CN1401096A - 用于i-线的高分辨率感光性树脂组合物和形成图案的方法 - Google Patents
用于i-线的高分辨率感光性树脂组合物和形成图案的方法 Download PDFInfo
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- CN1401096A CN1401096A CN01804830A CN01804830A CN1401096A CN 1401096 A CN1401096 A CN 1401096A CN 01804830 A CN01804830 A CN 01804830A CN 01804830 A CN01804830 A CN 01804830A CN 1401096 A CN1401096 A CN 1401096A
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- Prior art keywords
- photosensitizer
- photosensitive polymer
- methacrylate
- polymer combination
- line
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- 239000011342 resin composition Substances 0.000 title claims abstract description 4
- 238000000034 method Methods 0.000 title claims description 23
- 229920005989 resin Polymers 0.000 claims abstract description 29
- 239000011347 resin Substances 0.000 claims abstract description 29
- 239000003504 photosensitizing agent Substances 0.000 claims abstract description 27
- 229920003986 novolac Polymers 0.000 claims abstract description 24
- 239000000178 monomer Substances 0.000 claims abstract description 17
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical group [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000004793 Polystyrene Substances 0.000 claims abstract description 13
- 229920002223 polystyrene Polymers 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 10
- 125000003011 styrenyl group Chemical class [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims abstract 3
- 229920000642 polymer Polymers 0.000 claims description 34
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 19
- 239000003513 alkali Substances 0.000 claims description 17
- 150000002148 esters Chemical class 0.000 claims description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 12
- 230000032050 esterification Effects 0.000 claims description 12
- 238000005886 esterification reaction Methods 0.000 claims description 12
- 229920002367 Polyisobutene Polymers 0.000 claims description 9
- 238000000059 patterning Methods 0.000 claims description 7
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 claims description 6
- 150000001540 azides Chemical class 0.000 claims description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims 2
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 claims 2
- -1 acrylic ester Chemical class 0.000 abstract description 26
- 239000000758 substrate Substances 0.000 abstract description 4
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 229920000193 polymethacrylate Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 15
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 12
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 10
- 150000003440 styrenes Chemical class 0.000 description 10
- 241001597008 Nomeidae Species 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 7
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 150000007524 organic acids Chemical class 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 4
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 4
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229960004063 propylene glycol Drugs 0.000 description 4
