CN113784776A - 气体处理方法和气体处理装置 - Google Patents
气体处理方法和气体处理装置 Download PDFInfo
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- CN113784776A CN113784776A CN202080032955.9A CN202080032955A CN113784776A CN 113784776 A CN113784776 A CN 113784776A CN 202080032955 A CN202080032955 A CN 202080032955A CN 113784776 A CN113784776 A CN 113784776A
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- gas
- bromofluoroethylene
- adsorbent
- bromo
- fluoroethylene
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- 238000012545 processing Methods 0.000 title claims description 13
- 238000003672 processing method Methods 0.000 title description 4
- LNKSRHHQKNUTLI-UHFFFAOYSA-N 1-bromo-1-fluoroethene Chemical group FC(Br)=C LNKSRHHQKNUTLI-UHFFFAOYSA-N 0.000 claims abstract description 82
- 239000003463 adsorbent Substances 0.000 claims abstract description 67
- 239000011148 porous material Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000007789 gas Substances 0.000 claims description 146
- 238000001179 sorption measurement Methods 0.000 claims description 71
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 20
- 239000011261 inert gas Substances 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 239000010457 zeolite Substances 0.000 claims description 7
- JNODEIRSLUOUMY-OWOJBTEDSA-N (e)-1-bromo-2-fluoroethene Chemical group F\C=C\Br JNODEIRSLUOUMY-OWOJBTEDSA-N 0.000 claims description 6
- JNODEIRSLUOUMY-UPHRSURJSA-N (z)-1-bromo-2-fluoroethene Chemical group F\C=C/Br JNODEIRSLUOUMY-UPHRSURJSA-N 0.000 claims description 6
- 229910021536 Zeolite Inorganic materials 0.000 claims description 6
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- YQPBMUIOKYTYDS-UPHRSURJSA-N (e)-1-bromo-1,2-difluoroethene Chemical group F\C=C(/F)Br YQPBMUIOKYTYDS-UPHRSURJSA-N 0.000 claims description 4
- YQPBMUIOKYTYDS-OWOJBTEDSA-N (z)-1-bromo-1,2-difluoroethene Chemical group F\C=C(\F)Br YQPBMUIOKYTYDS-OWOJBTEDSA-N 0.000 claims description 4
- -1 bromotrifluoroethylene, 1-bromo-2, 2-difluoroethylene Chemical group 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052743 krypton Inorganic materials 0.000 claims description 4
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052754 neon Inorganic materials 0.000 claims description 4
