ITMI20030015A1 - Procedimento per formare uno strato ceramico avente - Google Patents

Procedimento per formare uno strato ceramico avente

Info

Publication number
ITMI20030015A1
ITMI20030015A1 IT000015A ITMI20030015A ITMI20030015A1 IT MI20030015 A1 ITMI20030015 A1 IT MI20030015A1 IT 000015 A IT000015 A IT 000015A IT MI20030015 A ITMI20030015 A IT MI20030015A IT MI20030015 A1 ITMI20030015 A1 IT MI20030015A1
Authority
IT
Italy
Prior art keywords
procedure
forming
ceramic layer
ceramic
layer
Prior art date
Application number
IT000015A
Other languages
English (en)
Inventor
Dominique Billieres
Jean-Michel Drouin
Gerard Main
Matthew A Simpson
Original Assignee
Saint Gobain Ceramics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Ceramics filed Critical Saint Gobain Ceramics
Publication of ITMI20030015A1 publication Critical patent/ITMI20030015A1/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Vapour Deposition (AREA)
IT000015A 2002-01-11 2003-01-08 Procedimento per formare uno strato ceramico avente ITMI20030015A1 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/044,744 US6884514B2 (en) 2002-01-11 2002-01-11 Method for forming ceramic layer having garnet crystal structure phase and article made thereby

Publications (1)

Publication Number Publication Date
ITMI20030015A1 true ITMI20030015A1 (it) 2003-07-12

Family

ID=21934086

Family Applications (1)

Application Number Title Priority Date Filing Date
IT000015A ITMI20030015A1 (it) 2002-01-11 2003-01-08 Procedimento per formare uno strato ceramico avente

Country Status (6)

Country Link
US (1) US6884514B2 (it)
AU (1) AU2002359865A1 (it)
FR (1) FR2834723A1 (it)
IT (1) ITMI20030015A1 (it)
TW (1) TW200307057A (it)
WO (1) WO2003059615A1 (it)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8067067B2 (en) * 2002-02-14 2011-11-29 Applied Materials, Inc. Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
US7838079B2 (en) * 2004-11-17 2010-11-23 Battelle Energy Alliance, Llc Coated armor system and process for making the same
US7422983B2 (en) * 2005-02-24 2008-09-09 International Business Machines Corporation Ta-TaN selective removal process for integrated device fabrication
US10242888B2 (en) 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
US10622194B2 (en) 2007-04-27 2020-04-14 Applied Materials, Inc. Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
US20090214825A1 (en) * 2008-02-26 2009-08-27 Applied Materials, Inc. Ceramic coating comprising yttrium which is resistant to a reducing plasma
US8029595B2 (en) * 2008-06-02 2011-10-04 Nitto Denko Corporation Method and apparatus of producing nanoparticles using nebulized droplet
US8339025B2 (en) * 2009-06-01 2012-12-25 Nitto Denko Corporation Luminescent ceramic and light-emitting device using the same
US8206672B2 (en) * 2009-07-10 2012-06-26 Nitto Denko Corporation Production of phase-pure ceramic garnet particles
US20120177908A1 (en) * 2010-07-14 2012-07-12 Christopher Petorak Thermal spray coatings for semiconductor applications
US8854451B2 (en) * 2011-10-19 2014-10-07 Lam Research Corporation Automated bubble detection apparatus and method
US9034199B2 (en) 2012-02-21 2015-05-19 Applied Materials, Inc. Ceramic article with reduced surface defect density and process for producing a ceramic article
US9212099B2 (en) 2012-02-22 2015-12-15 Applied Materials, Inc. Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
US9850568B2 (en) 2013-06-20 2017-12-26 Applied Materials, Inc. Plasma erosion resistant rare-earth oxide based thin film coatings
US9711334B2 (en) 2013-07-19 2017-07-18 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
US9583369B2 (en) 2013-07-20 2017-02-28 Applied Materials, Inc. Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
US9725799B2 (en) 2013-12-06 2017-08-08 Applied Materials, Inc. Ion beam sputtering with ion assisted deposition for coatings on chamber components
US9869013B2 (en) 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
CN107848830B (zh) * 2015-07-22 2020-03-03 松下知识产权经营株式会社 石榴石化合物和其制造方法、使用了该石榴石化合物的发光装置和装饰物及该石榴石化合物的使用方法
DE102016206968A1 (de) * 2016-04-25 2017-10-26 Siemens Aktiengesellschaft Hitzeschild mit äußerster Yttriumoxidbeschichtung, Verfahren zur Herstellung und Produkt
US11223066B2 (en) 2018-08-01 2022-01-11 Samsung Electronics Co., Ltd. Solid-state electrolyte and method of manufacture thereof
US11251460B2 (en) 2018-08-01 2022-02-15 Samsung Electronics Co., Ltd. Solution-processed solid-state electrolyte and method of manufacture thereof
JP7139988B2 (ja) * 2019-02-13 2022-09-21 Tdk株式会社 蛍光体および光源装置
US11757127B2 (en) 2019-06-18 2023-09-12 Samsung Electronics Co., Ltd. Lithium solid electrolyte and method of manufacture thereof
US20210403337A1 (en) * 2020-06-30 2021-12-30 Applied Materials, Inc. Yttrium oxide based coating and bulk compositions
CN113584417B (zh) * 2021-08-02 2022-08-02 重庆臻宝实业有限公司 一种稀土金属盐类陶瓷复合涂层及其制备方法与应用

