CN1188747C - 具有改进的剥离能力和分辨率的光成像组合物及干膜光刻胶 - Google Patents
具有改进的剥离能力和分辨率的光成像组合物及干膜光刻胶 Download PDFInfo
- Publication number
- CN1188747C CN1188747C CNB991248007A CN99124800A CN1188747C CN 1188747 C CN1188747 C CN 1188747C CN B991248007 A CNB991248007 A CN B991248007A CN 99124800 A CN99124800 A CN 99124800A CN 1188747 C CN1188747 C CN 1188747C
- Authority
- CN
- China
- Prior art keywords
- methyl
- acrylate
- integer
- optical imaging
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
- C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
- C08L53/005—Modified block copolymers
Abstract
Description
化学成分 | 最适宜量(固体的%) |
乙氧基化的双酚“A”二甲基丙烯酸酯 | 12.4 |
双氯咪唑 | 3.0 |
二苯甲酸二丙二醇酯(3501-35-00,3500-35-00) | 4.5 |
乙基米蚩酮 | 0.05 |
9-苯基吖啶(3500-35-00) | 0.12 |
三苯膦吖啶(3598-35-00) | 0.05 |
正苯基甘氨酸(3598-35-00) | 0.05 |
里丝胺绿基底染料 | 0.10 |
隐性结晶紫 | 0.5 |
不同的成分 | 1 | 2 | 3 | 4 | 5 | 6 |
来自表“A”的混合材料 | ||||||
R-M915低聚物(组合物7) | 29 | 29 | 29 | 29 | 0 | 29 |
乙氧基化的双“A”二(甲基)丙烯酸酯 | 0 | 0 | 0 | 0 | 29 | 0 |
高分子量聚合物(MMA=69,MAA=23,n-BA=8) | 49.5 | |||||
低分子量聚合物/含有苯乙烯(苯乙烯=64,MAA=36) | 49.5 | |||||
低分子量聚合物/不含苯乙烯(MMA=64,MAA=36) | 49.5 | |||||
低分子量聚合物/不含苯乙烯(MMA=56,MAA=36,n-BA=8) | 49.5 | 49.5 | ||||
低分子量聚合物/不合苯乙烯(MMA=64,MAA=23) | 49.5 | |||||
酸值 | 150 | 235 | 235 | 235 | 235 | 150 |
分子量 | 85,000 | 35,000 | 35,000 | 35,000 | 35,000 | 35,000 |
Tg | 90 | 130 | 130 | 105 | 105 | 130 |
性能试验 | 1 | 2 | 3[可接受的] | 4[可接受的] | 5 | 6可接受的] | 性能目标 |
显影时间(1%Na2CO3,30C,秒) | 64 | 48 | 44 | 39 | 38 | 42 | <45 |
分辨率(分辨的最小间隔,微米) | 70 | 45 | 40 | 45 | 40 | 40 | <50 |
粘合性,应力条件(完整留下的最小线,微米) | 40 | 60 | 50 | 50 | 55 | 50 | <55 |
断裂强度(断裂所需的克数) | 1250 | 475 | 855 | 1350 | 225 | 875 | >800 |
剥离时间(3%NaOH,45C,秒) | 90 | 65 | 22 | 35 | 30 | 40 | <45 |
剥离粒径(毫米) | >100 | >100 | 5 | 10 | 2 | 10 | <20 |
过度电镀剥离(干净剥离的最小线,微米) | 200 | 100 | 35 | 50 | 100 | 75 | <75 |
滚压边缘熔化(室温,30天) | 元 | 轻微 | 无 | 无 | 严重 | 元 | 无 |
Claims (15)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/209,353 | 1998-12-11 | ||
US09/209,353 US6322951B1 (en) | 1998-12-11 | 1998-12-11 | Photoimageable compositions having improved flexibility and stripping ability |
US09/364,495 US6329123B1 (en) | 1998-12-11 | 1999-07-30 | Photoimageable compositions having improved flexibility and stripping ability |
US09/364,495 | 1999-07-30 | ||
US09/376,539 US6319653B1 (en) | 1998-12-11 | 1999-08-18 | Photoimageable compositions having improved stripping ability and resolution |
US09/376,539 | 1999-08-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1257223A CN1257223A (zh) | 2000-06-21 |
CN1188747C true CN1188747C (zh) | 2005-02-09 |
Family
ID=27395359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB991248007A Expired - Lifetime CN1188747C (zh) | 1998-12-11 | 1999-12-10 | 具有改进的剥离能力和分辨率的光成像组合物及干膜光刻胶 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1008910A1 (zh) |
JP (1) | JP4429440B2 (zh) |
CN (1) | CN1188747C (zh) |
TW (1) | TW498185B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100495340B1 (ko) * | 1999-12-21 | 2005-06-14 | 스미토모 쇼지 플라스틱 가부시키가이샤 | 베이스의 부분적 도금 방법 |
