FR2893611B1 - Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief - Google Patents
Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en reliefInfo
- Publication number
- FR2893611B1 FR2893611B1 FR0553554A FR0553554A FR2893611B1 FR 2893611 B1 FR2893611 B1 FR 2893611B1 FR 0553554 A FR0553554 A FR 0553554A FR 0553554 A FR0553554 A FR 0553554A FR 2893611 B1 FR2893611 B1 FR 2893611B1
- Authority
- FR
- France
- Prior art keywords
- geometry
- producing
- substrate
- oxide ceramic
- coating based
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1225—Deposition of multilayers of inorganic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0553554A FR2893611B1 (fr) | 2005-11-23 | 2005-11-23 | Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief |
ES06819672T ES2393204T3 (es) | 2005-11-23 | 2006-11-22 | Procedimiento de realización de un revestimiento a base de un óxido cerámico adaptado a la geometría de un sustrato que presenta unos motivos en relieve |
EP06819672A EP1969155B1 (fr) | 2005-11-23 | 2006-11-22 | Procede de realisation d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief |
PCT/EP2006/068767 WO2007060180A1 (fr) | 2005-11-23 | 2006-11-22 | Procede de realisation d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief |
JP2008541743A JP5208758B2 (ja) | 2005-11-23 | 2006-11-22 | レリーフ特性を有する基板の形状に適合する酸化物セラミックに基づく塗膜製造プロセス |
US12/094,631 US20080292790A1 (en) | 2005-11-23 | 2006-11-22 | Process For Producing a Coating Based on an Oxide Ceramic that Conforms to the Geometry of a Substrate Having Features in Relief |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0553554A FR2893611B1 (fr) | 2005-11-23 | 2005-11-23 | Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2893611A1 FR2893611A1 (fr) | 2007-05-25 |
FR2893611B1 true FR2893611B1 (fr) | 2007-12-21 |
Family
ID=36118163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0553554A Expired - Fee Related FR2893611B1 (fr) | 2005-11-23 | 2005-11-23 | Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080292790A1 (fr) |
EP (1) | EP1969155B1 (fr) |
JP (1) | JP5208758B2 (fr) |
ES (1) | ES2393204T3 (fr) |
FR (1) | FR2893611B1 (fr) |
WO (1) | WO2007060180A1 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2967992B1 (fr) | 2010-11-26 | 2015-05-29 | Commissariat Energie Atomique | Preparation de sols d'oxydes metalliques stables, utiles notamment pour la fabrication de films minces a proprietes optiques et resistants a l'abrasion |
FR2981064B1 (fr) | 2011-10-07 | 2014-11-28 | Commissariat Energie Atomique | Procede de preparation d'un materiau sur un substrat par voie sol-gel |
CN103693682A (zh) * | 2014-01-07 | 2014-04-02 | 哈尔滨工业大学 | ZnTiO3多孔纳米材料的合成方法 |
EP2947178A1 (fr) * | 2014-05-21 | 2015-11-25 | IMEC vzw | Revêtement conforme sur des substrats tridimensionnels |
US9443782B1 (en) * | 2015-08-11 | 2016-09-13 | Freescale Semiconductor, Inc. | Method of bond pad protection during wafer processing |
FR3045036B1 (fr) * | 2015-12-15 | 2017-12-22 | Commissariat Energie Atomique | Procede de preparation d'une solution sol-gel utilisable pour la preparation d'une ceramique de titanate de baryum dope par du hafnium et/ou par au moins un element lanthanide |
CN111908833B (zh) * | 2020-07-22 | 2021-11-02 | 电子科技大学 | 一种锆钛酸铅气凝胶复合涂层的制备方法 |
CN114293179B (zh) * | 2021-12-08 | 2024-02-06 | 重庆材料研究院有限公司 | 一种贵金属热电偶用氧化铪涂层的制备方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4276543A (en) * | 1979-03-19 | 1981-06-30 | Trw Inc. | Monolithic triple diffusion analog to digital converter |
US5670432A (en) * | 1996-08-01 | 1997-09-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Thermal treatment to form a void free aluminum metal layer for a semiconductor device |