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 4
- SVTXQCIMTFGPTM-UHFFFAOYSA-N (Z)-1,2-dibromo-1-fluoroethene Chemical group FC(Br)=CBr SVTXQCIMTFGPTM-UHFFFAOYSA-N 0.000 claims description 3
- SVTXQCIMTFGPTM-UPHRSURJSA-N (e)-1,2-dibromo-1-fluoroethene Chemical group F\C(Br)=C/Br SVTXQCIMTFGPTM-UPHRSURJSA-N 0.000 claims description 3
- GXDSTINOBUJMCU-UHFFFAOYSA-N 1,1,2-tribromo-2-fluoroethene Chemical group FC(Br)=C(Br)Br GXDSTINOBUJMCU-UHFFFAOYSA-N 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 2
- AYCANDRGVPTASA-UHFFFAOYSA-N 1-bromo-1,2,2-trifluoroethene Chemical group FC(F)=C(F)Br AYCANDRGVPTASA-UHFFFAOYSA-N 0.000 description 36
- 239000002808 molecular sieve Substances 0.000 description 27
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 27
- VSZURNDHYWQPTO-UHFFFAOYSA-N 2-bromo-1,1,3,3,3-pentafluoroprop-1-ene Chemical compound FC(F)=C(Br)C(F)(F)F VSZURNDHYWQPTO-UHFFFAOYSA-N 0.000 description 10
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 10
- 239000003245 coal Substances 0.000 description 9
- JNODEIRSLUOUMY-UHFFFAOYSA-N 1-bromo-2-fluoroethene Chemical group FC=CBr JNODEIRSLUOUMY-UHFFFAOYSA-N 0.000 description 8
- QZGNGBWAMYFUST-UHFFFAOYSA-N 2-bromo-1,1-difluoroethene Chemical group FC(F)=CBr QZGNGBWAMYFUST-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 239000000741 silica gel Substances 0.000 description 4
- 229910002027 silica gel Inorganic materials 0.000 description 4
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 4
- 235000013162 Cocos nucifera Nutrition 0.000 description 3
- 244000060011 Cocos nucifera Species 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000010792 warming Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- ZJCFOZHHYJVNNP-UHFFFAOYSA-N F[C]Br Chemical compound F[C]Br ZJCFOZHHYJVNNP-UHFFFAOYSA-N 0.000 description 1
- QJSJCMLYVXTUOF-UHFFFAOYSA-N [F].C=C.[Br] Chemical group [F].C=C.[Br] QJSJCMLYVXTUOF-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910001657 ferrierite group Inorganic materials 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910000154 gallium phosphate Inorganic materials 0.000 description 1
