CN111386498A - 感光性转印材料、树脂图案制造方法及布线制造方法 - Google Patents
感光性转印材料、树脂图案制造方法及布线制造方法 Download PDFInfo
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
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- G—PHYSICS
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- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
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JP2017-227035 | 2017-11-27 | ||
JP2017227035 | 2017-11-27 | ||
JP2018098330 | 2018-05-22 | ||
JP2018-098330 | 2018-05-22 | ||
PCT/JP2018/039375 WO2019102771A1 (ja) | 2017-11-27 | 2018-10-23 | 感光性転写材料、樹脂パターン製造方法、及び、配線製造方法 |
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CN111386498A true CN111386498A (zh) | 2020-07-07 |
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CN201880075097.9A Pending CN111386498A (zh) | 2017-11-27 | 2018-10-23 | 感光性转印材料、树脂图案制造方法及布线制造方法 |
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JP (2) | JP6999693B2 (ja) |
CN (1) | CN111386498A (ja) |
TW (1) | TW201924935A (ja) |
WO (1) | WO2019102771A1 (ja) |
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WO2021065152A1 (ja) * | 2019-09-30 | 2021-04-08 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
CN114450161B (zh) * | 2019-09-30 | 2024-04-02 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
JP7506745B2 (ja) * | 2020-06-26 | 2024-06-26 | 富士フイルム株式会社 | 組成物、転写フィルム、積層体の製造方法、回路配線の製造方法、及び、電子デバイスの製造方法 |
WO2022138576A1 (ja) * | 2020-12-25 | 2022-06-30 | 富士フイルム株式会社 | 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、電子デバイスの製造方法、及び、積層体の製造方法 |
JPWO2023127755A1 (ja) * | 2021-12-27 | 2023-07-06 |
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JP2002372788A (ja) * | 2001-06-13 | 2002-12-26 | Fuji Photo Film Co Ltd | 感光性転写材料およびカラーフィルターの製造方法 |
JP2003215794A (ja) * | 2002-01-23 | 2003-07-30 | Fuji Photo Film Co Ltd | 感光性転写材料及びカラーフィルター |
WO2006064884A1 (ja) * | 2004-12-15 | 2006-06-22 | Kuraray Co., Ltd. | 活性エネルギー線硬化性樹脂組成物およびその用途 |
JP2006268027A (ja) * | 2005-02-23 | 2006-10-05 | Jsr Corp | プラズマディスプレイパネルの製造方法および転写フィルム |
JP2007225939A (ja) * | 2006-02-23 | 2007-09-06 | Fujifilm Corp | 多層材料、樹脂パターンの形成方法、基板、表示装置及び液晶表示装置 |
JP2015184323A (ja) * | 2014-03-20 | 2015-10-22 | 富士フイルム株式会社 | 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置 |
CN107015437A (zh) * | 2015-10-21 | 2017-08-04 | 富士胶片株式会社 | 干膜抗蚀剂、电路布线的制造方法、电路布线、输入装置及显示装置 |
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JP3947008B2 (ja) * | 2002-01-15 | 2007-07-18 | 富士フイルム株式会社 | 感光性転写材料 |
JP2005266166A (ja) | 2004-03-17 | 2005-09-29 | Fuji Photo Film Co Ltd | 感光性転写材料およびそれを用いたプリント配線基板の製造方法 |
JP2005352064A (ja) | 2004-06-09 | 2005-12-22 | Fuji Photo Film Co Ltd | 感光性フィルム、永久パターン及びその形成方法 |
JP2006344314A (ja) | 2005-06-09 | 2006-12-21 | Fujifilm Holdings Corp | 磁気記録媒体 |
-
2018
- 2018-10-23 WO PCT/JP2018/039375 patent/WO2019102771A1/ja active Application Filing
- 2018-10-23 JP JP2019556140A patent/JP6999693B2/ja active Active
- 2018-10-23 CN CN201880075097.9A patent/CN111386498A/zh active Pending
- 2018-11-06 TW TW107139235A patent/TW201924935A/zh unknown
-
2021
- 2021-12-13 JP JP2021201967A patent/JP2022043153A/ja not_active Abandoned
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JP2002372788A (ja) * | 2001-06-13 | 2002-12-26 | Fuji Photo Film Co Ltd | 感光性転写材料およびカラーフィルターの製造方法 |
JP2003215794A (ja) * | 2002-01-23 | 2003-07-30 | Fuji Photo Film Co Ltd | 感光性転写材料及びカラーフィルター |
WO2006064884A1 (ja) * | 2004-12-15 | 2006-06-22 | Kuraray Co., Ltd. | 活性エネルギー線硬化性樹脂組成物およびその用途 |
JP2006268027A (ja) * | 2005-02-23 | 2006-10-05 | Jsr Corp | プラズマディスプレイパネルの製造方法および転写フィルム |
JP2007225939A (ja) * | 2006-02-23 | 2007-09-06 | Fujifilm Corp | 多層材料、樹脂パターンの形成方法、基板、表示装置及び液晶表示装置 |
JP2015184323A (ja) * | 2014-03-20 | 2015-10-22 | 富士フイルム株式会社 | 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置 |
CN107015437A (zh) * | 2015-10-21 | 2017-08-04 | 富士胶片株式会社 | 干膜抗蚀剂、电路布线的制造方法、电路布线、输入装置及显示装置 |
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JP2022043153A (ja) | 2022-03-15 |
JPWO2019102771A1 (ja) | 2020-11-19 |
JP6999693B2 (ja) | 2022-01-19 |
WO2019102771A1 (ja) | 2019-05-31 |
TW201924935A (zh) | 2019-07-01 |
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