CN114401847B - 柔性印刷版原版 - Google Patents

柔性印刷版原版 Download PDF

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Publication number
CN114401847B
CN114401847B CN202080065388.7A CN202080065388A CN114401847B CN 114401847 B CN114401847 B CN 114401847B CN 202080065388 A CN202080065388 A CN 202080065388A CN 114401847 B CN114401847 B CN 114401847B
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CN
China
Prior art keywords
printing plate
mask layer
flexographic printing
cover film
plate precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
CN202080065388.7A
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English (en)
Chinese (zh)
Other versions
CN114401847A (zh
Inventor
芳本和也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongyang Textile Mc Co ltd
Original Assignee
Dongyang Textile Mc Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongyang Textile Mc Co ltd filed Critical Dongyang Textile Mc Co ltd
Publication of CN114401847A publication Critical patent/CN114401847A/zh
Application granted granted Critical
Publication of CN114401847B publication Critical patent/CN114401847B/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
  • Printing Plates And Materials Therefor (AREA)
CN202080065388.7A 2019-09-20 2020-09-09 柔性印刷版原版 Active CN114401847B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019171534 2019-09-20
JP2019-171534 2019-09-20
PCT/JP2020/034149 WO2021054225A1 (ja) 2019-09-20 2020-09-09 フレキソ印刷原版

Publications (2)

Publication Number Publication Date
CN114401847A CN114401847A (zh) 2022-04-26
CN114401847B true CN114401847B (zh) 2024-06-07

Family

ID=74884508

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080065388.7A Active CN114401847B (zh) 2019-09-20 2020-09-09 柔性印刷版原版

Country Status (5)

Country Link
US (1) US12429773B2 (https=)
EP (1) EP4032719A4 (https=)
JP (1) JP7352873B2 (https=)
CN (1) CN114401847B (https=)
WO (1) WO2021054225A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7786244B2 (ja) * 2022-02-21 2025-12-16 東レ株式会社 感光性樹脂印刷版原版
TW202533829A (zh) 2024-02-16 2025-09-01 瑞士商諾華公司 用於治療anca相關性血管炎的因子b抑制劑

Citations (15)

* Cited by examiner, † Cited by third party
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EP1398163A2 (en) * 2002-09-16 2004-03-17 E.I. Du Pont De Nemours And Company Print control for flexographic printing
JP2004163925A (ja) * 2002-10-24 2004-06-10 Toray Ind Inc 感光性樹脂印刷版原版、その製造方法およびこれを用いた樹脂凸版印刷版の製造方法
JP2005289041A (ja) * 2004-03-09 2005-10-20 Dainippon Printing Co Ltd 湾曲を防止したガスバリアフィルム
JP2007079203A (ja) * 2005-09-15 2007-03-29 Toray Ind Inc 感光性樹脂印刷版原版およびこれを用いた樹脂凸版印刷版の製造方法
JP2007139853A (ja) * 2005-11-15 2007-06-07 Toray Ind Inc 感光性樹脂印刷版原版、その製造方法およびこれを用いた樹脂凸版印刷版の製造方法
JP4332865B1 (ja) * 2008-05-23 2009-09-16 東洋紡績株式会社 フレキソ印刷原版
JP2009229484A (ja) * 2008-03-19 2009-10-08 Toray Ind Inc 感光性樹脂板製版用カバーフィルム
CN102112924A (zh) * 2008-06-11 2011-06-29 东洋纺织株式会社 感光性柔性印刷原版
JP2013114136A (ja) * 2011-11-30 2013-06-10 Toyobo Co Ltd 感光性樹脂凸版印刷原版
JP2016087997A (ja) * 2014-11-07 2016-05-23 東洋紡株式会社 感光性樹脂凸版を用いた印刷方法
WO2016136478A1 (ja) * 2015-02-27 2016-09-01 富士フイルム株式会社 フレキソ印刷版、フレキソ印刷版の製造方法およびフレキソ印刷版原版
WO2017051921A1 (ja) * 2015-09-25 2017-03-30 富士フイルム株式会社 フレキソ印刷版
CN107867101A (zh) * 2016-09-27 2018-04-03 住友橡胶工业株式会社 树脂原版的制法、印刷版的制法及液晶显示元件的制法
CN108454254A (zh) * 2017-02-20 2018-08-28 住友橡胶工业株式会社 粗糙面化片材与其用途
TW201831317A (zh) * 2017-02-20 2018-09-01 日商住友橡膠工業股份有限公司 粗糙面化片材與使用其的印刷用樹脂原版的製造方法、柔版印刷版的製造方法、及液晶顯示元件的製造方法