US7410738B2 (en) * | 2004-02-10 | 2008-08-12 | Xerox Corporation | Imaging member having first and second charge transport layers |
WO2007049519A1 (ja) * | 2005-10-25 | 2007-05-03 | Hitachi Chemical Company, Ltd. | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
KR101738464B1 (ko) * | 2012-04-27 | 2017-05-22 | 후지필름 가부시키가이샤 | 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 el 표시 장치, 및 액정 표시 장치 |
TWI546002B (zh) * | 2015-08-13 | 2016-08-11 | 馗鼎奈米科技股份有限公司 | 金屬線路之製造方法 |
CN113801291B (zh) * | 2021-04-27 | 2023-05-12 | 杭州福斯特电子材料有限公司 | 感光树脂组合物、感光干膜抗蚀剂和pcb板的制作方法 |
CN115677939A (zh) * | 2022-11-25 | 2023-02-03 | 茂名清荷科技有限公司 | 一种感光性接枝聚合物以及含有其的感光性树脂组合物 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0674225A1 (en) * | 1994-03-16 | 1995-09-27 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition and photosensitive film |
TW424172B (en) * | 1995-04-19 | 2001-03-01 | Hitachi Chemical Co Ltd | Photosensitive resin composition and photosensitive element using the same |
DE69725380T2 (de) * | 1996-05-16 | 2004-08-26 | Teijin Seiki Co. Ltd. | Lichthärtbare Zusammensetzung, Verfahren zur Herstellung eines lichtgehärteten geformten Gegenstands, Form und Verfahren zum Vakuumdruckgiessen und Urethanacrylat |
US5952154A (en) * | 1998-05-29 | 1999-09-14 | Morton International, Inc. | Photoimageable composition having improved flexibility |
TW494277B (en) * | 1998-05-29 | 2002-07-11 | Nichigo Morton Co Ltd | Photoimageable composition having improved flexibility |
-
1999
- 1999-11-30 EP EP99309618A patent/EP1008910A1/en not_active Withdrawn
- 1999-12-10 CN CNB991248007A patent/CN1188747C/zh not_active Expired - Lifetime
- 1999-12-13 JP JP35366799A patent/JP4429440B2/ja not_active Expired - Lifetime
-
2000
- 2000-02-29 TW TW88121429A patent/TW498185B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1257223A (zh) | 2000-06-21 |
JP4429440B2 (ja) | 2010-03-10 |
EP1008910A1 (en) | 2000-06-14 |
TW498185B (en) | 2002-08-11 |
JP2000199959A (ja) | 2000-07-18 |
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C14 | Grant of patent or utility model | ||
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Owner name: A-STAR TECHNOLOGY LTD. Free format text: FORMER OWNER: ROHM + HAAS ELECTRONIC MATERIALS CO., LTD. Effective date: 20100910 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Owner name: ROHM + HAAS ELECTRONIC MATERIALS CO., LTD. Free format text: FORMER NAME: SIPOREI CORP. |
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Free format text: CORRECT: ADDRESS; FROM: MASSACHUSETTS, UNITED STATES TO: VIRGINIA, UNITED STATES |
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Address after: Massachusetts USA Patentee after: Rohm and Haas Electronic Materials Address before: Massachusetts USA Patentee before: SHIPLEY Co.,LLC |
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Granted publication date: 20050209 |
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CX01 | Expiry of patent term |