CN111732107A - 一种水玻璃制备超大粒径高浓度硅溶胶的方法 - Google Patents
一种水玻璃制备超大粒径高浓度硅溶胶的方法 Download PDFInfo
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- CN111732107A CN111732107A CN202010661159.3A CN202010661159A CN111732107A CN 111732107 A CN111732107 A CN 111732107A CN 202010661159 A CN202010661159 A CN 202010661159A CN 111732107 A CN111732107 A CN 111732107A
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 title claims abstract description 93
- 239000002245 particle Substances 0.000 title claims abstract description 92
- 238000000034 method Methods 0.000 title claims abstract description 43
- 235000019353 potassium silicate Nutrition 0.000 title claims abstract description 33
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 43
- 238000002360 preparation method Methods 0.000 claims abstract description 26
- 230000008569 process Effects 0.000 claims abstract description 19
- 230000012010 growth Effects 0.000 claims abstract description 13
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000004094 surface-active agent Substances 0.000 claims abstract description 9
- 238000001704 evaporation Methods 0.000 claims abstract description 8
- 230000008020 evaporation Effects 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 238000000108 ultra-filtration Methods 0.000 claims abstract description 8
- 239000013078 crystal Substances 0.000 claims description 51
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 48
- 239000012452 mother liquor Substances 0.000 claims description 45
- 238000006243 chemical reaction Methods 0.000 claims description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 230000032683 aging Effects 0.000 claims description 17
- 238000005498 polishing Methods 0.000 claims description 16
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 14
- 238000009835 boiling Methods 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 14
- 239000012535 impurity Substances 0.000 claims description 14
- 238000003756 stirring Methods 0.000 claims description 13
- 229910052681 coesite Inorganic materials 0.000 claims description 11
- 229910052906 cristobalite Inorganic materials 0.000 claims description 11
- 229910052682 stishovite Inorganic materials 0.000 claims description 11
- 229910052905 tridymite Inorganic materials 0.000 claims description 11
- 239000003729 cation exchange resin Substances 0.000 claims description 10
- 238000005342 ion exchange Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229910001415 sodium ion Inorganic materials 0.000 claims description 8
- 238000000265 homogenisation Methods 0.000 claims description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- 230000034655 secondary growth Effects 0.000 claims description 6
- 229940093429 polyethylene glycol 6000 Drugs 0.000 claims description 5
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 3
- 150000001768 cations Chemical class 0.000 claims description 3
- 229920002223 polystyrene Polymers 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 3
- 238000006116 polymerization reaction Methods 0.000 abstract description 3
- 238000002425 crystallisation Methods 0.000 abstract description 2
- 230000008025 crystallization Effects 0.000 abstract description 2
- 238000004448 titration Methods 0.000 description 6
- 125000002091 cationic group Chemical group 0.000 description 4
- 238000007865 diluting Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000004111 Potassium silicate Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000000693 micelle Substances 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 2
