JPWO2021054225A1 - - Google Patents

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Publication number
JPWO2021054225A1
JPWO2021054225A1 JP2021546633A JP2021546633A JPWO2021054225A1 JP WO2021054225 A1 JPWO2021054225 A1 JP WO2021054225A1 JP 2021546633 A JP2021546633 A JP 2021546633A JP 2021546633 A JP2021546633 A JP 2021546633A JP WO2021054225 A1 JPWO2021054225 A1 JP WO2021054225A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021546633A
Other languages
Japanese (ja)
Other versions
JP7352873B2 (ja
JPWO2021054225A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2021054225A1 publication Critical patent/JPWO2021054225A1/ja
Publication of JPWO2021054225A5 publication Critical patent/JPWO2021054225A5/ja
Application granted granted Critical
Publication of JP7352873B2 publication Critical patent/JP7352873B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP2021546633A 2019-09-20 2020-09-09 フレキソ印刷原版 Active JP7352873B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019171534 2019-09-20
JP2019171534 2019-09-20
PCT/JP2020/034149 WO2021054225A1 (ja) 2019-09-20 2020-09-09 フレキソ印刷原版

Publications (3)

Publication Number Publication Date
JPWO2021054225A1 true JPWO2021054225A1 (https=) 2021-03-25
JPWO2021054225A5 JPWO2021054225A5 (https=) 2022-03-08
JP7352873B2 JP7352873B2 (ja) 2023-09-29

Family

ID=74884508

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021546633A Active JP7352873B2 (ja) 2019-09-20 2020-09-09 フレキソ印刷原版

Country Status (5)

Country Link
US (1) US12429773B2 (https=)
EP (1) EP4032719A4 (https=)
JP (1) JP7352873B2 (https=)
CN (1) CN114401847B (https=)
WO (1) WO2021054225A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7786244B2 (ja) * 2022-02-21 2025-12-16 東レ株式会社 感光性樹脂印刷版原版
TW202533829A (zh) 2024-02-16 2025-09-01 瑞士商諾華公司 用於治療anca相關性血管炎的因子b抑制劑

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005289041A (ja) * 2004-03-09 2005-10-20 Dainippon Printing Co Ltd 湾曲を防止したガスバリアフィルム
JP2013114136A (ja) * 2011-11-30 2013-06-10 Toyobo Co Ltd 感光性樹脂凸版印刷原版

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51150416A (en) 1975-06-17 1976-12-24 Touwa Taipuraitaa Kk Japanese typewriter feeding device
JPS52131227A (en) 1976-04-28 1977-11-04 Nippon Furnace Kogyo Kk Combustion device
JPS5629909A (en) 1979-08-20 1981-03-25 Yanmar Agricult Equip Posture control device of riding type rice transplanter
JP4610132B2 (ja) 2001-07-11 2011-01-12 旭化成イーマテリアルズ株式会社 非赤外線遮蔽層を有する印刷用構成体
TWI297809B (https=) 2001-10-24 2008-06-11 Toyo Boseki
US6984478B2 (en) * 2002-09-16 2006-01-10 E.I. Du Pont De Nemours And Company Print control for flexographic printing
JP4442187B2 (ja) * 2002-10-24 2010-03-31 東レ株式会社 感光性樹脂印刷版原版、その製造方法およびこれを用いた樹脂凸版印刷版の製造方法
JP2004317964A (ja) 2003-04-18 2004-11-11 Toyobo Co Ltd 感光性樹脂積層体
JP2007079203A (ja) * 2005-09-15 2007-03-29 Toray Ind Inc 感光性樹脂印刷版原版およびこれを用いた樹脂凸版印刷版の製造方法
JP4736734B2 (ja) * 2005-11-15 2011-07-27 東レ株式会社 感光性樹脂印刷版原版の製造方法およびこれを用いた樹脂凸版印刷版の製造方法
JP5050821B2 (ja) * 2007-12-05 2012-10-17 東レ株式会社 感光性樹脂印刷版原版
JP2009229484A (ja) * 2008-03-19 2009-10-08 Toray Ind Inc 感光性樹脂板製版用カバーフィルム
CN102016720B (zh) * 2008-05-23 2013-01-09 东洋纺织株式会社 柔版印刷原版
JP4200510B1 (ja) * 2008-06-11 2008-12-24 東洋紡績株式会社 感光性フレキソ印刷原版
US8530142B2 (en) * 2011-03-15 2013-09-10 Eastman Kodak Company Flexographic printing plate precursor, imaging assembly, and use
US20130251905A1 (en) * 2012-03-23 2013-09-26 Millercoors, Llc Method of applying thermal ink to beverage containers
JP6370196B2 (ja) * 2014-11-07 2018-08-08 東洋紡株式会社 感光性樹脂凸版を用いた印刷方法
CN107249901B (zh) * 2015-02-27 2019-03-22 富士胶片株式会社 柔版印刷版、柔版印刷版的制造方法及柔版印刷版原版
WO2017051921A1 (ja) * 2015-09-25 2017-03-30 富士フイルム株式会社 フレキソ印刷版
JP6802973B2 (ja) * 2016-09-27 2020-12-23 住友ゴム工業株式会社 印刷用樹脂原版の製造方法、フレキソ印刷版の製造方法、および液晶表示素子の製造方法
JP6683208B2 (ja) 2016-11-11 2020-04-15 東レ株式会社 感光性樹脂組成物および感光性樹脂版原版
JP6660568B2 (ja) * 2017-02-20 2020-03-11 住友ゴム工業株式会社 粗面化シートとそれを用いた印刷用樹脂原版の製造方法、およびフレキソ印刷版の製造方法
CN108454254B (zh) * 2017-02-20 2021-06-22 住友橡胶工业株式会社 粗糙面化片材与其用途
WO2018181354A1 (ja) * 2017-03-31 2018-10-04 東洋紡株式会社 感光性ｃｔｐフレキソ印刷原版
EP3657255A4 (en) * 2017-07-20 2020-08-19 Asahi Kasei Kabushiki Kaisha PHOTOSENSITIVE RESIN STRUCTURE FOR PRINTING PLATE AND ASSOCIATED PRODUCTION PROCESS
EP4019254A4 (en) * 2019-08-23 2023-04-19 Toyobo Co., Ltd. ORIGINAL FLEXOGRAPHIC PRINTING PLATE

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005289041A (ja) * 2004-03-09 2005-10-20 Dainippon Printing Co Ltd 湾曲を防止したガスバリアフィルム
JP2013114136A (ja) * 2011-11-30 2013-06-10 Toyobo Co Ltd 感光性樹脂凸版印刷原版

Also Published As

Publication number Publication date
WO2021054225A1 (ja) 2021-03-25
JP7352873B2 (ja) 2023-09-29
EP4032719A4 (en) 2023-05-03
CN114401847A (zh) 2022-04-26
US12429773B2 (en) 2025-09-30
US20220342310A1 (en) 2022-10-27
EP4032719A1 (en) 2022-07-27
CN114401847B (zh) 2024-06-07

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