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JPS51150416A (en) 1975-06-17 1976-12-24 Touwa Taipuraitaa Kk Japanese typewriter feeding device
JPS52131227A (en) 1976-04-28 1977-11-04 Nippon Furnace Kogyo Kk Combustion device
JPS5629909A (en) 1979-08-20 1981-03-25 Yanmar Agricult Equip Posture control device of riding type rice transplanter
JP4610132B2 (ja) 2001-07-11 2011-01-12 旭化成イーマテリアルズ株式会社 非赤外線遮蔽層を有する印刷用構成体
TWI297809B (https=) 2001-10-24 2008-06-11 Toyo Boseki
JP2004317964A (ja) 2003-04-18 2004-11-11 Toyobo Co Ltd 感光性樹脂積層体
JP5050821B2 (ja) * 2007-12-05 2012-10-17 東レ株式会社 感光性樹脂印刷版原版
US8530142B2 (en) * 2011-03-15 2013-09-10 Eastman Kodak Company Flexographic printing plate precursor, imaging assembly, and use
US20130251905A1 (en) * 2012-03-23 2013-09-26 Millercoors, Llc Method of applying thermal ink to beverage containers
JP6683208B2 (ja) 2016-11-11 2020-04-15 東レ株式会社 感光性樹脂組成物および感光性樹脂版原版
WO2018181354A1 (ja) * 2017-03-31 2018-10-04 東洋紡株式会社 感光性ｃｔｐフレキソ印刷原版
EP3657255A4 (en) * 2017-07-20 2020-08-19 Asahi Kasei Kabushiki Kaisha PHOTOSENSITIVE RESIN STRUCTURE FOR PRINTING PLATE AND ASSOCIATED PRODUCTION PROCESS
EP4019254A4 (en) * 2019-08-23 2023-04-19 Toyobo Co., Ltd. ORIGINAL FLEXOGRAPHIC PRINTING PLATE

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1398163A2 (en) * 2002-09-16 2004-03-17 E.I. Du Pont De Nemours And Company Print control for flexographic printing
JP2004163925A (ja) * 2002-10-24 2004-06-10 Toray Ind Inc 感光性樹脂印刷版原版、その製造方法およびこれを用いた樹脂凸版印刷版の製造方法
JP2005289041A (ja) * 2004-03-09 2005-10-20 Dainippon Printing Co Ltd 湾曲を防止したガスバリアフィルム
JP2007079203A (ja) * 2005-09-15 2007-03-29 Toray Ind Inc 感光性樹脂印刷版原版およびこれを用いた樹脂凸版印刷版の製造方法
JP2007139853A (ja) * 2005-11-15 2007-06-07 Toray Ind Inc 感光性樹脂印刷版原版、その製造方法およびこれを用いた樹脂凸版印刷版の製造方法
JP2009229484A (ja) * 2008-03-19 2009-10-08 Toray Ind Inc 感光性樹脂板製版用カバーフィルム
JP4332865B1 (ja) * 2008-05-23 2009-09-16 東洋紡績株式会社 フレキソ印刷原版
CN102112924A (zh) * 2008-06-11 2011-06-29 东洋纺织株式会社 感光性柔性印刷原版
JP2013114136A (ja) * 2011-11-30 2013-06-10 Toyobo Co Ltd 感光性樹脂凸版印刷原版
JP2016087997A (ja) * 2014-11-07 2016-05-23 東洋紡株式会社 感光性樹脂凸版を用いた印刷方法
WO2016136478A1 (ja) * 2015-02-27 2016-09-01 富士フイルム株式会社 フレキソ印刷版、フレキソ印刷版の製造方法およびフレキソ印刷版原版
WO2017051921A1 (ja) * 2015-09-25 2017-03-30 富士フイルム株式会社 フレキソ印刷版
CN107867101A (zh) * 2016-09-27 2018-04-03 住友橡胶工业株式会社 树脂原版的制法、印刷版的制法及液晶显示元件的制法
CN108454254A (zh) * 2017-02-20 2018-08-28 住友橡胶工业株式会社 粗糙面化片材与其用途
TW201831317A (zh) * 2017-02-20 2018-09-01 日商住友橡膠工業股份有限公司 粗糙面化片材與使用其的印刷用樹脂原版的製造方法、柔版印刷版的製造方法、及液晶顯示元件的製造方法

Also Published As

Publication number Publication date
WO2021054225A1 (ja) 2021-03-25
JP7352873B2 (ja) 2023-09-29
EP4032719A4 (en) 2023-05-03
CN114401847A (zh) 2022-04-26
US12429773B2 (en) 2025-09-30
US20220342310A1 (en) 2022-10-27
EP4032719A1 (en) 2022-07-27
JPWO2021054225A1 (https=) 2021-03-25

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Legal Events

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PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: No. 1, No. 13, meitian-1, Shibei District, Osaka, Osaka, Japan

Applicant after: TOYOBO Co.,Ltd.

Address before: Japan's Osaka Osaka North Doushima Haji chome 2 times 8

Applicant before: TOYOBO Co.,Ltd.

CB02 Change of applicant information
TA01 Transfer of patent application right

Effective date of registration: 20230717

Address after: South Building, Meitian Twin Towers, No. 13-1, Meitian 1-chome, Kita ku, Osaka City, Osaka Prefecture, Japan

Applicant after: Dongyang Textile MC Co.,Ltd.

Address before: No. 1, No. 13, meitian-1, Shibei District, Osaka, Osaka, Japan

Applicant before: TOYOBO Co.,Ltd.

TA01 Transfer of patent application right
GR01 Patent grant