CN1194115C - 椭圆陶瓷蒸发器 - Google Patents

椭圆陶瓷蒸发器 Download PDF

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CN1194115C
CN1194115C CNB991078047A CN99107804A CN1194115C CN 1194115 C CN1194115 C CN 1194115C CN B991078047 A CNB991078047 A CN B991078047A CN 99107804 A CN99107804 A CN 99107804A CN 1194115 C CN1194115 C CN 1194115C
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vaporizer
cross
metal
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CN1237647A (zh
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马丁·塞弗特
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ESK Ceramics GmbH and Co KG
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Ceramic Capacitors (AREA)
  • Inorganic Insulating Materials (AREA)
  • Furnace Charging Or Discharging (AREA)
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Abstract

本发明涉及用于蒸发金属的蒸发器,其在进行金属蒸发的区域中的截面面积大于相同宽度和高度之三角形蒸发器的相应截面面积,同时在该具体的区域中具有比相同宽度和高度之长方形蒸发器更小的最小周长。

Description

椭圆陶瓷蒸发器
技术领域
本发明涉及陶瓷蒸发器。
背景技术
用金属、特别是铝涂敷柔性基底之最经常使用的方法是高真空带状涂敷法(tape coating)。所述待涂敷的基底在冷却辊上通过,并同时暴露于铝蒸气,该铝蒸气则在所述基底表面上沉积成薄的金属层。
为产生所需要的恒定蒸气流,通过直接通入电流将陶瓷蒸发器——蒸发皿加热至约1450℃。连续送入铝线,在陶瓷表面上液化,然后在约10-4mbar的真空下蒸发。在金属化单元中,设置一系列的蒸发皿,其方式是在基底的整个宽度上沉积均匀厚度的铝层。
陶瓷蒸发皿的化学组成通常为45-55重量%的TiB2、25-55重量%的BN以及0-20重量%的AlN。许多专利都描述了此等组合物(例如US-A-3,915,900或者US-A-4,089,643之第1栏第10和11行及第2栏第5行中引用的专利)。
蒸发皿的常规形状是以长方形截面为基础的。该蒸发皿的宽度和长度根据所需要的蒸发速率来选择,所述蒸发速率通常为约0.35-0.40gAlcm-2·min-1。已证明长方形的截面是有用的,这是因为它即使在高温时仍能够保持高的机械稳定性,而且制造费用不高。
具有非长方形截面的蒸发器也已有人描述过。US-A-4,089,643描述了具有三角形截面和空槽的蒸发器。该三角形蒸发器较之于具有长方形截面的蒸发器的明显优点是节省材料,降低了运行该蒸发皿的电能。但是这些优点却被以下缺陷抵销了:三角形蒸发器与长方形蒸发器相比使用寿命短。
发明内容
本发明的目的在于提供用于蒸发金属的陶瓷蒸发器,该蒸发器较之于相同高度、长度和宽度的长方形蒸发器运行能量消耗更低,而且没有相同高度、长度和宽度之三角形蒸发器寿命短的缺点。
该目的是通过以下蒸发器实现的:所述蒸发器在其进行金属蒸发的区域中的截面面积大于相同宽度和高度之三角形蒸发器的相应截面面积,同时在该具体的区域中具有比相同宽度和高度之长方形蒸发器更小的最小周长。
优选的是,本发明的蒸发器对于进行金属蒸发的区域中给定的高度和宽度具有最小的周长,而且同时在该具体区域中具有最大的截面面积。
特别优选的是,本发明的蒸发器具有分开的椭圆形。
该椭圆的分开优选沿其主轴。
本发明蒸发器的一个形状可使进行蒸发的表面与椭圆形侧壁之间的角度为90度。这可省略在上述区域中磨削去掉锐角的加工步骤,而这对于三角形蒸发器是必须的,以避免损伤。
本发明的蒸发器不需要在蒸气沉积单元中的特殊夹持装置来将其横向夹持住,这对于三角形蒸发器通常是必须的。
同样,其它机械加工蒸发器端面的步骤也变成不是必须的,而这对于三角形蒸发器则是必须的,作为特殊夹持装置的替代方法,例如描述于DE 197 08 599。
因此,本发明蒸发器的制造不需要更多的机械加工,或者如上述三角形蒸发器一样,节省了材料使用量。
本发明蒸发器没有上述任何一种缺陷,因为它可简单地通过磨削加工由常规的长方形蒸发器来制造。
优选的是,在其上制造本发明形状的长度相应于蒸发器在蒸发沉积单元中的夹持间隔。
这使得本发明的蒸发器又能够简单地在其被夹持的区域中具有长方形截面,并因而可以没有任何问题地使用于常规标准长方形蒸发器所用的带状涂敷单元中。
但是,也可磨削蒸发器的整个长度成为本发明的形状。此等蒸发器例如可用于端面夹持蒸发皿的蒸气沉积单元中。
另外,对于本发明的蒸发器,可以省略在蒸发器中机械加工出空槽。当然,也可如本领域技术人员已知的在蒸发器中机械加工出空槽。
附图说明
图1显示了两种现有技术的蒸发器(长方形蒸发器、三角形蒸发器)与本发明蒸发器(椭圆蒸发器)的截面的比较。这些蒸发器都没有空槽。
图2示意性地显示了本发明蒸发器的一个例子,其带有空槽,而且适合于端面夹持。
图3示意性地显示了本发明蒸发器的一个例子,其带有空槽,而且适合于横向夹持。为更清晰地显示出椭圆形,图3还显示了该蒸发器的截面。
具体实施方式
以下实施例将用于说明本发明。
实施例1:制造根据本发明的蒸发器
用椭圆形磨削轮磨削购自于Elektroschmelzwerk Kempten GmbH(Munich)的长方形蒸发器(10×30×120cm)(其名称为DiMet Typ5),由此制得根据本发明具有椭圆截面的蒸发器。
实施例2:长方形蒸发器和椭圆蒸发器的比较
如下比较实施例1所述的蒸发器和实施例1中用于制造本发明之蒸发器的蒸发器。
将两个蒸发器端面夹持入实验蒸发单元中。在加热之前,将2g Al放置在蒸发皿之进行金属蒸发的表面的中间。抽成小于10-4mbar的真空。在此等高真空下,缓慢加热蒸发皿,直至铝熔融。测定此时的电功率(产生的电流和电压)。
结果
长方形截面:5.6V/610A=3.42KW
椭圆截面:5.8V/525A=3.05KW
该结果表明,对于用铝润湿,椭圆截面的蒸发器所需要的能量减少约11%。

Claims (2)

1、用于蒸发金属的蒸发器,其在进行金属蒸发的区域中的截面面积大于相同宽度和高度之三角形蒸发器的相应截面面积,同时在该具体的区域中具有比相同宽度和高度之长方形蒸发器更小的最小周长,并且其在进行金属蒸发的区域中的截面具有凹陷的半椭圆形。
2、如权利要求1所述的蒸发器,其截面形状为沿其主轴分成两半的椭圆形。
CNB991078047A 1998-05-28 1999-05-28 椭圆陶瓷蒸发器 Expired - Fee Related CN1194115C (zh)

Applications Claiming Priority (3)

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DE19823908A DE19823908A1 (de) 1998-05-28 1998-05-28 Elliptischer keramischer Verdampfer
DE19823908.4 1998-05-28
CA002274411A CA2274411C (en) 1998-05-28 1999-06-11 Elliptical ceramic evaporators

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CN1237647A CN1237647A (zh) 1999-12-08
CN1194115C true CN1194115C (zh) 2005-03-23

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US (1) US6085025A (zh)
EP (1) EP0962546B1 (zh)
JP (1) JP3355149B2 (zh)
CN (1) CN1194115C (zh)
AT (1) ATE199576T1 (zh)
CA (1) CA2274411C (zh)
DE (2) DE19823908A1 (zh)
ES (1) ES2155724T3 (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102985148A (zh) * 2010-05-04 2013-03-20 联邦科学与工业研究组织 分离方法
CN105803402A (zh) * 2015-01-20 2016-07-27 钴碳化钨硬质合金公司 Imc蒸发舟皿绝热筒组件
US11821062B2 (en) 2019-04-29 2023-11-21 Kennametal Inc. Cemented carbide compositions and applications thereof

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19956811A1 (de) 1999-11-25 2001-06-13 Kempten Elektroschmelz Gmbh Keramischer Flash-TV-Verdampfer
DE10015850A1 (de) * 2000-03-30 2001-10-18 Kempten Elektroschmelz Gmbh Material für alterungsbeständige keramische Verdampfer
DE10015847C2 (de) * 2000-03-30 2002-03-14 Wacker Chemie Gmbh Vorrichtung zum Bedampfen von Schwarzweiß- oder Farbbildröhren mit Aluminium
PT1585846E (pt) * 2003-01-08 2010-11-23 Kennametal Sintec Keramik Gmbh Recipiente vaporizador aquecido por resistência
DE102005027382B4 (de) * 2005-06-14 2010-01-28 Leybold Optics Gmbh Verdampferschiffchen für eine Vorrichtung zum Beschichten von Substraten
DE102005030862B4 (de) * 2005-07-01 2009-12-24 Sintec Keramik Gmbh Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper
US7494616B2 (en) 2005-11-04 2009-02-24 Momentive Performance Materials Inc. Container for evaporation of metal and method to manufacture thereof
CN105327523B (zh) * 2014-07-14 2018-03-09 上海和辉光电有限公司 一种oled有机发光材料的升华制成方法与制成装置
US20160208373A1 (en) 2015-01-20 2016-07-21 Kennametal Inc. Imc evaporator boat assembly
EP3470545A1 (en) 2017-10-10 2019-04-17 3M Innovative Properties Company Evaporation boat for evaporation of metals
EP3767004B1 (en) 2019-07-17 2023-09-27 3M Innovative Properties Company Evaporation boat for evaporation of metals

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2773923A (en) * 1953-01-26 1956-12-11 Raytheon Mfg Co Zone-refining apparatus
US2996412A (en) * 1958-10-10 1961-08-15 Continental Can Co Art of depositing metals
DE1207179B (de) * 1961-02-09 1965-12-16 Licentia Gmbh Oxydkeramischer Tiegel zum Vakuum-Aufdampfen von Metallen
US3514575A (en) * 1967-08-10 1970-05-26 Sylvania Electric Prod Metal-evaporating source
US3636305A (en) * 1971-03-10 1972-01-18 Gte Sylvania Inc Apparatus for metal vaporization comprising a heater and a refractory vessel
ES417413A1 (es) * 1972-08-18 1976-03-01 Kempten Elektroschmelz Gmbh Perfeccionamientos introducidos en evaporadores a base de material refractario sinterizado.
DE2317762B2 (de) * 1973-04-09 1978-08-17 Siemens Ag, 1000 Berlin Und 8000 Muenchen Tiegel zur Aufnahme des Verdampfungsgutes in Elektronenstrahl-Aufdampfanlagen
JPS5274580A (en) * 1975-12-19 1977-06-22 Hitachi Ltd Boat for vacuum evaporation
US4089643A (en) * 1976-03-19 1978-05-16 Gte Sylvania Incorporated Self-resistance-heated evaporation boat
JPS63192860A (ja) * 1987-02-06 1988-08-10 Hitachi Ltd 蒸着用ボ−ト
US5395180A (en) * 1993-12-14 1995-03-07 Advanced Ceramics Corporation Boron nitride vaporization vessel
US5537507A (en) * 1994-09-28 1996-07-16 Advanced Ceramics Corporation Coated flash evaporator heater

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102985148A (zh) * 2010-05-04 2013-03-20 联邦科学与工业研究组织 分离方法
CN102985148B (zh) * 2010-05-04 2016-01-20 联邦科学与工业研究组织 分离方法
CN105803402A (zh) * 2015-01-20 2016-07-27 钴碳化钨硬质合金公司 Imc蒸发舟皿绝热筒组件
US11821062B2 (en) 2019-04-29 2023-11-21 Kennametal Inc. Cemented carbide compositions and applications thereof

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JP3355149B2 (ja) 2002-12-09
DE19823908A1 (de) 1999-12-02
EP0962546B1 (de) 2001-03-07
CA2274411C (en) 2003-03-25
ATE199576T1 (de) 2001-03-15
CA2274411A1 (en) 2000-12-11
US6085025A (en) 2000-07-04
ES2155724T3 (es) 2001-05-16
DE59900051D1 (de) 2001-04-12
CN1237647A (zh) 1999-12-08
JPH11350048A (ja) 1999-12-21
EP0962546A1 (de) 1999-12-08

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