- LWFNJDOYCSNXDO-UHFFFAOYSA-K gallium;phosphate Chemical compound [Ga+3].[O-]P([O-])([O-])=O LWFNJDOYCSNXDO-UHFFFAOYSA-K 0.000 description 1
- 231100000086 high toxicity Toxicity 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052680 mordenite Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Abstract
本发明提供一种能有效去除溴氟乙烯的气体处理方法和气体处理装置。通过使含有溴氟乙烯的气体,在0℃以上且低于120℃的温度环境下接触具有平均细孔径0.4nm以上4nm以下的细孔的吸附剂(7),使溴氟乙烯吸附于吸附剂(7),而从前述气体中分离溴氟乙烯。
Description
技术领域
本发明涉及一种气体处理方法和气体处理装置。
背景技术
在半导体的制造步骤中,作为干蚀刻装置的蚀刻气体或CVD装置的腔室清洁气体等,使用四氟化碳、六氟乙烷等全氟碳化物。这些全氟碳化物为极为稳定的化合物且对地球温室化的影响较大,所以释放至大气时有对环境造成不良影响的风险。因此,从半导体的制造步骤中排出的废气以将所含的全氟碳化物回收或分解后再释放至大气中为宜。
在专利文献1中,作为上述全氟碳化物的替代物的环境负荷较小的等离子体蚀刻气体,其公开了一种含有具有双键的溴氟碳化物(溴氟烯)的等离子体蚀刻气体。溴氟烯其与四氟化碳、六氟乙烷等不具有双键的全氟碳化物相比对地球温室化的影响较小,但并非小到可予以忽视。而且,溴氟烯其毒性较高,直接释放至大气时会对人体及环境造成不良影响,因此,由半导体的制造步骤中排出的废气必需将所含溴氟烯回收或分解后,再释放至大气中。
作为溴氟烯的处理方法,例如专利文献2中提出一种使碳原子数3或4的溴氟烯吸附于沸石的方法。
[现有技术文献]
[专利文献]
[专利文献1]国际公开第2012/124726号
[专利文献2]日本专利公开公报2017年第47338号
发明内容
[发明所要解决的课题]
然而,目前仍未发现能有效去除碳原子数2的溴氟烯(溴氟乙烯)的方法。
本发明以提供一种能有效去除溴氟乙烯的气体处理方法和气体处理装置为课题。
[解决课题的手段]
为解决前述课题,本发明一方案如以下[1]~[9]所述。
[1].一种气体处理方法,其通过使含有溴氟乙烯的气体在0℃以上且低于120℃的温度环境下接触具有平均细孔径为0.4nm以上且4nm以下的细孔的吸附剂,使所述溴氟乙烯吸附于所述吸附剂,而从所述气体中分离所述溴氟乙烯。
[2].如[1]所述的气体处理方法,所述溴氟乙烯为溴三氟乙烯、1-溴-2,2-二氟乙烯、(E)-1-溴-1,2-二氟乙烯、(Z)-1-溴-1,2-二氟乙烯、1-溴-1-氟乙烯、(E)-1-溴-2-氟乙烯、(Z)-1-溴-2-氟乙烯、1,1-二溴-2-氟乙烯、(E)-1,2-二溴-2-氟乙烯、(Z)-1,2-二溴-2-氟乙烯和三溴氟乙烯中的至少1种。
[3].如[1]或[2]所述的气体处理方法,所述含有溴氟乙烯的气体为所述溴氟乙烯与非活性气体的混合气体。
[4].如[3]所述的气体处理方法,所述非活性气体为氮气、氦气、氩气、氖气和氪气中的至少1种。
[5].如[1]~[4]中任一项所述的气体处理方法,所述含有溴氟乙烯的气体中的所述溴氟乙烯的含有率低于25体积%。
[6].如[1]~[5]中任一项所述的气体处理方法,所述吸附剂为沸石和活性碳中的至少一者。
[7].如[1]~[6]中任一项所述的气体处理方法,所述温度环境为0℃以上且100℃以下。
[8].如[1]~[6]中任一项所述的气体处理方法,所述温度环境为0℃以上且70℃以下。
[9].一种气体处理装置,其具备收纳有具有平均细孔径为0.4nm以上且4nm以下的细孔的吸附剂的吸附处理容器,
所述吸附处理容器具有供给口及排出口,
从所述供给口向所述吸附处理容器内供给含有溴氟乙烯的气体,
将对所述含有溴氟乙烯的气体实施采用所述吸附剂的吸附处理而得的处理过的气体从所述吸附处理容器内通过所述排出口排到外部。
[发明效果]
根据本发明,可有效去除溴氟乙烯。
附图说明
图1为说明本发明一实施方式的气体处理装置的结构的示意图。
具体实施方式
以下就本发明一实施方式加以说明。此外,本实施方式表示本发明的一例,本发明不受限于本实施方式。此外,对于本实施方式可施加各种变更或改良,且施加各种变更或改良的形态也可包含在本发明中。
本实施方式的气体处理装置1具备收纳有具有平均细孔径0.4nm以上4nm以下的细孔的吸附剂7的吸附塔6(相当于本发明的构成要件的“吸附处理容器”)。此吸附塔6具有供给口4及排出口5,从所述供给口4向吸附塔6内供给含有溴氟乙烯的气体,将对含有溴氟乙烯的气体实施采用吸附剂7的吸附处理而得的处理过的气体从吸附塔6内通过所述排出口5排到外部。
进而,本实施方式的气体处理装置1具备:供给溴氟乙烯气体的溴氟乙烯气体供给机构2、供给非活性气体的非活性气体供给机构3、及进行傅立叶变换红外线光谱分析的傅立叶变换红外线光谱仪8。