- 235000013772 propylene glycol Nutrition 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- QPVRKFOKCKORDP-UHFFFAOYSA-N 1,3-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CC(C)(O)CC=C1 QPVRKFOKCKORDP-UHFFFAOYSA-N 0.000 description 3
- PCNMALATRPXTKX-UHFFFAOYSA-N 1,4-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CCC(C)(O)C=C1 PCNMALATRPXTKX-UHFFFAOYSA-N 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical group COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical group CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- JEFSTMHERNSDBC-UHFFFAOYSA-N 1,2-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CC=CCC1(C)O JEFSTMHERNSDBC-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- MQCPOLNSJCWPGT-UHFFFAOYSA-N 2,2'-Bisphenol F Chemical compound OC1=CC=CC=C1CC1=CC=CC=C1O MQCPOLNSJCWPGT-UHFFFAOYSA-N 0.000 description 2
- WWGUMAYGTYQSGA-UHFFFAOYSA-N 2,3-dimethylnaphthalene Chemical compound C1=CC=C2C=C(C)C(C)=CC2=C1 WWGUMAYGTYQSGA-UHFFFAOYSA-N 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- CPEXFJVZFNYXGU-UHFFFAOYSA-N 2,4,6-trihydroxybenzophenone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC=CC=C1 CPEXFJVZFNYXGU-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- OSOLELDZBFOFHO-UHFFFAOYSA-N 2-phenylphenanthrene Chemical compound C1=CC=CC=C1C1=CC=C2C3=CC=CC=C3C=CC2=C1 OSOLELDZBFOFHO-UHFFFAOYSA-N 0.000 description 2
- HMNKTRSOROOSPP-UHFFFAOYSA-N 3-Ethylphenol Chemical compound CCC1=CC=CC(O)=C1 HMNKTRSOROOSPP-UHFFFAOYSA-N 0.000 description 2
- WXYSZTISEJBRHW-UHFFFAOYSA-N 4-[2-[4-[1,1-bis(4-hydroxyphenyl)ethyl]phenyl]propan-2-yl]phenol Chemical compound C=1C=C(C(C)(C=2C=CC(O)=CC=2)C=2C=CC(O)=CC=2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WXYSZTISEJBRHW-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000007767 bonding agent Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 150000002220 fluorenes Chemical class 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 150000002475 indoles Chemical class 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical compound OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 150000003220 pyrenes Chemical class 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 2
- 230000004304 visual acuity Effects 0.000 description 2
- OKJFKPFBSPZTAH-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-(4-hydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O OKJFKPFBSPZTAH-UHFFFAOYSA-N 0.000 description 1
- ZDROXNKXVHPNBJ-UHFFFAOYSA-N (2,6-dihydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=C(O)C=CC=C1O ZDROXNKXVHPNBJ-UHFFFAOYSA-N 0.000 description 1
- SHMWGXIEPCHLGC-UHFFFAOYSA-N (4-ethenylphenyl)-phenylmethanone Chemical compound C1=CC(C=C)=CC=C1C(=O)C1=CC=CC=C1 SHMWGXIEPCHLGC-UHFFFAOYSA-N 0.000 description 1
- ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- OWEYKIWAZBBXJK-UHFFFAOYSA-N 1,1-Dichloro-2,2-bis(4-hydroxyphenyl)ethylene Chemical compound C1=CC(O)=CC=C1C(=C(Cl)Cl)C1=CC=C(O)C=C1 OWEYKIWAZBBXJK-UHFFFAOYSA-N 0.000 description 1
