CN111386498A - 感光性转印材料、树脂图案制造方法及布线制造方法 - Google Patents

感光性转印材料、树脂图案制造方法及布线制造方法 Download PDF

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Publication number
CN111386498A
CN111386498A CN201880075097.9A CN201880075097A CN111386498A CN 111386498 A CN111386498 A CN 111386498A CN 201880075097 A CN201880075097 A CN 201880075097A CN 111386498 A CN111386498 A CN 111386498A
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China
Prior art keywords
photosensitive
layer
photosensitive layer
transfer material
group
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Pending
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CN201880075097.9A
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English (en)
Chinese (zh)
Inventor
两角一真
藤本进二
汉那慎一
石坂壮二
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Fujifilm Corp
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Fujifilm Corp
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Publication of CN111386498A publication Critical patent/CN111386498A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
CN201880075097.9A 2017-11-27 2018-10-23 感光性转印材料、树脂图案制造方法及布线制造方法 Pending CN111386498A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2017-227035 2017-11-27
JP2017227035 2017-11-27
JP2018098330 2018-05-22
JP2018-098330 2018-05-22
PCT/JP2018/039375 WO2019102771A1 (ja) 2017-11-27 2018-10-23 感光性転写材料、樹脂パターン製造方法、及び、配線製造方法

Publications (1)

Publication Number Publication Date
CN111386498A true CN111386498A (zh) 2020-07-07

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880075097.9A Pending CN111386498A (zh) 2017-11-27 2018-10-23 感光性转印材料、树脂图案制造方法及布线制造方法

Country Status (4)

Country Link
JP (2) JP6999693B2 (ja)
CN (1) CN111386498A (ja)
TW (1) TW201924935A (ja)
WO (1) WO2019102771A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021065152A1 (ja) * 2019-09-30 2021-04-08 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
CN114450161B (zh) * 2019-09-30 2024-04-02 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
JP7506745B2 (ja) * 2020-06-26 2024-06-26 富士フイルム株式会社 組成物、転写フィルム、積層体の製造方法、回路配線の製造方法、及び、電子デバイスの製造方法
WO2022138576A1 (ja) * 2020-12-25 2022-06-30 富士フイルム株式会社 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、電子デバイスの製造方法、及び、積層体の製造方法
JPWO2023127755A1 (ja) * 2021-12-27 2023-07-06

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002372788A (ja) * 2001-06-13 2002-12-26 Fuji Photo Film Co Ltd 感光性転写材料およびカラーフィルターの製造方法
JP2003215794A (ja) * 2002-01-23 2003-07-30 Fuji Photo Film Co Ltd 感光性転写材料及びカラーフィルター
WO2006064884A1 (ja) * 2004-12-15 2006-06-22 Kuraray Co., Ltd. 活性エネルギー線硬化性樹脂組成物およびその用途
JP2006268027A (ja) * 2005-02-23 2006-10-05 Jsr Corp プラズマディスプレイパネルの製造方法および転写フィルム
JP2007225939A (ja) * 2006-02-23 2007-09-06 Fujifilm Corp 多層材料、樹脂パターンの形成方法、基板、表示装置及び液晶表示装置
JP2015184323A (ja) * 2014-03-20 2015-10-22 富士フイルム株式会社 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置
CN107015437A (zh) * 2015-10-21 2017-08-04 富士胶片株式会社 干膜抗蚀剂、电路布线的制造方法、电路布线、输入装置及显示装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3947008B2 (ja) * 2002-01-15 2007-07-18 富士フイルム株式会社 感光性転写材料
JP2005266166A (ja) 2004-03-17 2005-09-29 Fuji Photo Film Co Ltd 感光性転写材料およびそれを用いたプリント配線基板の製造方法
JP2005352064A (ja) 2004-06-09 2005-12-22 Fuji Photo Film Co Ltd 感光性フィルム、永久パターン及びその形成方法
JP2006344314A (ja) 2005-06-09 2006-12-21 Fujifilm Holdings Corp 磁気記録媒体

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002372788A (ja) * 2001-06-13 2002-12-26 Fuji Photo Film Co Ltd 感光性転写材料およびカラーフィルターの製造方法
JP2003215794A (ja) * 2002-01-23 2003-07-30 Fuji Photo Film Co Ltd 感光性転写材料及びカラーフィルター
WO2006064884A1 (ja) * 2004-12-15 2006-06-22 Kuraray Co., Ltd. 活性エネルギー線硬化性樹脂組成物およびその用途
JP2006268027A (ja) * 2005-02-23 2006-10-05 Jsr Corp プラズマディスプレイパネルの製造方法および転写フィルム
JP2007225939A (ja) * 2006-02-23 2007-09-06 Fujifilm Corp 多層材料、樹脂パターンの形成方法、基板、表示装置及び液晶表示装置
JP2015184323A (ja) * 2014-03-20 2015-10-22 富士フイルム株式会社 感光性積層体、転写材料、パターン化された感光性積層体及びその製造方法、タッチパネル、並びに画像表示装置
CN107015437A (zh) * 2015-10-21 2017-08-04 富士胶片株式会社 干膜抗蚀剂、电路布线的制造方法、电路布线、输入装置及显示装置

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JP2022043153A (ja) 2022-03-15
JPWO2019102771A1 (ja) 2020-11-19
JP6999693B2 (ja) 2022-01-19
WO2019102771A1 (ja) 2019-05-31
TW201924935A (zh) 2019-07-01

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Application publication date: 20200707