CN1324110C - 用于缓冲酸蚀刻溶液的氟化表面活性剂 - Google Patents

用于缓冲酸蚀刻溶液的氟化表面活性剂 Download PDF

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Publication number
CN1324110C
CN1324110C CNB03824926XA CN03824926A CN1324110C CN 1324110 C CN1324110 C CN 1324110C CN B03824926X A CNB03824926X A CN B03824926XA CN 03824926 A CN03824926 A CN 03824926A CN 1324110 C CN1324110 C CN 1324110C
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CN
China
Prior art keywords
etching
solution
etching solution
fluoride
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB03824926XA
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English (en)
Chinese (zh)
Other versions
CN1694939A (zh
Inventor
米歇尔·J·帕伦特
帕特里夏·M·萨武
理查德·M·弗林
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3M Innovative Properties Co
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3M Innovative Properties Co
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Filing date
Publication date
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Publication of CN1694939A publication Critical patent/CN1694939A/zh
Application granted granted Critical
Publication of CN1324110C publication Critical patent/CN1324110C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • ing And Chemical Polishing (AREA)
CNB03824926XA 2002-11-08 2003-09-11 用于缓冲酸蚀刻溶液的氟化表面活性剂 Expired - Fee Related CN1324110C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/290,765 US7169323B2 (en) 2002-11-08 2002-11-08 Fluorinated surfactants for buffered acid etch solutions
US10/290,765 2002-11-08

Publications (2)

Publication Number Publication Date
CN1694939A CN1694939A (zh) 2005-11-09
CN1324110C true CN1324110C (zh) 2007-07-04

Family

ID=32229103

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB03824926XA Expired - Fee Related CN1324110C (zh) 2002-11-08 2003-09-11 用于缓冲酸蚀刻溶液的氟化表面活性剂

Country Status (9)

Country Link
US (1) US7169323B2 (https=)
EP (1) EP1558697B1 (https=)
JP (1) JP4160562B2 (https=)
KR (1) KR101036068B1 (https=)
CN (1) CN1324110C (https=)
AT (1) ATE345375T1 (https=)
AU (1) AU2003272331A1 (https=)
DE (1) DE60309738T2 (https=)
WO (1) WO2004044091A1 (https=)

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US7294610B2 (en) * 2004-03-03 2007-11-13 3M Innovative Properties Company Fluorinated sulfonamide surfactants for aqueous cleaning solutions
JP4677890B2 (ja) * 2005-11-29 2011-04-27 信越半導体株式会社 埋め込み拡散エピタキシャルウエーハの製造方法および埋め込み拡散エピタキシャルウエーハ
JP2008124135A (ja) * 2006-11-09 2008-05-29 Stella Chemifa Corp 微細加工処理剤、及びそれを用いた微細加工処理方法
EP2139030B1 (en) * 2007-04-13 2014-05-14 Daikin Industries, Ltd. Etching solution
KR101030057B1 (ko) * 2008-07-16 2011-04-22 (주) 이피웍스 실리콘 폐기물의 재생방법 및 그 방법으로 재생된 실리콘조성물
US20100160458A1 (en) * 2008-12-23 2010-06-24 3M Innovative Properties Company Method of making a composition and aqueous composition preparable thereby
US20100155657A1 (en) * 2008-12-23 2010-06-24 3M Innovative Properties Company Aqueous composition containing fluorinated sulfonamide and sulfonamidate compounds
WO2010113744A1 (ja) * 2009-03-30 2010-10-07 東レ株式会社 導電膜除去剤および導電膜除去方法
US8030112B2 (en) * 2010-01-22 2011-10-04 Solid State System Co., Ltd. Method for fabricating MEMS device
WO2013022673A2 (en) * 2011-08-10 2013-02-14 3M Innovative Properties Company Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
RU2015128132A (ru) * 2012-12-14 2017-01-18 Басф Се Применение композиций, содержащих поверхностно-активное вещество и средство придания гидрофобности, для предохранения рельефа от разрушения при обработке рельефных материалов с линейными размерами, равными 50 нм или менее
JP6444316B2 (ja) 2013-01-29 2018-12-26 スリーエム イノベイティブ プロパティズ カンパニー 界面活性剤並びにその製造及び使用方法
KR101530606B1 (ko) * 2014-03-18 2015-07-01 주식회사 스노젠 인산 및 황산계 과불소화알킬 에스테르 계면 활성제와 이를 함유하는 크롬 식각액 및 저온 공정용 소핑제
JP6433730B2 (ja) * 2014-09-08 2018-12-05 東芝メモリ株式会社 半導体装置の製造方法及び半導体製造装置
EP3191532B1 (en) 2014-09-11 2019-08-28 3M Innovative Properties Company Fluorinated surfactant containing compositions
CN104388091B (zh) * 2014-10-25 2016-06-01 江阴市化学试剂厂有限公司 缓冲氧化腐蚀液制备方法
US11193059B2 (en) 2016-12-13 2021-12-07 Current Lighting Solutions, Llc Processes for preparing color stable red-emitting phosphor particles having small particle size
KR102460326B1 (ko) * 2018-06-28 2022-10-31 오씨아이 주식회사 실리콘 기판 식각 용액
TW202035361A (zh) * 2018-12-12 2020-10-01 美商3M新設資產公司 氟化胺氧化物界面活性劑
CN111171965B (zh) * 2020-01-20 2021-07-20 安徽建筑大学 一种运行清洗多功能复合清洗液
CN112939804B (zh) * 2021-02-04 2022-11-15 济宁康德瑞化工科技有限公司 一种有机胺氧化物的制备方法
CN116590020A (zh) 2021-05-20 2023-08-15 斯泰拉化工公司 微细加工处理剂、和微细加工处理方法
DE102021116206B3 (de) * 2021-06-23 2022-09-29 Infineon Technologies Bipolar Gmbh & Co. Kg Verfahren und Vorrichtung zur Herstellung einer Randstruktur eines Halbleiterbauelements

