CN113526960B - 一种碳化硅陶瓷及其热等静压烧结工艺 - Google Patents

一种碳化硅陶瓷及其热等静压烧结工艺 Download PDF

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CN113526960B
CN113526960B CN202110817939.7A CN202110817939A CN113526960B CN 113526960 B CN113526960 B CN 113526960B CN 202110817939 A CN202110817939 A CN 202110817939A CN 113526960 B CN113526960 B CN 113526960B
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silicon carbide
carbide
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李少峰
李平
叶传剑
励佳栋
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Ningbo Donglian Mechanical Seal Co ltd
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Abstract

本发明提供了一种碳化硅陶瓷,该碳化硅陶瓷的原料包括以下重量份数组分:碳化硅:45~96.8份;硼化钙:1~15份;碳化铝功能梯度材料:1~15份;金属单质:1~20份;碳化硼:0.1~3份;碳:0.1~2份。硼化钙可以提高材料的致密性,且也是一种很好的增强补韧材料,碳化铝功能梯度材料是一种优异的碳化硅陶瓷的增强补韧材料,而金属单质不仅自身具有良好的延展性,还可以与组织中的残留碳源反应生成相应的硬质碳化物相,起到增韧补强作用,碳化硼和碳作为碳化硅陶瓷的烧结助剂,有利于促进烧结致密化。

Description

一种碳化硅陶瓷及其热等静压烧结工艺
技术领域
本发明属于陶瓷技术领域,涉及一种碳化硅陶瓷及其热等静压烧结工艺。
背景技术
碳化硅具有密度小、硬度高、弹性模量优、耐腐蚀及耐热冲击等一系列优异的性能,使其广泛应用于机械密封件、耐磨材料、航天航空及装甲防弹等众多领域。碳化硅的共价键比例高达88%,因此,在常规条件下很难烧结致密。碳化硅陶瓷材料常用的烧结技术主要有无压烧结(常压烧结)工艺和热压烧结工艺。无压烧结工艺分为固相烧结和液相烧结,无压固相烧结有很明显的缺陷:如制品需要很高的烧结温度、晶粒容易长大、性能较低等。无压液相烧结工艺需要添加在较低温度下形成低共熔点组分的物质 (如氧化铝和氧化钇等),而添加的氧化物会与碳化硅材料发生反应,生成挥发性的气体,不仅增加了失重比例,还不利于材料的致密化。而热等静压烧结技术(HIP)是一种在加热过程中,以惰性气体氮气或氩气作为压力传递介质,使材料(粉末状、素坯或者烧结体)经受各向均衡压力,在高温高压的协同作用下烧结致密的工艺。该技术可在较低的温度和较短保温时间内制备出各向同性、微观结构均匀、细小且致密度高的产品。一般按照工艺过程分为两种:(1)由粉料经过成型工艺制作成素坯或者经过烧结工艺的烧结体,再经HIP工艺处理;(2)包套HIP,即陶瓷粉末利用包套包封后直接进行HIP工艺。
发明内容
本发明提供了一种碳化硅陶瓷及其热等静压烧结工艺,通过碳化硅陶瓷各组分:碳化硅、硼化钙、碳化铝功能梯度材料、金属单质、碳化硼、碳的相互配合,使得碳化硅陶瓷具有金属和陶瓷的优异性能,提高碳化硅陶瓷的强度和韧性。
本发明一个方面提供了一种碳化硅陶瓷,制备该碳化硅陶瓷的原料包括以下重量份数组分:
碳化硅:45~96.8份;
硼化钙:1~15份;
碳化铝功能梯度材料:1~15份;
金属单质:1~20份;
碳化硼:0.1~3份;
碳:0.1~2份。