- JGPKOHSNRGXCSD-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-[4-(4-phenylphenyl)phenyl]benzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC(=CC=2)C=2C=CC(=CC=2)C=2C=CC=CC=2)=C1C JGPKOHSNRGXCSD-UHFFFAOYSA-N 0.000 description 1
- BRIKLJCDBBFRAE-UHFFFAOYSA-N 1,2-diphenylindole Chemical compound C=1C=CC=CC=1N1C2=CC=CC=C2C=C1C1=CC=CC=C1 BRIKLJCDBBFRAE-UHFFFAOYSA-N 0.000 description 1
- SIJHJHYRYHIWFW-UHFFFAOYSA-N 1,3,6,8-tetraphenylpyrene Chemical compound C1=CC=CC=C1C(C1=CC=C23)=CC(C=4C=CC=CC=4)=C(C=C4)C1=C2C4=C(C=1C=CC=CC=1)C=C3C1=CC=CC=C1 SIJHJHYRYHIWFW-UHFFFAOYSA-N 0.000 description 1
- NHJNEVDNUSFTSG-UHFFFAOYSA-N 1,5-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CC=CC(C)(O)C1 NHJNEVDNUSFTSG-UHFFFAOYSA-N 0.000 description 1
- GQHLUGQTYDTQDG-UHFFFAOYSA-N 1,7-diphenylnaphthalene Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2C=3C=CC=CC=3)C2=C1 GQHLUGQTYDTQDG-UHFFFAOYSA-N 0.000 description 1
- IJJYNFWMKNYNEW-UHFFFAOYSA-N 1-(4-pyren-1-ylphenyl)pyrene Chemical group C1=CC(C=2C=CC(=CC=2)C=2C3=CC=C4C=CC=C5C=CC(C3=C54)=CC=2)=C2C=CC3=CC=CC4=CC=C1C2=C43 IJJYNFWMKNYNEW-UHFFFAOYSA-N 0.000 description 1
- AUBIKQOPRLRIHL-UHFFFAOYSA-N 1-(butoxymethyl)-4-ethenylbenzene Chemical compound CCCCOCC1=CC=C(C=C)C=C1 AUBIKQOPRLRIHL-UHFFFAOYSA-N 0.000 description 1
- GKEUODMJRFDLJY-UHFFFAOYSA-N 1-Methylfluorene Chemical class C12=CC=CC=C2CC2=C1C=CC=C2C GKEUODMJRFDLJY-UHFFFAOYSA-N 0.000 description 1
- AGPLQTQFIZBOLI-UHFFFAOYSA-N 1-benzyl-4-phenylbenzene Chemical group C=1C=C(C=2C=CC=CC=2)C=CC=1CC1=CC=CC=C1 AGPLQTQFIZBOLI-UHFFFAOYSA-N 0.000 description 1
- WGGLDBIZIQMEGH-UHFFFAOYSA-N 1-bromo-4-ethenylbenzene Chemical compound BrC1=CC=C(C=C)C=C1 WGGLDBIZIQMEGH-UHFFFAOYSA-N 0.000 description 1
- QOVCUELHTLHMEN-UHFFFAOYSA-N 1-butyl-4-ethenylbenzene Chemical compound CCCCC1=CC=C(C=C)C=C1 QOVCUELHTLHMEN-UHFFFAOYSA-N 0.000 description 1
- WHFHDVDXYKOSKI-UHFFFAOYSA-N 1-ethenyl-4-ethylbenzene Chemical compound CCC1=CC=C(C=C)C=C1 WHFHDVDXYKOSKI-UHFFFAOYSA-N 0.000 description 1
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 1
- QQHQTCGEZWTSEJ-UHFFFAOYSA-N 1-ethenyl-4-propan-2-ylbenzene Chemical compound CC(C)C1=CC=C(C=C)C=C1 QQHQTCGEZWTSEJ-UHFFFAOYSA-N 0.000 description 1
- UIMPAOAAAYDUKQ-UHFFFAOYSA-N 1-methoxy-4-(4-methoxyphenyl)benzene Chemical group C1=CC(OC)=CC=C1C1=CC=C(OC)C=C1 UIMPAOAAAYDUKQ-UHFFFAOYSA-N 0.000 description 1
- RHDYQUZYHZWTCI-UHFFFAOYSA-N 1-methoxy-4-phenylbenzene Chemical group C1=CC(OC)=CC=C1C1=CC=CC=C1 RHDYQUZYHZWTCI-UHFFFAOYSA-N 0.000 description 1
- VJIFNNRQWNILPY-UHFFFAOYSA-N 1-methyl-4-(2-phenylphenyl)benzene Chemical group C1=CC(C)=CC=C1C1=CC=CC=C1C1=CC=CC=C1 VJIFNNRQWNILPY-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical class C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- BQMWZHUIGYNOAL-UHFFFAOYSA-N 1-phenylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)C1=CC=CC=C1 BQMWZHUIGYNOAL-UHFFFAOYSA-N 0.000 description 1
- ODHVRMYJIOFUAK-UHFFFAOYSA-N 11-methylbenzo[a]carbazole Chemical compound C1=CC=CC2=C3N(C)C4=CC=CC=C4C3=CC=C21 ODHVRMYJIOFUAK-UHFFFAOYSA-N 0.000 description 1