溴氟乙烯气体供给机构2与吸附塔6的供给口4通过配管连接,从溴氟乙烯气体供给机构2传送的溴氟乙烯气体由供给口4供给至吸附塔6的内部,在0℃以上且低于120℃的温度环境下实施采用吸附剂7的吸附处理。
由供给口4供给至吸附塔6的内部的气体可为仅由溴氟乙烯构成的溴氟乙烯气体,也可为溴氟乙烯气体与其他气体的混合气体。其他气体不特别限定,可举出例如非活性气体。也即,可如图1所示,使从溴氟乙烯气体供给机构2延伸的配管与从非活性气体供给机构3延伸的配管汇流,并使汇流的配管连接于吸附塔6的供给口4。
若为此种构成,则从溴氟乙烯气体供给机构2传送的溴氟乙烯气体与从非活性气体供给机构3传送的非活性气体在汇流的配管内混合而形成混合气体,混合气体便由供给口4供给至吸附塔6的内部。以下有时将仅由溴氟乙烯构成的溴氟乙烯气体、及溴氟乙烯气体与其他气体的混合气体记载为“含溴氟乙烯的气体”。
供给至吸附塔6的内部的含溴氟乙烯的气体,在0℃以上且低于120℃的温度环境下与吸附剂7接触,实施采用吸附剂7的吸附处理。也即,由于含溴氟乙烯的气体中的溴氟乙烯吸附于吸附剂7,含溴氟乙烯的气体即分离成溴氟乙烯与其他气体。
实施采用吸附剂7的吸附处理而得的处理过的气体,即经分离的其他气体经由排出口5从吸附塔6内向外部排出。由于排出口5与傅立叶变换红外线光谱仪8通过配管连接,处理过的气体便供给至傅立叶变换红外线光谱仪8。
在傅立叶变换红外线光谱仪8中,对处理过的气体进行傅立叶变换红外线光谱分析,且进行处理过的气体中所含有的溴氟乙烯的定量分析或定性分析。
傅立叶变换红外线光谱仪8连接有废弃用配管9,傅立叶变换红外线光谱分析完成后的处理过的气体经由废弃用配管9向系统外排出。
若采用本实施方式的气体处理装置1,无需繁琐的操作即能以温和的条件有效去除溴氟乙烯。
以下就本实施方式的气体处理装置1与本实施方式的气体处理方法进一步详细加以说明。
[溴氟乙烯]
溴氟乙烯指分子内具有氟原子与溴原子的碳原子数2的不饱和烃。
溴氟乙烯的具体例可举出溴三氟乙烯、1-溴-2,2-二氟乙烯、(E)-1-溴-1,2-二氟乙烯、(Z)-1-溴-1,2-二氟乙烯、1-溴-1-氟乙烯、(E)-1-溴-2-氟乙烯、(Z)-1-溴-2-氟乙烯、1,1-二溴-2-氟乙烯、(E)-1,2-二溴-2-氟乙烯、(Z)-1,2-二溴-2-氟乙烯、三溴氟乙烯等。
这些之中,基于可在常温下容易地气化的观点,优选为溴三氟乙烯、1-溴-2,2-二氟乙烯、(E)-1-溴-1,2-二氟乙烯、(Z)-1-溴-1,2-二氟乙烯、1-溴-1-氟乙烯、(E)-1-溴-2-氟乙烯、(Z)-1-溴-2-氟乙烯。
溴氟乙烯可单独使用1种,也可并用2种以上。
[非活性气体]
非活性气体可举出氮气(N2)、氦(He)、氩(Ar)、氖(Ne)、氪(Kr)、氙(Xe)。这些之中,优选为氮气、氦气、氩气、氖气及氪气,更优选为氮气及氩气。这些非活性气体可单独使用1种,也可并用2种以上。
[吸附剂]
吸附剂的种类只要是具有平均细孔径0.4nm以上4nm以下的细孔则不特别限定,基于经济性或取得容易性观点,优选为活性碳、沸石、硅胶、氧化铝,更优选为沸石及活性碳。
沸石的结构可举出例如T型、毛沸石型、菱沸石型、4A型、5A型、ZSM-5型、LiLSX型、AlPO4-11型、镁碱沸石型、菱钾沸石(offretite)型、丝光沸石型、β型、AlPO4-5型、NaY型、NaX型、CaX型、AlPO4-8型、UTD-1型、VPI-5型、磷酸镓(Cloverite)型、MCM-41型、FSM-16型。沸石当中,基于取得容易性观点,特优选为分子筛4A(例如ユニオン昭和株式会社制)、分子筛5A(例如ユニオン昭和株式会社制)、分子筛13X(例如ユニオン昭和株式会社制)等。
吸附剂所具有的细孔的平均细孔径若为0.4nm以上4nm以下,能有效吸附溴氟乙烯,且吸附的溴氟乙烯不易发生脱附。
吸附剂的形状不特别限定,可为例如纤维状、蜂巢状、圆柱状、丸粒状、破碎状、粒状、粉末状。
[吸附处理的温度]
采用吸附剂7的吸附处理需在0℃以上且低于120℃的温度环境下进行,优选在0℃以上100℃以下的温度环境下,更优选在0℃以上70℃以下的温度环境下进行。
若在上述的温度环境下使含溴氟乙烯的气体与吸附剂7接触而进行吸附处理,则吸附的溴氟乙烯不易从吸附剂7脱附,因此溴氟乙烯的吸附量增加。再者,由于不需要用以控制温度的大型装置,可使气体处理装置1的结构更简单。而且,在吸附塔6内不易发生溴氟乙烯的液化。
[其他吸附条件]
含溴氟乙烯的气体中的溴氟乙烯的含有率(浓度)、含溴氟乙烯的气体的流量、吸附剂7的量、吸附塔6的大小等吸附条件不特别限定,可依据含溴氟乙烯的气体的种类、量等适宜设定。其中,含溴氟乙烯的气体中的溴氟乙烯的含有率(浓度)可定为50体积%以下,优选定为30体积%以下,更优选定为25体积%以下。
[实施例]
以下示出实施例及比较例更详细地说明本发明。
[实施例1]
利用具有与图1所示气体处理装置1同样结构的气体处理装置进行含溴氟乙烯的气体的吸附处理。此气体处理装置具备内径1英寸、长100mm的不锈钢制吸附塔,且此吸附塔中填充有作为吸附剂的28.7g的分子筛13X(ユニオン昭和株式会社制)。
分子筛13X所具有的细孔的平均细孔径为1.0nm。平均细孔径通过BET吸附法来测定。测定条件如下:
测定仪器:日机装株式会社制BELSORP-max