硼化钙可以提高材料的致密性,且也是一种很好的增强补韧材料,碳化铝功能梯度材料是一种优异的碳化硅陶瓷的增强补韧材料,而金属单质不仅自身具有良好的延展性,还可以与组织中的残留碳源反应生成相应的硬质碳化物相,起到增韧补强作用,碳化硼和碳作为碳化硅陶瓷的烧结助剂,有利于促进烧结致密化。
作为优选,碳化铝功能梯度材料由内至外依次为碳化铝、氮化铝和氧化铝。
作为优选,碳化铝功能梯度材料的制备方法包括以下步骤:
S1、将粒度为0.05~0.25mm的碳化铝细粉在氮气流中于 1000~1100℃温度下保温2~4h;
S2、将步骤S1获得的产物于650~750℃温度下保温3~5h,获得由内至外依次为碳化铝、氮化铝和氧化铝的碳化铝功能梯度材料。
碳化铝在1000~1100℃温度的氮气流中发生以下反应:
Al4C3+2N2→4AlN+3C,
保温反应2~4h,部分碳化铝生成氮化铝,而生成的C在 650~750℃温度下保温3~5h下除去,且氮化铝在650~750℃温度下表面氧化生成氧化铝层,最终获得内层为碳化铝、中间层为氮化铝、外层为氧化铝的碳化铝功能梯度材料。
在碳化硅陶瓷中添加碳化铝可有效提高陶瓷的强度和韧性,但是碳化铝在室温下即可与水发生分解反应,而在碳化硅陶瓷制备过程中,碳化铝难免会碰到水,导致碳化铝失效。本发明对碳化铝进行表面改性,可以很好地将碳化铝保护起来,发挥碳化铝作用,且碳化铝表面形成的氮化铝和氧化铝均有利于碳化硅陶瓷性能的提高。
作为优选,所述金属单质为钨、钼、钽和铌中的一种或几种。钨、钼、钽和铌分别与碳源反应生成的的碳化钨、碳化钼、碳化钽和碳化铌为硬质碳化相,有效提高碳化硅陶瓷的强度。
作为优选,所述金属单质为钨和铌的复合物。钨与碳源反应生成的的碳化钨为高硬度碳化相,有利于提高陶瓷的强度,而金属单质铌具有较好的延展性,与碳反应剩下的金属单质铌有利于提高陶瓷的韧性。
作为优选,所述钨和铌的质量比为1:(1.2~1.6)。铌的质量大于钨,以剩余足够的单质铌提高陶瓷韧性。
作为优选,碳与金属单质的摩尔比为1:(1.01~1.05)。金属单质与碳可以生成高硬度碳化相,提高陶瓷的强度,而当碳与金属单质的摩尔比为1:(1.01~1.05)时,有一定数量的金属单质未与碳源反应,剩余的金属单质用以提高陶瓷的韧性。此时,当金属单质为钨和铌的质量比为1:(1.2~1.6)的复合物时,碳化硅陶瓷具有更好的性能。
本发明另一个方面提供了一种碳化硅陶瓷的热等静压烧结工艺,包括以下步骤:
S1、按照质量百分比称取各组分,将碳化硅、硼化钙、碳化硼、碳、粘结剂、分散剂投入球磨机中,加入水,球磨4~6h,然后加入金属单质,继续球磨20~50min;
S2、将步骤S1所得浆料采用离心喷雾干燥塔进行干燥造粒,过30~80目筛;
S3、将碳化铝功能梯度材料与步骤S2的造粒料高速混合均匀,然后装入钢模具中采用干压成型获得素坯;
S4、素坯按照图纸要求进行加工后,放入热等静压烧结炉内,在惰性气体中进行烧结,烧结结束后自然冷却;
S5、烧结后的产品按照要求经过磨加工、研磨抛光,检验合格后包装入库。
本发明的热等静压烧结工艺中,金属单质在最后20~50min 添加,以免球磨时间过长破坏金属颗粒的形状,导致在压制时由于拱桥效应使坯体的致密度降低,从而影响产品的性能。
本发明的碳化铝功能梯度材料与球磨及喷雾造粒后的粒料一起混合,避免了碳化铝功能梯度材料在球磨过程的粒度破坏、梯度结构破坏等不利后果,有效保持碳化铝功能梯度材料结构完整性。
作为优选,步骤S1中,球磨转速为100~500r/min,球磨采用的球磨介质为碳化硅材料球,碳化硅材料球与碳化硅、硼化钙、金属单质、碳化硼、碳、粘结剂和分散剂的总质量比为3~4:1。
作为优选,步骤S1的粘结剂为聚乙烯醇、聚乙二醇、羧甲基纤维素钠、聚乙烯吡咯烷酮、糊精中的一种或多种;步骤S1 的分散剂为四甲基氢氧化铵、聚丙烯酸铵、柠檬酸铵、三乙醇胺中的一种或多种。粘结剂的质量为碳化硅、硼化钙、金属单质、碳化硼、碳总量的0.1~3wt%,分散剂的质量为碳化硅、硼化钙、金属单质、碳化硼、碳总量的0.1~2wt%。球磨过程加入的水,使得浆料的固含量为30~60wt%。
