CN1219739C - 全氟化产物的纯化方法 - Google Patents
全氟化产物的纯化方法 Download PDFInfo
- Publication number
- CN1219739C CN1219739C CNB031314643A CN03131464A CN1219739C CN 1219739 C CN1219739 C CN 1219739C CN B031314643 A CNB031314643 A CN B031314643A CN 03131464 A CN03131464 A CN 03131464A CN 1219739 C CN1219739 C CN 1219739C
- Authority
- CN
- China
- Prior art keywords
- pfc
- pph
- azeotrope
- azeotropic
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 57
- 238000000746 purification Methods 0.000 title description 4
- 239000000203 mixture Substances 0.000 claims abstract description 230
- 230000008569 process Effects 0.000 claims abstract description 20
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims abstract description 9
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000004821 distillation Methods 0.000 claims description 108
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 98
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 96
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 96
- 150000001875 compounds Chemical class 0.000 claims description 64
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 47
- 238000009835 boiling Methods 0.000 claims description 37
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 11
- 239000001272 nitrous oxide Substances 0.000 claims description 9
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 229960004065 perflutren Drugs 0.000 claims description 3
- 229910018503 SF6 Inorganic materials 0.000 claims description 2
- 150000002222 fluorine compounds Chemical group 0.000 claims description 2
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 5
- 229960004424 carbon dioxide Drugs 0.000 claims 1
- 229960001730 nitrous oxide Drugs 0.000 claims 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 37
- 238000000895 extractive distillation Methods 0.000 abstract description 14
- 239000000463 material Substances 0.000 abstract description 12
- 238000010533 azeotropic distillation Methods 0.000 abstract description 6
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 124
- 239000000047 product Substances 0.000 description 96
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 33
- 238000010992 reflux Methods 0.000 description 33
- 238000011084 recovery Methods 0.000 description 28
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 26
- 238000004519 manufacturing process Methods 0.000 description 24
- 238000000926 separation method Methods 0.000 description 23
- 238000000605 extraction Methods 0.000 description 22
- 239000007789 gas Substances 0.000 description 21
- 239000002994 raw material Substances 0.000 description 20
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 17
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 11
- UHCBBWUQDAVSMS-UHFFFAOYSA-N fluoroethane Chemical compound CCF UHCBBWUQDAVSMS-UHFFFAOYSA-N 0.000 description 11
- 230000008859 change Effects 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 9
- GTLACDSXYULKMZ-UHFFFAOYSA-N pentafluoroethane Chemical compound FC(F)C(F)(F)F GTLACDSXYULKMZ-UHFFFAOYSA-N 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 239000013058 crude material Substances 0.000 description 7
- 239000002699 waste material Substances 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910001868 water Inorganic materials 0.000 description 6
- UJPMYEOUBPIPHQ-UHFFFAOYSA-N 1,1,1-trifluoroethane Chemical compound CC(F)(F)F UJPMYEOUBPIPHQ-UHFFFAOYSA-N 0.000 description 5
- AFYPFACVUDMOHA-UHFFFAOYSA-N chlorotrifluoromethane Chemical compound FC(F)(F)Cl AFYPFACVUDMOHA-UHFFFAOYSA-N 0.000 description 5
- RFCAUADVODFSLZ-UHFFFAOYSA-N 1-Chloro-1,1,2,2,2-pentafluoroethane Chemical compound FC(F)(F)C(F)(F)Cl RFCAUADVODFSLZ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 235000019406 chloropentafluoroethane Nutrition 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- -1 moisture Chemical class 0.000 description 4