吸附物质:氮气
测定温度:-196℃
吸附剂的前处理:在真空条件下以300℃加热干燥6h
吸附剂的用量:0.10g。
以流量50mL/min将溴三氟乙烯与干燥氮气的混合气体(混合气体中的溴三氟乙烯的含有率为20体积%)供给至吸附塔,进行吸附处理。此外,吸附处理中将吸附塔内的温度(具体为吸附剂的表面温度)维持在30.0~40.0℃。
利用傅立叶变换红外线光谱仪测定从吸附塔的排出口排出的处理过的气体中的溴三氟乙烯的浓度。其结果,从混合气体刚开始供给时至供给30分钟时的溴三氟乙烯的浓度为206.35~273.81体积ppm(参照下述表1)。也即,吸附剂使用分子筛13X时,有99.86~99.90%的溴三氟乙烯被吸附剂吸附。
表1
[实施例2]
除吸附剂使用椰壳活性碳(大阪ガスケミカル株式会社制)来替代分子筛13X以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。椰壳活性碳所具有的细孔的平均细孔径为2.5nm。其结果,从刚开始供给混合气体时至供给30分钟时的溴三氟乙烯的浓度为27.78~436.51体积ppm(参照下述表2)。也即,吸附剂使用椰壳活性碳时,有99.78~99.99%的溴三氟乙烯被吸附剂吸附。
表2
[实施例3]
除吸附剂使用煤系活性碳(大阪ガスケミカル株式会社制)来替代分子筛13X以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。煤系活性碳所具有的细孔的平均细孔径为3.4nm。其结果,从刚开始供给混合气体时至供给30分钟时的溴三氟乙烯的浓度为23.81~369.05体积ppm(参照下述表3)。也即,吸附剂使用煤系活性碳时,有99.82~99.99%的溴三氟乙烯被吸附剂吸附。
表3
[实施例4]
除吸附剂使用分子筛5A(ユニオン昭和株式会社制)来替代分子筛13X以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。分子筛5A所具有的细孔的平均细孔径为0.5nm。
其结果,刚开始供给混合气体时的溴三氟乙烯的浓度为630.95体积ppm,混合气体供给开始5分钟时的溴三氟乙烯的浓度为5507.94体积ppm(参照下述表4)。分析吸附效率降低的原因为吸附剂发生吸附转效所致。也即,吸附剂使用分子筛5A时,与分子筛13X及上述活性碳相比吸附容量虽较差,但仍有97%以上的溴三氟乙烯被吸附。
表4
[实施例5]
除将吸附塔内的温度设为60~70℃以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。其结果,混合气体开始供给15分钟后的溴三氟乙烯的浓度为503.97体积ppm、20分钟后的溴三氟乙烯的浓度为2222.22体积ppm(参照下述表5)。
与实施例1相比吸附容量降低的原因,分析是因吸附剂被加温,而促进溴三氟乙烯的脱附的原因。然而,纵为本条件,仍有98%以上的溴三氟乙烯被吸附。
表5
[实施例6]
除将吸附塔内的温度设为0~5℃以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的溴三氟乙烯的浓度为19.84~206.35体积ppm(参照下述表6)。与实施例1相比吸附容量提升的原因,分析是通过将吸附剂冷却,而抑制溴三氟乙烯的脱附的原因。
表6
[实施例7]
除含溴氟乙烯的气体使用1-溴-1-氟乙烯与干燥氮气的混合气体(混合气体中的1-溴-1-氟乙烯的含有率为20体积%)以外以与实施例1同样的方式进行1-溴-1-氟乙烯的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的1-溴-1-氟乙烯的浓度为178.57~202.38体积ppm(参照下述表7)。也即,吸附剂使用分子筛13X时,有99.90~99.91%的1-溴-1-氟乙烯被吸附剂。
表7
[实施例8]
除吸附剂使用煤系活性碳(大阪ガスケミカル株式会社制)来替代分子筛13X以外以与实施例7同样的方式进行1-溴-1-氟乙烯的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的1-溴-1-氟乙烯的浓度为23.81~206.35体积ppm(参照下述表8)。也即,吸附剂使用煤系活性碳时,有99.90~99.99%的1-溴-1-氟乙烯被吸附剂吸附。
表8
[实施例9]
除含溴氟乙烯的气体使用1-溴-2-氟乙烯((E)-1-溴-2-氟乙烯与(Z)-1-溴-2-氟乙烯以等摩尔量混合而成的)与干燥氮气的混合气体(混合气体中的1-溴-2-氟乙烯的含有率为20体积%)以外以与实施例1同样的方式进行1-溴-2-氟乙烯的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的1-溴-2-氟乙烯的浓度为162.70~285.71ppm(参照下述表9)。也即,吸附剂使用分子筛13X时,有99.86~99.92%的1-溴-2-氟乙烯被吸附剂吸附。
表9
[实施例10]