- IXQGCWUGDFDQMF-UHFFFAOYSA-N 2-Ethylphenol Chemical compound CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- KKOWXJFINYUXEE-UHFFFAOYSA-N 2-butoxyphenol Chemical compound CCCCOC1=CC=CC=C1O KKOWXJFINYUXEE-UHFFFAOYSA-N 0.000 description 1
- QSKPIOLLBIHNAC-UHFFFAOYSA-N 2-chloro-acetaldehyde Chemical compound ClCC=O QSKPIOLLBIHNAC-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- CGYGETOMCSJHJU-UHFFFAOYSA-N 2-chloronaphthalene Chemical compound C1=CC=CC2=CC(Cl)=CC=C21 CGYGETOMCSJHJU-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- BAGQBTMEEISJLK-UHFFFAOYSA-N 2-fluoronaphthalene Chemical compound C1=CC=CC2=CC(F)=CC=C21 BAGQBTMEEISJLK-UHFFFAOYSA-N 0.000 description 1
- GPLIMIJPIZGPIF-UHFFFAOYSA-N 2-hydroxy-1,4-benzoquinone Chemical compound OC1=CC(=O)C=CC1=O GPLIMIJPIZGPIF-UHFFFAOYSA-N 0.000 description 1
- ZTMADXFOCUXMJE-UHFFFAOYSA-N 2-methylbenzene-1,3-diol Chemical compound CC1=C(O)C=CC=C1O ZTMADXFOCUXMJE-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- ILZXXGLGJZQLTR-UHFFFAOYSA-N 2-phenylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=CC=C1 ILZXXGLGJZQLTR-UHFFFAOYSA-N 0.000 description 1
- HORNXRXVQWOLPJ-UHFFFAOYSA-N 3-chlorophenol Chemical compound OC1=CC=CC(Cl)=C1 HORNXRXVQWOLPJ-UHFFFAOYSA-N 0.000 description 1
- 125000004208 3-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C([H])C(*)=C1[H] 0.000 description 1
- ASHGTJPOSUFTGB-UHFFFAOYSA-N 3-methoxyphenol Chemical compound COC1=CC=CC(O)=C1 ASHGTJPOSUFTGB-UHFFFAOYSA-N 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical group O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- DNJBAJYGHASTJZ-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)methyl]benzene-1,2,3-triol Chemical compound CC1=C(O)C(C)=CC(CC=2C(=C(O)C(O)=CC=2)O)=C1 DNJBAJYGHASTJZ-UHFFFAOYSA-N 0.000 description 1
- IJWIRZQYWANBMP-UHFFFAOYSA-N 4-[2-(4-hydroxy-3-propan-2-ylphenyl)propan-2-yl]-2-propan-2-ylphenol Chemical compound C1=C(O)C(C(C)C)=CC(C(C)(C)C=2C=C(C(O)=CC=2)C(C)C)=C1 IJWIRZQYWANBMP-UHFFFAOYSA-N 0.000 description 1
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 1
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 1
- YQUQWHNMBPIWGK-UHFFFAOYSA-N 4-isopropylphenol Chemical compound CC(C)C1=CC=C(O)C=C1 YQUQWHNMBPIWGK-UHFFFAOYSA-N 0.000 description 1
- GWNJZSGBZMLRBW-UHFFFAOYSA-N 9,10-dinaphthalen-1-ylanthracene Chemical compound C12=CC=CC=C2C(C=2C3=CC=CC=C3C=CC=2)=C(C=CC=C2)C2=C1C1=CC=CC2=CC=CC=C12 GWNJZSGBZMLRBW-UHFFFAOYSA-N 0.000 description 1
- OGOYZCQQQFAGRI-UHFFFAOYSA-N 9-ethenylanthracene Chemical compound C1=CC=C2C(C=C)=C(C=CC=C3)C3=CC2=C1 OGOYZCQQQFAGRI-UHFFFAOYSA-N 0.000 description 1
- CPGPAVAKSZHMBP-UHFFFAOYSA-N 9-methylanthracene Chemical compound C1=CC=C2C(C)=C(C=CC=C3)C3=CC2=C1 CPGPAVAKSZHMBP-UHFFFAOYSA-N 0.000 description 1
- SDFLTYHTFPTIGX-UHFFFAOYSA-N 9-methylcarbazole Chemical compound C1=CC=C2N(C)C3=CC=CC=C3C2=C1 SDFLTYHTFPTIGX-UHFFFAOYSA-N 0.000 description 1
- LUBXLGUQZVKOFP-UHFFFAOYSA-N 9-phenylanthracene Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=CC2=CC=CC=C12 LUBXLGUQZVKOFP-UHFFFAOYSA-N 0.000 description 1
