CN112198162A - 外观检查装置 - Google Patents

外观检查装置 Download PDF

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Publication number
CN112198162A
CN112198162A CN202010630532.9A CN202010630532A CN112198162A CN 112198162 A CN112198162 A CN 112198162A CN 202010630532 A CN202010630532 A CN 202010630532A CN 112198162 A CN112198162 A CN 112198162A
Authority
CN
China
Prior art keywords
camera
illuminators
image
inspection apparatus
appearance inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010630532.9A
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English (en)
Chinese (zh)
Inventor
中岛丰治
市村和宽
为则通洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nishijin Corp
Seishin Trading Co Ltd
Original Assignee
Nishijin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nishijin Corp filed Critical Nishijin Corp
Publication of CN112198162A publication Critical patent/CN112198162A/zh
Pending legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques

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  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
CN202010630532.9A 2019-07-08 2020-07-03 外观检查装置 Pending CN112198162A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-126970 2019-07-08
JP2019126970A JP6616040B1 (ja) 2019-07-08 2019-07-08 外観検査装置

Publications (1)

Publication Number Publication Date
CN112198162A true CN112198162A (zh) 2021-01-08

Family

ID=68763512

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010630532.9A Pending CN112198162A (zh) 2019-07-08 2020-07-03 外观检查装置

Country Status (3)

Country Link
JP (1) JP6616040B1 (ja)
CN (1) CN112198162A (ja)
TW (1) TWI747365B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110676155A (zh) * 2019-09-27 2020-01-10 上海申和热磁电子有限公司 一种检测抛光硅片表面浅在缺陷的方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102635249B1 (ko) 2020-08-31 2024-02-08 세메스 주식회사 이미지 획득 방법, 이미지 획득 장치 및 웨이퍼 검사 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033228A (ja) * 1999-07-26 2001-02-09 Nok Corp 表面検査装置
JP2008102103A (ja) * 2006-10-20 2008-05-01 Ccs Inc 光照射装置
CN102713579A (zh) * 2009-12-11 2012-10-03 第一实业视检系统股份有限公司 外观检查装置
CN103562711A (zh) * 2011-03-10 2014-02-05 美德客科技有限公司 改善图像清晰度的目视检查装置
JP2014085220A (ja) * 2012-10-23 2014-05-12 Ushio Inc 外観検査装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011517340A (ja) * 2008-02-04 2011-06-02 エフペーエス・フード・プロセッシング・システムズ・ベーフェー 卵の表面上の汚れ及びその他の欠陥を検出するためのソフトウェア制御を有する視覚システム
JP5806808B2 (ja) * 2010-08-18 2015-11-10 倉敷紡績株式会社 撮像光学検査装置
CN202176973U (zh) * 2011-06-30 2012-03-28 深圳宜美智科技有限公司 一种适用于印刷线路板外观机检的光源装置
JP6153311B2 (ja) * 2012-10-30 2017-06-28 株式会社クボタ 粒状体検査装置
JP6157086B2 (ja) * 2012-10-30 2017-07-05 株式会社クボタ 粒状体検査装置
JP2016114452A (ja) * 2014-12-15 2016-06-23 株式会社NejiLaw 撮像システム
CN206192898U (zh) * 2016-08-24 2017-05-24 昆山市海宣电子有限公司 一种线路板外观检查装置
JP6935262B2 (ja) * 2017-08-03 2021-09-15 日立チャネルソリューションズ株式会社 外観検査装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001033228A (ja) * 1999-07-26 2001-02-09 Nok Corp 表面検査装置
JP2008102103A (ja) * 2006-10-20 2008-05-01 Ccs Inc 光照射装置
CN102713579A (zh) * 2009-12-11 2012-10-03 第一实业视检系统股份有限公司 外观检查装置
CN103562711A (zh) * 2011-03-10 2014-02-05 美德客科技有限公司 改善图像清晰度的目视检查装置
JP2014085220A (ja) * 2012-10-23 2014-05-12 Ushio Inc 外観検査装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110676155A (zh) * 2019-09-27 2020-01-10 上海申和热磁电子有限公司 一种检测抛光硅片表面浅在缺陷的方法
CN110676155B (zh) * 2019-09-27 2021-12-10 上海中欣晶圆半导体科技有限公司 一种检测抛光硅片表面浅在缺陷的方法

Also Published As

Publication number Publication date
TWI747365B (zh) 2021-11-21
TW202102839A (zh) 2021-01-16
JP2021012127A (ja) 2021-02-04
JP6616040B1 (ja) 2019-12-04

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