除吸附剂使用煤系活性碳(大阪ガスケミカル株式会社制)来替代分子筛13X以外以与实施例9同样的方式进行1-溴-2-氟乙烯((E)-1-溴-2-氟乙烯与(Z)-1-溴-2-氟乙烯以等摩尔量混合而成的)的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的1-溴-2-氟乙烯的浓度为19.84~166.67体积ppm(参照下述表10)。也即,吸附剂使用煤系活性碳时,有99.92~99.99%的1-溴-2-氟乙烯被吸附剂吸附。
表10
[实施例11]
除含溴氟乙烯的气体使用1-溴-2,2-二氟乙烯与干燥氮气的混合气体(混合气体中的1-溴-2,2-二氟乙烯的含有率为20体积%)以外以与实施例1同样的方式进行1-溴-2,2-二氟乙烯的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的1-溴-2,2-二氟乙烯的浓度为150.79~246.03体积ppm(参照下述表11)。也即,吸附剂使用分子筛13X时,有99.88~99.92%的1-溴-2,2-二氟乙烯被吸附剂吸附。
表11
[实施例12]
除吸附剂使用煤系活性碳(大阪ガスケミカル株式会社制)来替代分子筛13X以外以与实施例11同样的方式进行1-溴-2,2-二氟乙烯的吸附处理。其结果,从刚开始供给混合气体时至供给30分钟时的1-溴-2,2-二氟乙烯的浓度为23.81~206.35体积ppm(参照下述表12)。也即,吸附剂使用煤系活性碳时,有99.90~99.99%%的1-溴-2,2-二氟乙烯被吸附剂吸附。
表12
[比较例1]
除吸附剂使用B型硅胶(丰田化工株式会社制)来替代分子筛13X以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。B型硅胶所具有的细孔的平均细孔径为6.0nm。其结果,在开始供给混合气体起2分钟以内,检测出浓度超过定量测定极限(8000ppm)的溴三氟乙烯。也即,吸附剂使用B型硅胶时,无法吸附溴三氟乙烯。
[比较例2]
除吸附剂使用分子筛3A(ユニオン昭和株式会社制)来替代分子筛13X以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。分子筛3A所具有的细孔的平均细孔径为0.3nm。其结果,从刚开始供给混合气体时,就检测出浓度超过定量测定极限(8000ppm)的溴三氟乙烯。也即,吸附剂使用分子筛3A时,无法吸附溴三氟乙烯。
[比较例3]
除吸附剂使用γ-氧化铝(高纯度化学研究所制)来替代分子筛13X以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。γ-氧化铝所具有的细孔的平均细孔径为8.5nm。其结果,从刚开始供给混合气体时,就检测出浓度超过定量测定极限(8000ppm)的溴三氟乙烯。也即,吸附剂使用γ-氧化铝时,无法吸附溴三氟乙烯。
[比较例4]
除将吸附塔内的温度设为120℃以外以与实施例1同样的方式进行溴三氟乙烯的吸附处理。其结果,从刚开始供给混合气体时,就检测出浓度超过定量测定极限(8000ppm)的溴三氟乙烯。也即,吸附塔内的温度为120℃以上的高温时,无法吸附溴三氟乙烯。
[比较例5]
除处理气体使用2-溴-1,1,3,3,3-五氟丙烯与干燥氮气的混合气体(混合气体中的2-溴-1,1,3,3,3-五氟丙烯的含有率为20体积%)以外以与实施例4同样的方式进行2-溴-1,1,3,3,3-五氟丙烯的吸附处理。其结果,从刚开始供给混合气体时,就检测出浓度超过定量测定极限(8000ppm)的2-溴-1,1,3,3,3-五氟丙烯。也即,吸附剂使用分子筛5A时,无法吸附2-溴-1,1,3,3,3-五氟丙烯。
[比较例6]
除处理气体使用2-溴-1,1,3,3,3-五氟丙烯与干燥氮气的混合气体(混合气体中的2-溴-1,1,3,3,3-五氟丙烯的含有率为20体积%)以外以与实施例1同样的方式进行2-溴-1,1,3,3,3-五氟丙烯的吸附处理。其结果,开始供给混合气体10分钟后,即检测出浓度超过定量测定极限(8000ppm)的2-溴-1,1,3,3,3-五氟丙烯。也即,吸附剂使用分子筛13X时,得到2-溴-1,1,3,3,3-五氟丙烯的吸附量比溴三氟乙烯的吸附量差的结果。
附图符号说明
1:气体处理装置
2:溴氟乙烯气体供给机构
3:非活性气体供给机构
4:供给口
5:排出口
6:吸附塔
7:吸附剂
8:傅立叶变换红外线光谱仪
9:废弃用配管
Claims (9)
1.一种气体处理方法,其通过使含有溴氟乙烯的气体在0℃以上且低于120℃的温度环境下接触具有平均细孔径为0.4nm以上且4nm以下的细孔的吸附剂,使所述溴氟乙烯吸附于所述吸附剂,而从所述气体中分离所述溴氟乙烯。
2.如权利要求1所述的气体处理方法,所述溴氟乙烯为溴三氟乙烯、1-溴-2,2-二氟乙烯、(E)-1-溴-1,2-二氟乙烯、(Z)-1-溴-1,2-二氟乙烯、1-溴-1-氟乙烯、(E)-1-溴-2-氟乙烯、(Z)-1-溴-2-氟乙烯、1,1-二溴-2-氟乙烯、(E)-1,2-二溴-2-氟乙烯、(Z)-1,2-二溴-2-氟乙烯和三溴氟乙烯中的至少1种。
3.如权利要求1或2所述的气体处理方法,所述含有溴氟乙烯的气体为所述溴氟乙烯与非活性气体的混合气体。
