CN1313881C - 感光树脂组合物 - Google Patents
感光树脂组合物 Download PDFInfo
- Publication number
- CN1313881C CN1313881C CNB03804109XA CN03804109A CN1313881C CN 1313881 C CN1313881 C CN 1313881C CN B03804109X A CNB03804109X A CN B03804109XA CN 03804109 A CN03804109 A CN 03804109A CN 1313881 C CN1313881 C CN 1313881C
- Authority
- CN
- China
- Prior art keywords
- resin composition
- photosensitive resin
- propylene glycol
- solvent
- monomethyl ether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 25
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- 208000013469 light sensitivity Diseases 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
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- 238000002360 preparation method Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 150000002672 m-cresols Chemical class 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- OJURWUUOVGOHJZ-UHFFFAOYSA-N methyl 2-[(2-acetyloxyphenyl)methyl-[2-[(2-acetyloxyphenyl)methyl-(2-methoxy-2-oxoethyl)amino]ethyl]amino]acetate Chemical compound C=1C=CC=C(OC(C)=O)C=1CN(CC(=O)OC)CCN(CC(=O)OC)CC1=CC=CC=C1OC(C)=O OJURWUUOVGOHJZ-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical class CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical class CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
分辨率(μm) | 耐热性 | 透光度 | 涂敷性 | 显影残渣 | |
实施例1 | 2.2 | ○ | ○ | ◎ | ◎ |
实施例2 | 2.2 | ○ | ○ | ◎ | ◎ |
实施例3 | 2.2 | ○ | ○ | ○ | ○ |
实施例4 | 2.2 | ○ | ○ | ○ | ○ |
实施例5 | 2.2 | ○ | ○ | ○ | ○ |
实施例6 | 2.2 | ○ | ○ | ○ | ○ |
对比例1 | 2.3 | ○ | ○ | × | × |
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002051487A JP3894477B2 (ja) | 2002-02-27 | 2002-02-27 | 感光性樹脂組成物 |
JP51487/2002 | 2002-02-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1633627A CN1633627A (zh) | 2005-06-29 |
CN1313881C true CN1313881C (zh) | 2007-05-02 |
Family
ID=27764310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB03804109XA Expired - Fee Related CN1313881C (zh) | 2002-02-27 | 2003-02-24 | 感光树脂组合物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20050079436A1 (zh) |
EP (1) | EP1482360A1 (zh) |
JP (1) | JP3894477B2 (zh) |
KR (1) | KR20040094748A (zh) |
CN (1) | CN1313881C (zh) |
TW (1) | TWI261148B (zh) |
WO (1) | WO2003073167A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3842750B2 (ja) * | 2003-03-25 | 2006-11-08 | Azエレクトロニックマテリアルズ株式会社 | 感光性樹脂組成物 |
JP3977307B2 (ja) * | 2003-09-18 | 2007-09-19 | 東京応化工業株式会社 | ポジ型フォトレジスト組成物及びレジストパターン形成方法 |
JP4558443B2 (ja) * | 2004-03-15 | 2010-10-06 | ダイセル化学工業株式会社 | レジスト組成物 |
JP4647418B2 (ja) * | 2005-07-19 | 2011-03-09 | ダイセル化学工業株式会社 | レジスト組成物 |
TWI406062B (zh) * | 2005-07-29 | 2013-08-21 | Sumitomo Chemical Co | A photosensitive resin composition for optical spacers, an optical spacers, and a liquid crystal display device |
JP2013130816A (ja) * | 2011-12-22 | 2013-07-04 | Nippon Zeon Co Ltd | 永久膜用樹脂組成物及び電子部品 |
SG11201503340XA (en) * | 2012-10-31 | 2015-06-29 | Hitachi Chemical Co Ltd | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device |
KR102081881B1 (ko) * | 2018-12-20 | 2020-02-26 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치 |
KR102079266B1 (ko) * | 2018-12-20 | 2020-02-19 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치 |
KR102079264B1 (ko) * | 2018-12-20 | 2020-02-19 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치 |
TWI760123B (zh) * | 2021-02-26 | 2022-04-01 | 新應材股份有限公司 | 用於低溫製程的正型感光性樹脂組成物以及光阻膜的製造方法 |
Citations (5)
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JPH0840646A (ja) * | 1994-07-07 | 1996-02-13 | W Schlafhorst Ag & Co | 綾巻きボビンを製造するための繊維機械のための結糸装置 |
JPH0840647A (ja) * | 1994-06-23 | 1996-02-13 | Valmet Paper Mach Inc | 巻取り用巻心の固定端部 |
CN1180849A (zh) * | 1996-10-25 | 1998-05-06 | 克拉瑞特国际有限公司 | 敏射线组合物 |
CN1290357A (zh) * | 1998-12-10 | 2001-04-04 | 克拉瑞特国际有限公司 | 正性敏射线的树脂组合物 |
CN1327547A (zh) * | 1999-10-07 | 2001-12-19 | 克拉瑞特国际有限公司 | 辐射敏感性组合物 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0184870B1 (ko) * | 1990-02-20 | 1999-04-01 | 아사구라 다기오 | 감방사선성 수지 조성물 |
JPH07140646A (ja) * | 1993-06-22 | 1995-06-02 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
JPH07140647A (ja) * | 1993-06-28 | 1995-06-02 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物 |
JP2000194130A (ja) * | 1998-12-25 | 2000-07-14 | Clariant (Japan) Kk | 感光性樹脂組成物 |
TWI278496B (en) * | 2000-11-14 | 2007-04-11 | Jsr Corp | Anti-reflection coating forming composition |
-
2002
- 2002-02-27 JP JP2002051487A patent/JP3894477B2/ja not_active Expired - Fee Related
-
2003
- 2003-02-24 KR KR10-2004-7013488A patent/KR20040094748A/ko not_active Application Discontinuation
- 2003-02-24 EP EP20030707016 patent/EP1482360A1/en not_active Withdrawn
- 2003-02-24 TW TW092103745A patent/TWI261148B/zh not_active IP Right Cessation
- 2003-02-24 US US10/504,226 patent/US20050079436A1/en not_active Abandoned
- 2003-02-24 WO PCT/JP2003/001987 patent/WO2003073167A1/ja not_active Application Discontinuation
- 2003-02-24 CN CNB03804109XA patent/CN1313881C/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0840647A (ja) * | 1994-06-23 | 1996-02-13 | Valmet Paper Mach Inc | 巻取り用巻心の固定端部 |
JPH0840646A (ja) * | 1994-07-07 | 1996-02-13 | W Schlafhorst Ag & Co | 綾巻きボビンを製造するための繊維機械のための結糸装置 |
CN1180849A (zh) * | 1996-10-25 | 1998-05-06 | 克拉瑞特国际有限公司 | 敏射线组合物 |
CN1290357A (zh) * | 1998-12-10 | 2001-04-04 | 克拉瑞特国际有限公司 | 正性敏射线的树脂组合物 |
CN1327547A (zh) * | 1999-10-07 | 2001-12-19 | 克拉瑞特国际有限公司 | 辐射敏感性组合物 |
Also Published As
Publication number | Publication date |
---|---|
TW200304045A (en) | 2003-09-16 |
JP2003255521A (ja) | 2003-09-10 |
TWI261148B (en) | 2006-09-01 |
WO2003073167A1 (fr) | 2003-09-04 |
US20050079436A1 (en) | 2005-04-14 |
EP1482360A1 (en) | 2004-12-01 |
JP3894477B2 (ja) | 2007-03-22 |
KR20040094748A (ko) | 2004-11-10 |
CN1633627A (zh) | 2005-06-29 |
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