CN111377515B - 用于分解过氧化氢的方法及使用该方法的装置 - Google Patents

用于分解过氧化氢的方法及使用该方法的装置 Download PDF

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Publication number
CN111377515B
CN111377515B CN201911368807.XA CN201911368807A CN111377515B CN 111377515 B CN111377515 B CN 111377515B CN 201911368807 A CN201911368807 A CN 201911368807A CN 111377515 B CN111377515 B CN 111377515B
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CN
China
Prior art keywords
hydrogen peroxide
waste liquid
sulfuric acid
decomposing
decomposition
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CN201911368807.XA
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English (en)
Chinese (zh)
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CN111377515A (zh
Inventor
吉田启幸
土屋恵悟
永野寿年
户泽信彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ri Cao Engineering Co ltd
Kanto Chemical Co Inc
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Ri Cao Engineering Co ltd
Kanto Chemical Co Inc
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Publication of CN111377515A publication Critical patent/CN111377515A/zh
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B17/00—Sulfur; Compounds thereof
    • C01B17/69—Sulfur trioxide; Sulfuric acid
    • C01B17/90—Separation; Purification
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/22—Treatment of water, waste water, or sewage by freezing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/30—Wastewater or sewage treatment systems using renewable energies
    • Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Removal Of Specific Substances (AREA)
  • Catalysts (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN201911368807.XA 2018-12-28 2019-12-26 用于分解过氧化氢的方法及使用该方法的装置 Active CN111377515B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-248406 2018-12-28
JP2018248406A JP7219088B2 (ja) 2018-12-28 2018-12-28 過酸化水素を分解する方法および該方法に用いる装置

Publications (2)

Publication Number Publication Date
CN111377515A CN111377515A (zh) 2020-07-07
CN111377515B true CN111377515B (zh) 2023-06-27

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CN201911368807.XA Active CN111377515B (zh) 2018-12-28 2019-12-26 用于分解过氧化氢的方法及使用该方法的装置

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JP (1) JP7219088B2 (ja)
KR (1) KR20200083322A (ja)
CN (1) CN111377515B (ja)
TW (1) TW202035279A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113336198B (zh) * 2021-08-05 2021-10-15 清大国华环境集团股份有限公司 一种集成电路行业废硫酸回收利用方法及系统

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1223971A (zh) * 1997-12-01 1999-07-28 索尼株式会社 利用硫酸/过氧化物混合液的方法
JPH11319849A (ja) * 1998-05-15 1999-11-24 Sony Corp 硫酸・過酸化物混合薬液処理装置
JP2002001358A (ja) * 2000-06-20 2002-01-08 Mitsubishi Gas Chem Co Inc 化学研磨廃液の過酸化水素分解方法
CN105293449A (zh) * 2015-10-30 2016-02-03 上海新阳半导体材料股份有限公司 一种从半导体清洗工艺的废酸中回收硫酸的方法
CN108793095A (zh) * 2018-09-26 2018-11-13 高频美特利环境科技（北京）有限公司 溶液除杂方法和溶液除杂系统

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5954530B2 (ja) 2012-03-30 2016-07-20 栗田工業株式会社 硫酸廃液処理装置および硫酸廃液処理方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1223971A (zh) * 1997-12-01 1999-07-28 索尼株式会社 利用硫酸/过氧化物混合液的方法
JPH11319849A (ja) * 1998-05-15 1999-11-24 Sony Corp 硫酸・過酸化物混合薬液処理装置
JP2002001358A (ja) * 2000-06-20 2002-01-08 Mitsubishi Gas Chem Co Inc 化学研磨廃液の過酸化水素分解方法
CN105293449A (zh) * 2015-10-30 2016-02-03 上海新阳半导体材料股份有限公司 一种从半导体清洗工艺的废酸中回收硫酸的方法
CN108793095A (zh) * 2018-09-26 2018-11-13 高频美特利环境科技（北京）有限公司 溶液除杂方法和溶液除杂系统

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Publication number Publication date
KR20200083322A (ko) 2020-07-08
CN111377515A (zh) 2020-07-07
JP7219088B2 (ja) 2023-02-07
JP2020104086A (ja) 2020-07-09
TW202035279A (zh) 2020-10-01

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