- 229910052913 potassium silicate Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000005526 G1 to G0 transition Effects 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 239000003146 anticoagulant agent Substances 0.000 description 1
- 229940127219 anticoagulant drug Drugs 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000005495 investment casting Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 235000019794 sodium silicate Nutrition 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
Description
SiO<sub>2</sub>% | 粒径 | 粘度 | 稳定期 | 合成周期 | |
实施例1 | 36.8 | 140 | 1.9 | 大于1年 | 8h |
实施例2 | 40.2 | 155 | 1.5 | 大于1年 | 8h |
实施例3 | 37.6 | 150 | 1.8 | 大于1.5年 | 8h |
对比例 | 24.5 | 40 | 2.8 | 大于0.5年 | 大于20h |
Claims (10)
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CN202010661159.3A CN111732107B (zh) | 2020-07-10 | 2020-07-10 | 一种水玻璃制备超大粒径高浓度硅溶胶的方法 |
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CN202010661159.3A CN111732107B (zh) | 2020-07-10 | 2020-07-10 | 一种水玻璃制备超大粒径高浓度硅溶胶的方法 |
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CN111732107A true CN111732107A (zh) | 2020-10-02 |
CN111732107B CN111732107B (zh) | 2021-03-30 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113277521A (zh) * | 2021-05-17 | 2021-08-20 | 中国科学院上海微系统与信息技术研究所 | 一种胶体二氧化硅的制备方法 |
CN113880098A (zh) * | 2021-11-17 | 2022-01-04 | 江苏海格新材料有限公司 | 一种高纯球形硅微粉的生产方法 |
CN115448741A (zh) * | 2022-08-11 | 2022-12-09 | 航天特种材料及工艺技术研究所 | 基于恒液面浓缩-原位凝胶工艺制备氧化铝纤维增强陶瓷基复合材料的方法及其应用 |
Citations (8)
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---|---|---|---|---|
CN1594080A (zh) * | 2004-07-03 | 2005-03-16 | 河北工业大学 | 大粒径硅溶胶的制备方法 |
CN1830778A (zh) * | 2006-04-07 | 2006-09-13 | 北京国瑞升科技有限公司 | 一种大粒径纳米级二氧化硅胶体的制备方法 |
CN1830777A (zh) * | 2005-03-07 | 2006-09-13 | 中国科学院上海应用物理研究所 | 硅溶胶的制造方法及制得的硅溶胶 |
CN103030151A (zh) * | 2012-12-05 | 2013-04-10 | 广东惠和硅制品有限公司 | 一种中性大粒径高浓度高纯度硅溶胶、制备方法及其用途 |
US20140013674A1 (en) * | 2011-12-28 | 2014-01-16 | Jgc Catalysts And Chemicals Ltd. | High Purity Silica Sol and its Production Method |
CN104495857A (zh) * | 2014-12-10 | 2015-04-08 | 深圳市力合材料有限公司 | 一种快速制备大粒径硅溶胶的方法 |
CN105883824A (zh) * | 2016-04-12 | 2016-08-24 | 广东惠和硅制品有限公司 | 一种大粒径硅溶胶的制备方法 |
CN106752968A (zh) * | 2016-11-18 | 2017-05-31 | 福建三邦硅材料有限公司 | 一种蓝宝石抛光用大粒径低粘度硅溶胶的制备方法 |
-
2020
- 2020-07-10 CN CN202010661159.3A patent/CN111732107B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1594080A (zh) * | 2004-07-03 | 2005-03-16 | 河北工业大学 | 大粒径硅溶胶的制备方法 |
CN1830777A (zh) * | 2005-03-07 | 2006-09-13 | 中国科学院上海应用物理研究所 | 硅溶胶的制造方法及制得的硅溶胶 |
CN1830778A (zh) * | 2006-04-07 | 2006-09-13 | 北京国瑞升科技有限公司 | 一种大粒径纳米级二氧化硅胶体的制备方法 |
US20140013674A1 (en) * | 2011-12-28 | 2014-01-16 | Jgc Catalysts And Chemicals Ltd. | High Purity Silica Sol and its Production Method |
CN103030151A (zh) * | 2012-12-05 | 2013-04-10 | 广东惠和硅制品有限公司 | 一种中性大粒径高浓度高纯度硅溶胶、制备方法及其用途 |
CN104495857A (zh) * | 2014-12-10 | 2015-04-08 | 深圳市力合材料有限公司 | 一种快速制备大粒径硅溶胶的方法 |
CN105883824A (zh) * | 2016-04-12 | 2016-08-24 | 广东惠和硅制品有限公司 | 一种大粒径硅溶胶的制备方法 |
CN106752968A (zh) * | 2016-11-18 | 2017-05-31 | 福建三邦硅材料有限公司 | 一种蓝宝石抛光用大粒径低粘度硅溶胶的制备方法 |
Non-Patent Citations (1)
Title |
---|
段晓娜等: "硅溶胶的研究进展及应用", 《硅酸盐通报》 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113277521A (zh) * | 2021-05-17 | 2021-08-20 | 中国科学院上海微系统与信息技术研究所 | 一种胶体二氧化硅的制备方法 |
CN113880098A (zh) * | 2021-11-17 | 2022-01-04 | 江苏海格新材料有限公司 | 一种高纯球形硅微粉的生产方法 |
CN115448741A (zh) * | 2022-08-11 | 2022-12-09 | 航天特种材料及工艺技术研究所 | 基于恒液面浓缩-原位凝胶工艺制备氧化铝纤维增强陶瓷基复合材料的方法及其应用 |
CN115448741B (zh) * | 2022-08-11 | 2023-07-18 | 航天特种材料及工艺技术研究所 | 基于恒液面浓缩-原位凝胶工艺制备氧化铝纤维增强陶瓷基复合材料的方法及其应用 |
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CN111732107B (zh) | 2021-03-30 |
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