DE60316746D1 - Keramischer Suszeptor - Google Patents
Keramischer SuszeptorInfo
- Publication number
- DE60316746D1 DE60316746D1 DE60316746T DE60316746T DE60316746D1 DE 60316746 D1 DE60316746 D1 DE 60316746D1 DE 60316746 T DE60316746 T DE 60316746T DE 60316746 T DE60316746 T DE 60316746T DE 60316746 D1 DE60316746 D1 DE 60316746D1
- Authority
- DE
- Germany
- Prior art keywords
- ceramic susceptor
- susceptor
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000919 ceramic Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
- H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Resistance Heating (AREA)
- Surface Heating Bodies (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002121616A JP2003317906A (ja) | 2002-04-24 | 2002-04-24 | セラミックスヒータ |
JP2002121616 | 2002-04-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60316746D1 true DE60316746D1 (de) | 2007-11-22 |
DE60316746T2 DE60316746T2 (de) | 2008-02-07 |
Family
ID=29243592
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60316746T Expired - Fee Related DE60316746T2 (de) | 2002-04-24 | 2003-04-15 | Keramischer Suszeptor |
Country Status (8)
Country | Link |
---|---|
US (2) | US6806443B2 (de) |
EP (1) | EP1363316B1 (de) |
JP (1) | JP2003317906A (de) |
KR (1) | KR100551643B1 (de) |
CN (1) | CN1225342C (de) |
CA (1) | CA2424507C (de) |
DE (1) | DE60316746T2 (de) |
TW (1) | TWI236527B (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7394043B2 (en) * | 2002-04-24 | 2008-07-01 | Sumitomo Electric Industries, Ltd. | Ceramic susceptor |
JP2003317906A (ja) * | 2002-04-24 | 2003-11-07 | Sumitomo Electric Ind Ltd | セラミックスヒータ |
KR100478744B1 (ko) * | 2002-05-02 | 2005-03-28 | 주성엔지니어링(주) | 서셉터 및 이의 제조방법 |
DE60237173D1 (de) * | 2002-12-26 | 2010-09-09 | Mitsubishi Heavy Ind Ltd | Elektrostatisches futter |
JP4756695B2 (ja) | 2006-02-20 | 2011-08-24 | コバレントマテリアル株式会社 | 面状ヒータ |
DE102007016029A1 (de) * | 2007-03-30 | 2008-10-02 | Sig Technology Ag | Haltevorrichtung für eine CVD- oder PVD-Beschichtungsanlage |
KR101477142B1 (ko) * | 2013-09-13 | 2014-12-29 | (주)티티에스 | 기판 지지대 및 이를 구비하는 기판 지지 장치. |
JP1541874S (de) * | 2015-03-16 | 2016-01-18 | ||
US10636690B2 (en) * | 2016-07-20 | 2020-04-28 | Applied Materials, Inc. | Laminated top plate of a workpiece carrier in micromechanical and semiconductor processing |
US10679873B2 (en) * | 2016-09-30 | 2020-06-09 | Ngk Spark Plug Co., Ltd. | Ceramic heater |
DE102017121038A1 (de) * | 2017-05-24 | 2018-11-29 | Webasto SE | Luftheizgerät |
JP7018744B2 (ja) * | 2017-11-24 | 2022-02-14 | 昭和電工株式会社 | SiCエピタキシャル成長装置 |
CN109738481A (zh) * | 2018-11-27 | 2019-05-10 | 武汉嘉仪通科技有限公司 | 一种薄膜材料的赛贝克系数测量装置及方法 |
CN112822798B (zh) * | 2020-12-31 | 2022-11-25 | 博宇(天津)半导体材料有限公司 | 一种立式陶瓷加热器 |
CN116120085A (zh) * | 2023-02-14 | 2023-05-16 | 广东工业大学 | 一种等离子表面刻蚀结合玻璃陶瓷连接SiC陶瓷的方法及其制得的陶瓷连接件和应用 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0447155B1 (de) * | 1990-03-12 | 1995-07-26 | Ngk Insulators, Ltd. | Wafer-Heizgeräte für Apparate, zur Halbleiterherstellung Heizanlage mit diesen Heizgeräten und Herstellung von Heizgeräten |
US6133557A (en) * | 1995-01-31 | 2000-10-17 | Kyocera Corporation | Wafer holding member |
JP3477062B2 (ja) | 1997-12-26 | 2003-12-10 | 京セラ株式会社 | ウエハ加熱装置 |
JPH11260534A (ja) * | 1998-01-09 | 1999-09-24 | Ngk Insulators Ltd | 加熱装置およびその製造方法 |
JP4166345B2 (ja) * | 1998-10-07 | 2008-10-15 | 日本碍子株式会社 | 塩素系ガスに対する耐蝕性部材 |
JP3381909B2 (ja) | 1999-08-10 | 2003-03-04 | イビデン株式会社 | 半導体製造・検査装置用セラミックヒータ |
JP3222121B2 (ja) | 1999-10-22 | 2001-10-22 | イビデン株式会社 | 半導体製造・検査装置用セラミックヒータ |
JP2001196152A (ja) * | 2000-01-13 | 2001-07-19 | Sumitomo Electric Ind Ltd | セラミックスヒータ |
JP2001203257A (ja) * | 2000-01-20 | 2001-07-27 | Sumitomo Electric Ind Ltd | 半導体製造装置用ウェハ保持体 |
JP2003317906A (ja) * | 2002-04-24 | 2003-11-07 | Sumitomo Electric Ind Ltd | セラミックスヒータ |
-
2002
- 2002-04-24 JP JP2002121616A patent/JP2003317906A/ja active Pending
-
2003
- 2003-04-04 CA CA002424507A patent/CA2424507C/en not_active Expired - Fee Related
- 2003-04-15 EP EP03252397A patent/EP1363316B1/de not_active Expired - Lifetime
- 2003-04-15 DE DE60316746T patent/DE60316746T2/de not_active Expired - Fee Related
- 2003-04-23 US US10/249,614 patent/US6806443B2/en not_active Expired - Fee Related
- 2003-04-23 KR KR1020030025633A patent/KR100551643B1/ko not_active IP Right Cessation
- 2003-04-23 CN CNB031229778A patent/CN1225342C/zh not_active Expired - Fee Related
- 2003-04-24 TW TW092109607A patent/TWI236527B/zh not_active IP Right Cessation
-
2004
- 2004-08-20 US US10/711,064 patent/US6946625B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2003317906A (ja) | 2003-11-07 |
US20030201264A1 (en) | 2003-10-30 |
US20050000956A1 (en) | 2005-01-06 |
TW200406566A (en) | 2004-05-01 |
CN1453095A (zh) | 2003-11-05 |
DE60316746T2 (de) | 2008-02-07 |
CN1225342C (zh) | 2005-11-02 |
US6946625B2 (en) | 2005-09-20 |
US6806443B2 (en) | 2004-10-19 |
KR100551643B1 (ko) | 2006-02-14 |
EP1363316A2 (de) | 2003-11-19 |
EP1363316B1 (de) | 2007-10-10 |
TWI236527B (en) | 2005-07-21 |
KR20030084683A (ko) | 2003-11-01 |
CA2424507A1 (en) | 2003-10-24 |
CA2424507C (en) | 2005-07-12 |
EP1363316A3 (de) | 2004-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |