CN115003851A - 蒸镀掩模中间体、蒸镀掩模、掩模装置及蒸镀掩模的制造方法 - Google Patents

蒸镀掩模中间体、蒸镀掩模、掩模装置及蒸镀掩模的制造方法 Download PDF

Info

Publication number
CN115003851A
CN115003851A CN202180009116.XA CN202180009116A CN115003851A CN 115003851 A CN115003851 A CN 115003851A CN 202180009116 A CN202180009116 A CN 202180009116A CN 115003851 A CN115003851 A CN 115003851A
Authority
CN
China
Prior art keywords
vapor deposition
mask
deposition mask
shaped
fragile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180009116.XA
Other languages
English (en)
Chinese (zh)
Inventor
松隈香
相川建一郎
小林昭彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2020211778A external-priority patent/JP7099512B2/ja
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Publication of CN115003851A publication Critical patent/CN115003851A/zh
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN202180009116.XA 2020-02-05 2021-01-28 蒸镀掩模中间体、蒸镀掩模、掩模装置及蒸镀掩模的制造方法 Pending CN115003851A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2020-018188 2020-02-05
JP2020018188 2020-02-05
JP2020211778A JP7099512B2 (ja) 2020-02-05 2020-12-21 蒸着マスク中間体、蒸着マスク、マスク装置、および、蒸着マスクの製造方法
JP2020-211778 2020-12-21
PCT/JP2021/003015 WO2021157463A1 (ja) 2020-02-05 2021-01-28 蒸着マスク中間体、蒸着マスク、マスク装置、および、蒸着マスクの製造方法

Publications (1)

Publication Number Publication Date
CN115003851A true CN115003851A (zh) 2022-09-02

Family

ID=77200643

Family Applications (2)

Application Number Title Priority Date Filing Date
CN202180009116.XA Pending CN115003851A (zh) 2020-02-05 2021-01-28 蒸镀掩模中间体、蒸镀掩模、掩模装置及蒸镀掩模的制造方法
CN202120294867.8U Active CN215887199U (zh) 2020-02-05 2021-02-02 蒸镀掩模中间体、蒸镀掩模以及掩模装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN202120294867.8U Active CN215887199U (zh) 2020-02-05 2021-02-02 蒸镀掩模中间体、蒸镀掩模以及掩模装置

Country Status (4)

Country Link
JP (1) JP2022121540A (ko)
KR (1) KR102580986B1 (ko)
CN (2) CN115003851A (ko)
WO (1) WO2021157463A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021157463A1 (ja) * 2020-02-05 2021-08-12 凸版印刷株式会社 蒸着マスク中間体、蒸着マスク、マスク装置、および、蒸着マスクの製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011098A (ja) * 2001-06-13 2003-01-15 Dainippon Printing Co Ltd トリミング装置およびトリミング方法
JP2004055231A (ja) * 2002-07-17 2004-02-19 Dainippon Printing Co Ltd 有機ｅｌ素子製造に用いる真空蒸着用多面付けメタルマスク
CN107916396A (zh) * 2016-10-07 2018-04-17 大日本印刷株式会社 蒸镀掩模的制造方法、中间产品和蒸镀掩模
CN215887199U (zh) * 2020-02-05 2022-02-22 凸版印刷株式会社 蒸镀掩模中间体、蒸镀掩模以及掩模装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4662661B2 (ja) * 2001-08-29 2011-03-30 大日本印刷株式会社 有機ｅｌ素子製造に用いる真空蒸着用金属マスク
KR102068222B1 (ko) * 2013-02-20 2020-01-21 삼성디스플레이 주식회사 증착용 마스크 제조방법
JP6108544B2 (ja) 2013-06-17 2017-04-05 新東エスプレシジョン株式会社 マスク製造装置
KR102366570B1 (ko) * 2015-06-19 2022-02-25 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
WO2017014172A1 (ja) 2015-07-17 2017-01-26 凸版印刷株式会社 蒸着用メタルマスク基材、蒸着用メタルマスク、蒸着用メタルマスク基材の製造方法、および、蒸着用メタルマスクの製造方法
WO2018025835A1 (ja) * 2016-08-05 2018-02-08 凸版印刷株式会社 蒸着用メタルマスク、蒸着用メタルマスクの製造方法、および、表示装置の製造方法
TWI784196B (zh) * 2018-09-07 2022-11-21 日商凸版印刷股份有限公司 蒸鍍遮罩中間體、蒸鍍遮罩、及蒸鍍遮罩的製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011098A (ja) * 2001-06-13 2003-01-15 Dainippon Printing Co Ltd トリミング装置およびトリミング方法
JP2004055231A (ja) * 2002-07-17 2004-02-19 Dainippon Printing Co Ltd 有機ｅｌ素子製造に用いる真空蒸着用多面付けメタルマスク
CN107916396A (zh) * 2016-10-07 2018-04-17 大日本印刷株式会社 蒸镀掩模的制造方法、中间产品和蒸镀掩模
CN207313683U (zh) * 2016-10-07 2018-05-04 大日本印刷株式会社 中间产品和蒸镀掩模
CN215887199U (zh) * 2020-02-05 2022-02-22 凸版印刷株式会社 蒸镀掩模中间体、蒸镀掩模以及掩模装置

Also Published As

Publication number Publication date
TW202138593A (zh) 2021-10-16
KR102580986B1 (ko) 2023-09-20
WO2021157463A1 (ja) 2021-08-12
KR20220110313A (ko) 2022-08-05
JP2022121540A (ja) 2022-08-19
CN215887199U (zh) 2022-02-22

Similar Documents

Publication Publication Date Title
CN112639157B (zh) 蒸镀掩模中间体、蒸镀掩膜及蒸镀掩模的制造方法
CN107916396B (zh) 蒸镀掩模的制造方法、中间产品和蒸镀掩模
WO2021147896A1 (zh) 支撑板及折叠显示器
CN215887199U (zh) 蒸镀掩模中间体、蒸镀掩模以及掩模装置
KR20160138252A (ko) 증착 마스크의 인장 방법, 프레임이 구비된 증착 마스크의 제조 방법, 유기 반도체 소자의 제조 방법, 및 인장 장치
CN213266672U (zh) 蒸镀掩模中间体以及蒸镀掩模
JP7099512B2 (ja) 蒸着マスク中間体、蒸着マスク、マスク装置、および、蒸着マスクの製造方法
TWI838605B (zh) 蒸鍍遮罩中間體、蒸鍍遮罩及蒸鍍遮罩的製造方法
CN216107159U (zh) 蒸镀掩模中间体及蒸镀掩模
JP2024043397A (ja) 蒸着マスク中間体、蒸着マスク、および、蒸着マスクの製造方法
JPH1161442A (ja) エッチング部品構造体
JPH09298269A (ja) リードフレーム構造体
JP2003346680A (ja) 色選別電極、陰極線管及びそれらの製造方法
JP2013030492A (ja) 連鎖端子
JPWO2008096450A1 (ja) 回路基板、積層回路基板および電子機器
JP2007188818A (ja) シャドウマスクの製造方法
JP2004281111A (ja) シャドウマスクの製造方法およびシャドウマスク

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination