CN1296770C - 光敏抗蚀剂显影液用消泡分散剂 - Google Patents

光敏抗蚀剂显影液用消泡分散剂 Download PDF

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Publication number
CN1296770C
CN1296770C CNB2003101204686A CN200310120468A CN1296770C CN 1296770 C CN1296770 C CN 1296770C CN B2003101204686 A CNB2003101204686 A CN B2003101204686A CN 200310120468 A CN200310120468 A CN 200310120468A CN 1296770 C CN1296770 C CN 1296770C
Authority
CN
China
Prior art keywords
fatty acid
developer solution
resist
acid
acid ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2003101204686A
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English (en)
Chinese (zh)
Other versions
CN1503057A (zh
Inventor
保坂将毅
川俣大雅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Denka Kogyo KK filed Critical Asahi Denka Kogyo KK
Publication of CN1503057A publication Critical patent/CN1503057A/zh
Application granted granted Critical
Publication of CN1296770C publication Critical patent/CN1296770C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CNB2003101204686A 2002-10-30 2003-10-30 光敏抗蚀剂显影液用消泡分散剂 Expired - Fee Related CN1296770C (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002316395 2002-10-30
JP316395/02 2002-10-30
JP316395/2002 2002-10-30

Publications (2)

Publication Number Publication Date
CN1503057A CN1503057A (zh) 2004-06-09
CN1296770C true CN1296770C (zh) 2007-01-24

Family

ID=34260193

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2003101204686A Expired - Fee Related CN1296770C (zh) 2002-10-30 2003-10-30 光敏抗蚀剂显影液用消泡分散剂

Country Status (3)

Country Link
KR (1) KR100719208B1 (ko)
CN (1) CN1296770C (ko)
TW (1) TW200406253A (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100573316C (zh) * 2005-07-08 2009-12-23 上海纺印印刷包装有限公司 一种阳图型热敏/光敏版显影液及其制备方法
CN101721945B (zh) * 2009-11-09 2012-01-11 健雄职业技术学院 高性能消泡剂
CN102466986A (zh) * 2010-11-09 2012-05-23 苏州瑞红电子化学品有限公司 一种防腐蚀碱性显影液组合物
JP5305182B2 (ja) * 2011-02-16 2013-10-02 東洋紡株式会社 印刷版用現像液組成物、現像液および印刷原版の製造方法
CN111965958A (zh) * 2020-09-07 2020-11-20 苏州理硕科技有限公司 一种干膜光刻胶用显影液及其制备方法
CN117298664B (zh) * 2023-11-27 2024-01-23 山东尚正新材料科技股份有限公司 聚醚多元醇酯消泡剂及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810600A (ja) * 1994-06-30 1996-01-16 Toho Chem Ind Co Ltd 感光性樹脂工業用消泡分散剤
JPH09293964A (ja) * 1996-04-26 1997-11-11 Matsushita Electric Works Ltd 内層回路入り積層板の製造方法
CN1188506A (zh) * 1995-06-23 1998-07-22 花王株式会社 用于发酵的消泡剂和使用该消泡剂的发酵生产方法
CN1228111A (zh) * 1996-06-26 1999-09-08 普罗格特-甘布尔公司 包含硅氧烷抑泡剂和脂肪酸酯的低泡液态洗涤剂组合物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3656174B2 (ja) * 1996-02-29 2005-06-08 サンノプコ株式会社 消泡剤組成物
JP3238078B2 (ja) 1996-10-03 2001-12-10 伯東株式会社 消泡剤組成物
JP3690773B2 (ja) 1998-03-26 2005-08-31 サンノプコ株式会社 水中油型エマルション消泡剤組成物
DE19903546A1 (de) 1999-01-29 2000-08-03 Basf Ag Entschäumer und/oder Entlüfter auf der Basis von Öl-in-Wasser-Dispersionen

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810600A (ja) * 1994-06-30 1996-01-16 Toho Chem Ind Co Ltd 感光性樹脂工業用消泡分散剤
CN1188506A (zh) * 1995-06-23 1998-07-22 花王株式会社 用于发酵的消泡剂和使用该消泡剂的发酵生产方法
JPH09293964A (ja) * 1996-04-26 1997-11-11 Matsushita Electric Works Ltd 内層回路入り積層板の製造方法
CN1228111A (zh) * 1996-06-26 1999-09-08 普罗格特-甘布尔公司 包含硅氧烷抑泡剂和脂肪酸酯的低泡液态洗涤剂组合物

Also Published As

Publication number Publication date
CN1503057A (zh) 2004-06-09
TWI332860B (ko) 2010-11-11
KR100719208B1 (ko) 2007-05-16
KR20040038767A (ko) 2004-05-08
TW200406253A (en) 2004-05-01

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