- VIJYEGDOKCKUOL-UHFFFAOYSA-N 9-phenylcarbazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2C2=CC=CC=C21 VIJYEGDOKCKUOL-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HTVITOHKHWFJKO-UHFFFAOYSA-N Bisphenol B Chemical compound C=1C=C(O)C=CC=1C(C)(CC)C1=CC=C(O)C=C1 HTVITOHKHWFJKO-UHFFFAOYSA-N 0.000 description 1
- QDMMAJNKZYLYAC-UHFFFAOYSA-N C=C.C(CCCCC)C1=CC=CC=C1 Chemical compound C=C.C(CCCCC)C1=CC=CC=C1 QDMMAJNKZYLYAC-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241000692870 Inachis io Species 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- BRKROPWLBIWVMH-UHFFFAOYSA-N [4-(2-phenylphenyl)phenyl]methanamine Chemical group C1=CC(CN)=CC=C1C1=CC=CC=C1C1=CC=CC=C1 BRKROPWLBIWVMH-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical class CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- YUENFNPLGJCNRB-UHFFFAOYSA-N anthracen-1-amine Chemical compound C1=CC=C2C=C3C(N)=CC=CC3=CC2=C1 YUENFNPLGJCNRB-UHFFFAOYSA-N 0.000 description 1
- 229940054051 antipsychotic indole derivative Drugs 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- TUAHORSUHVUKBD-UHFFFAOYSA-N benzo[c]phenanthrene Chemical compound C1=CC=CC2=C3C4=CC=CC=C4C=CC3=CC=C21 TUAHORSUHVUKBD-UHFFFAOYSA-N 0.000 description 1
- 150000004054 benzoquinones Chemical class 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical group C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- 229940106691 bisphenol a Drugs 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- QXRUSZKJUVYKLM-UHFFFAOYSA-N butyl 4-ethenylbenzoate Chemical compound CCCCOC(=O)C1=CC=C(C=C)C=C1 QXRUSZKJUVYKLM-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- KXSGQVTXLQEQSA-UHFFFAOYSA-N ethene 1-phenylethanone Chemical compound C=C.CC(=O)C1=CC=CC=C1 KXSGQVTXLQEQSA-UHFFFAOYSA-N 0.000 description 1
- URCAYJXJXYLGTI-UHFFFAOYSA-N ethene fluorobenzene Chemical compound C=C.FC1=CC=CC=C1 URCAYJXJXYLGTI-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229940035423 ethyl ether Drugs 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- LZCLXQDLBQLTDK-UHFFFAOYSA-N lactic acid ethyl ester Natural products CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000013541 low molecular weight contaminant Substances 0.000 description 1
- 150000002672 m-cresols Chemical class 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- HDBWAWNLGGMZRQ-UHFFFAOYSA-N p-Vinylbiphenyl Chemical group C1=CC(C=C)=CC=C1C1=CC=CC=C1 HDBWAWNLGGMZRQ-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229940090668 parachlorophenol Drugs 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002987 phenanthrenes Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical class C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
用于i-线曝光的感光性树脂组合物,包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。将光敏树脂组合物应用到如平板显示器的基底上,用i-线照射,优选的曝光能量为50到500mJ/cm2,将曝光后的膜进行显影,得到高分辨率的、没有拖尾等现象的较好的图案。
Description
技术领域
本发明涉及通过i-线曝光和感光性树脂组合物形成图案的方法,用于制备半导体设备、平板显示器(FPD)等。
背景技术
在许多制造例如LSI半导体集成电路、生产FPD的显示平面、制造用于热压头的电路基板等领域,人们广泛使用光刻法制作精细元件或进行精细加工。在光刻技术中,人们采用正性或负性感光性树脂组合物得到抗蚀图案。在这些感光性树脂组合物中,包括碱溶性树脂和醌二叠氮化物光敏剂的组合物被广泛用于正性感光性树脂组合物。关于这些组合物,文献中描述了不同的组合物配方,例如,‘酚醛清漆树脂/醌二叠氮化物’,这些文献例如日本审查专利公开文献,例如日本审查专利公开第23570/1979号(美国专利3,666,473),日本审查专利公开第30850/1981号(美国专利4,115,128),日本未审专利公开第73045/1980号和第205933/1986号等。
