JP7764467B2 - 電鋳型の製造方法及びフォトマスク - Google Patents

電鋳型の製造方法及びフォトマスク

Info

Publication number
JP7764467B2
JP7764467B2 JP2023511055A JP2023511055A JP7764467B2 JP 7764467 B2 JP7764467 B2 JP 7764467B2 JP 2023511055 A JP2023511055 A JP 2023511055A JP 2023511055 A JP2023511055 A JP 2023511055A JP 7764467 B2 JP7764467 B2 JP 7764467B2
Authority
JP
Japan
Prior art keywords
corner
light
insoluble
soluble
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023511055A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022210159A1 (https=
Inventor
陽介 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Publication of JPWO2022210159A1 publication Critical patent/JPWO2022210159A1/ja
Application granted granted Critical
Publication of JP7764467B2 publication Critical patent/JP7764467B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
JP2023511055A 2021-03-29 2022-03-23 電鋳型の製造方法及びフォトマスク Active JP7764467B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021054711 2021-03-29
JP2021054711 2021-03-29
PCT/JP2022/013484 WO2022210159A1 (ja) 2021-03-29 2022-03-23 電鋳型の製造方法及びフォトマスク

Publications (2)

Publication Number Publication Date
JPWO2022210159A1 JPWO2022210159A1 (https=) 2022-10-06
JP7764467B2 true JP7764467B2 (ja) 2025-11-05

Family

ID=83455355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023511055A Active JP7764467B2 (ja) 2021-03-29 2022-03-23 電鋳型の製造方法及びフォトマスク

Country Status (5)

Country Link
US (1) US20240176229A1 (https=)
EP (1) EP4317535A4 (https=)
JP (1) JP7764467B2 (https=)
CN (1) CN117098875A (https=)
WO (1) WO2022210159A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006343776A (ja) 1995-05-03 2006-12-21 Asml Masktools Bv リソグラフィックィックマスクパターンのための近接効果補正フィーチャの生成方法
JP2007046109A (ja) 2005-08-10 2007-02-22 Seiko Instruments Inc 電鋳型、電鋳部品及び電鋳部品の製造方法
JP2011248347A (ja) 2010-04-28 2011-12-08 Semiconductor Energy Lab Co Ltd フォトマスク
JP2016057158A (ja) 2014-09-09 2016-04-21 セイコーインスツル株式会社 時計部品、ムーブメント、時計、および時計部品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63216052A (ja) * 1987-03-05 1988-09-08 Fujitsu Ltd 露光方法
JP3164815B2 (ja) * 1990-09-19 2001-05-14 株式会社日立製作所 半導体装置の製造方法
US5920487A (en) * 1997-03-03 1999-07-06 Motorola Inc. Two dimensional lithographic proximity correction using DRC shape functions
JP3998458B2 (ja) * 2001-11-08 2007-10-24 富士通株式会社 波長に依存しないリソグラフィ用の露光パターン生成方法及び露光パターン生成装置
JP2003255508A (ja) * 2002-02-28 2003-09-10 Oki Electric Ind Co Ltd マスクパターンの補正方法、フォトマスク、露光方法、半導体装置
JP4550569B2 (ja) 2004-12-20 2010-09-22 セイコーインスツル株式会社 電鋳型とその製造方法
JP7575904B2 (ja) 2019-09-30 2024-10-30 国立大学法人 東京大学 鉄系酸化物磁性粉およびその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006343776A (ja) 1995-05-03 2006-12-21 Asml Masktools Bv リソグラフィックィックマスクパターンのための近接効果補正フィーチャの生成方法
JP2007046109A (ja) 2005-08-10 2007-02-22 Seiko Instruments Inc 電鋳型、電鋳部品及び電鋳部品の製造方法
JP2011248347A (ja) 2010-04-28 2011-12-08 Semiconductor Energy Lab Co Ltd フォトマスク
JP2016057158A (ja) 2014-09-09 2016-04-21 セイコーインスツル株式会社 時計部品、ムーブメント、時計、および時計部品の製造方法

Also Published As

Publication number Publication date
EP4317535A1 (en) 2024-02-07
CN117098875A (zh) 2023-11-21
US20240176229A1 (en) 2024-05-30
WO2022210159A1 (ja) 2022-10-06
JPWO2022210159A1 (https=) 2022-10-06
EP4317535A4 (en) 2025-10-22

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