀的设备体。这种设备体含有至少3.5重量%铝,优选至少4.5重量%铝,特别优选至少8重量%的铝。此外其还含有镍和/或硅,或者其由含有至少3.5重量%的铝以及镍和/或硅的合金组成。优选的铝和镍或硅的各含量值对应于前述根据本发明进行使用的优选范围。至于本发明的设备体,优选涉及到的是反应器、存贮容器、它们的部件如管道、取样设备、蒸馏设备、搅拌器组件或控制阀。设备体可以完全由合金制成,或者其至少部分地在和腐蚀性介质相接触的那面上用合金镀覆。
本发明的再一项内容在于,在使用氟化氢或能释放出氟化氢的反应物的情况下制备氟化合物的方法。在本发明方法中使用一个或多个根据本发明的设备体。其中,设备体又是可以完全由所述合金组成的,或是完全由所述合金镀层的。然而也可以使用那些只有部分由所述合金组成的或只有部分用所述合金镀层的设备体。所述概念“制备氟化合物的方法”在本发明范围内也包括用于提纯氟化合物的方法,其中存在有氟化氢或释放出氟化氢的过程。
优选的本发明的方法包括制备有机氟化物,且其是通过卤素-氟交换法和/或在使用氟化氢和催化剂(优选金属卤化物-催化剂并特别优选使用卤化锑-催化剂或卤化钽-催化剂)的情况下的氟化氢-加成法而制得的。
设备体对于腐蚀性介质是非常稳定的。
下列实施例将对本发明作出进一步的阐述而非用来限制其范围。
实施例1:
对经镀层的样品进行腐蚀试验
对各种不同的镀层材料(参见表1)进行试验,这些材料镀覆到Hastelloy B 3型圆柱体上形成250μm的镀层厚度。该试验的目的在于找寻到一种镀层材料,其能耐受住存在有五氟化锑、氟化氢和有机物且温度为120℃压力为约15巴的条件。
试验进行过程:
对样品进行测量称重。第一步,在室温和常压下并在FEP烧瓶中用氟化氢对所有样品进行氟化15min。所有样品各以50g氟化氢在带有特氟隆(Teflon)内衬层的压煮器中并于120℃和约8巴的条件下氟化12小时。质量差异记录在表中。
为进行腐蚀试验,要将样品各自置于带有特氟隆内衬层的压煮器中,并加入40g的五氟化锑(0.18Mol),32g的氟化氢(1.6Mol)和15g的五氯乙烷(0.09Mol)。在120℃的油浴中加热压煮器48小时,然后将压煮器置于冰中冷却,打开,将样品从压煮器中取出并且腐蚀溶液在10%的酒石酸中进行水解。将样品块洗涤、干燥、称重并照相。
表1:腐蚀试验的结果
样品号 | 镀层材料 | 材料 | 质量差氟化液相 | 质量差催化液相 | 质量差氯化气相 | 面积cm2 | 腐蚀速率g/cm2 |
1 | AE7687(Al12Si) | 0.088g | 0.070g | 24.06 | 0.000 | ||
2 | Amdry 956 | Ni5Al | 0.138g | -2.266g | 0.043g | 23.88 | 0.095 |
3 | Metco 54Ns | Al99% | 0.090g | 0.035g | 0.018g | 23.69 | 0.000 |
4 | Metco 64C | Mo3C | 0.040g | -6.466g | - | 24.06 | 0.269 |
5 | Amdry 313X | Mo99.5 | 0.046g | -5.334g | - | 23.93 | 0.223 |
结果:
样品号1,2和3(对比实施例)的镀层材料在五氟化锑、氟化氢和有机物的混合物中,且在120℃和约15巴的条件下是稳定的。样品号4和5同样是对比实施例,它们表现出了强烈的腐蚀。
实施例2:
样品1和3的镀层材料的持续腐蚀试验
试验进行过程:
使用已经经历过48小时-试验的圆柱体样品。为进行腐蚀试验,要将样品各自置于带有特氟隆内衬层的压煮器中,并加入40g的五氟化锑(0.18Mol),32g的氟化氢(1.6Mol)和15g的五氯乙烷(0.09Mol)。
在120℃的油浴中加热压煮器233小时,然后将压煮器置于冰中冷却,打开,将样品从压煮器中取出并且将腐蚀溶液在10%的酒石酸中进行水解。将样品块洗涤、干燥并称重。
结果:
以Al12Si(样品号1)镀层的样品圆柱体没有显示出变化。在以Al99%(样品号3)镀层的样品圆柱体上,镀层在接缝区裂开了并导致产生了后壁处的腐蚀。在所试验的腐蚀体系中,材料Al12Si是稳定的。
Claims (13)
1、含有至少3.5重量%的铝以及镍和/或硅的合金在制备与化学腐蚀性介质接触的耐腐蚀设备体方面的用途。
2、根据权利要求1的用途,其特征在于,化学腐蚀性介质可以释放出氟化氢或含有氟化氢。
3、根据权利要求1的用途,其特征在于,合金中含有至少3.5重量%的铝和至少4.5重量%、优选至少8重量%的硅。
4、根据权利要求3的用途,其特征在于,合金含有80~92重量%的铝和8到20重量%的硅,或者是由它们组成。
5、根据权利要求1的用途,其特征在于,合金含有至少3.5重量%的铝和至少5重量%的镍。
6、根据权利要求5的用途,其特征在于合金含有3.5~95重量%的铝和5~96.5重量%的镍,或者是由它们组成。
7、根据权利要求6的用途,其特征在于,合金含有3.5~10重量%的铝和90~96.5重量%的镍,或者是由它们组成。
8、根据权利要求1的用途,其特征在于,设备体至少部分是由合金组成的,或是至少部分用合金镀覆的。
9、根据权利要求1的用途,其特征在于,所谓的设备体涉及存贮容器或反应容器、管道、取样装置或部件、搅拌装置组件、泵或控制阀。
10、可用于和化学腐蚀性介质相接触的设备体,其至少部分由含有至少2.5重量%的铝以及镍和/或硅的,或是由它们组成的合金构成或镀覆。
11、根据权利要求10的设备体,其选自反应容器、存贮容器、管道、泵、搅拌装置、取样装置或其部件和控制阀。
12、用于在使用氟化氢或能释放出氟化氢的反应物的情况下制备氟化物的方法,其特征在于,使用一个或多个如权利要求10的设备体。