4.如权利要求3所述的气体处理方法,所述非活性气体为氮气、氦气、氩气、氖气和氪气中的至少1种。
5.如权利要求1~4中任一项所述的气体处理方法,所述含有溴氟乙烯的气体中的所述溴氟乙烯的含有率低于25体积%。
6.如权利要求1~5中任一项所述的气体处理方法,所述吸附剂为沸石和活性碳中的至少一者。
7.如权利要求1~6中任一项所述的气体处理方法,所述温度环境为0℃以上且100℃以下。
8.如权利要求1~6中任一项所述的气体处理方法,所述温度环境为0℃以上且70℃以下。
9.一种气体处理装置,其具备收纳有具有平均细孔径为0.4nm以上且4nm以下的细孔的吸附剂的吸附处理容器,
所述吸附处理容器具有供给口及排出口,
从所述供给口向所述吸附处理容器内供给含有溴氟乙烯的气体,将对所述含有溴氟乙烯的气体实施采用所述吸附剂的吸附处理而得的处理过的气体从所述吸附处理容器内通过所述排出口排到外部。
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Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0284227A2 (en) * | 1987-03-04 | 1988-09-28 | Praxair Canada Inc. | Apparatus and process for the recovery of halogenated hydrocarbons in a gas stream |
US4820318A (en) * | 1987-12-24 | 1989-04-11 | Allied-Signal Inc. | Removal of organic compounds from gas streams using carbon molecular sieves |
CN1561318A (zh) * | 2000-04-28 | 2005-01-05 | 昭和电工株式会社 | 提纯四氟甲烷的方法及其应用 |
US20070028771A1 (en) * | 2005-08-03 | 2007-02-08 | Ji-Young Shin | Adsorption apparatus, semiconductor device manufacturing facility comprising the same, and method of recycling perfulorocompounds |
WO2009031467A1 (ja) * | 2007-09-07 | 2009-03-12 | Kuraray Chemical Co., Ltd. | 吸着材及びその製造方法、並びにキャニスタ及びその使用方法 |
CN101479220A (zh) * | 2006-06-30 | 2009-07-08 | 昭和电工株式会社 | 高纯度六氟丙烯的制造方法及清洗气 |
US20090249953A1 (en) * | 2008-03-26 | 2009-10-08 | Matheson Tri-Gas | Purification of fluorine containing gases and systems and materials thereof |
US20120222556A1 (en) * | 2009-09-01 | 2012-09-06 | Blue-Zone Technologies Ltd. | Systems and methods for gas treatment |
TW201416123A (zh) * | 2012-10-31 | 2014-05-01 | China Steel Corp | 組合式除臭模組及其應用 |
CN105829659A (zh) * | 2013-12-20 | 2016-08-03 | 3M创新有限公司 | 作为工作流体的氟化烯烃及其使用方法 |
JP2017047338A (ja) * | 2015-08-31 | 2017-03-09 | 宇部興産株式会社 | ブロモフルオロアルケン含有ガスの処理方法及びブロモフルオロアルケン含有ガスの処理装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4471448B2 (ja) * | 2000-04-28 | 2010-06-02 | 昭和電工株式会社 | テトラフルオロメタンの精製方法及びその用途 |
US9368363B2 (en) | 2011-03-17 | 2016-06-14 | Zeon Corporation | Etching gas and etching method |
EP4043421A1 (en) * | 2014-02-20 | 2022-08-17 | Agc Inc. | Method for purifying fluid that includes trifluoroethylene, and method for producing trifluoroethylene |
JP2017047387A (ja) * | 2015-09-03 | 2017-03-09 | 日新製鋼株式会社 | 硬化膜の製造方法 |