就酚醛清漆树脂和感光性物质,人们对包括酚醛清漆树脂和醌二叠氮化物的组合物进行了广泛的研究和开发。在酚醛清漆树脂方面,已经开发了新树脂,另外通过提高传统已知树脂的物理性质,已经得到了具有优良性质的感光性树脂组合物。例如许多公开技术提供了具有优良性能的感光性树脂组合物,日本未审查专利公开第140235/1985号和第105243/1989号使用了具有特定分子量分布的酚醛清漆树脂,日本未审查专利公开第97347/1985号,第189739/1985号和日本专利公开第2590342号使用了通过分馏法除去低分子量组份的酚醛清漆树脂。
另一方面,半导体元件的集成度逐年变高,在制造半导体元件等的过程中,需要线宽小于亚微米级图案的工艺。然而,上述现有技术描述的传统已知的感光性树脂组合物不能满足这些要求。而且制造液晶显示器(LCD)等的显示表面,一直使用g-线或g+h-线射线源的曝光设备曝光,然而,人们开始审查使用i-线射线源制造精细元件的工艺,并审查适合于i-线光照曝光的具有高分辨率的感光性树脂组合物。
为了实现感光性树脂组合物对于i-线曝光的高分辨力,建议使用下列技术,1,1,1-三(4-羟基-3,5-二甲基苯基)丁烷的1,2-萘醌-2-二叠氮化物-5-磺酸酯作为光敏剂(日本未审查专利公开第332167/1994号),由特定的苯酚化合物和光敏剂衍生的酚醛清漆树脂(日本未审查公开第88364/1993,第20503/1998号和第137324/2000),由三羟基二苯甲酮的萘醌二叠氮化物磺酸酯和三羟基二苯甲酮以特定的比例组成的光敏组份(日本未审查公开第82926/1996号),以特定比例酯化的2,3,4-三羟基二苯甲酮的1,2-萘醌-2-二叠氮化物-5-磺酸酯和2,3,4,4’-四羟基二苯甲酮的1,2-萘醌-2-二叠氮化物-5-磺酸酯的混合物作为光敏剂(日本未审查专利公开第109051/1990号),多羟基化合物的1,2-萘醌-2-二叠氮化物-5和/或4-磺酸酯的限定的四酯作为光敏剂(日本未审查专利公开第15853/1997号),2,3,4,4’-四羟基二苯甲酮的1,2-萘醌-2-二叠氮化物-5-磺酸酯和1,2-萘醌-2-二叠氮化物-4-磺酸酯以特定比例混合作为光敏剂。然而在迄今为止的现有技术中,在分辨率方面有问题,图案形成有拖尾现象。因此希望找到一种感光性树脂组合物,它具有高分辨率,并当用i-线光源曝光时得到优良的图案形状,及使用它形成图案的方法。
发明的公开
经过努力的研究和检测,本发明人发现在使用i-线曝光源形成图案的方法中,包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂的感光性树脂组合物达到了上述目的,并完成了本发明,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。
本发明涉及形成图案的方法,其特征为在使用i-线曝光源形成图案的方法中,感光性树脂组合物包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。
进一步本发明涉及用于i-线曝光的感光性树脂组合物,其特征为感光性树脂组合物包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。
在下文中会更详细描述本发明。
在本发明图案形成的方法中,使用i-线作为曝光光源,使用的感光性树脂组合物包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。根据本发明,将感光性树脂组合物曝光在i-线下的曝光量取决于感光性树脂组合物的成份,然而在实际应用中,形成图案不拖尾的优选曝光量为50到500mJ/cm2,当应用于FPD时,优选50到200mJ/cm2。
根据本发明,用于i-线曝光的感光性树脂组合物中,优选使用的酚醛清漆树脂,没有特别的限定,迄今为止,可以为已知的在感光性树脂组合物中使用的酚醛清漆树脂,包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂。在本发明中将多种酚之间或苯酚和例如福尔马林的醛混合多聚,得到优选使用的酚醛清漆树脂。
关于用于制备酚醛清漆树脂的酚类,包括例如,苯酚、对甲苯酚、间甲苯酚、邻甲苯酚、2,3-二甲基苯酚、2,4-二甲基苯酚、2,5-二甲基苯酚、2,6-二甲基苯酚、3,4-二甲基苯酚、3,5-二甲基苯酚、2,3,4-三甲基苯酚、2,3,5-三甲基苯酚、3,4,5-三甲基苯酚、2,4,5-三甲基苯酚、亚甲基双酚、亚甲基双对甲苯酚、间苯二酚、邻苯二酚、2-甲基间苯二酚、4-甲基间苯二酚、邻氯苯酚、间氯苯酚、对氯苯酚、2,3-二氯苯酚、间甲氧基苯酚、对甲氧基苯酚、对丁氧基苯酚、邻乙基苯酚、间乙基苯酚、对乙基苯酚、2,3-二乙基苯酚、2,5-二乙基苯酚、对异丙基苯酚、α-萘酚、β-萘酚等。它们可以单独使用或两种或多种混合使用。
关于醛类,实例可以为多聚甲醛、乙醛、苯甲醛、羟基苯甲醛、氯代乙醛等和福尔马林。它们可以单独使用或两个或多个混合使用。
根据本发明,以聚苯乙烯作为标准测量,感光性树脂组合物中使用的酚醛清漆树脂的重均分子量优选为2,000到50,000,更加优选为3,000到40,000。
另一方面,关于单体包括聚丙烯酸酯(i)、聚异丁烯酸酯(ii)、聚苯乙烯衍生物(iii)、由选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体组成的共聚物(iv),下面描述的丙烯酸酯、异丁烯酸酯和苯乙烯衍生物为优选的。
丙烯酸酯:
丙烯酸甲酯、丙烯酸乙酯、丙烯酸正丙酯、丙烯酸正丁酯、丙烯酸正己酯、丙烯酸异丙酯、丙烯酸异丁酯、丙烯酸叔丁酯、丙烯酸环己基酯、丙烯酸苄基酯、丙烯酸2-氯乙基酯、甲基-α-氯代丙烯酸酯、α-溴代丙烯酸苯基酯等。
异丁烯酸酯:
异丁烯酸甲酯、异丁烯酸乙酯、异丁烯酸正丙酯、异丁烯酸正丁酯、异丁烯酸正己酯、异丁烯酸异丙酯、异丁烯酸异丁酯、异丁烯酸叔丁酯、异丁烯酸环己基酯、异丁烯酸苄基酯、异丁烯酸苯基酯、异丁烯酸1-苯基乙基酯、异丁烯酸2-苯基乙基酯、异丁烯酸糠基酯、异丁烯酸二苯基甲基酯、异丁烯酸五氯苯基酯、异丁烯酸萘基酯、异丁烯酸异boronyl酯、异丁烯酸苄基酯等。
苯乙烯衍生物:
4-氟苯乙烯、2,5-二氟苯乙烯、2,4-二氟苯乙烯、对异丙基苯乙烯、苯乙烯、邻氯苯乙烯、4-乙酰基苯乙烯、4-苯甲酰基苯乙烯、4-溴苯乙烯、4-丁氧基羰基苯乙烯、4-丁氧基甲基苯乙烯、4-丁基苯乙烯、4-乙基苯乙烯、4-己基苯乙烯、4-甲氧基苯乙烯、4-甲基苯乙烯、2,4-二甲基苯乙烯、2,5-二甲基苯乙烯、2,4,5-三甲基苯乙烯、4-苯基苯乙烯、4-丙氧基苯乙烯等。
在上述聚合物中,如有必要可使用有机酸单体作为共聚物的组份,优选的有机酸单体描述如下:
有机酸单体:
丙烯酸、异丁烯酸、亚甲基丁二酸、马来酸、2-丙烯酰氢化邻苯二甲酸酯、2-丙烯酰氧基丙基氢化邻苯二甲酸酯等。
当使用有机酸单体作为共聚物组份时,在共聚物中,丙烯酸酯、异丁烯酸酯和苯乙烯衍生物部分显示了抑制碱溶的作用,然而有机酸单体部分显示了促进碱溶的作用。因此在感光性树脂组合物在显影剂中的曝光区域,可以依靠有机酸单体的含量平衡溶解抑制和溶解促进。