作为优选,步骤S3干压成型中的压力为1-3T/cm2
作为优选,步骤S4中的烧结为:先在1800-1900℃下保温 1~4h,然后升温至1820~1950℃下并加压至1-10MPa,保温1~4h。
与现有技术相比,本发明的有益效果:
1、本发明碳化硅陶瓷原料包括碳化硅、硼化钙、碳化铝功能梯度材料、金属单质、碳化硼、碳,硼化钙可以提高材料的致密性,且也是一种很好的增强补韧材料,碳化铝功能梯度材料可作为碳化硅陶瓷的增强补韧材料,而金属单质不仅自身具有良好的延展性,还可以与组织中的残留碳源反应生成相应的硬质碳化物相,起到增韧补强作用,碳化硼和碳作为碳化硅陶瓷的烧结助剂,有利于促进烧结致密化;
2、本发明采用的碳化铝功能梯度材料内层为碳化铝、中间层为氮化铝、外层为氧化铝,本发明对碳化铝进行表面改性,可以很好地将碳化铝保护起来,发挥碳化铝作用,且碳化铝表面形成的氮化铝和氧化铝均有利于碳化硅陶瓷性能的提高;
3、本发明的碳与金属单质的摩尔比为1:(1.01~1.05),一定数量的金属单质与碳生成高硬度碳化相,提高陶瓷的强度,还有一定数量的金属单质未与碳源反应,剩余的金属单质可以提高陶瓷的韧性。
4、本发明的金属单质为钨和铌的质量比为1:(1.2~1.6)的复合物时,钨与碳源反应生成的的碳化钨为高硬度碳化相,有利于提高陶瓷的强度,而金属单质铌具有较好的延展性,与碳反应剩下的金属单质铌有利于提高陶瓷的韧性,铌的质量大于钨,以剩余足够的单质铌提高陶瓷韧性;
5、本发明的热等静压烧结工艺中,金属单质在最后20~50min 添加,以免球磨时间过长破坏金属颗粒的形状,导致在压制时由于拱桥效应使坯体的致密度降低,从而影响产品的性能;
6、本发明的碳化铝功能梯度材料未与其它原料一起球磨,而是与球磨及喷雾造粒后的粒料一起混合,避免了碳化铝功能梯度材料在球磨过程的粒度破坏、梯度结构破坏等不利后果,有效保持碳化铝功能梯度材料结构完整性。
具体实施方式
下面通过具体实施例,对本发明的技术方案作进一步描述说明,应当理解的是,此处所描述的具体实施例仅用于帮助理解本发明,不用于本发明的具体限制。如果无特殊说明,本发明的实施例中所采用的原料均为本领域常用的原料,实施例中所采用的方法,均为本领域的常规方法。
以下实施例和对比例中,采用的碳化铝功能梯度材料由以下制备方法获得:
S1、将100g粒度为0.05~0.25mm的碳化铝细粉在氮气流(纯度为99.9%,流量为5L/h)中于1050℃温度下保温3h;
S2、将步骤S1获得的产物于700℃温度下保温4h,获得碳化铝功能梯度材料。
实施例1
实施例1的碳化硅陶瓷的原料组分如表1所示。
实施例1的碳化硅陶瓷的热等静压烧结工艺如下所示:
S1、按照表1实施例1的各原料重量份数称取碳化硅、硼化钙、碳化铝功能梯度材料、碳化硼、钨、铌、碳,并称取1份聚乙烯醇和0.5份四甲基氢氧化铵,将碳化硅、硼化钙、碳化硼、碳、聚乙烯醇、四甲基氢氧化铵投入球磨机中,加入碳化硅材料球作为球磨介质,碳化硅材料球的加入量为碳化硅、硼化钙、钨、铌、碳化硼、碳、聚乙烯醇和四甲基氢氧化铵总质量的3倍,然后加入水使得浆料的固含量为40wt%,球磨转速为300r/min,球磨5h后,加入钨和铌,继续球磨30min;
S2、将步骤S1所得浆料采用离心喷雾干燥塔进行干燥造粒,过50目筛;
S3、将碳化铝功能梯度材料与步骤S2的造粒料在1000rpm 下混合10min,然后装入钢模具中采用干压成型(2T/cm2)获得素坯;
S4、素坯按照图纸要求进行加工后,放入热等静压烧结炉内,在氮气气氛中进行烧结,先在1820℃下保温2h,然后升温至 1880℃下并加压至5MPa,保温2h。烧结结束后自然冷却;
S5、烧结后的产品经过磨加工、研磨抛光,检验合格后包装入库。
实施例2
实施例2的碳化硅陶瓷的原料组分如表1所示。
实施例2的碳化硅陶瓷的热等静压烧结工艺如下所示:
