CN113993922A - 感光性着色树脂组合物、固化物、间隔壁及图像显示装置 - Google Patents

感光性着色树脂组合物、固化物、间隔壁及图像显示装置 Download PDF

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Publication number
CN113993922A
CN113993922A CN202080042736.9A CN202080042736A CN113993922A CN 113993922 A CN113993922 A CN 113993922A CN 202080042736 A CN202080042736 A CN 202080042736A CN 113993922 A CN113993922 A CN 113993922A
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Chinese (zh)
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山川朋子
利光惠理子
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Publication of CN113993922A publication Critical patent/CN113993922A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
CN202080042736.9A 2019-07-22 2020-05-29 感光性着色树脂组合物、固化物、间隔壁及图像显示装置 Pending CN113993922A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019134426 2019-07-22
JP2019-134426 2019-07-22
PCT/JP2020/021393 WO2021014759A1 (ja) 2019-07-22 2020-05-29 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Publications (1)

Publication Number Publication Date
CN113993922A true CN113993922A (zh) 2022-01-28

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CN202080042736.9A Pending CN113993922A (zh) 2019-07-22 2020-05-29 感光性着色树脂组合物、固化物、间隔壁及图像显示装置

Country Status (5)

Country Link
JP (2) JP6885518B1 (ko)
KR (2) KR102511654B1 (ko)
CN (1) CN113993922A (ko)
TW (1) TWI826695B (ko)
WO (1) WO2021014759A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11969722B2 (en) 2019-06-26 2024-04-30 Ffi Ionix Ip, Inc. Anionic membranes incorporating functional additives
JPWO2022209771A1 (ko) * 2021-03-31 2022-10-06
WO2023157713A1 (ja) * 2022-02-16 2023-08-24 東レ株式会社 樹脂組成物、遮光膜、遮光膜の製造方法および隔壁付き基板、表示装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010164965A (ja) * 2008-12-19 2010-07-29 Mitsubishi Chemicals Corp カラーフィルタ画素形成用組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
JP2012022337A (ja) * 2011-10-03 2012-02-02 Fujifilm Corp 離画壁及びその製造方法、カラーフィルタ及びその製造方法並びに液晶表示装置
CN102540711A (zh) * 2010-11-08 2012-07-04 Jsr株式会社 滤色器用着色组合物、滤色器、显示元件以及滤色器用颜料分散液
CN103608704A (zh) * 2011-09-14 2014-02-26 富士胶片株式会社 用于彩色滤光片的着色放射线敏感性组合物、图案形成方法、彩色滤光片及其制备方法以及固态图像传感器
WO2017038339A1 (ja) * 2015-08-31 2017-03-09 富士フイルム株式会社 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
WO2017141723A1 (ja) * 2016-02-19 2017-08-24 富士フイルム株式会社 硬化性組成物、遮光膜、固体撮像装置、および、カラーフィルタ
CN111566561A (zh) * 2018-01-26 2020-08-21 三菱化学株式会社 着色感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明

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JP4913750B2 (ja) * 2005-11-21 2012-04-11 富士フイルム株式会社 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
TW201329635A (zh) 2011-11-11 2013-07-16 Asahi Glass Co Ltd 負型感光性樹脂組成物、隔壁、黑色矩陣及光學元件
JP2013249417A (ja) * 2012-06-01 2013-12-12 Fujifilm Corp 分散組成物、並びに、これを用いた、重合性組成物、遮光性カラーフィルタ、固体撮像素子、液晶表示装置、ウエハレベルレンズ、及び、撮像ユニット
JP6260581B2 (ja) * 2014-12-23 2018-01-17 ベーイプシロンカー−シェミー ゲーエムベーハーＢＹＫ−Ｃｈｅｍｉｅ ＧｍｂＨ 水溶性顔料親和性基と一緒に分散剤を含む着色料組成物
US20170260823A1 (en) * 2015-04-06 2017-09-14 Halliburton Energy Services, Inc. Compliant slip assembly for securing well tools in a tubing string
CN108027561B (zh) 2015-09-30 2021-10-08 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法
JP6992424B2 (ja) 2017-11-10 2022-01-13 Dic株式会社 インク組成物、光変換層及びカラーフィルタ

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010164965A (ja) * 2008-12-19 2010-07-29 Mitsubishi Chemicals Corp カラーフィルタ画素形成用組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
CN102540711A (zh) * 2010-11-08 2012-07-04 Jsr株式会社 滤色器用着色组合物、滤色器、显示元件以及滤色器用颜料分散液
CN103608704A (zh) * 2011-09-14 2014-02-26 富士胶片株式会社 用于彩色滤光片的着色放射线敏感性组合物、图案形成方法、彩色滤光片及其制备方法以及固态图像传感器
JP2012022337A (ja) * 2011-10-03 2012-02-02 Fujifilm Corp 離画壁及びその製造方法、カラーフィルタ及びその製造方法並びに液晶表示装置
WO2017038339A1 (ja) * 2015-08-31 2017-03-09 富士フイルム株式会社 着色層の製造方法、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
WO2017141723A1 (ja) * 2016-02-19 2017-08-24 富士フイルム株式会社 硬化性組成物、遮光膜、固体撮像装置、および、カラーフィルタ
CN111566561A (zh) * 2018-01-26 2020-08-21 三菱化学株式会社 着色感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明

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Publication number Publication date
KR102511654B1 (ko) 2023-03-17
TW202104304A (zh) 2021-02-01
JP2021120756A (ja) 2021-08-19
JP6885518B1 (ja) 2021-06-16
TWI826695B (zh) 2023-12-21
JP7201019B2 (ja) 2023-01-10
JPWO2021014759A1 (ja) 2021-09-13
KR20220038589A (ko) 2022-03-29
KR20230038602A (ko) 2023-03-20
WO2021014759A1 (ja) 2021-01-28

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