另外,使用聚苯乙烯作标准,这些聚丙烯酸酯、聚异丁烯酸酯、聚苯乙烯衍生物或由选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物的两个或更多单体组成的共聚物的重均分子量优选为2,000到80,000,更加优选5,000到40,000。相对于100份的酚醛清漆树脂,这些聚丙烯酸酯、聚异丁烯酸酯、聚苯乙烯衍生物或由选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物的两个或更多单体组成的共聚物的浓度优选0.1到10.0重量份,更优选0.5到5.0重量份。
在用于i-线曝光的感光性树脂组合物中,本发明的含有醌二叠氮化物基团的光敏剂,可以为已知的含有醌二叠氮化物基团的光敏剂,特别是下述方法得到的物质,将例如萘醌二叠氮化物磺酸氯化物或苯醌二叠氮化物磺酸氯化物的醌二叠氮化物磺酸卤化物和低或高分子量的化合物反应,其中的化合物优选含有可以和酸卤化物缩合的官能团。关于可以和酸卤化物缩合的官能团具体化为,羟基或氨基,含有羟基的小分子化合物,例如羟基醌、间苯二酚、2,4-二羟基二苯甲酮、2,3,4-三羟基二苯甲酮、2,4,6-三羟基二苯甲酮、2,4,4’-三羟基二苯甲酮、2,3,4,4’-四羟基二苯甲酮、2,2’,4,4’-四羟基二苯甲酮、2,2’,3,4,6’-五羟基二苯甲酮等。含有羟基的大分子化合物例子包括酚醛清漆树脂和多羟基苯乙烯等。
在本发明的感光性树脂组合物中,相对于100份重量的树脂组份,含有醌二叠氮化物基团的光敏剂优选为10到30重量份,更优选15到25重量份。如果少于10重量份,膜的保持程度会降低或加工容度(例如显影时间相关性)会受到严重损害。如果超过了30重量份,会由于敏感性太低导致实际应用的问题,或导致光敏剂沉淀。
其中R8代表氢、C1-C4烷基、C1-C4烷氧基或环己基;m和n分别为0,1或2;a,b,c,d,e,f,g和h为0或1到5的整数,并满足a+b≤5,c+d≤5,e+f≤5和g+h≤5和i为0,1或2。
在本发明的感光性树脂组合物中,含有酚羟基的通式(I)小分子化合物作为溶解促进剂,优选用于控制溶解率,或提高感光性树脂组合物的敏感度或控制敏感度。
关于上述含有酚羟基的通式(I)小分子化合物,具体说明如下,例如,邻甲基苯酚、间甲基苯酚、对甲基苯酚、2,4-二甲基苯酚、2,5-二甲基苯酚、2,6-二甲基苯酚、双酚A、B、C、E、F或G,4,4’,4”-次甲基三苯酚、2,6-双[(2-羟基-5-甲基苯基)甲基]-4-甲基苯酚、4,4’-[1-[4-[1-(4-羟基苯基)-1-甲基乙基]苯基]亚乙基]双酚、4,4’,4”-次乙基三苯酚、4-[双(4-羟基苯基)甲基]-2-乙氧基苯酚、4,4’-[(2-羟基苯基)亚甲基]双[2,3-二甲基苯酚]、4,4’-[(3-羟基苯基)亚甲基]双[2,6-二甲基苯酚]、4,4’-[(4-羟基苯基)亚甲基]双[2,6-二甲基苯酚]、2,2’-[(2-羟基苯基)亚甲基]双[3,5-二甲基苯酚]、2,2’-[(4-羟基苯基)亚甲基]双[3,5-二甲基苯酚]、4,4’-[(3,4-二羟基苯基)亚甲基]双[2,3,6-三甲基苯酚]、4-[双(3-环己基-4-羟基-6-甲基苯基)甲基]-1,2-苯基二醇、4,6-双[(3,5-二甲基-4-羟基苯基)甲基]-1,2,3-苯三醇、4,4’-[(2-羟基苯基)亚甲基]双[3-甲基苯酚]、4,4’,4”-(3-甲基-1-丙基-3-次基)三苯酚、4,4’4”,4-(1,4-亚苯基二次甲基)四苯酚、2,4,6-三[(3,5-二甲基-4-羟基苯基)甲基-1,3-苯二醇、2,4,6-三[(3,5-二甲基-2-羟基苯基)甲基-1,3-苯二醇、4,4’-[1-[4-[1-[4-羟基-3,5-双[(羟基-3-甲基苯基)甲基]苯基]-1-甲基乙基]苯基]亚乙基]双[2,6-双(羟基-3-甲基苯基)甲基]苯酚等。相对于100重量份的酚醛清漆树脂,这些含有酚羟基的小分子化合物使用量一般为1到20重量份,优选3到15重量份。
可以将荧光物质加入到本发明的感光性树脂组合物中,在本发明感光性树脂组合物中使用的荧光物质包括,萘和萘衍生物,例如1-羟基萘、1-甲基萘、2,3-二甲基萘、1-氨基萘、2-氟萘、2-氯萘、1,7-二苯基萘等;蒽和蒽衍生物,例如9-甲基蒽、9,10-二甲基蒽、9-氰基蒽、1-氨基蒽、9-苯基蒽、9,10-二苯基蒽、9,10-二氯蒽、9,10-二萘基蒽、9-乙烯基蒽、9-(对乙烯基苯基)-10-苯基蒽等;菲和菲衍生物,例如3,4-苯并菲、2-苯基菲等;芘和芘衍生物,例如1,3,6,8-四苯基芘、二芘、邻亚苯基芘等;苝和苝衍生物,例如苯并苝等;芴及芴衍生物,例如1-甲基芴、1,2-苯并芴等;咔唑和咔唑衍生物,例如N-甲基咔唑、N-甲基苯并咔唑、N-苯基咔唑、N-乙烯基咔唑等;联苯和联苯衍生物,例如4-甲基苯基联苯、3,3’-二甲基联苯、4-甲氧基联苯、4,4’-二甲氧基联苯、4,4’-二羟基联苯、4-苄基联苯、4-乙烯基联苯、八甲基联苯等;对三联苯及对三联苯衍生物,例如4-甲基三联苯、2-甲基对三联苯、3,3”-二甲基三联苯、4-(3,3-二甲基丁氧基)对三联苯、2,2’-亚甲基对三联苯等;对四联苯和对四联苯衍生物,例如3,3-二甲基对四联苯、四甲基对四联苯、4-(3-乙基丁氧基)对四联苯等;吲哚和吲哚衍生物,例如2-苯基吲哚、1-甲基-2-苯基吲哚、1-N-丁基-2-联苯吲哚、1,2-二苯基吲哚、1-联苯-2-吲哚等;吖啶及其衍生物、并四苯及其衍生物;rublene及其衍生物;及其衍生物等等。考虑要混合的光敏剂的吸收波长范围来优选这些荧光物质,这些荧光物质可以单独使用或两种或多种混合。相对于100重量份光敏剂,加入的荧光物质的量为0.0001到1.0重量份,优选为0.0005到0.5重量份。加入这些荧光物质会提高敏感度。
用于溶解碱溶性树脂、光敏剂和本发明式(I)的溶解促进剂的溶剂包括,乙二醇单烷基醚,例如乙二醇单甲基醚和乙二醇单乙基醚;乙二醇单烷基醚乙酸酯例如乙二醇单甲基醚乙酸酯和乙二醇单乙基醚乙酸酯;丙二醇单烷基醚例如丙二醇单甲基醚和丙二醇单乙基醚;丙二醇单烷基醚乙酸酯例如丙二醇单甲基醚乙酸酯和丙二醇单乙基醚乙酸酯;乳酸酯例如甲基乳酸酯和乙基乳酸酯;芳香烃例如甲苯和二甲苯;酮例如甲基乙基酮、2-庚酮和环己酮;酰胺例如N,N-二甲基乙酰胺和N-甲基吡咯烷酮;内酯例如γ-丁内酯等等。这些溶剂可以单独使用或两种或多种混合使用。
进一步,可以将染料、粘合助剂、表面活性剂等加入到本发明的感光性组合物中。染料包括例如,甲基紫、结晶紫、孔雀绿等;粘合助剂包括例如烷基咪唑啉、丁酸、烷基酸、多羟基苯乙烯、聚乙烯基甲基醚、叔丁基酚醛清漆树脂、环氧硅烷、环氧聚合物、硅烷等;表面活性剂包括例如非离子表面活性剂例如聚二醇及其衍生物,它们为聚丙二醇或聚氧亚乙基十二烷基醚,含氟的表面活性剂例如Fluorad(商标名,由Sumitomo 3M Ltd.制造)、Megafac(商标名,由Dai-Nippon Ink & Chemicals,Inc.制造)、Sulflon(商标名,由Asahi Glass Co.,Ltd.制造)或有机硅氧烷表面活性剂例如KP341(商标名,Shin-Etsu Chemical Co.,Ltd.制造)。
