KR20220139354A - 피가공물을 전해 처리하기 위한 전극 및 장치, 장치의 셀을 형성하기 위한 어셈블리, 방법 및 컴퓨터 프로그램 - Google Patents

피가공물을 전해 처리하기 위한 전극 및 장치, 장치의 셀을 형성하기 위한 어셈블리, 방법 및 컴퓨터 프로그램 Download PDF

Info

Publication number
KR20220139354A
KR20220139354A KR1020227030834A KR20227030834A KR20220139354A KR 20220139354 A KR20220139354 A KR 20220139354A KR 1020227030834 A KR1020227030834 A KR 1020227030834A KR 20227030834 A KR20227030834 A KR 20227030834A KR 20220139354 A KR20220139354 A KR 20220139354A
Authority
KR
South Korea
Prior art keywords
electrode
workpiece
segment
edge
coordinates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020227030834A
Other languages
English (en)
Korean (ko)
Inventor
헨리 쿤체
페르디난트 비너
브리타 쉘러
Original Assignee
아토테크 도이칠란트 게엠베하 운트 콤파니 카게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 아토테크 도이칠란트 게엠베하 운트 콤파니 카게 filed Critical 아토테크 도이칠란트 게엠베하 운트 콤파니 카게
Publication of KR20220139354A publication Critical patent/KR20220139354A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008—Current shielding devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
KR1020227030834A 2020-02-07 2021-02-05 피가공물을 전해 처리하기 위한 전극 및 장치, 장치의 셀을 형성하기 위한 어셈블리, 방법 및 컴퓨터 프로그램 Pending KR20220139354A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP20156050 2020-02-07
EP20156050.5 2020-02-07
PCT/EP2021/052760 WO2021156415A1 (en) 2020-02-07 2021-02-05 Electrode and apparatus for electrolytically treating a workpiece, assembly for forming a cell of the apparatus and method and computer program

Publications (1)

Publication Number Publication Date
KR20220139354A true KR20220139354A (ko) 2022-10-14

Family

ID=69526171

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227030834A Pending KR20220139354A (ko) 2020-02-07 2021-02-05 피가공물을 전해 처리하기 위한 전극 및 장치, 장치의 셀을 형성하기 위한 어셈블리, 방법 및 컴퓨터 프로그램

Country Status (8)

Country Link
US (1) US12522942B2 (https=)
EP (1) EP4100562A1 (https=)
JP (1) JP7747642B2 (https=)
KR (1) KR20220139354A (https=)
CN (1) CN115349035B (https=)
PH (1) PH12022552031A1 (https=)
TW (1) TWI878447B (https=)
WO (1) WO2021156415A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117802557A (zh) * 2022-09-23 2024-04-02 奥特斯科技(重庆)有限公司 用于对部件承载件结构进行电镀覆的电镀覆设备和方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06306693A (ja) * 1993-04-27 1994-11-01 Kawasaki Steel Corp 金属ストリップの幅方向めっき付着量制御用めっき電極ならびにめっき付着量制御方法
JPH10287997A (ja) * 1997-04-17 1998-10-27 Tomoji Watanabe メッキ装置
US6919010B1 (en) 2001-06-28 2005-07-19 Novellus Systems, Inc. Uniform electroplating of thin metal seeded wafers using rotationally asymmetric variable anode correction
US6322673B1 (en) * 1999-12-18 2001-11-27 Electroplating Technologies, Ltd. Apparatus for electrochemical treatment of a continuous web
US7682498B1 (en) * 2001-06-28 2010-03-23 Novellus Systems, Inc. Rotationally asymmetric variable electrode correction
DE10141056C2 (de) * 2001-08-22 2003-12-24 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum elektrolytischen Behandeln von elektrisch leitfähigen Schichten in Durchlaufanlagen
US8858774B2 (en) 2008-11-07 2014-10-14 Novellus Systems, Inc. Electroplating apparatus for tailored uniformity profile
US10011917B2 (en) * 2008-11-07 2018-07-03 Lam Research Corporation Control of current density in an electroplating apparatus
CN102725442B (zh) 2009-11-03 2015-01-28 新南创新私人有限公司 用于太阳能电池的金属电极的光镀
TWI530593B (zh) 2014-08-11 2016-04-21 亞智科技股份有限公司 多陽極控制裝置及具有該裝置的電鍍設備

Also Published As

Publication number Publication date
PH12022552031A1 (en) 2023-11-29
US20230062477A1 (en) 2023-03-02
WO2021156415A1 (en) 2021-08-12
JP7747642B2 (ja) 2025-10-01
CN115349035A (zh) 2022-11-15
EP4100562A1 (en) 2022-12-14
CN115349035B (zh) 2025-10-03
TWI878447B (zh) 2025-04-01
JP2023512815A (ja) 2023-03-29
TW202136592A (zh) 2021-10-01
US12522942B2 (en) 2026-01-13

Similar Documents

Publication Publication Date Title
EP1419290B1 (en) Segmented counterelectrode for an electrolytic treatment system
US7563352B2 (en) Method and conveyorized system for electorlytically processing work pieces
US20130081939A1 (en) Serial plating system
TW202202663A (zh) 控制個別夾具電流的電鍍裝置
EP3872236B1 (en) Distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate
KR20220139354A (ko) 피가공물을 전해 처리하기 위한 전극 및 장치, 장치의 셀을 형성하기 위한 어셈블리, 방법 및 컴퓨터 프로그램
JP7070012B2 (ja) 電解めっき装置、および金属張積層板の製造方法
KR101605379B1 (ko) 전기동도금 방법
US20020157959A1 (en) Process for electroplating a work piece coated with an electrically conducting polymer
KR102206395B1 (ko) 개별파티션을 구비한 도금장치
CN111032928B (zh) 用于印刷线路板的镀敷设备和金属夹具
CN109518260A (zh) 电镀辅助板及应用其的电镀系统
KR100976745B1 (ko) 작업물을 전해 금속 도금하기 위한 컨베이어 도금 라인 및방법
CN112359399A (zh) 一种电镀阴极遮挡装置
JP2011153335A (ja) めっき方法および電解めっき装置
WO2011093023A1 (ja) めっき方法および電解めっき装置
JP2002514267A (ja) プレート形状の被処理物を電気分解的に処理するための装置と電気分解的処理の際に被処理物のエッジ範囲を電気的に遮蔽するための方法
KR20220139646A (ko) 수직 연속형 동도금 장치 및 방법
TWI677599B (zh) 電鍍裝置
HK1060906B (en) Segmented counterelectrode for an electrolytic treatment system

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000