- 239000012159 carrier gas Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- YUCFVHQCAFKDQG-UHFFFAOYSA-N fluoromethane Chemical compound F[CH] YUCFVHQCAFKDQG-UHFFFAOYSA-N 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 239000004341 Octafluorocyclobutane Substances 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229940050176 methyl chloride Drugs 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 description 2
- 235000019407 octafluorocyclobutane Nutrition 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 230000003134 recirculating effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000005057 refrigeration Methods 0.000 description 2
- LVGUZGTVOIAKKC-UHFFFAOYSA-N 1,1,1,2-tetrafluoroethane Chemical compound FCC(F)(F)F LVGUZGTVOIAKKC-UHFFFAOYSA-N 0.000 description 1
- WXGNWUVNYMJENI-UHFFFAOYSA-N 1,1,2,2-tetrafluoroethane Chemical compound FC(F)C(F)F WXGNWUVNYMJENI-UHFFFAOYSA-N 0.000 description 1
- JRHNUZCXXOTJCA-UHFFFAOYSA-N 1-fluoropropane Chemical compound CCCF JRHNUZCXXOTJCA-UHFFFAOYSA-N 0.000 description 1
- QUTHCURCAWPHIN-UHFFFAOYSA-N 4-[2-(1-methyl-5-nitroimidazol-2-yl)ethynyl]pyrimidin-2-amine Chemical compound C1=C([N+]([O-])=O)N(C)C(C#CC=2N=C(N)N=CC=2)=N1 QUTHCURCAWPHIN-UHFFFAOYSA-N 0.000 description 1
- 101100060007 Caenorhabditis elegans mig-22 gene Proteins 0.000 description 1
- 239000004340 Chloropentafluoroethane Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- UBAZGMLMVVQSCD-UHFFFAOYSA-N carbon dioxide;molecular oxygen Chemical compound O=O.O=C=O UBAZGMLMVVQSCD-UHFFFAOYSA-N 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000004773 chlorofluoromethyl group Chemical group [H]C(F)(Cl)* 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- NGVMDCLQUCKXKF-UHFFFAOYSA-N fluoroethane;tetrafluoromethane Chemical compound CCF.FC(F)(F)F NGVMDCLQUCKXKF-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011027 product recovery Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C19/00—Acyclic saturated compounds containing halogen atoms
- C07C19/08—Acyclic saturated compounds containing halogen atoms containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
- B01D3/36—Azeotropic distillation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
- C01B21/0835—Nitrogen trifluoride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
- C01B21/0835—Nitrogen trifluoride
- C01B21/0837—Purification
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/38—Separation; Purification; Stabilisation; Use of additives
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6499397P | 1997-11-10 | 1997-11-10 | |
| US60/064993 | 1997-11-10 | ||
| US8614698P | 1998-05-20 | 1998-05-20 | |
| US60/086146 | 1998-05-20 | ||
| US09/189322 | 1998-11-09 | ||
| US09/189,322 US6458249B2 (en) | 1997-11-10 | 1998-11-09 | Process for purifying perfluorinated products |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB988109646A Division CN1137043C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1515529A CN1515529A (zh) | 2004-07-28 |
| CN1219739C true CN1219739C (zh) | 2005-09-21 |
Family
ID=27370715
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031314643A Expired - Fee Related CN1219739C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
| CNB988109646A Expired - Fee Related CN1137043C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
| CNB031314635A Expired - Fee Related CN1252011C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
| CNB031314678A Expired - Fee Related CN1246216C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB988109646A Expired - Fee Related CN1137043C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
| CNB031314635A Expired - Fee Related CN1252011C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