S1、按照表1实施例2的各原料重量份数称取碳化硅、硼化钙、碳化铝功能梯度材料、碳化硼、钨、铌、碳,并称取1.5份聚乙二醇和1.0份聚丙烯酸铵,将碳化硅、硼化钙、碳化硼、碳、聚乙二醇、聚丙烯酸铵投入球磨机中,加入碳化硅材料球作为球磨介质,碳化硅材料球的加入量为碳化硅、硼化钙、钨、铌、碳化硼、碳、聚乙二醇和聚丙烯酸铵总质量的3.5倍,然后加入水使得浆料的固含量为35wt%,球磨转速为200r/min,球磨5.5h后,加入钨和铌,继续球磨40min;
S2、将步骤S1所得浆料采用离心喷雾干燥塔进行干燥造粒,过70目筛;
S3、将碳化铝功能梯度材料与步骤S2的造粒料在1200rpm 下混合8min,然后装入钢模具中采用干压成型(3T/cm2)获得素坯;
S4、素坯按照图纸要求进行加工后,放入热等静压烧结炉内,在氮气气氛中进行烧结,先在1840℃下保温3h,然后升温至 1890℃下并加压至6MPa,保温2h。烧结结束后自然冷却;
S5、烧结后的产品经过磨加工、研磨抛光,检验合格后包装入库。
实施例3
实施例3的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
实施例4
实施例4的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
实施例5
实施例5的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
对比例1
对比例1的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
对比例2
对比例2的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
对比例3
对比例3的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
对比例4
对比例4的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺同实施例1。
对比例5
对比例5的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺如下所示:
S1、按照表1对比例5的各原料重量份数称取碳化硅、硼化钙、碳化铝功能梯度材料、碳化硼、钨、铌、碳,并称取1份聚乙烯醇和0.5份四甲基氢氧化铵,将碳化硅、硼化钙、碳化硼、钨、铌、碳、聚乙烯醇、四甲基氢氧化铵投入球磨机中,加入碳化硅材料球作为球磨介质,碳化硅材料球的加入量为碳化硅、硼化钙、钨、铌、碳化硼、碳、聚乙烯醇和四甲基氢氧化铵总质量的3倍,然后加入水使得浆料的固含量为40wt%,球磨转速为300r/min,球磨5.5h;
后续步骤同实施例1。
对比例6
对比例6的碳化硅陶瓷的原料组分如表1所示。其碳化硅陶瓷的热等静压烧结工艺如下所示:
S1、按照表1对比例6的各原料重量份数称取碳化硅、硼化钙、碳化铝功能梯度材料、碳化硼、钨、铌、碳,并称取1份聚乙烯醇和0.5份四甲基氢氧化铵,将碳化硅、硼化钙、碳化铝功能梯度材料、碳化硼、碳、聚乙烯醇、四甲基氢氧化铵投入球磨机中,加入碳化硅材料球作为球磨介质,碳化硅材料球的加入量为碳化硅、硼化钙、碳化铝功能梯度材料、钨、铌、碳化硼、碳、聚乙烯醇和四甲基氢氧化铵总质量的3倍,然后加入水使得浆料的固含量为40wt%,球磨转速为300r/min,球磨5h后,加入钨和铌,继续球磨30min;
S2、将步骤S1所得浆料采用离心喷雾干燥塔进行干燥造粒,过50目筛;
S3、称取步骤S2的造粒料装入钢模具中采用干压成型 (2T/cm2)获得素坯;
后续步骤同实施例1。
表1实施例1-5以及对比例1-6的碳化硅陶瓷
Figure BDA0003170846000000091
Figure BDA0003170846000000101
将实施例1-5以及对比例1-6获得的碳化硅陶瓷进行性能测试,结果如表2所示。
表2实施例1-5以及对比例1-6碳化硅陶瓷性能数据
实施例 维氏硬度(kg/mm<sup>2</sup>) 弯曲强度(MPa) 断裂韧性(MPa·m<sup>1/2</sup>)
实施例1 2650 643 6.2
