CN1347270A - 薄膜电致发光元件及其制造方法 - Google Patents
薄膜电致发光元件及其制造方法 Download PDFInfo
- Publication number
- CN1347270A CN1347270A CN01132529A CN01132529A CN1347270A CN 1347270 A CN1347270 A CN 1347270A CN 01132529 A CN01132529 A CN 01132529A CN 01132529 A CN01132529 A CN 01132529A CN 1347270 A CN1347270 A CN 1347270A
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- China
- Prior art keywords
- layer
- dielectric layer
- film
- dielectric
- electrode layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
试样 | 总膜厚(μm) | 膜结构 | 耐压(V) | 介电常数 | 电子显微镜照片 | 备注 |
11 | 2.0 | 0.4×5 | 0 | - | 图6 | 比较例 |
12 | 2.1 | 0.7×3 | 30 | 500 | 图7 | 比较例 |
13 | 3.5 | 0.7×5 | 140 | 520 | - | 比较例 |
14 | 4.2 | 0.7×6 | 220 | 540 | 图8 | 本发明 |
15 | 4.4 | 0.4×11 | 170 | 530 | - | 本发明 |
16 | 7.0 | 0.7×10 | 320 | 600 | - | 本发明 |
17 | 14.0 | 0.7×20 | 430 | 620 | - | 本发明 |
18 | 16.4 | 0.7×22 | 450 | 620 | - | 比较例 |
试样 | 总膜厚(μm) | 膜结构 | 耐压(V) | 介电常数 | 备注 |
21 | 1.5 | 1.5×1 | 0 | - | 比较例 |
22 | 3.0 | 1.5×2 | 80 | 350 | 比较例 |
23 | 4.5 | 1.5×3 | 250 | 370 | 本发明 |
24 | 7.5 | 1.5×5 | 350 | 380 | 本发明 |
25 | 12.0 | 1.5×8 | 390 | 380 | 本发明 |
26 | 15.0 | 1.5×10 | 450 | 390 | 本发明 |
27 | 19.5 | 1.5×13 | 460 | 400 | 比较例 |
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP299352/2000 | 2000-09-29 | ||
JP2000299352A JP2002110344A (ja) | 2000-09-29 | 2000-09-29 | 薄膜el素子及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1347270A true CN1347270A (zh) | 2002-05-01 |
CN1178558C CN1178558C (zh) | 2004-12-01 |
Family
ID=18781169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB011325291A Expired - Fee Related CN1178558C (zh) | 2000-09-29 | 2001-07-06 | 薄膜电致发光元件及其制造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6809474B2 (zh) |
EP (1) | EP1194014A3 (zh) |
JP (1) | JP2002110344A (zh) |
KR (1) | KR20020025656A (zh) |
CN (1) | CN1178558C (zh) |
CA (1) | CA2352527C (zh) |
TW (1) | TW527851B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101163356B (zh) * | 2007-11-28 | 2011-11-30 | 上海广电电子股份有限公司 | 提高电致发光显示器中介质层绝缘性能的方法 |
CN101496087B (zh) * | 2006-07-31 | 2012-01-11 | 摩托罗拉移动公司 | 具有像素阵列的电致发光显示器 |
CN107998905A (zh) * | 2017-12-20 | 2018-05-08 | 宋永秀 | 一种表面完整性好的小孔径陶瓷膜的制备方法 |
CN113281802A (zh) * | 2020-02-04 | 2021-08-20 | 西门子医疗有限公司 | 用于电磁辐射的探测器和制造其的方法 |
CN114497243A (zh) * | 2022-01-21 | 2022-05-13 | 中山德华芯片技术有限公司 | 一种红外探测器芯片及其制作方法与应用 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6707230B2 (en) * | 2001-05-29 | 2004-03-16 | University Of North Carolina At Charlotte | Closed loop control systems employing relaxor ferroelectric actuators |
KR100497213B1 (ko) * | 2001-10-29 | 2005-06-28 | 더 웨스타임 코퍼레이션 | 복합기판 및 이를 사용한 el패널과 그 제조방법 |
JP2003347062A (ja) * | 2002-05-24 | 2003-12-05 | Tdk Corp | El素子の製造方法およびel素子 |
US7038377B2 (en) * | 2002-01-16 | 2006-05-02 | Seiko Epson Corporation | Display device with a narrow frame |
JP2004178930A (ja) * | 2002-11-26 | 2004-06-24 | Sony Corp | 発光素子およびこれを用いた表示装置 |
US6977806B1 (en) * | 2003-02-26 | 2005-12-20 | Tdk Corporation | Multi-layered unit including electrode and dielectric layer |
US6958900B2 (en) * | 2003-02-26 | 2005-10-25 | Tdk Corporation | Multi-layered unit including electrode and dielectric layer |