JP3451623B2 (ja) * | 1996-10-28 | 2003-09-29 | セイコーエプソン株式会社 | インクジェット記録ヘッド |
US6328433B1 (en) * | 1998-01-22 | 2001-12-11 | Seiko Epson Corporation | Piezoelectric film element and ink-jet recording head using the same |
JP2002110344A (ja) * | 2000-09-29 | 2002-04-12 | Tdk Corp | 薄膜el素子及びその製造方法 |
FR2829757B1 (fr) * | 2001-09-20 | 2004-07-09 | Commissariat Energie Atomique | Procede de preparation d'un sol stable de zircono-titanate de plomb et procede de preparation de films a partir dudit sol |
KR100486727B1 (ko) * | 2002-11-14 | 2005-05-03 | 삼성전자주식회사 | 평판형 렌즈의 제조방법 |
-
2005
- 2005-11-23 FR FR0553554A patent/FR2893611B1/fr not_active Expired - Fee Related
-
2006
- 2006-11-22 US US12/094,631 patent/US20080292790A1/en not_active Abandoned
- 2006-11-22 EP EP06819672A patent/EP1969155B1/fr not_active Not-in-force
- 2006-11-22 JP JP2008541743A patent/JP5208758B2/ja not_active Expired - Fee Related
- 2006-11-22 ES ES06819672T patent/ES2393204T3/es active Active
- 2006-11-22 WO PCT/EP2006/068767 patent/WO2007060180A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
US20080292790A1 (en) | 2008-11-27 |
FR2893611A1 (fr) | 2007-05-25 |
JP2009516634A (ja) | 2009-04-23 |
ES2393204T3 (es) | 2012-12-19 |
WO2007060180A1 (fr) | 2007-05-31 |
JP5208758B2 (ja) | 2013-06-12 |
EP1969155A1 (fr) | 2008-09-17 |
EP1969155B1 (fr) | 2012-08-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2893611B1 (fr) | Procede de realisaion d'un revetement a base d'une ceramique oxyde conforme a la geometrie d'un substrat presentant des motifs en relief | |
FR2892409B1 (fr) | Procede de traitement d'un substrat | |
IL185110A0 (en) | Processes for the production of organometallic compounds | |
CY1109599T1 (el) | Κρυσταλλικες μορφες υδροχλωρικης (r)-8-χλωρο-1-μεθυλο-2,3,4,5-τετραϋδρο-1η-3-βενζαζεπινης | |
EP1900317A3 (fr) | Serviette abrasive pour traiter une surface | |
FR2863771B1 (fr) | Procede de traitement d'une tranche multicouche presentant un differentiel de caracteristiques thermiques | |
FR2896618B1 (fr) | Procede de fabrication d'un substrat composite | |
EP1426346A4 (fr) | Solution de traitement de surface a composants multiples destinee au traitement de precision dune plaque de base en verre | |
AU2003232469A8 (en) | Method for the production of structured layers on substrates | |
PL1541373T3 (pl) | Sposób wytwarzania paneli mających dekoracyjną powierzchnię | |
EP1974838A4 (fr) | Procede permettant de produire un motif | |
EP1491560A4 (fr) | Procede de production de composes a poids moleculaire eleve pour resine photosensible | |
EP1873131A4 (fr) | Procédé de fabrication de substrat céramique, et substrat céramique | |
PL1877350T3 (pl) | Powlekane podłoże i sposób wytwarzania powlekanego podłoża | |
EP1930486A4 (fr) | Procede de production de substrat semi-conducteur | |
ITMI20030015A1 (it) | Procedimento per formare uno strato ceramico avente | |
FR2912259B1 (fr) | Procede de fabrication d'un substrat du type "silicium sur isolant". | |
MX341629B (es) | Placa transparente texturada y procedimiento de fabricacion de tal placa. | |
EP1965616A4 (fr) | Substrat de verre présentant un motif de circuit, et son processus de fabrication | |
GB2420663B (en) | Substrate for pattern formation | |
IL178084A0 (en) | Process for producing semi-conductor coated substrate | |
DK1222860T3 (da) | Bolsje med ru konsistens beregnet til behandling af halitose | |
GB2374315B (en) | Method for producing multilayer ceramic substrate | |
HK1117274A1 (en) | Process of forming a curved profile on a semiconductor substrate | |
DE50203707D1 (de) | Resistloses lithographieverfahren zur herstellung feiner strukturen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20160729 |