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US4370254A (en) * 1979-05-25 1983-01-25 Bayer Aktiengesellschaft Use of perfluoroalkane sulphonamide salts as surface active agents
CN1005288B (zh) * 1985-05-23 1989-09-27 荷兰塞纳拉帕拉塔公司 工作于两个频段的雷达系统
CN1227279A (zh) * 1997-11-21 1999-09-01 国际商业机器公司 蚀刻组合物及其用途
US6201122B1 (en) * 1992-12-08 2001-03-13 3M Innovative Properties Company Fluoroaliphatic radical-containing anionic sulfonamido compounds
CN1328696A (zh) * 1998-11-24 2001-12-26 大金工业株式会社 蚀刻溶液,蚀刻制品和制造蚀刻制品的方法

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US4055458A (en) 1975-08-07 1977-10-25 Bayer Aktiengesellschaft Etching glass with HF and fluorine-containing surfactant
DE3038985A1 (de) * 1980-10-15 1982-05-27 Bayer Ag, 5090 Leverkusen Verfahren zum saeurepolieren von glas
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JPS6039176A (ja) 1983-08-10 1985-02-28 Daikin Ind Ltd エッチング剤組成物
US4585624A (en) * 1984-11-19 1986-04-29 Young Galen F Paraformaldehyde gas generator for fumigating animal houses
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US5350489A (en) * 1990-10-19 1994-09-27 Purex Co., Ltd. Treatment method of cleaning surface of plastic molded item
US5085786A (en) 1991-01-24 1992-02-04 Minnesota Mining And Manufacturing Company Aqueous film-forming foamable solution useful as fire extinguishing concentrate
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US5688884A (en) 1995-08-31 1997-11-18 E. I. Du Pont De Nemours And Company Polymerization process
JP3332700B2 (ja) 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
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US6807824B1 (en) 1999-04-27 2004-10-26 Hiroshi Miwa Glass etching composition and method for frosting using the same
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EP1246856B1 (en) 1999-10-27 2009-07-15 3M Innovative Properties Company Fluorochemical sulfonamide surfactants
US6310018B1 (en) 2000-03-31 2001-10-30 3M Innovative Properties Company Fluorinated solvent compositions containing hydrogen fluoride
US20020089044A1 (en) 2001-01-09 2002-07-11 3M Innovative Properties Company Hermetic mems package with interlocking layers
JP2002256460A (ja) 2001-02-09 2002-09-11 Nippon Parkerizing Co Ltd アルミニウムおよびアルミニウム合金に用いるエッチングとデスマッティング用の組成物及びその方法
US20020142619A1 (en) 2001-03-30 2002-10-03 Memc Electronic Materials, Inc. Solution composition and process for etching silicon
US6555510B2 (en) 2001-05-10 2003-04-29 3M Innovative Properties Company Bis(perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4370254A (en) * 1979-05-25 1983-01-25 Bayer Aktiengesellschaft Use of perfluoroalkane sulphonamide salts as surface active agents
CN1005288B (zh) * 1985-05-23 1989-09-27 荷兰塞纳拉帕拉塔公司 工作于两个频段的雷达系统
US6201122B1 (en) * 1992-12-08 2001-03-13 3M Innovative Properties Company Fluoroaliphatic radical-containing anionic sulfonamido compounds
CN1227279A (zh) * 1997-11-21 1999-09-01 国际商业机器公司 蚀刻组合物及其用途
CN1328696A (zh) * 1998-11-24 2001-12-26 大金工业株式会社 蚀刻溶液,蚀刻制品和制造蚀刻制品的方法

Also Published As

Publication number Publication date
KR20050072795A (ko) 2005-07-12
US20040089840A1 (en) 2004-05-13
EP1558697B1 (en) 2006-11-15
WO2004044091A1 (en) 2004-05-27
DE60309738D1 (de) 2006-12-28
CN1694939A (zh) 2005-11-09
JP2006505667A (ja) 2006-02-16
JP4160562B2 (ja) 2008-10-01
KR101036068B1 (ko) 2011-05-19
US7169323B2 (en) 2007-01-30
EP1558697A1 (en) 2005-08-03
ATE345375T1 (de) 2006-12-15
DE60309738T2 (de) 2007-09-20
AU2003272331A1 (en) 2004-06-03

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Granted publication date: 20070704