US20050253510A1 (en) * | 2004-05-11 | 2005-11-17 | Shogo Nasu | Light-emitting device and display device |
FR2893611B1 (fr) * | 2005-11-23 | 2007-12-21 | Commissariat Energie Atomique | Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief |
CN112309280B (zh) * | 2019-07-31 | 2022-04-29 | 北京梦之墨科技有限公司 | 一种具有可控图案的冷光片及其制作方法、发光装置 |
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JPS5652438B2 (zh) * | 1973-07-10 | 1981-12-11 | ||
US3919577A (en) * | 1973-09-21 | 1975-11-11 | Owens Illinois Inc | Multiple gaseous discharge display/memory panel having thin film dielectric charge storage member |
US4188565A (en) * | 1977-09-16 | 1980-02-12 | Sharp Kabushiki Kaisha | Oxygen atom containing film for a thin-film electroluminescent element |
JPS5652438A (en) | 1979-10-05 | 1981-05-11 | Graphtec Corp | Decoding circuit |
EP0111568B1 (en) * | 1982-05-28 | 1986-10-15 | Matsushita Electric Industrial Co., Ltd. | Thin film electric field light-emitting device |
DE3476624D1 (en) * | 1983-10-25 | 1989-03-09 | Sharp Kk | Thin film light emitting element |
EP0267377B1 (en) * | 1986-09-16 | 1993-02-03 | Hitachi, Ltd. | Electroluminescent display apparatus and process for producing the same |
JPS6445085A (en) * | 1987-08-14 | 1989-02-17 | Alps Electric Co Ltd | Manufacture of film type el display element |
JPH0254895A (ja) * | 1988-08-20 | 1990-02-23 | Mitsubishi Mining & Cement Co Ltd | エレクトロルミネセンス発光素子の製造方法 |
DE4019988A1 (de) | 1989-06-23 | 1991-01-10 | Sharp Kk | Duennfilm-eld |
JP2689661B2 (ja) | 1989-12-18 | 1997-12-10 | 松下電器産業株式会社 | 光干渉フィルタを含む薄膜エレクトロルミネセンス装置 |
JPH0461791A (ja) * | 1990-06-26 | 1992-02-27 | Sharp Corp | 薄膜エレクトロルミネッセンス素子 |
US5444268A (en) | 1990-11-02 | 1995-08-22 | Kabushiki Kaisha Komatsu Seisakusho | Thin film el device |
JPH04171697A (ja) * | 1990-11-02 | 1992-06-18 | Fuji Electric Co Ltd | エレクトロルミネッセンス表示パネル |
US5432015A (en) * | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
JP3274527B2 (ja) * | 1992-09-22 | 2002-04-15 | 株式会社日立製作所 | 有機発光素子とその基板 |
JP3578786B2 (ja) | 1992-12-24 | 2004-10-20 | アイファイアー テクノロジー インク | Elラミネート誘電層構造体および該誘電層構造体生成方法ならびにレーザパターン描画方法およびディスプレイパネル |
JP3187186B2 (ja) | 1993-02-03 | 2001-07-11 | モトローラ株式会社 | Tdma方式の通信方法及びその装置の送受信機 |
JP3250879B2 (ja) | 1993-07-26 | 2002-01-28 | 株式会社リコー | 画像支持体の再生方法および該再生方法に使用する再生装置 |
JP2888741B2 (ja) * | 1993-09-27 | 1999-05-10 | 日本ペイント株式会社 | 薄膜パターン形成法 |
JP2846571B2 (ja) * | 1994-02-25 | 1999-01-13 | 出光興産株式会社 | 有機エレクトロルミネッセンス素子 |
US5786664A (en) * | 1995-03-27 | 1998-07-28 | Youmin Liu | Double-sided electroluminescent device |
US5736754A (en) * | 1995-11-17 | 1998-04-07 | Motorola, Inc. | Full color organic light emitting diode array |
US5856029A (en) * | 1996-05-30 | 1999-01-05 | E.L. Specialists, Inc. | Electroluminescent system in monolithic structure |
JPH11273873A (ja) * | 1998-03-20 | 1999-10-08 | Nec Kansai Ltd | 電界発光灯 |
US6242858B1 (en) * | 1998-09-14 | 2001-06-05 | Planar Systems, Inc. | Electroluminescent phosphor thin films |
US6514891B1 (en) * | 1999-07-14 | 2003-02-04 | Lg Electronics Inc. | Thick dielectric composition for solid state display |