JP7310608B2 (ja) * | 2017-11-02 | 2023-07-19 | 株式会社レゾナック | エッチング方法及び半導体の製造方法 |
-
2020
- 2020-07-16 SG SG11202112211VA patent/SG11202112211VA/en unknown
- 2020-07-16 WO PCT/JP2020/027717 patent/WO2021024746A1/ja unknown
- 2020-07-16 JP JP2021537659A patent/JPWO2021024746A1/ja active Pending
- 2020-07-16 CN CN202080032955.9A patent/CN113784776B/zh active Active
- 2020-07-16 KR KR1020217035901A patent/KR102644490B1/ko active IP Right Grant
- 2020-07-16 EP EP20849694.3A patent/EP4011833A4/en active Pending
- 2020-07-28 TW TW109125368A patent/TWI771722B/zh active
-
2021
- 2021-11-01 IL IL287766A patent/IL287766A/en unknown
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0284227A2 (en) * | 1987-03-04 | 1988-09-28 | Praxair Canada Inc. | Apparatus and process for the recovery of halogenated hydrocarbons in a gas stream |
CN88101700A (zh) * | 1987-03-04 | 1988-10-05 | 联合碳化加拿大公司 | 从气体流中回收卤代烃的方法 |
US4820318A (en) * | 1987-12-24 | 1989-04-11 | Allied-Signal Inc. | Removal of organic compounds from gas streams using carbon molecular sieves |
CN1561318A (zh) * | 2000-04-28 | 2005-01-05 | 昭和电工株式会社 | 提纯四氟甲烷的方法及其应用 |
US20070028771A1 (en) * | 2005-08-03 | 2007-02-08 | Ji-Young Shin | Adsorption apparatus, semiconductor device manufacturing facility comprising the same, and method of recycling perfulorocompounds |
CN101479220A (zh) * | 2006-06-30 | 2009-07-08 | 昭和电工株式会社 | 高纯度六氟丙烯的制造方法及清洗气 |
WO2009031467A1 (ja) * | 2007-09-07 | 2009-03-12 | Kuraray Chemical Co., Ltd. | 吸着材及びその製造方法、並びにキャニスタ及びその使用方法 |
US20090249953A1 (en) * | 2008-03-26 | 2009-10-08 | Matheson Tri-Gas | Purification of fluorine containing gases and systems and materials thereof |
US20120222556A1 (en) * | 2009-09-01 | 2012-09-06 | Blue-Zone Technologies Ltd. | Systems and methods for gas treatment |
TW201416123A (zh) * | 2012-10-31 | 2014-05-01 | China Steel Corp | 組合式除臭模組及其應用 |
CN105829659A (zh) * | 2013-12-20 | 2016-08-03 | 3M创新有限公司 | 作为工作流体的氟化烯烃及其使用方法 |
JP2017047338A (ja) * | 2015-08-31 | 2017-03-09 | 宇部興産株式会社 | ブロモフルオロアルケン含有ガスの処理方法及びブロモフルオロアルケン含有ガスの処理装置 |
Non-Patent Citations (1)
Title |
---|
赵莹;崔秉鸿;赵军;: "13X沸石分子筛的改性并用于脱除空气中微量乙烯的研究", 山东化工, no. 02 * |
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