CN115735160A - 防护膜组件、曝光原版、曝光装置、防护膜组件的制造方法和半导体装置的制造方法 - Google Patents

防护膜组件、曝光原版、曝光装置、防护膜组件的制造方法和半导体装置的制造方法 Download PDF

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Publication number
CN115735160A
CN115735160A CN202180046004.1A CN202180046004A CN115735160A CN 115735160 A CN115735160 A CN 115735160A CN 202180046004 A CN202180046004 A CN 202180046004A CN 115735160 A CN115735160 A CN 115735160A
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China
Prior art keywords
pellicle
support frame
exposure
film
substrate
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Pending
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CN202180046004.1A
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English (en)
Chinese (zh)
Inventor
小野阳介
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of CN115735160A publication Critical patent/CN115735160A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
CN202180046004.1A 2020-08-05 2021-08-03 防护膜组件、曝光原版、曝光装置、防护膜组件的制造方法和半导体装置的制造方法 Pending CN115735160A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020133262 2020-08-05
JP2020-133262 2020-08-05
PCT/JP2021/028798 WO2022030498A1 (ja) 2020-08-05 2021-08-03 ペリクル、露光原版、露光装置、ペリクルの製造方法及び半導体装置の製造方法

Publications (1)

Publication Number Publication Date
CN115735160A true CN115735160A (zh) 2023-03-03

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CN202180046004.1A Pending CN115735160A (zh) 2020-08-05 2021-08-03 防护膜组件、曝光原版、曝光装置、防护膜组件的制造方法和半导体装置的制造方法

Country Status (7)

Country Link
US (2) US12078923B2 (enExample)
EP (1) EP4155430A4 (enExample)
JP (2) JP7307281B2 (enExample)
KR (2) KR20240121338A (enExample)
CN (1) CN115735160A (enExample)
TW (2) TWI845855B (enExample)
WO (1) WO2022030498A1 (enExample)

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JP2023151129A (ja) * 2022-03-31 2023-10-16 三井化学株式会社 Ｅｕｖリソグラフィ用ペリクル
DE102023105501A1 (de) * 2022-07-27 2024-02-01 Taiwan Semiconductor Manufacturing Co., Ltd. Pellikel für euv-lithografiemasken und verfahren zu deren herstellung

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US20170285461A1 (en) * 2015-02-24 2017-10-05 Mitsui Chemicals, Inc. Pellicle film, pellicle frame, pellicle, and method for producing same
US20190121229A1 (en) * 2016-06-28 2019-04-25 Mitsui Chemicals, Inc. Pellicle film, pellicle frame body, pellicle, and method for manufacturing pellicle
JP2019174628A (ja) * 2018-03-28 2019-10-10 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置

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JP2019174628A (ja) * 2018-03-28 2019-10-10 三井化学株式会社 検査方法、ペリクルの製造方法、および検査装置

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US12078923B2 (en) 2024-09-03
KR20240121338A (ko) 2024-08-08
TW202212962A (zh) 2022-04-01
TWI845855B (zh) 2024-06-21
JP2023120441A (ja) 2023-08-29
JP7307281B2 (ja) 2023-07-11
KR102689722B1 (ko) 2024-07-31
US20230341763A1 (en) 2023-10-26
WO2022030498A1 (ja) 2022-02-10
TWI889355B (zh) 2025-07-01
EP4155430A1 (en) 2023-03-29
TW202436998A (zh) 2024-09-16
EP4155430A4 (en) 2025-05-21
KR20230012050A (ko) 2023-01-25
US20240385510A1 (en) 2024-11-21
JPWO2022030498A1 (enExample) 2022-02-10

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