KR100595501B1 (ko) * | 1999-10-19 | 2006-07-03 | 엘지전자 주식회사 | 반도체 표시소자의 제조방법 |
US6650046B2 (en) * | 2000-11-17 | 2003-11-18 | Tdk Corporation | Thin-film EL device, and its fabrication process |
US6577059B2 (en) * | 2000-11-17 | 2003-06-10 | Tdk Corporation | Thin-film EL device, and its fabrication process |
-
2000
- 2000-09-29 JP JP2000299352A patent/JP2002110344A/ja not_active Withdrawn
-
2001
- 2001-05-30 US US09/866,732 patent/US6809474B2/en not_active Expired - Lifetime
- 2001-07-02 TW TW090116164A patent/TW527851B/zh not_active IP Right Cessation
- 2001-07-06 KR KR1020010040278A patent/KR20020025656A/ko not_active Application Discontinuation
- 2001-07-06 EP EP01115711A patent/EP1194014A3/en not_active Withdrawn
- 2001-07-06 CN CNB011325291A patent/CN1178558C/zh not_active Expired - Fee Related
- 2001-07-06 CA CA002352527A patent/CA2352527C/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101496087B (zh) * | 2006-07-31 | 2012-01-11 | 摩托罗拉移动公司 | 具有像素阵列的电致发光显示器 |
CN101163356B (zh) * | 2007-11-28 | 2011-11-30 | 上海广电电子股份有限公司 | 提高电致发光显示器中介质层绝缘性能的方法 |
CN107998905A (zh) * | 2017-12-20 | 2018-05-08 | 宋永秀 | 一种表面完整性好的小孔径陶瓷膜的制备方法 |
CN107998905B (zh) * | 2017-12-20 | 2020-11-13 | 绍兴凯达纺织装饰品有限公司 | 一种修复陶瓷膜表面大孔或者裂纹的方法 |
CN113281802A (zh) * | 2020-02-04 | 2021-08-20 | 西门子医疗有限公司 | 用于电磁辐射的探测器和制造其的方法 |
CN114497243A (zh) * | 2022-01-21 | 2022-05-13 | 中山德华芯片技术有限公司 | 一种红外探测器芯片及其制作方法与应用 |
CN114497243B (zh) * | 2022-01-21 | 2022-11-29 | 中山德华芯片技术有限公司 | 一种红外探测器芯片及其制作方法与应用 |
Also Published As
Publication number | Publication date |
---|---|
US20020041147A1 (en) | 2002-04-11 |
EP1194014A3 (en) | 2003-12-10 |
CN1178558C (zh) | 2004-12-01 |
JP2002110344A (ja) | 2002-04-12 |
US6809474B2 (en) | 2004-10-26 |
CA2352527C (en) | 2004-06-22 |
KR20020025656A (ko) | 2002-04-04 |
EP1194014A2 (en) | 2002-04-03 |
TW527851B (en) | 2003-04-11 |
CA2352527A1 (en) | 2002-03-29 |
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C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: THE WESTAIM CORP. Free format text: FORMER OWNER: TDK CORP. Effective date: 20050204 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20050204 Address after: Alberta Canada Patentee after: THE WESTAIM Corp. Address before: Tokyo, Japan Patentee before: TDK Corp. |
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ASS | Succession or assignment of patent right |
Owner name: YIFEILEI INTELLECTUAL PROPERTY CO.,LTD. Free format text: FORMER OWNER: IFIRE TECHNOLOGY INC. Effective date: 20080815 Owner name: IFIRE TECHNOLOGY INC. Free format text: FORMER OWNER: THE WESTAIM CORP. Effective date: 20080815 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20080815 Address after: Alberta Canada Patentee after: IFIRE IP Corp. Address before: Alberta Canada Patentee before: IFIRE TECHNOLOGY Inc. Effective date of registration: 20080815 Address after: Alberta Canada Patentee after: IFIRE TECHNOLOGY Inc. Address before: Alberta Canada Patentee before: The Westaim Corp. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20041201 Termination date: 20170706 |
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CF01 | Termination of patent right due to non-payment of annual fee |