CN117098875A - 电铸模具的制造方法及光掩模 - Google Patents

电铸模具的制造方法及光掩模 Download PDF

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Publication number
CN117098875A
CN117098875A CN202280024380.5A CN202280024380A CN117098875A CN 117098875 A CN117098875 A CN 117098875A CN 202280024380 A CN202280024380 A CN 202280024380A CN 117098875 A CN117098875 A CN 117098875A
Authority
CN
China
Prior art keywords
corner
light
light shielding
insoluble
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280024380.5A
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English (en)
Chinese (zh)
Inventor
佐佐木阳介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Publication of CN117098875A publication Critical patent/CN117098875A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
CN202280024380.5A 2021-03-29 2022-03-23 电铸模具的制造方法及光掩模 Pending CN117098875A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021054711 2021-03-29
JP2021-054711 2021-03-29
PCT/JP2022/013484 WO2022210159A1 (ja) 2021-03-29 2022-03-23 電鋳型の製造方法及びフォトマスク

Publications (1)

Publication Number Publication Date
CN117098875A true CN117098875A (zh) 2023-11-21

Family

ID=83455355

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280024380.5A Pending CN117098875A (zh) 2021-03-29 2022-03-23 电铸模具的制造方法及光掩模

Country Status (5)

Country Link
US (1) US20240176229A1 (https=)
EP (1) EP4317535A4 (https=)
JP (1) JP7764467B2 (https=)
CN (1) CN117098875A (https=)
WO (1) WO2022210159A1 (https=)

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63216052A (ja) * 1987-03-05 1988-09-08 Fujitsu Ltd 露光方法
JP3164815B2 (ja) * 1990-09-19 2001-05-14 株式会社日立製作所 半導体装置の製造方法
US5663893A (en) 1995-05-03 1997-09-02 Microunity Systems Engineering, Inc. Method for generating proximity correction features for a lithographic mask pattern
US5920487A (en) * 1997-03-03 1999-07-06 Motorola Inc. Two dimensional lithographic proximity correction using DRC shape functions
JP3998458B2 (ja) * 2001-11-08 2007-10-24 富士通株式会社 波長に依存しないリソグラフィ用の露光パターン生成方法及び露光パターン生成装置
JP2003255508A (ja) * 2002-02-28 2003-09-10 Oki Electric Ind Co Ltd マスクパターンの補正方法、フォトマスク、露光方法、半導体装置
JP4550569B2 (ja) 2004-12-20 2010-09-22 セイコーインスツル株式会社 電鋳型とその製造方法
JP4771254B2 (ja) * 2005-08-10 2011-09-14 セイコーインスツル株式会社 電鋳型及び電鋳部品の製造方法
JP2011248347A (ja) 2010-04-28 2011-12-08 Semiconductor Energy Lab Co Ltd フォトマスク
JP2016057158A (ja) 2014-09-09 2016-04-21 セイコーインスツル株式会社 時計部品、ムーブメント、時計、および時計部品の製造方法
JP7575904B2 (ja) 2019-09-30 2024-10-30 国立大学法人 東京大学 鉄系酸化物磁性粉およびその製造方法

Also Published As

Publication number Publication date
EP4317535A1 (en) 2024-02-07
US20240176229A1 (en) 2024-05-30
WO2022210159A1 (ja) 2022-10-06
JP7764467B2 (ja) 2025-11-05
JPWO2022210159A1 (https=) 2022-10-06
EP4317535A4 (en) 2025-10-22

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