实施例2 2520 690 6.9
实施例3 2630 622 5.9
实施例4 2610 636 6.1
实施例5 2640 635 6.0
对比例1 2693 479 4.3
对比例2 2652 605 5.9
对比例3 2661 595 5.8
对比例4 2668 562 5.1
对比例5 2550 572 5.5
对比例6 2620 579 5.6
如表2所示,实施例1-2的碳化硅陶瓷具有优异的弯曲强度和韧性,当金属单质并非钨和铌的复合物(如实施例5)时,当钨含量过多铌含量过少(如实施例3)以及钨含量过少铌含量过多(如实施例4)时,表现出碳化硅陶瓷强度和韧性不同程度的降低。对比例5的钨、铌同其它原料一起球磨,导致在压制时由于拱桥效应使坯体的致密度降低,从而影响陶瓷产品的性能。对比例6的碳化铝功能材料与其它原料一起球磨,导致碳化铝功能材料结构受损,从而影响其对碳化硅陶瓷性能的提升。
最后应说明的是,本文中所描述的具体实施例仅仅是对本发明精神作举例说明,而并非对本发明的实施方式的限定。本发明所属技术领域的技术人员可以对所描述的具有实施例做各种各样的修改或补充或采用类似的方式替代,这里无需也无法对所有的实施方式予以全例。而这些属于本发明的实质精神所引申出的显而易见的变化或变动仍属于本发明的保护范围,把它们解释成任何一种附加的限制都是与本发明精神相违背的。

Claims (5)

1.一种碳化硅陶瓷,其特征在于,所述碳化硅陶瓷的原料包括以下重量份数组分:
碳化硅:45~96.8份;
硼化钙:1~15份;
碳化铝功能梯度材料:1~15份;
金属单质:1~20份;
碳化硼:0.1~3份;
碳:0.1~2份;
碳化铝功能梯度材料由内至外依次为碳化铝、氮化铝和氧化铝;
碳化铝功能梯度材料的制备方法包括以下步骤:
S1、将粒度为0.05~0.25mm的碳化铝细粉在氮气流中于1000~1100℃温度下保温2~4h;
S2、将步骤S1获得的产物于650~750℃温度下保温3~5h,获得由内至外依次为碳化铝、氮化铝和氧化铝的碳化铝功能梯度材料;所述金属单质为钨、钼、钽和铌中的一种或几种;
所述碳化硅陶瓷的制备方法,包括以下步骤:
S1、按照重量份数称取各组分,将碳化硅、硼化钙、碳化硼、碳、粘结剂、分散剂投入球磨机中,加入水,球磨4~6h,然后加入金属单质,继续球磨20~50min;
S2、将步骤S1所得浆料采用离心喷雾干燥塔进行干燥造粒,过30~80目筛;
S3、将碳化铝功能梯度材料与步骤S2的造粒料高速混合均匀,然后装入钢模具中采用干压成型获得素坯;
S4、素坯按照图纸要求进行加工后,放入热等静压烧结炉内,在惰性气体中进行烧结,烧结结束后自然冷却;
S5、烧结后的产品按照要求经过磨加工、研磨抛光,检验合格后包装入库;
步骤S4中的烧结为:先在1800-1900℃下保温1~4h,然后升温至1820~1950℃下并加压至1-10MPa,保温1~4h。
2.根据权利要求1所述的碳化硅陶瓷,其特征在于,所述金属单质为钨和铌以质量比为1:(1.2~1.6)形成的复合物。
3.根据权利要求2所述的碳化硅陶瓷,其特征在于,碳与金属单质的摩尔比为1:(1.01~1.05)。
4.根据权利要求1所述的碳化硅陶瓷,其特征在于,步骤S1中,球磨采用的球磨介质为碳化硅材料球,碳化硅材料球与碳化硅、硼化钙、金属单质、碳化硼、碳、粘结剂和分散剂的总质量比为3~4:1。
5.根据权利要求1所述的碳化硅陶瓷,其特征在于,步骤S1的粘结剂为聚乙烯醇、聚乙二醇、羧甲基纤维素钠、聚乙烯吡咯烷酮、糊精中的一种或多种;步骤S1的分散剂为四甲基氢氧化铵、聚丙烯酸铵、柠檬酸铵、三乙醇胺中的一种或多种。
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CN106187203B (zh) * 2016-07-19 2019-06-28 华中科技大学 一种基于碳化铝制备氮化铝粉体的方法及其产品

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