CN111630210A - 电镀组合机构 - Google Patents
电镀组合机构 Download PDFInfo
- Publication number
- CN111630210A CN111630210A CN201780045216.1A CN201780045216A CN111630210A CN 111630210 A CN111630210 A CN 111630210A CN 201780045216 A CN201780045216 A CN 201780045216A CN 111630210 A CN111630210 A CN 111630210A
- Authority
- CN
- China
- Prior art keywords
- electroplating
- cathode
- annular cylinder
- plating
- surrounding wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009713 electroplating Methods 0.000 title claims abstract description 49
- 230000007246 mechanism Effects 0.000 title claims abstract description 12
- 238000007747 plating Methods 0.000 claims description 58
- 230000005540 biological transmission Effects 0.000 claims description 9
- 235000012431 wafers Nutrition 0.000 claims 3
- 230000000694 effects Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/22—Apparatus for electrolytic coating of small objects in bulk having open containers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
Abstract
本发明公开一种电镀组合机构,包含一电镀滚筒(3);所述电镀滚筒(3)具有一环形筒体(31)、一转轴(32)、一卡合部(33)及多个涡流叶片(37),所述转轴(32)的一第一端(321)设置在所述环形筒体(31)上,所述卡合部(33)设置在所述环形筒体(31)的一底部,用以被一驱动器带动旋转,所述涡流叶片(37)设置在所述环形筒体(31)的底部。
Description
PCT国内申请,说明书已公开。
Claims (8)
- PCT国内申请,权利要求书已公开。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2017/118619 WO2019127014A1 (zh) | 2017-12-26 | 2017-12-26 | 电镀组合机构 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111630210A true CN111630210A (zh) | 2020-09-04 |
CN111630210B CN111630210B (zh) | 2022-01-25 |
Family
ID=67063822
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201780045216.1A Active CN111630210B (zh) | 2017-12-26 | 2017-12-26 | 电镀组合机构 |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP3733934A4 (zh) |
JP (1) | JP6800308B2 (zh) |
KR (1) | KR102221652B1 (zh) |
CN (1) | CN111630210B (zh) |
WO (1) | WO2019127014A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7340441B2 (ja) | 2019-12-19 | 2023-09-07 | Koa株式会社 | 回転型めっき装置およびこれを用いためっき方法 |
CN113201786B (zh) * | 2021-03-25 | 2022-07-01 | 浙江机电职业技术学院 | 一种零件加工用滚镀装置 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3359195A (en) * | 1963-10-29 | 1967-12-19 | Hojyo Kazuya | Automatic chromium plating apparatus |
JPS6160158B2 (zh) * | 1983-05-09 | 1986-12-19 | Tetsuya Hojo | |
US4671862A (en) * | 1985-09-17 | 1987-06-09 | Siemens Aktiengesellschaft | Apparatus for mass electroplating of bulk goods |
GB2259523B (en) * | 1991-09-13 | 1995-04-26 | Murata Manufacturing Co | Method of plating miniature parts |
CN1904146A (zh) * | 2005-07-28 | 2007-01-31 | Tdk株式会社 | 镀层装置和镀层方法 |
CN101319345A (zh) * | 2007-06-06 | 2008-12-10 | 上村工业株式会社 | 工件表面处理系统 |
JP2009065005A (ja) * | 2007-09-07 | 2009-03-26 | Panasonic Corp | チップ状電子部品の製造方法 |
JP5514591B2 (ja) * | 2010-03-15 | 2014-06-04 | 孝志 上市 | メッキ装置 |
CN106884198A (zh) * | 2017-04-18 | 2017-06-23 | 林春芳 | 一种电镀装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3128459B2 (ja) * | 1995-02-28 | 2001-01-29 | 上村工業株式会社 | 小物の回転めっき装置 |
JPH11279800A (ja) * | 1998-03-26 | 1999-10-12 | Hitachi Metals Ltd | 小型電子部品のめっき方法 |
JP4458056B2 (ja) * | 2005-07-28 | 2010-04-28 | Tdk株式会社 | めっき装置 |
JP4832970B2 (ja) * | 2006-07-06 | 2011-12-07 | 上村工業株式会社 | 小物の表面処理装置 |
JP5672717B2 (ja) * | 2010-02-25 | 2015-02-18 | Tdk株式会社 | めっき装置、めっき方法およびチップ型電子部品の製造方法 |
JP4998578B2 (ja) * | 2010-03-29 | 2012-08-15 | Tdk株式会社 | めっき装置、めっき方法およびチップ型電子部品の製造方法 |
JP5598754B2 (ja) * | 2010-06-08 | 2014-10-01 | 日立金属株式会社 | めっき装置 |
WO2018189901A1 (ja) * | 2017-04-14 | 2018-10-18 | Ykk株式会社 | めっき材及びその製造方法 |
-
2017
- 2017-12-26 WO PCT/CN2017/118619 patent/WO2019127014A1/zh unknown
- 2017-12-26 KR KR1020197007654A patent/KR102221652B1/ko active IP Right Grant
- 2017-12-26 CN CN201780045216.1A patent/CN111630210B/zh active Active
- 2017-12-26 EP EP17936813.9A patent/EP3733934A4/en active Pending
- 2017-12-26 JP JP2019503564A patent/JP6800308B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3359195A (en) * | 1963-10-29 | 1967-12-19 | Hojyo Kazuya | Automatic chromium plating apparatus |
JPS6160158B2 (zh) * | 1983-05-09 | 1986-12-19 | Tetsuya Hojo | |
US4671862A (en) * | 1985-09-17 | 1987-06-09 | Siemens Aktiengesellschaft | Apparatus for mass electroplating of bulk goods |
GB2259523B (en) * | 1991-09-13 | 1995-04-26 | Murata Manufacturing Co | Method of plating miniature parts |
CN1904146A (zh) * | 2005-07-28 | 2007-01-31 | Tdk株式会社 | 镀层装置和镀层方法 |
CN101319345A (zh) * | 2007-06-06 | 2008-12-10 | 上村工业株式会社 | 工件表面处理系统 |
JP2009065005A (ja) * | 2007-09-07 | 2009-03-26 | Panasonic Corp | チップ状電子部品の製造方法 |
JP5514591B2 (ja) * | 2010-03-15 | 2014-06-04 | 孝志 上市 | メッキ装置 |
CN106884198A (zh) * | 2017-04-18 | 2017-06-23 | 林春芳 | 一种电镀装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20190082191A (ko) | 2019-07-09 |
EP3733934A4 (en) | 2021-07-14 |
EP3733934A1 (en) | 2020-11-04 |
JP6800308B2 (ja) | 2020-12-16 |
CN111630210B (zh) | 2022-01-25 |
JP2020506284A (ja) | 2020-02-27 |
WO2019127014A1 (zh) | 2019-07-04 |
KR102221652B1 (ko) | 2021-03-02 |
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