CN115349035B - 用于电解处理工件的电极及设备、用于形成所述设备的单元的组合件以及方法及计算机程序 - Google Patents

用于电解处理工件的电极及设备、用于形成所述设备的单元的组合件以及方法及计算机程序

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Publication number
CN115349035B
CN115349035B CN202180021766.6A CN202180021766A CN115349035B CN 115349035 B CN115349035 B CN 115349035B CN 202180021766 A CN202180021766 A CN 202180021766A CN 115349035 B CN115349035 B CN 115349035B
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CN
China
Prior art keywords
electrode
segment
workpiece
edges
edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
CN202180021766.6A
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English (en)
Chinese (zh)
Other versions
CN115349035A (zh
Inventor
亨利·库兹
费迪南多·温诺
布里塔·舍勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Germany Aituoteke Co ltd
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Germany Aituoteke Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Germany Aituoteke Co ltd filed Critical Germany Aituoteke Co ltd
Publication of CN115349035A publication Critical patent/CN115349035A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008—Current shielding devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
CN202180021766.6A 2020-02-07 2021-02-05 用于电解处理工件的电极及设备、用于形成所述设备的单元的组合件以及方法及计算机程序 Active CN115349035B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP20156050 2020-02-07
EP20156050.5 2020-02-07
PCT/EP2021/052760 WO2021156415A1 (en) 2020-02-07 2021-02-05 Electrode and apparatus for electrolytically treating a workpiece, assembly for forming a cell of the apparatus and method and computer program

Publications (2)

Publication Number Publication Date
CN115349035A CN115349035A (zh) 2022-11-15
CN115349035B true CN115349035B (zh) 2025-10-03

Family

ID=69526171

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180021766.6A Active CN115349035B (zh) 2020-02-07 2021-02-05 用于电解处理工件的电极及设备、用于形成所述设备的单元的组合件以及方法及计算机程序

Country Status (8)

Country Link
US (1) US12522942B2 (https=)
EP (1) EP4100562A1 (https=)
JP (1) JP7747642B2 (https=)
KR (1) KR20220139354A (https=)
CN (1) CN115349035B (https=)
PH (1) PH12022552031A1 (https=)
TW (1) TWI878447B (https=)
WO (1) WO2021156415A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117802557A (zh) * 2022-09-23 2024-04-02 奥特斯科技(重庆)有限公司 用于对部件承载件结构进行电镀覆的电镀覆设备和方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6919010B1 (en) * 2001-06-28 2005-07-19 Novellus Systems, Inc. Uniform electroplating of thin metal seeded wafers using rotationally asymmetric variable anode correction
US7682498B1 (en) * 2001-06-28 2010-03-23 Novellus Systems, Inc. Rotationally asymmetric variable electrode correction

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306693A (ja) * 1993-04-27 1994-11-01 Kawasaki Steel Corp 金属ストリップの幅方向めっき付着量制御用めっき電極ならびにめっき付着量制御方法
JPH10287997A (ja) * 1997-04-17 1998-10-27 Tomoji Watanabe メッキ装置
US6322673B1 (en) * 1999-12-18 2001-11-27 Electroplating Technologies, Ltd. Apparatus for electrochemical treatment of a continuous web
DE10141056C2 (de) * 2001-08-22 2003-12-24 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum elektrolytischen Behandeln von elektrisch leitfähigen Schichten in Durchlaufanlagen
US8858774B2 (en) 2008-11-07 2014-10-14 Novellus Systems, Inc. Electroplating apparatus for tailored uniformity profile
US10011917B2 (en) * 2008-11-07 2018-07-03 Lam Research Corporation Control of current density in an electroplating apparatus
CN102725442B (zh) 2009-11-03 2015-01-28 新南创新私人有限公司 用于太阳能电池的金属电极的光镀
TWI530593B (zh) 2014-08-11 2016-04-21 亞智科技股份有限公司 多陽極控制裝置及具有該裝置的電鍍設備

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6919010B1 (en) * 2001-06-28 2005-07-19 Novellus Systems, Inc. Uniform electroplating of thin metal seeded wafers using rotationally asymmetric variable anode correction
US7682498B1 (en) * 2001-06-28 2010-03-23 Novellus Systems, Inc. Rotationally asymmetric variable electrode correction

Also Published As

Publication number Publication date
KR20220139354A (ko) 2022-10-14
PH12022552031A1 (en) 2023-11-29
US20230062477A1 (en) 2023-03-02
WO2021156415A1 (en) 2021-08-12
JP7747642B2 (ja) 2025-10-01
CN115349035A (zh) 2022-11-15
EP4100562A1 (en) 2022-12-14
TWI878447B (zh) 2025-04-01
JP2023512815A (ja) 2023-03-29
TW202136592A (zh) 2021-10-01
US12522942B2 (en) 2026-01-13

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