| CNB031314678A Expired - Fee Related CN1246216C (zh) | 1997-11-10 | 1998-11-10 | 全氟化产物的纯化方法 |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP1030818B1 (https=) |
| JP (1) | JP2001522774A (https=) |
| KR (1) | KR100588025B1 (https=) |
| CN (4) | CN1219739C (https=) |
| AT (1) | ATE222215T1 (https=) |
| AU (1) | AU1455099A (https=) |
| CA (1) | CA2306800A1 (https=) |
| DE (1) | DE69807254T2 (https=) |
| RU (1) | RU2206498C2 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050016829A1 (en) * | 2003-04-14 | 2005-01-27 | Miller Ralph Newton | Distillation process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride |
| RU2248321C1 (ru) * | 2004-03-16 | 2005-03-20 | Общество с ограниченной ответственностью "НьюКем" | Способ очистки трифторида азота от тетрафторметана |
| CN1328160C (zh) * | 2005-07-27 | 2007-07-25 | 中国船舶重工集团公司第七一八研究所 | 三氟化氮气体的纯化方法 |
| KR100703875B1 (ko) * | 2005-09-07 | 2007-04-04 | 주식회사 소디프신소재 | 삼불화질소의 정제방법 |
| TW200808649A (en) * | 2006-05-31 | 2008-02-16 | Du Pont | Process for purifying perfluorinated products |
| CN101920944A (zh) * | 2010-08-30 | 2010-12-22 | 天津市泰源工业气体有限公司 | 一种萃取精馏分离三氟化氮与四氟化碳制备高纯三氟化氮的技术 |
| CN102516018A (zh) * | 2011-12-16 | 2012-06-27 | 天津市泰亨气体有限公司 | 一种制备高纯四氟化碳的方法 |
| KR101514801B1 (ko) * | 2013-06-25 | 2015-04-24 | (주)파인텍 | 과불화화합물의 분리 및 재활용시스템 |
| JP6798468B2 (ja) * | 2017-10-23 | 2020-12-09 | ダイキン工業株式会社 | ヘキサフルオロブタジエンの製造方法 |
| EP3686260B1 (de) * | 2019-01-23 | 2022-12-28 | Weiss Technik GmbH | Kältemittel |
| CN112279234B (zh) * | 2019-07-23 | 2023-08-08 | 中化近代环保化工(西安)有限公司 | 碳酰氟与二氧化碳的共沸组合物 |
| CN114288702A (zh) * | 2021-12-24 | 2022-04-08 | 天津海嘉斯迪新材料合伙企业(有限合伙) | 一种三氟化氮气体中氧化亚氮的回收系统及方法 |
| CN114191829A (zh) * | 2021-12-31 | 2022-03-18 | 天津海嘉斯迪新材料合伙企业(有限合伙) | 一种三氟化氮粗品中氧化亚氮的去除方法和系统 |
| CN114538391B (zh) * | 2022-03-01 | 2023-11-03 | 中船(邯郸)派瑞特种气体股份有限公司 | 一种从nf3废气中回收高纯n2o的装置及其回收方法 |
| CN121159359B (zh) * | 2025-11-20 | 2026-02-13 | 昊华气体有限公司 | 一种药用全氟烷烃的纯化方法及其设备 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63306383A (ja) * | 1987-06-04 | 1988-12-14 | 三井東圧化学株式会社 | フッ化窒素の精製方法 |
| JPH0798648B2 (ja) * | 1990-01-10 | 1995-10-25 | セントラル硝子株式会社 | Ｎｆ３ガスの精製方法 |
| US5637285A (en) * | 1996-01-30 | 1997-06-10 | Air Products And Chemicals, Inc. | Process for nitrogen trifluoride synthesis |
-
1998
- 1998-11-10 AU AU14550/99A patent/AU1455099A/en not_active Abandoned
- 1998-11-10 JP JP2000520379A patent/JP2001522774A/ja active Pending
- 1998-11-10 CN CNB031314643A patent/CN1219739C/zh not_active Expired - Fee Related
- 1998-11-10 EP EP98958520A patent/EP1030818B1/en not_active Expired - Lifetime
- 1998-11-10 KR KR1020007005058A patent/KR100588025B1/ko not_active Expired - Fee Related
- 1998-11-10 CN CNB988109646A patent/CN1137043C/zh not_active Expired - Fee Related
- 1998-11-10 DE DE69807254T patent/DE69807254T2/de not_active Expired - Fee Related
- 1998-11-10 CN CNB031314635A patent/CN1252011C/zh not_active Expired - Fee Related
- 1998-11-10 RU RU2000114632/12A patent/RU2206498C2/ru not_active IP Right Cessation
- 1998-11-10 AT AT98958520T patent/ATE222215T1/de not_active IP Right Cessation
- 1998-11-10 CA CA002306800A patent/CA2306800A1/en not_active Abandoned
- 1998-11-10 CN CNB031314678A patent/CN1246216C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1278779A (zh) | 2001-01-03 |
| KR100588025B1 (ko) | 2006-06-13 |
| CN1137043C (zh) | 2004-02-04 |
| CN1246216C (zh) | 2006-03-22 |
| CA2306800A1 (en) | 1999-05-20 |
| KR20010031951A (ko) | 2001-04-16 |
| EP1030818B1 (en) | 2002-08-14 |
| EP1030818A1 (en) | 2000-08-30 |
| CN1515488A (zh) | 2004-07-28 |
| ATE222215T1 (de) | 2002-08-15 |
| JP2001522774A (ja) | 2001-11-20 |
| CN1515527A (zh) | 2004-07-28 |
| AU1455099A (en) | 1999-05-31 |
| CN1252011C (zh) | 2006-04-19 |
| DE69807254D1 (de) | 2002-09-19 |
| CN1515529A (zh) | 2004-07-28 |
| DE69807254T2 (de) | 2003-04-10 |
| RU2206498C2 (ru) | 2003-06-20 |
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