CN1246389C - 正型感光性树脂前驱体组合物及使用其的显示装置 - Google Patents

正型感光性树脂前驱体组合物及使用其的显示装置 Download PDF

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Publication number
CN1246389C
CN1246389C CNB011394781A CN01139478A CN1246389C CN 1246389 C CN1246389 C CN 1246389C CN B011394781 A CNB011394781 A CN B011394781A CN 01139478 A CN01139478 A CN 01139478A CN 1246389 C CN1246389 C CN 1246389C
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group
general formula
compound
expression
precursor composition
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Expired - Lifetime
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CNB011394781A
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English (en)
Chinese (zh)
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CN1356356A (zh
Inventor
诹访充史
三好一登
富川真佐夫
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Toray Industries Inc
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Toray Industries Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CNB011394781A 2000-11-27 2001-11-27 正型感光性树脂前驱体组合物及使用其的显示装置 Expired - Lifetime CN1246389C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000359401 2000-11-27
JP359401/2000 2000-11-27
JP2001122334A JP4665333B2 (ja) 2000-11-27 2001-04-20 ポジ型感光性樹脂前駆体組成物
JP122334/2001 2001-04-20

Publications (2)

Publication Number Publication Date
CN1356356A CN1356356A (zh) 2002-07-03
CN1246389C true CN1246389C (zh) 2006-03-22

Family

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CNB011394781A Expired - Lifetime CN1246389C (zh) 2000-11-27 2001-11-27 正型感光性树脂前驱体组合物及使用其的显示装置

Country Status (6)

Country Link
US (1) US6593043B2 (https=)
EP (1) EP1209523B1 (https=)
JP (1) JP4665333B2 (https=)
KR (1) KR100788537B1 (https=)
CN (1) CN1246389C (https=)
TW (1) TW573216B (https=)

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* Cited by examiner, † Cited by third party
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DE112022000006T5 (de) 2021-07-27 2023-03-23 Jilin Oled Optical And Electronic Materials Co., Ltd. Harzzusammensetzung, Harzfilm und Anzeigevorrichtung

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US6887643B2 (en) 2002-08-05 2005-05-03 Toray Industries, Inc. Photosensitive resin precursor composition
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US20040238846A1 (en) * 2003-05-30 2004-12-02 Georg Wittmann Organic electronic device
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KR100914063B1 (ko) * 2007-11-30 2009-08-28 제일모직주식회사 포지티브형 감광성 수지 조성물
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JP5246607B2 (ja) * 2008-05-07 2013-07-24 住友ベークライト株式会社 ポジ型感光性樹脂組成物、硬化膜、保護膜及び絶縁膜、並びにそれを用いた半導体装置及び表示体装置
KR101023089B1 (ko) * 2008-09-29 2011-03-24 제일모직주식회사 포지티브형 감광성 수지 조성물
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KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
KR101333698B1 (ko) * 2009-11-10 2013-11-27 제일모직주식회사 포지티브형 감광성 수지 조성물
KR101333704B1 (ko) * 2009-12-29 2013-11-27 제일모직주식회사 포지티브형 감광성 수지 조성물
CN102893208B (zh) * 2010-03-15 2015-07-08 日产化学工业株式会社 含有聚酰胺酸酯和聚酰胺酸的液晶取向剂以及液晶取向膜
CN102893206B (zh) * 2010-03-15 2015-04-01 日产化学工业株式会社 包含对末端进行了修饰的聚酰胺酸酯的液晶取向剂及液晶取向膜
JP5858987B2 (ja) 2010-05-04 2016-02-10 エルジー・ケム・リミテッド ネガティブフォトレジスト組成物および素子のパターニング方法
KR20120066923A (ko) 2010-12-15 2012-06-25 제일모직주식회사 신규 페놀 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
KR101423539B1 (ko) 2010-12-20 2014-07-25 삼성전자 주식회사 포지티브형 감광성 수지 조성물
KR101400186B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101400192B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101600653B1 (ko) * 2012-12-26 2016-03-07 제일모직주식회사 봉지용 조성물, 이를 포함하는 장벽층 및 이를 포함하는 봉지화된 장치
KR102058651B1 (ko) 2013-02-27 2019-12-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 그를 이용한 표시 장치의 제조 방법
KR101700994B1 (ko) * 2013-07-01 2017-01-31 주식회사 엘지화학 광활성 물질의 분리방법
KR102241784B1 (ko) * 2013-10-23 2021-04-16 닛산 가가쿠 가부시키가이샤 액정 배향제, 액정 배향막, 및 액정 표시 소자
US9477148B1 (en) 2015-05-26 2016-10-25 Industrial Technology Research Institute Polymer, method for preparing the same, and a photosensitive resin composition thereof
CN111630454B (zh) * 2018-01-29 2023-07-14 富士胶片株式会社 感光性树脂组合物、树脂、固化膜、层叠体、固化膜的制造方法及半导体器件
CN117897453A (zh) * 2021-08-18 2024-04-16 日东电工株式会社 聚酰亚胺前体组合物、聚酰亚胺树脂、以及电路基板
CN114316263B (zh) * 2022-01-17 2023-02-03 深圳职业技术学院 交联型聚酰胺酸酯、其制备方法、包含其的聚酰亚胺组合物及聚酰亚胺树脂膜的制备方法

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DE112022000006T5 (de) 2021-07-27 2023-03-23 Jilin Oled Optical And Electronic Materials Co., Ltd. Harzzusammensetzung, Harzfilm und Anzeigevorrichtung

Also Published As

Publication number Publication date
JP4665333B2 (ja) 2011-04-06
KR20020041302A (ko) 2002-06-01
KR100788537B1 (ko) 2007-12-24
EP1209523B1 (en) 2015-08-26
EP1209523A3 (en) 2003-09-24
TW573216B (en) 2004-01-21
US20020090564A1 (en) 2002-07-11
CN1356356A (zh) 2002-07-03
JP2002221794A (ja) 2002-08-09
EP1209523A2 (en) 2002-05-29
US6593043B2 (en) 2003-07-15

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