13、根据权利要求12的方法,包括在使用氟化氢和催化剂的情况下制备有机氟化物,并优选是在使用基于卤化物的催化剂、特别是在基于卤化锑的催化剂的情况下制备。
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DE10163171.5 | 2001-12-21 | ||
DE10163171A DE10163171A1 (de) | 2001-12-21 | 2001-12-21 | Neue Verwendung für Legierungen |
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CN1589332A true CN1589332A (zh) | 2005-03-02 |
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CN02823130.9A Pending CN1589332A (zh) | 2001-12-21 | 2002-12-13 | 合金的新用途 |
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US (1) | US20050019487A1 (zh) |
EP (1) | EP1497475A2 (zh) |
JP (1) | JP2005513266A (zh) |
CN (1) | CN1589332A (zh) |
AU (1) | AU2002360974A1 (zh) |
DE (1) | DE10163171A1 (zh) |
WO (1) | WO2003054241A2 (zh) |
Cited By (3)
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CN104853839A (zh) * | 2012-09-06 | 2015-08-19 | 霍尼韦尔国际公司 | 用于1-氯-3,3,3-三氟丙烯制备方法中的反应器和搅拌器 |
CN110719812A (zh) * | 2017-06-06 | 2020-01-21 | 阿科玛法国公司 | 改变烃化合物中氟的分布的方法 |
CN110719811A (zh) * | 2017-06-06 | 2020-01-21 | 阿科玛法国公司 | 改变烃化合物中氟的分布的方法 |
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WO2016079122A1 (en) | 2014-11-17 | 2016-05-26 | Solvay Sa | A method for producing a chemical compound and apparatus therefor |
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-
2001
- 2001-12-21 DE DE10163171A patent/DE10163171A1/de not_active Withdrawn
-
2002
- 2002-12-13 CN CN02823130.9A patent/CN1589332A/zh active Pending
- 2002-12-13 AU AU2002360974A patent/AU2002360974A1/en not_active Abandoned
- 2002-12-13 EP EP02795187A patent/EP1497475A2/de not_active Withdrawn
- 2002-12-13 JP JP2003554940A patent/JP2005513266A/ja not_active Withdrawn
- 2002-12-13 WO PCT/EP2002/014219 patent/WO2003054241A2/de not_active Application Discontinuation
-
2004
- 2004-06-18 US US10/870,494 patent/US20050019487A1/en not_active Abandoned
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104853839A (zh) * | 2012-09-06 | 2015-08-19 | 霍尼韦尔国际公司 | 用于1-氯-3,3,3-三氟丙烯制备方法中的反应器和搅拌器 |
CN110719812A (zh) * | 2017-06-06 | 2020-01-21 | 阿科玛法国公司 | 改变烃化合物中氟的分布的方法 |
CN110719811A (zh) * | 2017-06-06 | 2020-01-21 | 阿科玛法国公司 | 改变烃化合物中氟的分布的方法 |
Also Published As
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WO2003054241A2 (de) | 2003-07-03 |
AU2002360974A1 (en) | 2003-07-09 |
EP1497475A2 (de) | 2005-01-19 |
JP2005513266A (ja) | 2005-05-12 |
US20050019487A1 (en) | 2005-01-27 |
DE10163171A1 (de) | 2003-07-03 |
WO2003054241A3 (de) | 2003-10-30 |
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