另外由于抗蚀剂的敏感度受工艺条件的影响,因此不可能一个对一个地进行抗蚀剂敏感度的检测,只有当确定了一些不确定的条件时,才可以检测敏感度的值。在本发明中,最佳的辐射曝光量在下述工艺条件下检测,首先使用4英寸的硅片或玻璃片作为基底,涂布条件是,通过旋转涂布法涂布抗蚀剂,旋转数为在100℃预烘干90秒时抗蚀剂膜厚度达到1.5微米。使用Hitachi Co.,Ltd.(光源为i-线,波长365nm,NA=0.50)制造的分光器(stepper)作为曝光仪进行曝光。显影条件,曝光后,用2.38重量%的TMAH(氢氧化四甲铵)作显影剂,在23℃下,通过搅拌系统显影60秒,然后将底片在纯水中浸渍60秒,然后干燥。当测量到本发明的最佳曝光量时,使用上述工艺条件,当工艺条件改变时,最佳曝光量也会改变。
实施本发明的最佳模式
参照实施例来具体描述本发明,但无论如何不是限制本发明。
实施例1
向以聚苯乙烯为标准检测出重均分子量为8,000的酚醛清漆树脂100重量份中,加入2重量份的聚(异丁烯酸甲酯-共-异丁烯酸正丁酯)、21重量份平均酯化率75%的2,3,4,4’-四羟基二苯甲酮和1,2-萘醌二叠氮化物-5-磺酰氯的酯化产物、5重量份4,4’-[1-[4-[1-(4-羟基苯基)-1-甲基乙基]苯基]亚乙基]双酚,将上述混合物溶解于390重量份丙二醇单甲基醚乙酸酯中,再将相对于固体含量为300ppm的含氟表面活性剂Megafac(由Dai-NipponInk & Chemicals,Inc.制造)加入,然后搅拌并通过0.2μm过滤器,来制备本发明的感光性树脂组合物。将这种组合物旋转涂布到4英寸硅片和4英寸的玻璃片上,在100℃的热板上预烘烤90秒,得到1.5μm厚的抗蚀涂层。用Hitachi Co.,Ltd.制造的i-线分光器(NA=0.5)对抗蚀涂层进行曝光,在23℃下,在2.38重量%的TMAH溶液中显影60秒,之后,通过扫描电镜观察到了最佳的曝光量,极限分辨率和图案,最佳曝光量为4英寸硅片上80mJ/cm2,4英寸玻璃片上72mJ/cm2,两个极限分辨率为0.5微米,两个的图案都为较好的长方形。
实施例2
使用实施例1相同的方式,除了使用酯化物质的混合物(50∶50混合比),其一为平均酯化率87.5%的2,3,4,4’-四羟基二苯甲酮和1,2-萘醌二叠氮化物-5-磺酰氯的酯化产物、另一个为平均酯化率75%的2,3,4,4’-四羟基二苯甲酮和1,2-萘醌二叠氮化物-5-磺酰氯的酯化产物,最佳曝光量为4英寸硅片上85mJ/cm2,4英寸玻璃片上77mJ/cm2,两个极限分辨率为0.5微米,两个的图案都为较好的长方形。
实施例3
和上述的方法相同,不同之处为将2.1×10-5重量份(相对于光敏剂0.0001重量份)蒽作为荧光剂加入,最佳曝光量为4英寸硅片上75mJ/cm2,4英寸玻璃片上68mJ/cm2,两个极限分辨率为0.5微米,两个的图案都为较好的长方形。
实施例4
和上述的方法相同,不同之处为将1.05×10-3重量份(相对于光敏剂0.005重量份)蒽作为荧光剂加入,最佳曝光量为4英寸硅片上71mJ/cm2,4英寸玻璃片上64mJ/cm2,两个极限分辨率为0.5微米,两个的图案都为较好的长方形。
实施例5
和上述的方法相同,不同之处为将2.1×10-2重量份(相对于光敏剂0.1重量份)蒽作为荧光剂加入,最佳曝光量为4英寸硅片上74mJ/cm2,4英寸玻璃片上67mJ/cm2,两个极限分辨率为0.5微米,两个的图案都为较好的长方形。
对比实施例1
使用与实施例1相同的方式,不同之处为使用25重量份的平均酯化率75%的2,3,4,4’-四羟基二苯甲酮和1,2-萘醌二叠氮化物-5-磺酰氯的酯化产物,及并不使用聚(异丁烯酸甲酯-共-异丁烯酸正丁酯),最佳曝光量为4英寸硅片上80mJ/cm2,4英寸玻璃片上72mJ/cm2,两个极限分辨率为0.75微米,两个的图案都有拖尾现象,和前面的实施例相比图案较差。
发明效果
根据本发明经i-线曝光后,形成如上所述的具有高分辨率的图案和好的图案。
工业实用性
本发明的感光性树脂组合物可以作为光致抗蚀剂,适用于制造半导体设备、平板显示器(FPD)等。
Claims (5)
1.使用i-线作为曝光光源,使用感光性树脂组合物形成图案的方法,其中所述的组合物包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。
2.用于i-线曝光的感光性树脂组合物,包括碱溶性树脂和含有醌二叠氮化物基团的光敏剂,其中碱溶性树脂为酚醛清漆树脂和选自下述一个或更多树脂的混合物,(i)聚丙烯酸酯、(ii)聚异丁烯酸酯、(iii)聚苯乙烯衍生物和(iv)包括两个或更多选自丙烯酸酯、异丁烯酸酯和苯乙烯衍生物单体的共聚物。
3.根据权利要求2所述的用于i-线曝光的感光性树脂组合物,其中所述含有醌二叠氮化物基团的光敏剂为四羟基二苯甲酮和1,2-萘醌二叠氮化物磺酸的酯化产物。
4.根据权利要求2或3所述的用于i-线曝光的感光性树脂组合物,其中所述含有醌二叠氮化物基团的光敏剂为四羟基二苯甲酮和1,2-萘醌二叠氮化物磺酸的酯化产物的混合物。
5.根据权利要求2至4中任一项所述的用于i-线曝光的感光性树脂组合物,其中相对于100重量份含有醌二叠氮化物基团的光敏剂,使用0.0001到1.0重量份的荧光剂。
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CN102590158A (zh) * | 2012-02-23 | 2012-07-18 | 常州天合光能有限公司 | 快速鉴别太阳能级umg硅片的方法 |
CN104375379A (zh) * | 2013-08-13 | 2015-02-25 | 第一毛织株式会社 | 正性光敏树脂组合物、光敏树脂膜和用其制备的显示装置 |
CN104375379B (zh) * | 2013-08-13 | 2019-06-14 | 第一毛织株式会社 | 正性光敏树脂组合物、光敏树脂膜和用其制备的显示装置 |
CN113956395A (zh) * | 2021-10-27 | 2022-01-21 | 江苏汉拓光学材料有限公司 | 聚合物树脂及其制备方法、电子束光刻胶及其制备与使用方法 |
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EP1345081A1 (en) | 2003-09-17 |
US6806019B2 (en) | 2004-10-19 |
US20030022093A1 (en) | 2003-01-30 |
WO2002048793A1 (fr) | 2002-06-20 |
TW554250B (en) | 2003-09-21 |
KR20030034042A (ko) | 2003-05-01 |
KR100857042B1 (ko) | 2008-09-05 |
JP3842736B2 (ja) | 2006-11-08 |
JPWO2002048793A1 (ja) | 2004-04-15 |
CN1208687C (zh) | 2005-06-29 |
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