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3825787A1 (de) * 1988-07-29 1990-02-01 Philips Nv Verfahren zur herstellung von eisengranatschichten
JPH0521628A (ja) 1991-07-16 1993-01-29 Sumitomo Electric Ind Ltd 半導体装置
JPH0529380A (ja) 1991-07-24 1993-02-05 Sharp Corp 半導体装置
US6273106B1 (en) 1996-10-04 2001-08-14 Nihon Genryo Co., Ltd. Particulate matter washing apparatus and method
US6447937B1 (en) * 1997-02-26 2002-09-10 Kyocera Corporation Ceramic materials resistant to halogen plasma and components using the same
US6015630A (en) 1997-04-10 2000-01-18 The University Of Connecticut Ceramic materials for thermal barrier coatings
US6106959A (en) 1998-08-11 2000-08-22 Siemens Westinghouse Power Corporation Multilayer thermal barrier coating systems
WO2000026649A2 (en) 1998-10-29 2000-05-11 Koninklijke Philips Electronics N.V. X-ray diffraction apparatus with an x-ray optical reference channel
US6383964B1 (en) * 1998-11-27 2002-05-07 Kyocera Corporation Ceramic member resistant to halogen-plasma corrosion
KR100273326B1 (ko) 1998-12-04 2000-12-15 김영환 고주파 스퍼터링 장치 및 이를 이용한 박막형성방법
EP1013623B1 (en) * 1998-12-21 2004-09-15 Shin-Etsu Chemical Co., Ltd. Corrosion-resistant composite oxide material
TW514996B (en) 1999-12-10 2002-12-21 Tokyo Electron Ltd Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
US6654610B1 (en) * 2000-05-05 2003-11-25 Lucent Technologies Inc. Two-way packet data protocol methods and apparatus for a mobile telecommunication system
JP2001343985A (ja) * 2000-06-02 2001-12-14 Nippon Telegr & Teleph Corp <Ntt> 音声スイッチ方法及び音声スイッチ
JP2001358207A (ja) * 2000-06-12 2001-12-26 Toshiba Ceramics Co Ltd シリコンウェハ支持部材
JP3967093B2 (ja) * 2000-07-10 2007-08-29 東芝セラミックス株式会社 セラミックス部材およびその製造方法
JP2002068864A (ja) * 2000-08-23 2002-03-08 Toshiba Ceramics Co Ltd 耐プラズマ性部材およびその製造方法

Also Published As

Publication number Publication date
AU2002359865A1 (en) 2003-07-30
US6884514B2 (en) 2005-04-26
TW200307057A (en) 2003-12-01
WO2003059615A1 (en) 2003-07-24
US20030134134A1 (en) 2003-07-17
FR2834723A1 (fr) 2003-07-18

Similar Documents

Publication Publication Date Title
ITMI20030015A1 (it) Procedimento per formare uno strato ceramico avente
NO20034277D0 (no) Fremgangsmåte for rensing av gruspakker
EP1534649A4 (en) CLAY COATED
DE60316746D1 (de) Keramischer Suszeptor
ITMI20020198A0 (it) (per)aloeteri
DE60326916D1 (de) Piezoelektrischer Vielschichtaktor
DE50307288D1 (de) Keramikbauelement
ITFI20020077A1 (it) Dispositivo per la determinazione dello spessore di uno strato conduttivo
GB0215958D0 (en) Ceramic materials
ITMO20010063A0 (it) Apparato per formare piastrelle
ITMO20010199A0 (it) Apparato per formare piastrelle
TW563684U (en) A ceramic slab
ATA14982002A (de) Ziegel
ITTO20030691A1 (it) Metodo ed apparecchiatura per formare uno strato
DE60302812D1 (de) Keramisches Abziehbild
DE50301367D1 (de) Fluidbetätigter kontraktionsantrieb
ITMO20020062A1 (it) Stampo per piastrelle ceramiche a nastro scorrevole
ATA4962002A (de) Dachziegel
TW586701U (en) Non-symmetric driving for piezo-electric ceramic transformer
ITMO20030202A1 (it) Stampo antiflessione per piastrelle ceramiche.
UA7776S (uk) Плитка керамічна
UA7777S (uk) Плитка керамічна
UA7781S (uk) Плитка керамічна
SE0401522D0 (sv) A New Ceramic Implant
ITRM20020420A0 (it) Procedimento per allumina idrata.